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1. 发明申请

US20130334172A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM 有权
标题翻译：基板处理装置，基板处理方法和计算机可读存储介质存储基板处理程序
公开(公告)号：US20130334172A1
公开(公告)日：2013-12-19
申请号：US13677534
申请日：2012-11-15
申请人： TOKYO ELECTRON LIMITED
发明人： Shuhei Matsumoto , Shuji Iwanaga , Hiroshi Tomita , Kenji Nakamizo , Satoshi Morita
IPC分类号： H01L21/67 , G05D3/00
CPC分类号： H01L21/67023 , G05D3/00 , H01L21/67051 , H01L21/6708 , H01L21/67259
摘要： Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate. The liquid processing apparatus includes a substrate holding unit that holds a substrate, a camera that photographs a region where a peripheral edge portion of substrate is present when substrate is properly held by the substrate holding unit, and a control unit that determines a holding state of the substrate held by the substrate holding unit based on an image photographed by the camera.
摘要翻译：公开了一种能够在不受例如基板的材料或表面状况的影响的情况下精确地确定基板的保持状态的液体处理装置。液体处理装置包括：保持基板的基板保持单元，当基板被基板保持单元适当地保持时拍摄基板周边部分存在的区域的照相机;以及控制单元，其确定基板保持单元的保持状态所述基板由所述基板保持单元基于由所述照相机拍摄的图像保持。

2. 发明申请

US20160370810A1 PROCESSING APPARATUS, PROCESSING METHOD, AND STORAGE MEDIUM 审中-公开
标题翻译：加工设备，加工方法和储存介质
公开(公告)号：US20160370810A1
公开(公告)日：2016-12-22
申请号：US15181770
申请日：2016-06-14
申请人： Tokyo Electron Limited
发明人： Keigo Satake , Kenji Nakamizo , Yuichi Douki , Takuro Masuzumi
IPC分类号： G05D7/06
CPC分类号： G05D7/0635 , G05B2219/41303 , H01L21/67051 , H01L21/67253
摘要： Disclosed is a processing apparatus including a chamber, at least one nozzle, a measuring unit, an opening/closing unit, and a controller. The chamber accommodates a workpiece therein. The nozzle is provided in the chamber to supply a processing fluid toward the workpiece. The measuring unit measures a supply flow rate of the processing fluid supplied to the nozzle. The opening/closing unit performs opening/closing of a flow path of the processing fluid to be supplied to the nozzle. The controller outputs opening and closing operation signals at a preset timing. After outputting the opening operation signal, the controller calculates an integrated amount of the processing fluid based on a measurement result of the measuring unit, and performs an output timing change processing to change a timing of outputting the opening or closing operation signal from the preset timing based on the calculated integrated amount.
摘要翻译：公开了一种包括室，至少一个喷嘴，测量单元，打开/关闭单元和控制器的处理设备。该室容纳工件。喷嘴设置在腔室中以朝向工件供应处理流体。测量单元测量供应到喷嘴的处理流体的供应流量。打开/关闭单元执行要供给到喷嘴的处理流体的流路的打开/关闭。控制器以预设的定时输出打开和关闭操作信号。在输出打开操作信号之后，控制器基于测量单元的测量结果计算处理流体的积分量，并且执行输出定时改变处理以改变从预设定时输出打开或关闭操作信号的定时基于计算的积分量。

3. 发明授权

US11135698B2 Processing apparatus, processing method, and storage medium 有权
公开(公告)号：US11135698B2
公开(公告)日：2021-10-05
申请号：US15181527
申请日：2016-06-14
申请人： Tokyo Electron Limited
发明人： Keigo Satake , Kenji Nakamizo , Yuichi Douki
IPC分类号： B24B37/005 , B24B37/20
摘要： Disclosed is a processing apparatus that includes a chamber accommodating a workpiece, a nozzle provided within the chamber, a measuring unit measuring the supply flow rate of the processing fluid supplied to the nozzle, an opening/closing unit performing opening/closing of the flow path of the processing fluid, and a controller. The controller sends an opening/closing operation signal that causes the opening/closing unit to perform an opening/closing operation according to recipe information that indicates processing contents. After sending the opening/closing operation signal to the opening/closing unit according to the recipe information, the controller starts the integration of the supply flow rate based on the measurement result of the measuring unit, monitors the rise of the supply flow rate based on the calculated integrated amount, and when supplying a specific flow rate, monitors the supply flow rate based on a value actually measured by the measuring unit.

4. 发明授权

US11094568B2 Processing apparatus, abnormality detection method, and storage medium 有权
公开(公告)号：US11094568B2
公开(公告)日：2021-08-17
申请号：US15960800
申请日：2018-04-24
申请人： TOKYO ELECTRON LIMITED
发明人： Kenji Nakamizo , Satoshi Morita , Akinori Tanaka , Hiroshi Komiya , Mikio Nakashima , Kousuke Fukuda , Youichi Masaki , Ryoji Ando , Ikuo Sunaka
IPC分类号： H01L21/67 , G01F9/00 , G01M3/28 , G01F25/00 , G05B23/02 , G01F15/00
摘要： A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.

5. 发明授权

US10261521B2 Processing apparatus, processing method, and storage medium 有权
公开(公告)号：US10261521B2
公开(公告)日：2019-04-16
申请号：US15181770
申请日：2016-06-14
申请人： Tokyo Electron Limited
发明人： Keigo Satake , Kenji Nakamizo , Yuichi Douki , Takuro Masuzumi
IPC分类号： G06F19/00 , G05D7/06 , H01L21/67
摘要： Disclosed is a processing apparatus including a chamber, at least one nozzle, a measuring unit, an opening/closing unit, and a controller. The chamber accommodates a workpiece therein. The nozzle is provided in the chamber to supply a processing fluid toward the workpiece. The measuring unit measures a supply flow rate of the processing fluid supplied to the nozzle. The opening/closing unit performs opening/closing of a flow path of the processing fluid to be supplied to the nozzle. The controller outputs opening and closing operation signals at a preset timing. After outputting the opening operation signal, the controller calculates an integrated amount of the processing fluid based on a measurement result of the measuring unit, and performs an output timing change processing to change a timing of outputting the opening or closing operation signal from the preset timing based on the calculated integrated amount.

6. 发明申请

US20160368114A1 PROCESSING APPARATUS, PROCESSING METHOD, AND STORAGE MEDIUM 审中-公开
标题翻译：加工设备，加工方法和储存介质
公开(公告)号：US20160368114A1
公开(公告)日：2016-12-22
申请号：US15181527
申请日：2016-06-14
申请人： Tokyo Electron Limited
发明人： Keigo Satake , Kenji Nakamizo , Yuichi Douki
IPC分类号： B24B37/005 , B24B37/20
CPC分类号： B24B37/005 , B24B37/20
摘要： Disclosed is a processing apparatus that includes a chamber accommodating a workpiece, a nozzle provided within the chamber, a measuring unit measuring the supply flow rate of the processing fluid supplied to the nozzle, an opening/closing unit performing opening/closing of the flow path of the processing fluid, and a controller. The controller sends an opening/closing operation signal that causes the opening/closing unit to perform an opening/closing operation according to recipe information that indicates processing contents. After sending the opening/closing operation signal to the opening/closing unit according to the recipe information, the controller starts the integration of the supply flow rate based on the measurement result of the measuring unit, monitors the rise of the supply flow rate based on the calculated integrated amount, and when supplying a specific flow rate, monitors the supply flow rate based on a value actually measured by the measuring unit.
摘要翻译：公开了一种处理装置，其包括容纳工件的室，设置在室内的喷嘴，测量供给到喷嘴的处理流体的供给流量的测量单元，执行流路开闭的打开/关闭单元的处理流体，以及控制器。控制器根据指示处理内容的配方信息发送打开/关闭操作信号，该打开/关闭操作信号使打开/关闭单元执行打开/关闭操作。根据配方信息向打开/关闭单元发送打开/关闭操作信号后，控制器基于测量单元的测量结果开始积分供给流量，基于以下方式监视供给流量的上升计算的积分量，以及当提供特定流量时，基于由测量单元实际测量的值监视供给流量。

7. 发明授权

US09039863B2 Substrate processing apparatus, substrate processing method, and computer readable storage medium storing substrate processing program 有权
标题翻译：基板处理装置，基板处理方法以及存储基板处理程序的计算机可读存储介质
公开(公告)号：US09039863B2
公开(公告)日：2015-05-26
申请号：US13677534
申请日：2012-11-15
申请人： Tokyo Electron Limited
发明人： Shuhei Matsumoto , Shuji Iwanaga , Hiroshi Tomita , Kenji Nakamizo , Satoshi Morita
IPC分类号： C23F1/00 , H01L21/67 , G05D3/00
CPC分类号： H01L21/67023 , G05D3/00 , H01L21/67051 , H01L21/6708 , H01L21/67259
摘要： Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate. The liquid processing apparatus includes a substrate holding unit that holds a substrate, a camera that photographs a region where a peripheral edge portion of substrate is present when substrate is properly held by the substrate holding unit, and a control unit that determines a holding state of the substrate held by the substrate holding unit based on an image photographed by the camera.
摘要翻译：公开了一种能够在不受例如基板的材料或表面状况的影响的情况下精确地确定基板的保持状态的液体处理装置。液体处理装置包括：保持基板的基板保持单元，当基板被基板保持单元适当地保持时拍摄基板周边部分存在的区域的照相机;以及控制单元，其确定基板保持单元的保持状态所述基板由所述基板保持单元基于由所述照相机拍摄的图像保持。

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