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1. 发明授权

US11273464B2 Substrate processing apparatus 有权
公开(公告)号：US11273464B2
公开(公告)日：2022-03-15
申请号：US16986412
申请日：2020-08-06
申请人： Tokyo Electron Limited
发明人： Satoshi Shimmura , Yuji Sakai , Kenta Shibasaki , Koji Takayanagi , Kenji Yada , Hiroichi Inada , Shinichi Seki , Kento Ogata
IPC分类号： B05C11/10 , B05B14/30 , B05C11/08 , B05C13/02
摘要： A substrate processing apparatus includes a cover member placed to surround a substrate held by a rotary holder; a collecting member placed in an exhaust path formed between the cover member and the rotary holder; and a solvent supply placed above the collecting member and configured to supply a solvent to the collecting member. The solvent supply includes an inner storage space surrounding the substrate; an outer storage space surrounding the inner storage space; and a partition wall extending along a circumferential direction to partition the inner storage space and the outer storage space. Multiple communication holes are extended to penetrate the partition wall such that the solvent introduced into the outer storage space flows to the inner storage space. Multiple dripping holes are extended to penetrate a bottom wall of the inner storage space such that the solvent within the inner storage space drops toward the collecting member.

2. 发明申请

US20160054653A1 LIQUID PROCESSING METHOD AND STORAGE MEDIUM 审中-公开
标题翻译：液体加工方法和储存介质
公开(公告)号：US20160054653A1
公开(公告)日：2016-02-25
申请号：US14919869
申请日：2015-10-22
申请人： Tokyo Electron Limited
发明人： Norihiko Sasagawa , Hiroichi Inada , Yasushi Takiguchi
IPC分类号： G03F7/16
CPC分类号： G03F7/162 , B05D1/005 , G03F7/3021 , G06F19/00 , H01L21/6715 , H01L21/67178
摘要： A liquid processing method includes: accommodating a substrate horizontally in each of a first processing region and a second processing region, for performing therein a process on the substrate by a processing solution from a nozzle; rotating a rotary body about a vertical axis; keeping a plurality of processing nozzles provided at the rotary body; supplying different kinds of processing solutions to the substrate from the plurality of processing nozzles; holding a processing nozzle selected from the plurality of processing nozzles by a nozzle holder provided at the rotary body; transferring the nozzle holder into selected one of the first and the second processing regions by a nozzle transfer device; and rotating the rotary body by a rotation driving unit so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the first and the second processing regions.
摘要翻译：液体处理方法包括：在第一处理区域和第二处理区域中的每一个中水平地容纳衬底，用于通过来自喷嘴的处理溶液在衬底上进行处理; 围绕垂直轴旋转旋转体; 保持设置在所述旋转体上的多个处理喷嘴; 从所述多个处理喷嘴向所述基板供应不同种类的处理溶液; 通过设置在所述旋转体的喷嘴保持从所述多个处理喷嘴中选择的处理喷嘴; 通过喷嘴传送装置将喷嘴保持器转移到第一和第二处理区域中的选定的一个中; 并且通过旋转驱动单元旋转所述旋转体，以使得所述喷嘴保持器的前后方向与所述第一和第二处理区域中的所选择的一个相对。

3. 发明授权

US10074548B2 Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium 有权
公开(公告)号：US10074548B2
公开(公告)日：2018-09-11
申请号：US14795213
申请日：2015-07-09
申请人： Tokyo Electron Limited
发明人： Norihiko Sasagawa , Hiroichi Inada , Masahito Hamada
IPC分类号： H01L21/67 , B01F5/00 , B01F7/00 , B01F15/00 , B01F3/08 , G03F7/30
CPC分类号： H01L21/6715 , B01F3/0853 , B01F3/0861 , B01F5/0057 , B01F5/0071 , B01F7/00908 , B01F7/00916 , B01F15/00883 , B01F15/00889 , B01F2003/0896 , G03F7/3021
摘要： Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port opened to supply a diluent for reducing a viscosity of the chemical liquid to the storage space; a vertex flow forming portion that forms vortex flows in the diluent and the chemical liquid by supplying a fluid to the storage space to stir the diluent and the chemical liquid; and a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space. Thus, the viscosity of the waste liquid discharged from the liquid discharge port may be reduced, and thus, it is not necessary to largely set the inclination of the liquid discharge path.

4. 发明授权

US10755952B2 Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium 有权
公开(公告)号：US10755952B2
公开(公告)日：2020-08-25
申请号：US16059265
申请日：2018-08-09
申请人： Tokyo Electron Limited
发明人： Norihiko Sasagawa , Hiroichi Inada , Masahito Hamada
IPC分类号： B01F5/00 , H01L21/67 , B01F7/00 , B01F15/00 , B01F3/08 , G03F7/30
摘要： Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port opened to supply a diluent for reducing a viscosity of the chemical liquid to the storage space; a vertex flow forming portion that forms vortex flows in the diluent and the chemical liquid by supplying a fluid to the storage space to stir the diluent and the chemical liquid; and a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space. Thus, the viscosity of the waste liquid discharged from the liquid discharge port may be reduced, and thus, it is not necessary to largely set the inclination of the liquid discharge path.

5. 发明申请

US20180350633A1 CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, CHEMICAL LIQUID DISCHARGE METHOD, AND STORAGE MEDIUM 审中-公开
公开(公告)号：US20180350633A1
公开(公告)日：2018-12-06
申请号：US16059265
申请日：2018-08-09
申请人： Tokyo Electron Limited
发明人： Norihiko Sasagawa , Hiroichi Inada , Masahito Hamada
IPC分类号： H01L21/67 , G03F7/30 , B01F7/00 , B01F15/00 , B01F3/08 , B01F5/00
CPC分类号： H01L21/6715 , B01F3/0853 , B01F3/0861 , B01F5/0057 , B01F5/0071 , B01F7/00908 , B01F7/00916 , B01F15/00883 , B01F15/00889 , B01F2003/0896 , G03F7/3021
摘要： Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port opened to supply a diluent for reducing a viscosity of the chemical liquid to the storage space; a vertex flow forming portion that forms vortex flows in the diluent and the chemical liquid by supplying a fluid to the storage space to stir the diluent and the chemical liquid; and a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space. Thus, the viscosity of the waste liquid discharged from the liquid discharge port may be reduced, and thus, it is not necessary to largely set the inclination of the liquid discharge path.

6. 发明授权

US10168618B2 Liquid processing method and storage medium 有权
公开(公告)号：US10168618B2
公开(公告)日：2019-01-01
申请号：US14919869
申请日：2015-10-22
申请人： Tokyo Electron Limited
发明人： Norihiko Sasagawa , Hiroichi Inada , Yasushi Takiguchi
IPC分类号： B05D3/12 , G03F7/16 , H01L21/67 , G03F7/30 , B05D1/00 , G06F19/00
摘要： A liquid processing method includes: accommodating a substrate horizontally in each of a first processing region and a second processing region, for performing therein a process on the substrate by a processing solution from a nozzle; rotating a rotary body about a vertical axis; keeping a plurality of processing nozzles provided at the rotary body; supplying different kinds of processing solutions to the substrate from the plurality of processing nozzles; holding a processing nozzle selected from the plurality of processing nozzles by a nozzle holder provided at the rotary body; transferring the nozzle holder into selected one of the first and the second processing regions by a nozzle transfer device; and rotating the rotary body by a rotation driving unit so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the first and the second processing regions.

7. 发明申请

US20170358464A1 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM 审中-公开
公开(公告)号：US20170358464A1
公开(公告)日：2017-12-14
申请号：US15619920
申请日：2017-06-12
申请人： Tokyo Electron Limited
发明人： Masahiro Abe , Hiroichi Inada , Tohru Azuma , Tsunenaga Nakashima , Naofumi Kishita , Hideki Kajiwara
IPC分类号： H01L21/67 , G03F7/16 , H01L21/677
CPC分类号： H01L21/6715 , G03F7/162
摘要： Disclosed is a liquid processing apparatus including: a plurality of substrate placement regions; a nozzle that supplies a processing liquid to a substrate from each processing position; a nozzle placement region provided behind a row of the substrate placement regions; an arm that detachably holds the nozzle at one end side; a driving unit that horizontally pivots the arm around a pivot axis; and a controller that outputs a control signal to convey the nozzle from the nozzle placement region to a standby position corresponding to a processing position of a conveyance destination, cause the nozzle to stand by at the standby position, and then, convey the nozzle to the processing position. The standby position is outside the substrate placement regions and is located between the processing position and the nozzle placement region when viewed in a front-and-rear direction.

8. 发明申请

US20220084844A1 NOZZLE STANDBY DEVICE, LIQUID PROCESSING APPARATUS AND OPERATION METHOD OF LIQUID PROCESSING APPARATUS 有权
公开(公告)号：US20220084844A1
公开(公告)日：2022-03-17
申请号：US17471457
申请日：2021-09-10
申请人： Tokyo Electron Limited
发明人： Satoshi Shimmura , Kohei Kawakami , Hiroichi Inada , Koji Takayanagi
IPC分类号： H01L21/67 , H01L21/02
摘要： A nozzle standby device configured to allow a nozzle to stand by therein includes a nozzle accommodation unit, having an inner circumferential surface formed to surround a leading end portion of the nozzle, provided with a drain opening facing a discharge opening of the nozzle; and a solvent discharge opening opened within the nozzle accommodation unit. The nozzle accommodation unit has a diameter reducing portion having a first and a second inner circumferential surfaces having different angles with respect to a center line of the nozzle accommodation unit such that an inner diameter of the diameter reducing portion becomes smaller toward the drain opening. An intersection point of two straight lines extending along two opposite portions of the first inner circumferential surface is located above the discharge opening of the nozzle when the leading end portion of the nozzle is placed in the diameter reducing portion.

9. 发明申请

US20210039131A1 SUBSTRATE PROCESSING APPARATUS 有权
公开(公告)号：US20210039131A1
公开(公告)日：2021-02-11
申请号：US16986412
申请日：2020-08-06
申请人： Tokyo Electron Limited
发明人： Satoshi Shimmura , Yuji Sakai , Kenta Shibasaki , Koji Takayanagi , Kenji Yada , Hiroichi Inada , Shinichi Seki , Kento Ogata
IPC分类号： B05C11/10 , B05C11/08 , B05C13/02 , B05B14/30
摘要： A substrate processing apparatus includes a cover member placed to surround a substrate held by a rotary holder; a collecting member placed in an exhaust path formed between the cover member and the rotary holder; and a solvent supply placed above the collecting member and configured to supply a solvent to the collecting member. The solvent supply includes an inner storage space surrounding the substrate; an outer storage space surrounding the inner storage space; and a partition wall extending along a circumferential direction to partition the inner storage space and the outer storage space. Multiple communication holes are extended to penetrate the partition wall such that the solvent introduced into the outer storage space flows to the inner storage space. Multiple dripping holes are extended to penetrate a bottom wall of the inner storage space such that the solvent within the inner storage space drops toward the collecting member.

10. 发明申请

US20160008840A1 CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, CHEMICAL LIQUID DISCHARGE METHOD, AND STORAGE MEDIUM 审中-公开
标题翻译：化学液体排放机构，液体加工设备，化学液体排放方法和储存介质
公开(公告)号：US20160008840A1
公开(公告)日：2016-01-14
申请号：US14795213
申请日：2015-07-09
申请人： Tokyo Electron Limited
发明人： Norihiko Sasagawa , Hiroichi Inada , Masahito Hamada
IPC分类号： B05C11/11 , B05C5/00 , B05C11/08
CPC分类号： H01L21/6715 , B01F3/0853 , B01F3/0861 , B01F5/0057 , B01F5/0071 , B01F7/00908 , B01F7/00916 , B01F15/00883 , B01F15/00889 , B01F2003/0896 , G03F7/3021
摘要： Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port opened to supply a diluent for reducing a viscosity of the chemical liquid to the storage space; a vertex flow forming portion that forms vortex flows in the diluent and the chemical liquid by supplying a fluid to the storage space to stir the diluent and the chemical liquid; and a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space. Thus, the viscosity of the waste liquid discharged from the liquid discharge port may be reduced, and thus, it is not necessary to largely set the inclination of the liquid discharge path.
摘要翻译：公开了一种化学液体排出机构。该机构包括：存储部，其包括药液存储空间; 打开稀释剂供给口以提供用于将化学液体的粘度降低到储存空间的稀释剂; 顶点流形成部分，通过向存储空间提供流体以搅拌稀释剂和化学液体，在稀释剂和化学液体中形成涡流; 以及液体排出口，其通过所述储存空间中的所述稀释剂供给口的上侧开口，使得通过所述稀释剂的供给，所述稀释剂和所述化学液体流入所述液体排出口以从所述存储空间排出。因此，可以减少从液体排出口排出的废液的粘度，因此不需要大量设定液体排出路径的倾斜度。

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