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1. 发明申请

US20180173103A1 OPTICAL PROCESSING APPARATUS, COATING/DEVELOPMENT APPARATUS, OPTICAL PROCESSING METHOD, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM 审中-公开
公开(公告)号：US20180173103A1
公开(公告)日：2018-06-21
申请号：US15828870
申请日：2017-12-01
申请人： Tokyo Electron Limited
发明人： Seiji NAGAHARA , Masaru Tomono , Nobutaka Fukunaga , Gousuke Shiraishi
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/7055 , G03F7/16 , G03F7/201 , G03F7/2022 , G03F7/30 , G03F7/7005 , G03F7/70133 , G03F7/70558 , H01L21/027 , H01L21/67115 , H01L21/6715
摘要： An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block. There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.

2. 发明授权

US09899243B2 Light irradiation apparatus 有权
公开(公告)号：US09899243B2
公开(公告)日：2018-02-20
申请号：US14962133
申请日：2015-12-08
申请人： Tokyo Electron Limited
发明人： Masahide Tadokoro , Yuichi Terashita , Gousuke Shiraishi , Tomohiro Iseki , Masaru Tomono , Hironori Mizoguchi
IPC分类号： G03B27/54 , H01L21/67 , G03F7/20
CPC分类号： H01L21/67115 , G03F7/70991
摘要： A light irradiation apparatus includes: a rotary holding unit that rotates a substrate around a rotary axis while holding the substrate; a lighting unit positioned to face the rotary holding unit; a light shielding mask positioned between the rotary holding unit and the lighting unit, and widened along a direction orthogonal to the rotary axis; and a driving unit that linearly moves the lighting unit along the direction orthogonal to the rotary axis. The light shielding mask overlaps with the substrate when viewed in the direction of the rotary axis. The light shielding mask has an opening portion. An opening width of the opening portion at a side away from the rotary axis is larger than the opening with near the rotary axis. The lighting unit irradiates light through the opening portion toward the surface of the substrate while being moved above the opening portion by the driving unit.

3. 发明授权

US10459339B2 Resist pattern forming method, coating and developing apparatus and storage medium 有权
公开(公告)号：US10459339B2
公开(公告)日：2019-10-29
申请号：US14889564
申请日：2014-05-08
申请人： TOKYO ELECTRON LIMITED
发明人： Tetsuo Fukuoka , Yoshio Kimura , Gousuke Shiraishi
IPC分类号： G03F7/16 , G03F7/38 , G03F7/20 , G03F7/40
摘要： This resist pattern forming method comprises: a step for coating a substrate with a chemically amplified resist; a subsequent step for forming a latent image of a pattern by exposing the resist film on the substrate; a subsequent step for irradiating the exposed resist film selectively with infrared light from a first heating source having wavelengths 2.0-6.0 μm; a subsequent step for heating the substrate by means of a second heating source that is different from the first heating source for the purpose of diffusing an acid that is produced in the resist film by exposure; and a subsequent step for forming a pattern of the resist film by supplying a developer liquid to the substrate. Consequently, roughening of sidewalls of the resist pattern can be suppressed.

4. 发明授权

US10274843B2 Exposure apparatus, exposure method and storage medium 有权
公开(公告)号：US10274843B2
公开(公告)日：2019-04-30
申请号：US15815925
申请日：2017-11-17
申请人： Tokyo Electron Limited
发明人： Seiji Nagahara , Masaru Tomono , Nobutaka Fukunaga , Gousuke Shiraishi , Yukie Minekawa
IPC分类号： G03F7/20 , H01L21/67 , H01L21/677
摘要： An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units configured to emit light independently of each other, so as to form a strip-like irradiation area; a rotation mechanism configured to rotate the substrate relative to the irradiation area; a stage moving mechanism configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit configured to make the exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed.

5. 发明授权

US10527948B2 Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium 有权
公开(公告)号：US10527948B2
公开(公告)日：2020-01-07
申请号：US15828870
申请日：2017-12-01
申请人： Tokyo Electron Limited
发明人： Seiji Nagahara , Masaru Tomono , Nobutaka Fukunaga , Gousuke Shiraishi
IPC分类号： G03F7/20 , H01L21/027
摘要： An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block. There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.

6. 发明授权

US10101669B2 Exposure apparatus, resist pattern forming method, and storage medium 有权
公开(公告)号：US10101669B2
公开(公告)日：2018-10-16
申请号：US15109917
申请日：2015-01-13
申请人： Tokyo Electron Limited
发明人： Seiji Nagahara , Gousuke Shiraishi , Satoru Shimura , Kousuke Yoshihara , Shinichiro Kawakami , Masaru Tomono , Yuichi Terashita , Hironori Mizoguchi
IPC分类号： G03F7/20
摘要： A technique which, in forming a resist pattern on a wafer, can achieve high resolution and high in-plane uniformity of pattern line width. After forming a resist film on a wafer W and subsequently performing pattern exposure by means of a pattern exposure apparatus, the entire pattern exposure area is exposed by using a flood exposure apparatus. During the flood exposure, the exposure amount is adjusted depending on the exposure position on the wafer based on information on the in-plane distribution of the line width of a resist pattern, previously obtained from an inspection apparatus. Methods for adjusting the exposure amount include a method which adjusts the exposure amount while moving a strip-shaped irradiation area corresponding to the diameter of the wafer, a method which involves intermittently moving an irradiation area, corresponding to a shot area in the preceding pattern exposure, to adjust the exposure amount for each chip.

7. 发明授权

US10025190B2 Substrate treatment system 有权
公开(公告)号：US10025190B2
公开(公告)日：2018-07-17
申请号：US15106915
申请日：2014-12-15
申请人： TOKYO ELECTRON LIMITED , OSAKA UNIVERSITY
发明人： Seiji Nagahara , Gousuke Shiraishi , Satoru Shimura , Kousuke Yoshihara , Shinichiro Kawakami , Masaru Tomono , Seiichi Tagawa , Akihiro Oshima
IPC分类号： G03F7/20 , H01L21/67
摘要： A substrate treatment system for treating a substrate, includes: a treatment station in which a plurality of treatment apparatuses which treat the substrate are provided; an interface station which directly or indirectly delivers the substrate between an exposure apparatus which is provided outside the substrate treatment system and performs exposure of patterns on a resist film on the substrate, and the substrate treatment system; a light irradiation apparatus which performs post-exposure using UV light on the resist film on the substrate after the exposure of patterns is performed; and a post-exposure station which houses the light irradiation apparatus and is adjustable to a reduced pressure or inert gas atmosphere, wherein the post-exposure station is connected to the exposure apparatus directly or indirectly via a space which is adjustable to a reduced pressure or inert gas atmosphere.

8. 发明申请

US20160170316A1 LIGHT IRRADIATION APPARATUS 有权
标题翻译：光照射装置
公开(公告)号：US20160170316A1
公开(公告)日：2016-06-16
申请号：US14962133
申请日：2015-12-08
申请人： Tokyo Electron Limited
发明人： Masahide Tadokoro , Yuichi Terashita , Gousuke Shiraishi , Tomohiro Iseki , Masaru Tomono , Hironori Mizoguchi
IPC分类号： G03F7/20 , H01L21/687
CPC分类号： H01L21/67115 , G03F7/70991
摘要： A light irradiation apparatus includes: a rotary holding unit that rotates a substrate around a rotary axis while holding the substrate; a lighting unit positioned to face the rotary holding unit; a light shielding mask positioned between the rotary holding unit and the lighting unit, and widened along a direction orthogonal to the rotary axis; and a driving unit that linearly moves the lighting unit along the direction orthogonal to the rotary axis. The light shielding mask overlaps with the substrate when viewed in the direction of the rotary axis. The light shielding mask has an opening portion. An opening width of the opening portion at a side away from the rotary axis is larger than the opening with near the rotary axis. The lighting unit irradiates light through the opening portion toward the surface of the substrate while being moved above the opening portion by the driving unit.
摘要翻译：光照射装置包括：旋转保持单元，其在保持基板的同时旋转基板绕旋转轴线; 定位成面向旋转保持单元的照明单元; 位于旋转保持单元和照明单元之间的遮光掩模，并且沿着与旋转轴线正交的方向加宽; 以及驱动单元，其沿着与旋转轴正交的方向线性地移动照明单元。当从旋转轴的方向观察时，遮光掩模与基板重叠。遮光罩具有开口部。离开旋转轴的一侧的开口部的开口宽度大于靠近旋转轴的开口部。照明单元通过驱动单元在开口部分上方移动通过开口部分朝向基板的表面照射光。

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