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1. 发明授权

US08119322B2 Method for producing self-aligned mask, articles produced by same and composition for same 有权
标题翻译：用于生产自对准面罩的方法，由相同制造的制品及其组合物
公开(公告)号：US08119322B2
公开(公告)日：2012-02-21
申请号：US12107889
申请日：2008-04-23
申请人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
发明人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
IPC分类号： G03F7/00 , G03F7/004 , G03F7/40
CPC分类号： H01L21/76834 , G03F7/0035 , G03F7/2022 , H01L21/76849 , Y10S430/146
摘要： A method for forming a self-aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material being either photo or thermally sensitive; performing a blanket exposure of the substrate; and allowing at least a portion of the masking material to preferential develop in a fashion that is replicates the existing pattern of the substrate. The existing pattern may be comprised of a first set of regions of the substrate having a first reflectivity and a second set of regions of the substrate having a second reflectivity different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. Structures made in accordance with the method.
摘要翻译：一种用于在衬底上的现有图案上形成自对准图案的方法，包括在载体中涂覆含有掩蔽材料的溶液的涂层，所述掩蔽材料是光敏的或热敏感的; 进行基板的覆盖曝光; 并且允许至少一部分掩模材料以复制衬底的现有图案的方式优先显影。现有图案可以由具有第一反射率的第一组基底区域和第二组区域组成，该第二组区域具有不同于第一组成的第二反射率。第一组区域可以包括一个或多个金属元件，并且第二组区域可以包括电介质。按照该方法制造的结构。

2. 发明授权

US07378738B2 Method for producing self-aligned mask, articles produced by same and composition for same 有权
标题翻译：用于生产自对准面罩的方法，由相同制造的制品及其组合物
公开(公告)号：US07378738B2
公开(公告)日：2008-05-27
申请号：US10653476
申请日：2003-09-02
申请人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
发明人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
IPC分类号： H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： H01L21/76834 , G03F7/0035 , G03F7/2022 , H01L21/76849 , Y10S430/146
摘要： A method for forming a self-aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material being either photo or thermally sensitive; performing a blanket exposure of the substrate; and allowing at least a portion of the masking material to preferential develop in a fashion that is replicates the existing pattern of the substrate. The existing pattern may be comprised of a first set of regions of the substrate having a first reflectivity and a second set of regions of the substrate having a second reflectivity different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. Structures made in accordance with the method.
摘要翻译：一种用于在衬底上的现有图案上形成自对准图案的方法，包括在载体中涂覆含有掩蔽材料的溶液的涂层，所述掩蔽材料是光敏的或热敏感的; 进行基板的覆盖曝光; 并且允许至少一部分掩模材料以复制衬底的现有图案的方式优先显影。现有图案可以由具有第一反射率的第一组基底区域和第二组区域组成，该第二组区域具有不同于第一组成的第二反射率。第一组区域可以包括一个或多个金属元件，并且第二组区域可以包括电介质。按照该方法制造的结构。

3. 发明申请

US20080220615A1 METHOD FOR PRODUCING SELF-ALIGNED MASK, ARTICLES PRODUCED BY SAME AND COMPOSITION FOR SAME 有权
标题翻译：用于生产自对准掩模的方法，由其生产的制品及其组合物
公开(公告)号：US20080220615A1
公开(公告)日：2008-09-11
申请号：US12107889
申请日：2008-04-23
申请人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
发明人： Timothy A. Brunner , Matthew E. Colburn , Elbert Huang , Muthumanickam Sankarapandian
IPC分类号： H01L21/027
CPC分类号： H01L21/76834 , G03F7/0035 , G03F7/2022 , H01L21/76849 , Y10S430/146
摘要： A method for forming a self-aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material being either photo or thermally sensitive; performing a blanket exposure of the substrate; and allowing at least a portion of the masking material to preferential develop in a fashion that is replicates the existing pattern of the substrate. The existing pattern may be comprised of a first set of regions of the substrate having a first reflectivity and a second set of regions of the substrate having a second reflectivity different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. Structures made in accordance with the method.
摘要翻译：一种用于在衬底上的现有图案上形成自对准图案的方法，包括在载体中涂覆含有掩蔽材料的溶液的涂层，所述掩蔽材料是光敏的或热敏感的; 进行基板的覆盖曝光; 并且允许至少一部分掩模材料以复制衬底的现有图案的方式优先显影。现有图案可以由具有第一反射率的第一组基底区域和第二组区域组成，该第二组区域具有不同于第一组成的第二反射率。第一组区域可以包括一个或多个金属元件，并且第二组区域可以包括电介质。按照该方法制造的结构。

4. 发明申请

US20140071415A1 ON-PRODUCT FOCUS OFFSET METROLOGY FOR USE IN SEMICONDUCTOR CHIP MANUFACTURING 有权
标题翻译：半导体芯片制造中使用的产品焦点偏移量纲
公开(公告)号：US20140071415A1
公开(公告)日：2014-03-13
申请号：US13608455
申请日：2012-09-10
申请人： Timothy A. Brunner
发明人： Timothy A. Brunner
IPC分类号： G03B27/52
CPC分类号： G03F1/50 , G03F1/44 , G03F7/70641
摘要： A focus monitor structure on a reticle includes a lithographic feature region, a horizontal grating region including a horizontal grating located on one side of the lithographic feature region, and a vertical grating region including a vertical grating located on the opposite side of the lithographic feature region. A polarized illumination beam causes a printed image of the lithographic feature region to shift either toward the direction of the horizontal grating region or toward the direction of the vertical grating region in a manner that depends on the sign of the focus offset of the photoresist layer relative to the lens of an exposure tool. The magnitude and sign of the focus offset can be monitored to provide a real-time feedback on the focus offset of the exposure tool by measuring the shift of the printed image of the lithographic feature region.
摘要翻译：掩模版上的聚焦监视器结构包括光刻特征区域，包括位于光刻特征区域的一侧的水平光栅的水平光栅区域和包括位于光刻特征区域相对侧的垂直光栅的垂直光栅区域。偏振照明光束使得光刻特征区域的印刷图像朝向水平光栅区域的方向或朝向垂直光栅区域的方向移动，其方式取决于光致抗蚀剂层相对的聚焦偏移的符号到曝光工具的镜头。可以通过测量光刻特征区域的打印图像的移动来监视聚焦偏移的幅度和符号，以提供对曝光工具的聚焦偏移的实时反馈。

5. 发明授权

US08582078B2 Test method for determining reticle transmission stability 失效
标题翻译：确定掩模传输稳定性的测试方法
公开(公告)号：US08582078B2
公开(公告)日：2013-11-12
申请号：US13098723
申请日：2011-05-02
申请人： Timothy A. Brunner , Colin J. Brodsky , Michael B. Pike
发明人： Timothy A. Brunner , Colin J. Brodsky , Michael B. Pike
IPC分类号： G03B27/52 , G03B27/32 , G03B27/68 , G03B27/62
CPC分类号： G03B27/52 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Methods, systems and apparatus for monitoring the state of a reticle by providing a reticle having a device exposure region in an imaging tool, defining one or more image fields across the device exposure region, and transmitting energy through the device exposure region. A detector detects the energy in the image field(s) at one or more testing intervals and a system control generates a transmission profile of average energy transmissions for each image field. Using this transmission profile, the state of the reticle is then determined at each testing interval followed by taking action based on the reticle state. The state of the reticle identifies whether the device exposure region has been deleteriously degraded, and as such, the reticle is no longer suitable for use. This is accomplished by determining if any average energy transmission of any image field across the reticle exceeds an allowable energy transmission threshold.
摘要翻译：通过在成像工具中提供具有装置曝光区域的掩模版来限定掩模版的状态的方法，系统和装置，其限定穿过装置曝光区域的一个或多个图像场，以及通过装置曝光区域传输能量。检测器以一个或多个测试间隔检测图像场中的能量，并且系统控制为每个图像场生成平均能量传输的传输轮廓。使用该传输配置文件，然后在每个测试间隔确定掩模版的状态，随后基于掩模版状态采取动作。掩模版的状态识别设备曝光区域是否被有害降解，因此，掩模版不再适合使用。这是通过确定跨越掩模版的任何图像场的任何平均能量传输是否超过允许的能量传输阈值来实现的。

6. 发明授权

US08023102B2 Test method for determining reticle transmission stability 有权
标题翻译：确定掩模传输稳定性的测试方法
公开(公告)号：US08023102B2
公开(公告)日：2011-09-20
申请号：US12105311
申请日：2008-04-18
申请人： Timothy A. Brunner , Colin J. Brodsky , Michael B. Pike
发明人： Timothy A. Brunner , Colin J. Brodsky , Michael B. Pike
IPC分类号： G03B27/52 , G03B27/68 , G03B27/32
CPC分类号： G03B27/52 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Methods, systems and apparatus for monitoring the state of a reticle by providing a reticle having a device exposure region in an imaging tool, defining one or more image fields across the device exposure region, and transmitting energy through the device exposure region. A detector detects the energy in the image field(s) at one or more testing intervals and a system control generates a transmission profile of average energy transmissions for each image field. Using this transmission profile, the state of the reticle is then determined at each testing interval followed by taking action based on the reticle state. The state of the reticle identifies whether the device exposure region has been deleteriously degraded, and as such, the reticle is no longer suitable for use. This is accomplished by determining if any average energy transmission of any image field across the reticle exceeds an allowable energy transmission threshold.
摘要翻译：通过在成像工具中提供具有装置曝光区域的掩模版来限定掩模版的状态的方法，系统和装置，其限定穿过装置曝光区域的一个或多个图像场，以及通过装置曝光区域传输能量。检测器以一个或多个测试间隔检测图像场中的能量，并且系统控制为每个图像场生成平均能量传输的传输轮廓。使用该传输配置文件，然后在每个测试间隔确定掩模版的状态，随后基于掩模版状态采取动作。掩模版的状态识别设备曝光区域是否被有害降解，因此，掩模版不再适合使用。这是通过确定跨越掩模版的任何图像场的任何平均能量传输是否超过允许的能量传输阈值来实现的。

7. 发明申请

US20090262317A1 TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY 有权
标题翻译：用于确定传输稳定性的测试方法
公开(公告)号：US20090262317A1
公开(公告)日：2009-10-22
申请号：US12105311
申请日：2008-04-18
申请人： Timothy A. Brunner , Colin J. Brodsky , Michael B. Pike
发明人： Timothy A. Brunner , Colin J. Brodsky , Michael B. Pike
IPC分类号： G03B27/52 , G01N21/00
CPC分类号： G03B27/52 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Methods, systems and apparatus for monitoring the state of a reticle by providing a reticle having a device exposure region in an imaging tool, defining one or more image fields across the device exposure region, and transmitting energy through the device exposure region. A detector detects the energy in the image field(s) at one or more testing intervals and a system control generates a transmission profile of average energy transmissions for each image field. Using this transmission profile, the state of the reticle is then determined at each testing interval followed by taking action based on the reticle state. The state of the reticle identifies whether the device exposure region has been deleteriously degraded, and as such, the reticle is no longer suitable for use. This is accomplished by determining if any average energy transmission of any image field across the reticle exceeds an allowable energy transmission threshold.
摘要翻译：通过在成像工具中提供具有装置曝光区域的掩模版来限定掩模版的状态的方法，系统和装置，其限定穿过装置曝光区域的一个或多个图像场，以及通过装置曝光区域传输能量。检测器以一个或多个测试间隔检测图像场中的能量，并且系统控制为每个图像场生成平均能量传输的传输轮廓。使用该传输配置文件，然后在每个测试间隔确定掩模版的状态，随后基于掩模版状态采取动作。掩模版的状态识别设备曝光区域是否被有害降解，因此，掩模版不再适合使用。这是通过确定跨越掩模版的任何图像场的任何平均能量传输是否超过允许的能量传输阈值来实现的。

8. 发明申请

US20090208865A1 PHOTOLITHOGRAPHY FOCUS IMPROVEMENT BY REDUCTION OF AUTOFOCUS RADIATION TRANSMISSION INTO SUBSTRATE 审中-公开
标题翻译：通过减少自适应辐射传输到基板中的光刻技术改进
公开(公告)号：US20090208865A1
公开(公告)日：2009-08-20
申请号：US12033303
申请日：2008-02-19
申请人： Timothy A. Brunner , Sean D. Burns , Kuang-Jung Chen , Wu-Song Huang , Kafai Lai , Wai-Kin Li , Bernhard R. Liegl
发明人： Timothy A. Brunner , Sean D. Burns , Kuang-Jung Chen , Wu-Song Huang , Kafai Lai , Wai-Kin Li , Bernhard R. Liegl
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： G03F7/091 , G03F7/70216 , Y10S430/127
摘要： An anti-reflective coating material, a microelectronic structure that includes an anti-reflective coating layer formed from the anti-reflective coating material and a related method for exposing a resist layer located over a substrate while using the anti-reflective coating layer provide for attenuation of secondary reflected vertical alignment beam radiation when aligning the substrate including the resist layer located thereover. Such enhanced vertical alignment provides for improved dimensional integrity of a patterned resist layer formed from the resist layer, as well as additional target layers that may be fabricated while using the resist layer as a mask.
摘要翻译：防反射涂层材料，包括由抗反射涂层材料形成的抗反射涂层的微电子结构和用于在使用抗反射涂层的同时使位于基板上的抗蚀剂层曝光的相关方法提供衰减当对准包括位于其上的抗蚀剂层的衬底时，二次反射垂直取向束辐射。这种增强的垂直对准提供了由抗蚀剂层形成的图案化抗蚀剂层的改进的尺寸完整性，以及可以在使用抗蚀剂层作为掩模时制造的附加目标层。

9. 发明授权

US06842237B2 Phase shifted test pattern for monitoring focus and aberrations in optical projection systems 失效
标题翻译：用于监测光学投影系统中的聚焦和像差的相移测试图案
公开(公告)号：US06842237B2
公开(公告)日：2005-01-11
申请号：US10035061
申请日：2001-12-28
申请人： Christopher P. Ausschnitt , Timothy A. Brunner , Joseph P. Kirk , Nakgeuon Seong
发明人： Christopher P. Ausschnitt , Timothy A. Brunner , Joseph P. Kirk , Nakgeuon Seong
IPC分类号： G01M11/02 , G01B9/00
CPC分类号： G01M11/0264
摘要： A method is described for determining lens aberrations using a test reticle and a standard metrology tool. The method provides test patterns, preferably in the form of standard overlay metrology test patterns, that include blazed gratings having orientation and pitch selected to sample desired portions of the lens pupil. The method measures relative shifts in the imaged test patterns using standard metrology tools to provide both magnitude and sign of the aberrations. The metrology tools need not be modified if standard test patterns are used, but can be adapted to obtain additional information. The test reticles may be formed with multiple test patterns having a range of orientations and pitch in order to compute any desired order of lens aberration. Alternatively, single test patterns may be used to determine both the magnitude and sign of lower order lens aberrations, such as defocus or coma.
摘要翻译：描述了使用测试掩模版和标准测量工具确定透镜像差的方法。该方法提供测试图案，优选地以标准覆盖度量测试图案的形式，其包括具有选择的取向和间距的闪耀光栅以对透镜光瞳的所需部分进行采样。该方法使用标准计量工具测量成像测试图案中的相对位移，以提供像差的幅度和符号。如果使用标准测试模式，则不需要修改计量工具，但可以调整以获取其他信息。为了计算任何所需的镜片像差顺序，测试光罩可以形成有具有取向范围和间距的多个测试图案。或者，可以使用单个测试图案来确定低阶透镜像差的大小和符号，例如散焦或昏迷。

10. 发明授权

US5953128A Optically measurable serpentine edge tone reversed targets 失效
标题翻译：光学测量的蛇纹石边缘反转目标
公开(公告)号：US5953128A
公开(公告)日：1999-09-14
申请号：US929341
申请日：1997-08-28
申请人： Christopher P. Ausschnitt , Timothy A. Brunner , Alan C. Thomas
发明人： Christopher P. Ausschnitt , Timothy A. Brunner , Alan C. Thomas
IPC分类号： G03F7/20 , G01B11/27
CPC分类号： G03F7/70558 , G03F7/70641
摘要： Focus and exposure parameters may be controlled in a lithographic process for manufacturing microelectronics by creating a complementary tone pattern of shapes and spaces in a resist film on a substrate. Corresponding dimensions of the resist shape and space are measured and the adequacy of focus or exposure dose are determined as a function of the measured dimensions. Etching parameters may also be controlled by creating a complementary tone pattern of etched shapes and spaces on a substrate. Corresponding dimensions of the etched shape and space are measured and the adequacy of etching parameters are determined as a function of the measured dimensions.
摘要翻译：聚焦和曝光参数可以通过在基板上的抗蚀剂膜中产生形状和空间的互补色调图案来制造微电子学的光刻工艺中进行控制。测量抗蚀剂形状和空间的相应尺寸，并根据所测量的尺寸确定聚焦或曝光剂量的适当性。也可以通过在衬底上产生蚀刻形状和空间的互补色调图案来控制蚀刻参数。测量蚀刻形状和空间的相应尺寸，并根据所测量的尺寸确定蚀刻参数的合适性。

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