专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07553426B2 Apparatus, system, and method for increasing data storage density in patterned media 有权
标题翻译：用于增加图案化介质中数据存储密度的装置，系统和方法
公开(公告)号：US07553426B2
公开(公告)日：2009-06-30
申请号：US11069874
申请日：2005-03-01
申请人： Thomas Robert Albrecht , Henry Hung Yang
发明人： Thomas Robert Albrecht , Henry Hung Yang
IPC分类号： B44C1/22
CPC分类号： G11B5/59644
摘要： An apparatus, system, and method are disclosed for increasing data storage density in patterned media. One or more deposition sources may apply magnetic material to one or more recesses formed in a substrate, each recess having opposing sidewalls that are effectively coated by the deposition sources. The top surface of the substrate may subsequently be planarized to remove magnetic material from such surface, thereby isolating one or more recordable magnetic regions formed on each sidewall. In this manner, the present invention may provide at least two recordable regions for every recess formed in a substrate.
摘要翻译：公开了用于增加图案化介质中的数据存储密度的装置，系统和方法。一个或多个沉积源可以将磁性材料施加到形成在衬底中的一个或多个凹部，每个凹部具有由沉积源有效地涂覆的相对的侧壁。随后可以将衬底的顶表面平坦化以从这种表面去除磁性材料，从而隔离形成在每个侧壁上的一个或多个可记录磁性区域。以这种方式，本发明可以为形成在基板中的每个凹部提供至少两个可记录区域。

2. 发明授权

US07046476B1 Method apparatus and system for accessing discontinuous media tracks 有权
标题翻译：用于访问不连续媒体轨道的方法装置和系统
公开(公告)号：US07046476B1
公开(公告)日：2006-05-16
申请号：US11032355
申请日：2005-01-10
申请人： Thomas Robert Albrecht , Henry Hung Yang
发明人： Thomas Robert Albrecht , Henry Hung Yang
IPC分类号： G11B5/596
CPC分类号： G11B5/59627 , G11B5/59688
摘要： An apparatus, system, and method are disclosed for accessing discontinuous media tracks. The apparatus, in one embodiment, accesses discontinuous media tracks of a storage medium having one or more independently formed storage regions thereon. Each storage region may include a set of track segments. A memory may be provided to store track offset information for each storage region. A mapping module may collect track offset information, calculate a physical offset between adjacent storage regions, define a track, create a table, and store the track offset information in the memory. The apparatus may further include a tracking module to sense a position of a head relative to a centerline of a track segment within a current storage region, access offset information, and align a storage head with a closely aligned track segment within a subsequent storage region. Consequently, discontinuous media tracks may be accessed by a storage access device.
摘要翻译：公开了用于访问不连续媒体轨道的装置，系统和方法。在一个实施例中，该装置访问其上具有一个或多个独立形成的存储区域的存储介质的不连续介质轨道。每个存储区域可以包括一组轨道段。可以提供存储器来存储每个存储区域的轨道偏移信息。映射模块可以收集轨道偏移信息，计算相邻存储区域之间的物理偏移量，定义轨道，创建表格，以及将轨道偏移信息存储在存储器中。该装置还可以包括跟踪模块，用于感测头部相对于当前存储区域内的轨道段的中心线的位置，访问偏移信息，以及使存储头与随后存储区域内的紧密对准的轨道段对准。因此，不连续媒体轨道可以被存储访问设备访问。

3. 发明授权

US07648641B2 Method and apparatus for creating a topographically patterned substrate 失效
标题翻译：用于产生地形图案化衬底的方法和装置
公开(公告)号：US07648641B2
公开(公告)日：2010-01-19
申请号：US11155099
申请日：2005-06-17
申请人： Thomas Robert Albrecht , Henry Hung Yang
发明人： Thomas Robert Albrecht , Henry Hung Yang
IPC分类号： B44C1/22
CPC分类号： C23F1/02 , B82Y10/00 , C23F1/26 , G11B5/012 , G11B5/74 , G11B5/743 , G11B5/82 , G11B5/855 , H01L21/0337 , H01L21/3086 , Y10T428/26 , Y10T428/31504 , Y10T428/31678 , Y10T428/31721 , Y10T428/31935
摘要： A method of the present invention is presented for deep etching of features on a surface. In one embodiment, the method includes providing a substrate having a surface selected to undergo a feature etching process and coating the substrate surface with a protective layer and an imprintable layer. The coated substrate is then subjected to a feature imprinting and etching process. Subsequent to the feature etching process, exposed portions of the protective layer are removed, exposing a well-defined, topographically patterned substrate. In addition, an apparatus for undergoing a feature etching process is disclosed. The apparatus comprises a substrate, an imprintable layer selected to undergo an imprinting process, and a protective layer positioned between the substrate and the imprintable layer. The protective layer may be selected to provide additional protection to selected portions of the substrate and to prevent non-planar byproducts of the feature etching process from transferring to the selected portions.
摘要翻译：本发明的方法用于深刻蚀表面上的特征。在一个实施例中，该方法包括提供具有被选择用于经历特征蚀刻工艺的表面的衬底，并用保护层和可压印层涂覆衬底表面。然后将经涂覆的基底进行特征压印和蚀刻工艺。在特征蚀刻工艺之后，去除保护层的暴露部分，暴露出明确定义的，地形图案化的衬底。另外，公开了一种经历特征蚀刻工艺的装置。该装置包括基板，可压印层，其被选择进行压印处理，以及位于基板和可压印层之间的保护层。可以选择保护层以为衬底的选定部分提供额外的保护，并且防止特征蚀刻工艺的非平面副产物转移到所选择的部分。

4. 发明授权

US08441758B2 Self-assembly structures used for fabricating patterned magnetic media 有权
标题翻译：用于制造图案化磁性介质的自组装结构
公开(公告)号：US08441758B2
公开(公告)日：2013-05-14
申请号：US13108515
申请日：2011-05-16
申请人： Thomas R. Albrecht , Xiao Z. Wu , Henry Hung Yang
发明人： Thomas R. Albrecht , Xiao Z. Wu , Henry Hung Yang
IPC分类号： G11B5/82
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/865
摘要： Methods of defining servo patterns and data patterns for forming patterned magnetic media are described. For one method, a lithographic process is performed to define a servo pattern in servo regions on a substrate. The lithographic process also defines a first data pattern in data regions of the substrate. The first data pattern is then transferred to (i.e., etched into) the data regions. Self-assembly structures are then formed on the data pattern in the data regions to define a second data pattern. The servo pattern is then transferred to the servo regions and the second data pattern is transferred to the data regions. Thus, the servo pattern is defined through lithographic processes while the data pattern is defined by a combination of lithographic processes and self-assembly.
摘要翻译：描述了定义用于形成图案化磁性介质的伺服图案和数据图案的方法。对于一种方法，执行光刻处理以在衬底上的伺服区域中定义伺服图案。光刻工艺还定义了衬底的数据区域中的第一数据模式。然后将第一数据模式转移到（即蚀刻）数据区。然后在数据区域中的数据模式上形成自组装结构以定义第二数据模式。然后将伺服模式传送到伺服区域，并将第二数据模式传送到数据区域。因此，通过光刻工艺定义伺服图案，同时通过光刻工艺和自组装的组合来定义数据图案。

5. 发明授权

US07341825B2 Method for producing high resolution nano-imprinting masters 有权
标题翻译：生产高分辨率纳米压印机的方法
公开(公告)号：US07341825B2
公开(公告)日：2008-03-11
申请号：US11442097
申请日：2006-05-25
申请人： Zvonimir Z. Bandic , Jui-Lung Li , Henry Hung Yang
发明人： Zvonimir Z. Bandic , Jui-Lung Li , Henry Hung Yang
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0015 , G03F7/0035
摘要： A method for producing high resolution nano-imprinting masters is disclosed. The method inverts the negative features of an exposed and developed positive e-beam resist to positive features in the patterned silicon nitride layer of the nano-imprinting master. A first, oxidation resistant, mask layer is used to pattern a DLC layer deposited on the silicon nitride layer. After patterning the DLC layer, the negative features of the DLC layer are filled with deposited metal, which creates a second mask layer subsequent to the removal of the remaining DLC layer. The second mask layer is used to etch the silicon nitride layer, creating the final nano-imprinting master.
摘要翻译：公开了一种生产高分辨率纳米压印机的方法。该方法将曝光和显影的正电子束抗蚀剂的负面特征反转到纳米压印母版的图案化氮化硅层中的正特征。使用第一抗氧化掩模层对沉积在氮化硅层上的DLC层进行图案化。在图案化DLC层之后，DLC层的负面特征被沉积的金属填充，其在除去剩余的DLC层之后产生第二掩模层。第二掩模层用于蚀刻氮化硅层，形成最终的纳米压印母版。

6. 发明申请

US20110258841A1 Planarization Methods For Patterned Media Disks 失效
标题翻译：图案化媒体盘的平面化方法
公开(公告)号：US20110258841A1
公开(公告)日：2011-10-27
申请号：US13082189
申请日：2011-04-07
申请人： Zvonimir Z. Bandic , Elizabeth Ann Dobisz , Jui-Lung Li , Henry Hung Yang
发明人： Zvonimir Z. Bandic , Elizabeth Ann Dobisz , Jui-Lung Li , Henry Hung Yang
IPC分类号： G11B5/127
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/746 , G11B5/855 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048
摘要： A method is provided for forming a plurality of regions of magnetic material in a substrate having a first approximately planar surface. The method comprises the steps of fabricating projections in the first surface of the substrate, depositing onto the first surface a magnetic material in such a way that the tops of the projections are covered with magnetic material, and depositing filler material atop the substrate so produced. The filler material may then be planarized, for example by chemical-mechanical polishing. In an alternative embodiment magnetic material is deposited on a substrate and portions of it are removed, leaving islands of material. Filler material is then deposited, which may be planarized.
摘要翻译：提供了一种用于在具有第一近似平面的基板中形成多个磁性材料区域的方法。该方法包括以下步骤：在衬底的第一表面中制造突起，在第一表面上沉积磁性材料，使得突起的顶部被磁性材料覆盖，并将填充材料沉积在如此制造的衬底上。然后可以例如通过化学机械抛光将填料材料平坦化。在替代实施例中，磁性材料沉积在基底上，并且其部分被去除，留下材料岛。然后沉积填料，其可以被平坦化。

7. 发明授权

US08003236B2 Method for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks, master mold made by the method, and disk imprinted by the master mold 有权
标题翻译：用于制造具有高比特宽比的用于纳米压印图案化磁记录盘的母模的方法，通过该方法制造的母模和由母模印制的盘
公开(公告)号：US08003236B2
公开(公告)日：2011-08-23
申请号：US12141060
申请日：2008-06-17
申请人： Thomas R. Albrecht , Barry Cushing Stipe , Henry Hung Yang
发明人： Thomas R. Albrecht , Barry Cushing Stipe , Henry Hung Yang
IPC分类号： G11B5/64
CPC分类号： G11B5/855
摘要： A method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks results in a master mold having topographic pillars arranged in a pattern of annular bands of concentric rings. The ratio of circumferential density of the pillars to the radial density of the concentric rings in a band is greater than 1. The method uses sidewall lithography to first form a pattern of generally radially-directed pairs of parallel lines on the master mold substrate, with the lines being grouped into annular zones or bands. The sidewall lithography process can be repeated, resulting in a doubling of the number of lines each time the process is repeated. Conventional lithography is used to form concentric rings over the radially-directed pairs of parallel lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands. The master mold may be used to nanoimprint the disks, resulting in disks having a BAR greater than 1, wherein BAR is the ratio of data track spacing in the radial direction to the data island spacing in the circumferential direction.
摘要翻译：用于制造用于纳米压印图案化介质磁记录盘的母模的方法导致具有布置成同心环的环形带图案的形状柱的母模。柱的圆周密度与带中同心环的径向密度的比率大于1.该方法使用侧壁光刻法首先在母模基底上形成大致径向定向的平行线对图案，其中，线路被分组成环形区域或带。可以重复侧壁光刻处理，导致每次重复该过程的行数加倍。常规光刻用于在径向对平行线上形成同心环。在蚀刻和抗蚀剂去除之后，主模具有布置成圆形环的柱，其中环被分组成环形带。主模可以用于纳米压印盘，导致具有大于1的BAR的盘，其中BAR是径向方向上的数据轨道间隔与圆周方向上的数据岛间隔的比率。

8. 发明授权

US07969686B2 Self-assembly structures used for fabricating patterned magnetic media 有权
标题翻译：用于制造图案化磁性介质的自组装结构
公开(公告)号：US07969686B2
公开(公告)日：2011-06-28
申请号：US11964680
申请日：2007-12-26
申请人： Thomas R. Albrecht , Xiao Z. Wu , Henry Hung Yang
发明人： Thomas R. Albrecht , Xiao Z. Wu , Henry Hung Yang
IPC分类号： G11B5/82
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/743 , G11B5/82 , G11B5/865
摘要： Methods of defining servo patterns and data patterns for forming patterned magnetic media are described. For one method, a lithographic process is performed to define a servo pattern in servo regions on a substrate. The lithographic process also defines a first data pattern in data regions of the substrate. The first data pattern is then transferred to (i.e., etched into) the data regions. Self-assembly structures are then formed on the data pattern in the data regions to define a second data pattern. The servo pattern is then transferred to the servo regions and the second data pattern is transferred to the data regions. Thus, the servo pattern is defined through lithographic processes while the data pattern is defined by a combination of lithographic processes and self-assembly.
摘要翻译：描述了定义用于形成图案化磁性介质的伺服图案和数据图案的方法。对于一种方法，执行光刻处理以在衬底上的伺服区域中定义伺服图案。光刻工艺还定义了衬底的数据区域中的第一数据模式。然后将第一数据模式转移到（即蚀刻）数据区。然后在数据区域中的数据模式上形成自组装结构以定义第二数据模式。然后将伺服模式传送到伺服区域，并将第二数据模式传送到数据区域。因此，通过光刻工艺定义伺服图案，同时通过光刻工艺和自组装的组合来定义数据图案。

9. 发明授权

US07649677B2 Multi-ridged subwavelength aperture for optical transmission and thermally assisted magnetic recording 有权
标题翻译：用于光学传输和热辅助磁记录的多脊亚波长孔径
公开(公告)号：US07649677B2
公开(公告)日：2010-01-19
申请号：US11398170
申请日：2006-04-04
申请人： Xuhui Jin , Chie Ching Poon , Timothy Carl Strand , Henry Hung Yang
发明人： Xuhui Jin , Chie Ching Poon , Timothy Carl Strand , Henry Hung Yang
IPC分类号： G02F2/00 , G11B19/02 , G02B6/10 , G02B6/12
CPC分类号： G11B5/314 , G11B5/02 , G11B2005/0005 , G11B2005/0021
摘要： A subwavelength aperture includes a plurality of ridges that project from an aperture sidewall into the aperture opening. The ridges may be closely spaced such that the hot spots associated with the ridges are likewise closely spaced and create an elongated hot spot. The subwavelength aperture of the present invention may be adapted for use in a magnetic head of a hard disk drive for improved thermally assisted recording (TAR) of magnetic data bits. Such a magnetic head may include an optical resonant cavity that is fabricated within the magnetic head structure.
摘要翻译：亚波长孔径包括从孔侧壁突出到孔口中的多个脊。脊可以紧密地间隔开，使得与脊相关联的热点同样紧密地间隔开并产生细长的热点。本发明的亚波长孔径可以适用于硬盘驱动器的磁头，用于改善磁数据位的热辅助记录（TAR）。这样的磁头可以包括在磁头结构内制造的光学谐振腔。

10. 发明申请

US20090310256A1 METHOD FOR MAKING A MASTER MOLD WITH HIGH BIT-ASPECT-RATIO FOR NANOIMPRINTING PATTERNED MAGNETIC RECORDING DISKS, MASTER MOLD MADE BY THE METHOD, AND DISK IMPRINTED BY THE MASTER MOLD 有权
标题翻译：用于制造具有高比特率比例的主模具用于纳米图案磁记录盘的方法，通过该方法制造的主模具和主模具所示的盘
公开(公告)号：US20090310256A1
公开(公告)日：2009-12-17
申请号：US12141060
申请日：2008-06-17
申请人： Thomas R. Albrecht , Barry Cushing Stipe , Henry Hung Yang
发明人： Thomas R. Albrecht , Barry Cushing Stipe , Henry Hung Yang
IPC分类号： G11B5/82 , B44C1/22 , B28B1/00
CPC分类号： G11B5/855
摘要： A method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks results in a master mold having topographic pillars arranged in a pattern of annular bands of concentric rings. The ratio of circumferential density of the pillars to the radial density of the concentric rings in a band is greater than 1. The method uses sidewall lithography to first form a pattern of generally radially-directed pairs of parallel lines on the master mold substrate, with the lines being grouped into annular zones or bands. The sidewall lithography process can be repeated, resulting in a doubling of the number of lines each time the process is repeated. Conventional lithography is used to form concentric rings over the radially-directed pairs of parallel lines. After etching and resist removal, the master mold has pillars arranged in circular rings, with the rings grouped into annular bands. The master mold may be used to nanoimprint the disks, resulting in disks having a BAR greater than 1, wherein BAR is the ratio of data track spacing in the radial direction to the data island spacing in the circumferential direction.
摘要翻译：用于制造用于纳米压印图案化介质磁记录盘的母模的方法导致具有布置成同心环的环形带图案的形状柱的母模。柱的圆周密度与带中同心环的径向密度的比率大于1.该方法使用侧壁光刻法首先在母模基底上形成大致径向定向的平行线对的图案，其中，线路被分组成环形区域或带。可以重复侧壁光刻处理，导致每次重复该过程的行数加倍。常规光刻用于在径向对平行线上形成同心环。在蚀刻和抗蚀剂去除之后，主模具有布置成圆形环的柱，其中环被分组成环形带。主模可以用于纳米压印盘，导致具有大于1的BAR的盘，其中BAR是径向方向上的数据轨道间隔与圆周方向上的数据岛间隔的比率。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式