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1. 发明授权

US06190732B1 Method and system for dispensing process gas for fabricating a device on a substrate 失效
标题翻译：用于分配用于在衬底上制造器件的工艺气体的方法和系统
公开(公告)号：US06190732B1
公开(公告)日：2001-02-20
申请号：US09146486
申请日：1998-09-03
申请人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
发明人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
IPC分类号： C23C1634
CPC分类号： C23C16/45565 , C23C16/4408 , C23C16/4412 , C23C16/45521 , C23C16/45589 , C23C16/4585 , Y10S438/905
摘要： A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance configuration for axisymetric process gas flow over the substrate and to form a high conductance configuration for enhanced evacuation of residual process gas from the reaction chamber upon completion of the process. A dual conductance chuck has an indented region that aligns with the exhaust port of the reaction chamber to restrict process gas flow in the low conductance configuration, and that moves distal a showerhead and the exhaust port to provide reduced restriction of process gas flow for reaction chamber evacuation. The chuck includes thermal control for enhancing film deposition on the substrate and for reducing residual film deposition on the chuck. An evacuation opening in the housing provides independent evacuation of residual gas from the housing. The present invention enhance throughput of device formation by reducing purge and process cycle times.
摘要翻译：一种用工艺气体（例如化学气相沉积）在衬底上制造器件的方法和系统。反应室和支撑卡盘配合以形成用于轴向测量工艺气体流过衬底的低电导结构，并且形成高电导配置，以在工艺完成时增强从反应室抽出残余工艺气体。双电导卡盘具有与反应室的排气口对准的缩进区域，以限制低导电构造中的工艺气体流动，并且在喷头和排气口的远端移动以减少对反应室的工艺气体流量的限制疏散。卡盘包括用于增强基板上的膜沉积并减少卡盘上的残留膜沉积的热控制。壳体中的排气开口可以从壳体中独立排出残留气体。本发明通过减少吹扫和处理循环时间来增强器件形成的生产能力。

2. 发明授权

US06692575B1 Apparatus for supporting a substrate in a reaction chamber 失效
标题翻译：用于在反应室中支撑基底的装置
公开(公告)号：US06692575B1
公开(公告)日：2004-02-17
申请号：US09484821
申请日：2000-01-18
申请人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
发明人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
IPC分类号： C23C1646
CPC分类号： C23C16/45565 , C23C16/4408 , C23C16/4412 , C23C16/45521 , C23C16/45589 , C23C16/4585 , Y10S438/905
摘要： A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance configuration for axisymetric process gas flow over the substrate and to form a high conductance configuration for enhanced evacuation of residual process gas from the reaction chamber upon completion of the process. A dual conductance chuck has an indented region that aligns with the exhaust port of the reaction chamber to restrict process gas flow in the low conductance configuration, and that moves distal a showerhead and the exhaust port to provide reduced restriction of process gas flow for reaction chamber evacuation. The chuck includes thermal control for enhancing film deposition on the substrate and for reducing residual film deposition on the chuck. An evacuation opening in the housing provides independent evacuation of residual gas from the housing. The present invention enhance throughput of device formation by reducing purge and process cycle times.
摘要翻译：一种用工艺气体（例如化学气相沉积）在衬底上制造器件的方法和系统。反应室和支撑卡盘配合以形成用于轴向测量工艺气体流过衬底的低电导结构，并且形成高电导配置，以在工艺完成时增强从反应室抽出残余工艺气体。双电导卡盘具有与反应室的排气口对准的缩进区域，以限制低导电构造中的工艺气体流动，并且在喷头和排气口的远端移动以减少对反应室的工艺气体流量的限制疏散。卡盘包括用于增强基板上的膜沉积并减少卡盘上的残留膜沉积的热控制。壳体中的排气开口可以从壳体中独立排出残留气体。本发明通过减少吹扫和处理循环时间来增强器件形成的生产能力。

3. 发明授权

US06508197B1 Apparatus for dispensing gas for fabricating substrates 失效
标题翻译：用于分配气体用于制造基底的装置
公开(公告)号：US06508197B1
公开(公告)日：2003-01-21
申请号：US09484816
申请日：2000-01-18
申请人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
发明人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
IPC分类号： C23C1600
CPC分类号： C23C16/45565 , C23C16/4408 , C23C16/4412 , C23C16/45521 , C23C16/45589 , C23C16/4585 , Y10S438/905
摘要： A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance configuration for axisymetric process gas flow over the substrate and to form a high conductance configuration for enhanced evacuation of residual process gas from the reaction chamber upon completion of the process. A dual conductance chuck has an indented region that aligns with the exhaust port of the reaction chamber to restrict process gas flow in the low conductance configuration, and that moves distal a showerhead and the exhaust port to provide reduced restriction of process gas flow for reaction chamber evacuation. The chuck includes thermal control for enhancing film deposition on the substrate and for reducing residual film deposition on the chuck. An evacuation opening in the housing provides independent evacuation of residual gas from the housing. The present invention enhance throughput of device formation by reducing purge and process cycle times.
摘要翻译：一种用工艺气体（例如化学气相沉积）在衬底上制造器件的方法和系统。反应室和支撑卡盘配合以形成用于轴向测量工艺气体流过衬底的低电导结构，并且形成高电导配置，以在工艺完成时增强从反应室抽出残余工艺气体。双电导卡盘具有与反应室的排气口对准的缩进区域，以限制低导电构造中的工艺气体流动，并且在喷头和排气口的远端移动以减少对反应室的工艺气体流量的限制疏散。卡盘包括用于增强基板上的膜沉积并减少卡盘上的残留膜沉积的热控制。壳体中的排气开口可以从壳体中独立排出残留气体。本发明通过减少吹扫和处理循环时间来增强器件形成的生产能力。

4. 发明授权

US06274495B1 Method for fabricating a device on a substrate 有权
标题翻译：在基板上制造器件的方法
公开(公告)号：US06274495B1
公开(公告)日：2001-08-14
申请号：US09484778
申请日：2000-01-18
申请人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
发明人： Thomas R. Omstead , Panya Wongsenakhum , William J. Messner , Edward J. Nagy , William Starks , Mehrdad M. Moslehi
IPC分类号： H01L2144
CPC分类号： C23C16/45565 , C23C16/4408 , C23C16/4412 , C23C16/45521 , C23C16/45589 , C23C16/4585 , Y10S438/905
摘要： A method and system for fabricating a device on a substrate with a process gas, such as with chemical vapor deposition. A reaction chamber and support chuck cooperate to form a low conductance configuration for axisymetric process gas flow over the substrate and to form a high conductance configuration for enhanced evacuation of residual process gas from the reaction chamber upon completion of the process. A dual conductance chuck has an indented region that aligns with the exhaust port of the reaction chamber to restrict process gas flow in the low conductance configuration, and that moves distal a showerhead and the exhaust port to provide reduced restriction of process gas flow for reaction chamber evacuation. The chuck includes thermal control for enhancing film deposition on the substrate and for reducing residual film deposition on the chuck. An evacuation opening in the housing provides independent evacuation of residual gas from the housing. The present invention enhance throughput of device formation by reducing purge and process cycle times.
摘要翻译：一种用工艺气体（例如化学气相沉积）在衬底上制造器件的方法和系统。反应室和支撑卡盘配合以形成用于轴向测量工艺气体流过衬底的低电导结构，并且形成高电导配置，以在工艺完成时增强从反应室抽出残余工艺气体。双电导卡盘具有与反应室的排气口对准的缩进区域，以限制低导电构造中的工艺气体流动，并且在喷头和排气口的远端移动以减少对反应室的工艺气体流量的限制疏散。卡盘包括用于增强基板上的膜沉积并减少卡盘上的残留膜沉积的热控制。壳体中的排气开口可以从壳体中独立排出残留气体。本发明通过减少吹扫和处理循环时间来增强器件形成的生产能力。

5. 发明授权

US06643945B1 Universal anchor bolt template 失效
标题翻译：通用锚栓模板
公开(公告)号：US06643945B1
公开(公告)日：2003-11-11
申请号：US10197054
申请日：2002-07-16
申请人： William Starks
发明人： William Starks
IPC分类号： G01B314
CPC分类号： E04G21/185
摘要： A universal anchor bolt template including a plate member having a square configuration. The plate member has planar upper and lower surfaces. The plate member has a plurality of apertures therethrough arranged in at least one group of four radial aperture lines. The apertures are spaced along each of the aperture lines in the group at corresponding distances, such that the use of corresponding apertures allows the anchoring bolts to be positioned in a square configuration with a selected center-to-center distance. Each of the apertures is surrounded by at least one concentric knock-out for allowing the apertures to be enlarged for the use of larger anchoring bolts than could be accommodated by the apertures.
摘要翻译：一种通用锚栓模板，其包括具有正方形构造的板构件。板构件具有平面的上表面和下表面。板构件具有穿过其布置在至少一组四个径向孔径线中的多个孔。孔以相应距离的组中的每个孔径线间隔开，使得使用相应的孔允许锚定螺栓以具有选定的中心到中心距离的正方形配置定位。每个孔被至少一个同心敲除包围，以允许孔被扩大以使用比由孔容纳的更大的锚定螺栓。

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