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    • 3. 发明授权
    • System and method for monitoring defects in structures
    • 监测结构缺陷的系统和方法
    • US06922641B2
    • 2005-07-26
    • US10664196
    • 2003-09-17
    • Thomas BatzingerAndrew MayPeter AllisonCarl Lester
    • Thomas BatzingerAndrew MayPeter AllisonCarl Lester
    • G01B5/28G01B7/06G01B7/28G01N27/20
    • G01B7/281
    • A system and method for monitoring defects in a structure are provided. The system includes a power supply for supplying an electric current to a monitoring area of the structure and a reference; a measurement circuit for measuring a potential drop across at least two contact points of the monitoring area and at least two contact points of the reference; and a processor adapted to determine a ratio of the monitoring area potential drop to the reference potential drop indicative of a percentage change in a thickness of the structure. The method includes the steps of supplying the current to the monitoring area and the reference; measuring a first potential drop across the monitoring area and the reference; and determining the ratio indicative of the percentage change in the thickness of the structure.
    • 提供了一种用于监测结构中的缺陷的系统和方法。 该系统包括用于向结构的监视区域提供电流的电源和参考; 测量电路,用于测量监测区域的至少两个接触点和参考的至少两个接触点的电位降; 以及处理器,其适于确定所述监测区域电位降与所述参考电位下降的比率,其指示所述结构的厚度的百分比变化。 该方法包括将电流提供给监视区域和参考信号的步骤; 测量监测区域和参考值的第一个潜在下降点; 并确定表示该结构的厚度的百分比变化的比率。