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    • 1. 发明申请
    • GAS SENSOR
    • 气体传感器
    • US20130032480A1
    • 2013-02-07
    • US13565040
    • 2012-08-02
    • Tetsuya ITOSatoshi TERAMOTOKentaro MORI
    • Tetsuya ITOSatoshi TERAMOTOKentaro MORI
    • G01N27/409
    • G01N27/406G01N27/4062G01N27/407G01N27/409G01N27/41G01N27/419
    • A gas sensor (100) includes an oxygen pump cell (135) and an oxygen-concentration detection cell (150) laminated together with a spacer (145) interposed therebetween. The spacer (145) has a gas detection chamber (145c) which faces electrodes (137, 152) of the cells (135, 150). The oxygen-concentration detection cell (150) produces an output voltage corresponding to the concentration of oxygen in the gas detection chamber (145c). The oxygen pump cell (135) pumps oxygen into and out of the measurement chamber (145c) such that the output voltage of the oxygen-concentration detection cell (150) becomes equal to a predetermined target voltage. A leakage portion mainly formed of zirconia is disposed between which electrically connects the oxygen-concentration detection cell (150) and the oxygen pump cell (135).
    • 气体传感器(100)包括氧隔膜(135)和与间隔件(145)一起夹在其间的氧浓度检测单元(150)。 间隔物(145)具有与电池(135,150)的电极(137,152)相对的气体检测室(145c)。 氧浓度检测单元(150)产生与气体检测室(145c)中的氧浓度对应的输出电压。 氧气泵电池(135)将氧气输入和输出测量室(145c),使得氧浓度检测单元(150)的输出电压等于预定的目标电压。 主要由氧化锆形成的泄漏部分设置在它们之间,电气连接氧浓度检测单元(150)和氧气泵单元(135)。
    • 5. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体器件及其制造方法
    • US20110070704A1
    • 2011-03-24
    • US12951774
    • 2010-11-22
    • Tetsuya ITO
    • Tetsuya ITO
    • H01L21/8242H01L21/02
    • H01L27/10894H01L27/0207H01L27/1085
    • It is disclosed a semiconductor device including a silicon substrate, provided with a plurality of cell active regions in a call region, an element isolation groove, formed in a portion, between any two of the plurality of cell active region, of the silicon substrate, a capacitor dielectric film, formed in the element isolation groove, a capacitor upper electrode, formed on the capacitor dielectric film, and configuring a capacitor together with the silicon substrate and the capacitor dielectric film. The semiconductor device is characterized in that a dummy active region is provided next to the cell region in the silicon substrate.
    • 公开了一种半导体器件,包括在通孔区域中设置有多个电池活性区域的硅衬底,形成在硅衬底的多个电池有源区域的任意两个之间的部分中的元件隔离槽, 形成在元件隔离槽中的电容器电介质膜,形成在电容器电介质膜上的电容器上电极,以及与硅衬底和电容器电介质膜一起构成电容器。 半导体器件的特征在于,在硅衬底中的单元区域旁边设置虚设有源区。
    • 7. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体器件及其制造方法
    • US20080224197A1
    • 2008-09-18
    • US12049592
    • 2008-03-17
    • Tetsuya ITO
    • Tetsuya ITO
    • H01L29/94H01L21/02
    • H01L27/10894H01L27/0207H01L27/1085
    • It is disclosed a semiconductor device including a silicon substrate, provided with a plurality of cell active regions in a call region, an element isolation groove, formed in a portion, between any two of the plurality of cell active region, of the silicon substrate, a capacitor dielectric film, formed in the element isolation groove, a capacitor upper electrode, formed on the capacitor dielectric film, and configuring a capacitor together with the silicon substrate and the capacitor dielectric film. The semiconductor device is characterized in that a dummy active region is provided next to the cell region in the silicon substrate.
    • 公开了一种半导体器件,包括在通孔区域中设置有多个电池活性区域的硅衬底,形成在硅衬底的多个电池有源区域的任意两个之间的部分中的元件隔离槽, 形成在元件隔离槽中的电容器电介质膜,形成在电容器电介质膜上的电容器上电极,以及与硅衬底和电容器电介质膜一起构成电容器。 半导体器件的特征在于,在硅衬底中的单元区域旁边设置虚设有源区。