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1. 发明授权

US08635886B2 Copper-containing silica glass, method for producing the same, and xenon flash lamp using the same 有权
标题翻译：含铜石英玻璃及其制造方法以及使用其的氙闪光灯
公开(公告)号：US08635886B2
公开(公告)日：2014-01-28
申请号：US13558698
申请日：2012-07-26
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
IPC分类号： C03B37/00 , C03B20/00
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译：本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为即使在高产量使用方面，长期稳定性也优异。含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

2. 发明授权

US07007510B2 Method of producing an optical member 有权
标题翻译：光学构件的制造方法
公开(公告)号：US07007510B2
公开(公告)日：2006-03-07
申请号：US10731186
申请日：2003-12-09
申请人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura , Martin Trommer , Stefan Ochs
发明人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura , Martin Trommer , Stefan Ochs
IPC分类号： C03C23/00
CPC分类号： C03C23/007 , C03B19/1453 , C03B32/00 , Y10T428/131 , Y10T428/24612
摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank. In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.
摘要翻译：本发明的目的是提供一种改进的坯料，使得可以获得高均匀性的光学构件，并提供用于热处理高度均匀的合成石英坯的容器和热处理方法。在本发明的第一方面，提供了一种特殊设计的坯件，其显示出凹形外表面。在本发明的第二方面，提供了一种用于热处理坯料的特殊设计容器，由此将中心处的发热度设定为高于周围环境的热量。

3. 发明申请

US20120291488A1 COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 有权
标题翻译：二氧化硅铜玻璃及其制造方法及使用其的氙气灯
公开(公告)号：US20120291488A1
公开(公告)日：2012-11-22
申请号：US13558698
申请日：2012-07-26
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
IPC分类号： C03C4/12 , C03C21/00 , C03B20/00
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译：本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为即使在高产量使用方面，长期稳定性也优异。含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

4. 发明申请

US20100109509A1 COPPER-CONTANING SILICA GLASS, METHOD FOR PRODUCING THE SAME, AND XENON FLASH LAMP USING THE SAME 审中-公开
标题翻译：二氧化硅铜玻璃及其制造方法及使用其的氙气灯
公开(公告)号：US20100109509A1
公开(公告)日：2010-05-06
申请号：US12595605
申请日：2008-04-28
申请人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
发明人： Tetsuji Ueda , Michinari Ohuchi , Hiroyuki Nishimura , Akira Fujinoki , Masahiro Nakatsuka , Hidetsugu Yoshida
IPC分类号： H01J17/16 , B05D3/02 , C03C3/04
CPC分类号： C03B19/1438 , C03B19/1453 , C03B2201/07 , C03B2201/23 , C03B2201/40 , C03C3/06 , C03C4/0071 , C03C4/085 , C03C4/12 , C03C23/0095 , C03C2201/23 , C03C2201/40 , C03C2203/44
摘要： It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use.The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.
摘要翻译：本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为即使在高产量使用方面，长期稳定性也优异。含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

5. 发明授权

US06578382B2 Synthetic quartz glass for optical use, heat treatment method and heat treatment apparatus for the same 失效
标题翻译：用于光学用途的合成石英玻璃，热处理方法和热处理装置
公开(公告)号：US06578382B2
公开(公告)日：2003-06-17
申请号：US09821352
申请日：2001-03-28
申请人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura
发明人： Tetsuji Ueda , Akira Fujinoki , Hiroyuki Nishimura
IPC分类号： C03C1500
CPC分类号： C03B19/1453 , C03B32/00 , C03B2201/21 , C03C23/007 , Y10S65/08 , Y10S65/90
摘要： A method for heat treating a synthetic quartz glass for optical use in a heating furnace, that comprises covering the surroundings of a synthetic quartz glass body with a SiO2 powder having a mean dissolved hydrogen molecule concentration of 1×1019 molecules/cm3 or higher, and then heat treating the body.
摘要翻译：一种用于热处理在加热炉中用于光学的合成石英玻璃的方法，其包括用平均溶解氢分子浓度为1×1019分/ cm 3或更高的SiO 2粉末覆盖合成石英玻璃体的周围，然后加热治疗身体。

6. 发明授权

US06689705B2 Synthetic quartz glass optical material and optical member 有权
标题翻译：合成石英玻璃光学材料和光学元件
公开(公告)号：US06689705B2
公开(公告)日：2004-02-10
申请号：US10048309
申请日：2002-01-29
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toru Yokota , Yasuyuki Yaginuma , Akira Sato , Tetsuji Ueda
IPC分类号： C03C306
CPC分类号： C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2207/32 , C03C3/06 , C03C4/0085 , C03C2201/12 , C03C2201/21 , C03C2203/54 , Y02P40/57
摘要： An object of the present invention is to provide a synthetic quartz glass optical material having a high optical transmittance for a radiation 157 nm in wavelength emitted from F2 excimer laser and a high resistance against irradiation of a F2 excimer laser radiation, yet having a uniformity suitable for such a fine patterning using a F2 excimer laser, and to provide an optical member using the same. The problems above are solved by a synthetic quartz glass optical material for F2 excimer lasers having an OH group concentration of 0.5 ppm or lower, a fluorine concentration of 0.1 to 2 mol %, a hydrogen molecule concentration of 5×1016 molecules/cm3 or lower, a difference between the maximum and minimum fluorine concentrations within 20 mol ppm, and a difference between the maximum and minimum refraction indices of 2×10−5 or lower.
摘要翻译：本发明的目的是提供一种合成石英玻璃光学材料，其对于从F2准分子激光器发射的波长为157nm的辐射具有高的透光率，并且具有高的对F2准分子激光辐射照射的抗性，但具有适合的均匀性对于使用F2准分子激光器的精细图案化，并提供使用其的光学部件。上述问题由OH基浓度为0.5ppm以下，氟浓度为0.1〜2mol％，氢分子浓度为5×10 16分子/ cm 2的F2准分子激光的合成石英玻璃光学材料解决， 3>以下，最大和最小氟浓度在20mol ppm内的差异，以及最大和最小折射率之间的差异为2×10 -5或更低。

7. 发明授权

US07093465B2 Method for heat treating synthetic quartz glass for optical use 有权
标题翻译：光学用合成石英玻璃热处理方法
公开(公告)号：US07093465B2
公开(公告)日：2006-08-22
申请号：US10297451
申请日：2001-05-31
申请人： Tetsuji Ueda , Hiroyuki Nishimura , Akira Fujinoki
发明人： Tetsuji Ueda , Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03C15/00
CPC分类号： C03C23/007 , C03B19/1453 , C03B32/00 , C03B2201/03 , Y10S65/90
摘要： An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide and a synthetic quartz glass for optical use.The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiO2 powder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.
摘要翻译：本发明的目的是克服现有技术的问题，提供热处理方法以及能够以更高的效率对具有较高均匀性的光学用合成石英玻璃进行热处理的热处理装置和更高的纯度。本发明的另一个目的是提供一种用于光学用途的合成石英玻璃。上述问题是通过在加热炉中对作为热处理对象的平坦圆筒形合成石英玻璃体进行热处理的方法来解决的，该方法是用于热处理用于光学用途的合成石英玻璃的方法，包括制备容器的石英玻璃，并且具有平坦的圆柱形空间用于在其中设置物体合成石英玻璃体，将两个或更多个目标合成石英玻璃体彼此平行地放置在容器中，用SiO 2填充空间，粉末，将容器置于加热炉内并关闭盖子，并对容器进行热处理。

8. 发明申请

US20060183622A1 Optical synthetic quartz glass and method for producing the same 有权
标题翻译：光学合成石英玻璃及其制备方法
公开(公告)号：US20060183622A1
公开(公告)日：2006-08-17
申请号：US10548237
申请日：2004-03-03
申请人： Hiroyuki Nishimura , Akira Fujinoki
发明人： Hiroyuki Nishimura , Akira Fujinoki
IPC分类号： C03C3/06 , C03B37/07 , C03B37/075 , C03B37/018
CPC分类号： C03B32/00 , C03B19/1453 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C2201/12 , C03C2201/23 , C03C2203/40 , C03C2203/42 , Y02P40/57
摘要： The present invention provides an optical synthetic quartz glass material which substantially does not cause changes in transmitted wave surface (TWS) by solarization, compaction (TWS delayed), rarefaction (TWS progressed) and photorefractive effect when ArF excimer laser irradiation is applied at a low energy density, e.g. at energy density per pulse of 0.3 mJ/cm2 or less. The present invention further provides a method for manufacturing the same. In order to solve the above-mentioned problems, the optical synthetic quartz glass material of the present invention is characterized in that, in a synthetic quartz glass prepared by a flame hydrolysis method using a silicon compound as a material, the followings are satisfied that the amount of SiOH is within a range of more than 10 ppm by weight to 400 ppm by weight, content of fluorine is 30 to 1000 ppm by weight, content of hydrogen is 0.1×1017 to 10×1017 molecules/cm3 and, when the amounts of SiOH and fluorine are A and B, respectively, total amount of A and B is 100 ppm by weight or more and B/A is 0.25 to 25.
摘要翻译：本发明提供了一种光学合成石英玻璃材料，其在低温下施加ArF准分子激光照射时，通过太阳化，压实（TWS延迟），稀释（TWS进行）和光折射效应基本上不会引起透射波面（TWS）的变化能量密度，例如每个脉冲的能量密度为0.3mJ / cm 2以下。本发明还提供一种制造该方法的方法。为了解决上述问题，本发明的光学合成石英玻璃材料的特征在于，在使用硅化合物作为材料的火焰水解法制备的合成石英玻璃中，满足以下条件： SiOH的量在大于10重量ppm至400重量ppm的范围内，氟含量为30至1000重量ppm，氢含量为0.1×10 17至10 10 17分子/ cm 3，当SiOH和氟的量分别为A和B时，A和B的总量为100重量ppm以上，B / A为 0.25至25。

9. 发明授权

US06761951B2 Synthetic quartz glass blank 有权
标题翻译：合成石英玻璃毛坯
公开(公告)号：US06761951B2
公开(公告)日：2004-07-13
申请号：US10315990
申请日：2002-12-11
申请人： Hisatoshi Otsuka , Kazuo Shirota , Akira Fujinoki , Hiroyuki Nishimura , Takayuki Shimakawa
发明人： Hisatoshi Otsuka , Kazuo Shirota , Akira Fujinoki , Hiroyuki Nishimura , Takayuki Shimakawa
IPC分类号： B32B300
CPC分类号： C03C3/06 , C03B19/1423 , C03B19/1453 , C03B19/1469 , C03B2201/21 , C03B2201/23 , C03B2207/06 , C03B2207/20 , C03B2207/32 , C03C2201/21 , C03C2201/23 , Y02P40/57 , Y10T428/21 , Y10T428/2913
摘要： A cylindrical, chlorine-free synthetic quartz glass blank of a specific size obtained by homogenizing a synthetic quartz glass ingot having periodic striae along a direction of growth has (a) striae grades in the working and off-axis directions which meet grade A of U.S. military specification MIL-G-174B, (b) average hydroxyl group concentrations in the working and off-axis directions of 700 to 1,000 ppm each, (c) average fictive temperatures in the working and off-axis directions of 850 to 950° C. each, and (d) a refractive index distribution for 633 nm wavelength light in the working direction of at most 1×10−6. The blank has a good transmittance to laser light, undergoes little deterioration when irradiated with laser light, and is particularly suitable for ArF excimer laser-related applications.
摘要翻译：通过沿着生长方向均匀化具有周期条纹的合成石英玻璃锭获得的具有特定尺寸的圆柱形，无氯合成石英玻璃坯料具有（a）在工作和离轴方向上的条纹等级，其满足美国A级军事规格MIL-G-174B，（b）工作和离轴方向的平均羟基浓度分别为700〜1,000ppm，（c）工作和离轴方向的平均假想温度为850〜950℃ ，和（d）工作方向上最多为1×10 -6的633nm波长的光的折射率分布。该空白对激光具有良好的透射率，当用激光照射时几乎不发生劣化，并且特别适用于ArF准分子激光相关应用。

10. 发明授权

US6031238A Projection aligner for integrated circuit fabrication 失效
标题翻译：用于集成电路制造的投影对准器
公开(公告)号：US6031238A
公开(公告)日：2000-02-29
申请号：US29451
申请日：1998-02-26
申请人： Akira Fujinoki , Hiroyuki Nishimura , Toshiki Mori
发明人： Akira Fujinoki , Hiroyuki Nishimura , Toshiki Mori
IPC分类号： G02B13/14 , G03F7/20
CPC分类号： G03F7/701 , G02B13/14 , G03F7/70225 , G03F7/70241 , G03F7/70958
摘要： A known projection aligner for integrated circuit fabrication, in which an integrated circuit pattern image is projected on a wafer, comprises an ArF excimer laser and an optical system composed of groups of quartz glass optical members made of synthetic quartz glass. To provide a projection aligner having optical properties, such as durability, optical transmittance and the like, which are not degraded over a long time of operation and the optical system can be constructed at a low cost as a whole, it is suggested that the optical system comprises a first quartz glass optical member group whose hydrogen molecule concentration is in the range between 1.times.10.sup.17 and 5.times.10.sup.18 molecules/cm.sup.3 and a third quartz glass optical member group whose hydrogen molecule concentration is in the range between 5.times.10.sup.18 to 5.times.10.sup.19 molecules/cm.sup.3.
摘要翻译： PCT No.PCT / EP97 / 03406 Sec。 371日期1998年2月26日 102（e）1998年2月26日PCT 1997年6月30日PCT公布。出版物WO98 / 00761 日本1998年1月8日在集成电路制造中，集成电路图案投影在晶片上的已知投影对准器包括ArF准分子激光器和由合成石英玻璃制成的石英玻璃光学部件组成的光学系统。为了提供一种投影对准器，其具有在长时间不劣化的光学性能，例如耐久性，光透射率等，并且光学系统可以以低成本整体构造，因此建议光学系统包括其氢分子浓度在1×10 17和5×10 18分子/ cm 3之间的第一石英玻璃光学构件组和氢分子浓度在5×1018至5×1019分/ cm 3之间的第三石英玻璃光学构件组。

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