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    • 3. 发明授权
    • Magnetism detecting system
    • 磁检测系统
    • US3971981A
    • 1976-07-27
    • US509445
    • 1974-09-26
    • Yukio NakagomeTeruji WatanabeTakasuke FukuiShizuo Suzuki
    • Yukio NakagomeTeruji WatanabeTakasuke FukuiShizuo Suzuki
    • G01R33/05G01R33/10G01R33/02G01C17/28
    • G01R33/05G01R33/10
    • A magnetism detecting system, in which reference magnetic fields sequentially scan many radial scanning lines obtained by dividing a plane to be detected at regular intervals of a desired angle with respect to an origin positioned at the common intersecting point of said scanning lines. At least one parametrically excited second harmonic oscillator detects the direction and magnitude of a magnetic field to be detected along each of the scanning lines. A display device is provided for scanning and displaying the plane with respect to the origin in synchronism with the scanning of each of the scanning lines. A detected output is applied to the display device when the magnetic field to be detected and the reference magnetic field coincides with each other in direction and in magnitude.
    • 一种磁检测系统,其中参考磁场顺序地扫描通过相对于位于所​​述扫描线的共同相交点处的原点以预定角度的规则间隔分割待检测的平面而获得的许多径向扫描线。 至少一个参数激励的二次谐波振荡器检测沿着每条扫描线检测的磁场的方向和幅度。 提供了一种显示装置,用于与每条扫描线的扫描同步地扫描和显示相对于原点的平面。 当要检测的磁场和参考磁场在方向和大小上彼此一致时,检测到的输出被施加到显示装置。
    • 4. 发明授权
    • Supporting structure for underwater structure
    • 水下结构支撑结构
    • US4697984A
    • 1987-10-06
    • US830940
    • 1986-02-19
    • Mamoru TakeuchiSadao NemotoShizuo SuzukiJuichiro Kawai
    • Mamoru TakeuchiSadao NemotoShizuo SuzukiJuichiro Kawai
    • F03B3/04E02B9/00F03B13/08F01D15/10F04D29/60
    • F03B13/08Y02E10/22Y02E10/223Y10S248/901
    • A supporting structure comprises a shell and a plurality of support members which are independent of each other, inserted in the shell and arranged so that the flexural rigidity is smaller in the water flow than in a perpendecular to the water flow. The supporting structure supports one place of an axial-flow bulb turbine which is to be supported at two places spaced in the water flow direction from each other. The support structure is more flexible in the water flow direction than in the perpendicular direction to the water flow, so that small bending stresses are induced in the support structure and the axial stresses induced in the support structure by the weight and the buoyancy acting on the turbine and the bending stresses induced in the support structure by axial deformation of the turbine are kept below an allowable stress of material constituting the support structure.
    • 支撑结构包括壳体和彼此独立的多个支撑构件,其插入壳体中并且布置成使得水流中的弯曲刚度小于水流中的弯曲刚度。 支撑结构支撑轴流式球泡涡轮机的一个位置,其将被支撑在彼此沿着水流方向隔开的两个位置处。 支撑结构在水流方向上比在垂直于水流的方向上更灵活,从而在支撑结构中引起小的弯曲应力,并且通过作用在支撑结构上的重量和浮力在支撑结构中引起的轴向应力 涡轮机和通过涡轮机的轴向变形在支撑结构中引起的弯曲应力被保持在构成支撑结构的材料的允许应力以下。
    • 7. 发明授权
    • Wafer mounting device
    • 晶圆安装装置
    • US5720849A
    • 1998-02-24
    • US904439
    • 1992-06-25
    • Noriyoshi YokosukaShizuo Suzuki
    • Noriyoshi YokosukaShizuo Suzuki
    • H01L21/677H01L21/00H01L21/304H01L21/683B65C9/08
    • H01L21/6715H01L21/6838Y10T156/1744Y10T156/178
    • A wafer mounting device transfers a wafer coated with an adhesive and pastes the wafer on a mount plate while maintaining the thickness of the adhesive uniform. A chuck plate is carried by a rotatable transfer arm and holds the adhesive-coated wafer by suction so that the wafer can be moved in a direction of rotation of the arm. The chuck plate is heated by a heater to substantially the same temperature as the wafer. A flexible pressing pad is disposed between the chuck plate and the transfer arm for biasing the chuck plate in a direction away from the arm, and a flexible pressure-adjusting pad is provided for biasing the chuck plate in a direction toward the arm. The pressing pad and the pressure-adjusting pad have hollow sections filled with pressurized fluid, and the pressure of the fluid within each pad is regulated to thereby control the pressing force of the chuck plate so that the wafer is placed softly on the mount plate.
    • 晶片安装装置传送涂有粘合剂的晶片并将晶片粘贴在安装板上,同时保持粘合剂的厚度均匀。 卡盘由可旋转的传送臂承载并通过抽吸保持粘合剂涂覆的晶片,使得晶片可以在臂的旋转方向上移动。 卡盘由加热器加热到与晶片基本相同的温度。 弹性按压垫设置在卡板和传送臂之间,用于沿着远离臂的方向偏置卡盘板,并且设置柔性压力调节垫,用于沿着朝向臂的方向偏置卡盘板。 按压垫和压力调节垫具有填充有加压流体的中空部分,并且调节每个垫内的流体的压力,从而控制卡盘板的按压力,使得晶片轻轻地放置在安装板上。
    • 10. 发明授权
    • Semiconductor wafer boat and vertical heat treating system
    • 半导体晶圆舟和立式热处理系统
    • US6095806A
    • 2000-08-01
    • US337402
    • 1999-06-22
    • Shizuo SuzukiHisashi KitamiyaHirofumi Kitayama
    • Shizuo SuzukiHisashi KitamiyaHirofumi Kitayama
    • H01L21/683C23C16/458C30B25/12C30B31/14H01L21/22H01L21/68F27D5/00
    • C30B25/12C23C16/4583C30B31/14Y10S414/138
    • A boat for semiconductor wafers includes first, second and third support rods arranged between and connected to top and bottom plates. The first, second and third support rods include a plurality of first racks, a plurality of second racks, and a plurality of third racks, respectively, such that the racks of each rods are vertically arrayed with gaps therebetween. The first, second and third racks serving to define a plurality of horizontal wafer supporting levels. Each wafer supporting level is defined by only combination of the first, second and third racks of the corresponding height. In each wafer supporting level, the first and second racks are arranged substantially in symmetry with respect to an axis passing through the center of a wafer transfer port, and the third rack is arranged deviant from the axis by a certain distance corresponding to 5% to 48% of the diameter of the wafer.
    • 用于半导体晶片的船包括布置在顶板和底板之间并连接到顶板和底板的第一,第二和第三支撑杆。 第一,第二和第三支撑杆分别包括多个第一机架,多个第二机架和多个第三机架,使得每个杆的齿条在其间具有间隙而垂直排列。 第一,第二和第三机架用于限定多个水平晶片支撑水平。 每个晶片支撑水平仅由对应高度的第一,第二和第三机架的组合限定。 在每个晶片支撑水平中,第一和第二机架相对于通过晶片传送端口的中心的轴线基本上对称布置,并且第三机架布置在与轴线偏离一定距离,对应于5%至 晶圆直径的48%。