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    • 1. 发明授权
    • Semiconductor integrated circuit patterns
    • 半导体集成电路模式
    • US06727026B2
    • 2004-04-27
    • US09815004
    • 2001-03-23
    • Tatsuaki KujiKoji HashimotoSatoshi UsuiShigeki Nojima
    • Tatsuaki KujiKoji HashimotoSatoshi UsuiShigeki Nojima
    • G03F900
    • G03F1/36H01L23/5226H01L2924/0002H01L2924/00
    • In a method of designing patterns of a semiconductor integrated circuit, the shape of each of a plurality of opening patterns formed by a plurality of contact holes is formed into a rectangular shape; and the contact holes are arranged in such a manner that a long side of each of the rectangular opening patterns is opposite to a long side of an adjacent rectangular opening pattern, and the positions of both ends of the long sides are trued up. Furthermore, a photomask is used for manufacturing a semiconductor integrated circuit as designed by the above method of designing patterns of a semiconductor integrated circuit, in which a plurality of rectangular opening patterns are provided thereon as a plurality of rectangular opening patterns for contact holes; and the a plurality of rectangular opening patterns are arranged in such a manner that adjacent long sides thereof are opposite to each other, and the position of both ends of each long side is trued up. Besides, a semiconductor device comprises a semiconductor integrated circuit designed by using a method of designing a semiconductor integrated circuit.
    • 在设计半导体集成电路的图案的方法中,由多个接触孔形成的多个开口图案中的每一个的形状形成为矩形; 并且接触孔被布置成使得每个矩形开口图案的长边与相邻的矩形开口图案的长边相对,并且长边的两端的位置被修整。 此外,光掩模用于制造半导体集成电路,如上述设计的半导体集成电路的图案的方法所设计的,其中多个矩形开口图案设置在其上,作为用于接触孔的多个矩形开口图案; 并且多个矩形开口图案被布置成使得其相邻的长边彼此相对,并且每个长边的两端的位置被修整。 此外,半导体器件包括通过使用设计半导体集成电路的方法设计的半导体集成电路。