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1. 发明授权

US07818151B2 Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool 有权
标题翻译：用于获得光刻模拟工具的短程火炬模型参数的方法，程序产品和设备
公开(公告)号：US07818151B2
公开(公告)日：2010-10-19
申请号：US11415423
申请日：2006-05-02
申请人： Tamer Coskun , Sangbong Park , Jang Fung Chen , Bernd Geh
发明人： Tamer Coskun , Sangbong Park , Jang Fung Chen , Bernd Geh
IPC分类号： G06F17/50
CPC分类号： G03F7/70941 , G03F7/705
摘要： A process of obtaining short-range flare model parameters representing a short-range flare which degrades a contrast of an image generated by a lithography tool, is disclosed. Short-range flare is measured from the image to obtain measured short-range flare data. A simulation is performed based on short-range flare model parameters to obtain simulated short-range flare data. The simulated short-range flare data is compared with the measured short range flare data. It is determined whether the short-range flare model parameters used in the simulation is appropriate based on the comparison result. The short-range flare model parameters is optimized according to the measured short-range data and the simulated short-range flare data if the short-range flare model parameters used for the simulation is not appropriate.
摘要翻译：公开了一种获得表示短距离火炬的短距离火炬模型参数的过程，其降低了由光刻工具产生的图像的对比度。从图像中测量短程光晕，以获得测量的短距离闪光数据。基于短距离火炬模型参数进行模拟，以获得模拟的短距离火炬数据。将模拟的短程火炬数据与测量的短距离火炬数据进行比较。根据比较结果确定模拟中使用的短程火炬模型参数是否合适。如果用于模拟的短距离火炬模型参数不合适，则根据测得的短距离数据和模拟的短距离火炬数据优化短距离火炬模型参数。

2. 发明授权

US08120753B2 Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process 有权
标题翻译：用于产生校准瞳孔核的方法，程序产品和装置及其在光刻仿真过程中的使用方法
公开(公告)号：US08120753B2
公开(公告)日：2012-02-21
申请号：US11979839
申请日：2007-11-08
申请人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
发明人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
IPC分类号： G03B27/32 , G03B27/54
CPC分类号： G03F7/70216 , G03F7/705 , G03F7/70675
摘要： A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.
摘要翻译：一种生成用于模拟具有瞳孔的光学成像系统的成像性能的模型的方法。该方法包括以下步骤：定义光学成像系统和由光学成像系统利用的过程; 并且定义表示光学成像系统和过程的成像性能的模型方程，其中模型方程式包括校准的瞳孔核心。校准瞳孔代表瞳孔表现的线性模型。

3. 发明授权

US07494753B2 Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation 有权
标题翻译：用于改进临界尺寸计算中使用的抗蚀剂模型校准的方法，程序产品和装置
公开(公告)号：US07494753B2
公开(公告)日：2009-02-24
申请号：US11339827
申请日：2006-01-26
申请人： Jang Fung Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
发明人： Jang Fung Chen , Gabriel Berger , Tamer Coskun , Sangbong Park , Ting Chen
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70625 , G03F1/36 , G03F1/68 , G03F7/705 , G03F7/70516
摘要： Improved calibration of a resist model used in critical dimension (CD) calculation is disclosed. A dose function is obtained based on optical tool to be used form the resist on a wafer. The dose function indicates the amount of energy in a resist. The dose function is convolved with a convolution kernel to obtain a modified dose function. The convolution kernel has variable diffusion lengths in different directions. The convolution kernel may include multiple Gaussian kernels each having variable diffusion lengths in different directions. The modified dose function is converted into a CD value which is compared with a target value. If necessary, the diffusion lengths of the Gaussian kernels are adjusted based on the comparison result.
摘要翻译：公开了在关键尺寸（CD）计算中使用的抗蚀剂模型的改进的校准。基于晶片上的抗蚀剂使用的光学工具获得剂量函数。剂量函数表示抗蚀剂中的能量。剂量函数与卷积核卷积以获得修改的剂量函数。卷积核在不同方向具有可变扩散长度。卷积核可以包括在不同方向上具有可变扩散长度的多个高斯核。将修改的剂量函数转换为与目标值进行比较的CD值。如果需要，基于比较结果调整高斯核的扩散长度。

4. 发明申请

US20080204690A1 Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process 有权
标题翻译：用于产生校准瞳孔核的方法，程序产品和装置及其在光刻仿真过程中的使用方法
公开(公告)号：US20080204690A1
公开(公告)日：2008-08-28
申请号：US11979839
申请日：2007-11-08
申请人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
发明人： Gabriel Berger , Tamer Coskun , Sangbong Park , Jang Fung Chen
IPC分类号： G03B27/54
CPC分类号： G03F7/70216 , G03F7/705 , G03F7/70675
摘要： A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.
摘要翻译：一种生成用于模拟具有瞳孔的光学成像系统的成像性能的模型的方法。该方法包括以下步骤：定义光学成像系统和由光学成像系统利用的过程; 并且定义表示光学成像系统和过程的成像性能的模型方程，其中模型方程式包括校准的瞳孔核心。校准瞳孔代表瞳孔表现的线性模型。

5. 发明申请

US20110236808A1 Method and Apparatus for Performing Dark Field Double Dipole Lithography (DDL) 有权
公开(公告)号：US20110236808A1
公开(公告)日：2011-09-29
申请号：US13155259
申请日：2011-06-07
申请人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
发明人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G03F1/00
CPC分类号： G03F1/36 , G03F1/70 , G03F7/70125 , G03F7/70466
摘要： A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.

6. 发明授权

US07981576B2 Method and apparatus for performing dark field double dipole lithography (DDL) 有权
标题翻译：用于进行暗场双偶极子光刻（DDL）的方法和装置
公开(公告)号：US07981576B2
公开(公告)日：2011-07-19
申请号：US12890494
申请日：2010-09-24
申请人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
发明人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G03F1/00 , G03F1/14 , G06F17/50
CPC分类号： G03F1/36 , G03F1/70 , G03F7/70125 , G03F7/70466
摘要： A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
摘要翻译：一种产生用于暗场双偶极成像过程的互补掩模的方法。该方法包括以下步骤：识别具有多个特征的目标图案，包括水平和垂直特征; 基于目标图案生成水平掩模，其中水平掩模包括低对比度垂直特征。水平掩模的生成包括优化包含在水平掩模中的低对比度垂直特征的偏压的步骤; 并将辅助特征应用于水平掩模。该方法还包括基于目标图案生成垂直掩模，其中垂直掩模包含低对比度水平特征。垂直掩模的产生包括优化垂直掩模中包含的低对比度水平特征的偏差的步骤; 并将辅助特征应用于垂直掩模。

7. 发明申请

US20090138500A1 METHOD OF COMPACT DISPLAY COMBINED WITH PROPERTY-TABLE-VIEW FOR A COMPLEX RELATIONAL DATA STRUCTURE 审中-公开
标题翻译：与复杂的关系数据结构的属性表视图组合的紧凑显示方法
公开(公告)号：US20090138500A1
公开(公告)日：2009-05-28
申请号：US12248833
申请日：2008-10-09
申请人： Zhiqiang YUAN , Jang Fung Chen , Sangbong Park
发明人： Zhiqiang YUAN , Jang Fung Chen , Sangbong Park
IPC分类号： G06F17/30
CPC分类号： G06F16/289 , G06F16/2246
摘要： A method of managing data with a relational data structure, wherein the data having one or more tree structures having sub-tree structures, each tree or sub-tree structure comprising nodes, and relationship information indicating a relationship between the nodes, comprises allocating at least one of the tree structures or the sub-tree structures into another tree structure according to the relationship information, if the relationship information indicates that a node in the at least one of the tree structures or the sub-tree structures relates to one or more of the nodes of the another tree structure.
摘要翻译：一种使用关系数据结构管理数据的方法，其中具有一个或多个具有子树结构的树结构的数据，包括节点的每个树或子树结构以及指示节点之间的关系的关系信息包括至少分配如果所述关系信息指示所述至少一个所述树结构或所述子树结构中的节点与所述树结构或所述子树结构中的一个或多个相关联，则根据所述关系信息将所述树结构或所述子树结构中的一个重构为另一个树结构另一个树结构的节点。

8. 发明授权

US08632930B2 Method and apparatus for performing dark field double dipole lithography (DDL) 有权
标题翻译：用于进行暗场双偶极子光刻（DDL）的方法和装置
公开(公告)号：US08632930B2
公开(公告)日：2014-01-21
申请号：US13155259
申请日：2011-06-07
申请人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
发明人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G03F1/36
CPC分类号： G03F1/36 , G03F1/70 , G03F7/70125 , G03F7/70466
摘要： A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
摘要翻译：一种产生用于暗场双偶极成像过程的互补掩模的方法。该方法包括以下步骤：识别具有多个特征的目标图案，包括水平和垂直特征; 基于目标图案生成水平掩模，其中水平掩模包括低对比度垂直特征。水平掩模的生成包括优化包含在水平掩模中的低对比度垂直特征的偏压的步骤; 并将辅助特征应用于水平掩模。该方法还包括基于目标图案生成垂直掩模，其中垂直掩模包含低对比度水平特征。垂直掩模的产生包括优化垂直掩模中包含的低对比度水平特征的偏差的步骤; 并将辅助特征应用于垂直掩模。

9. 发明授权

US07824826B2 Method and apparatus for performing dark field double dipole lithography (DDL) 有权
标题翻译：用于进行暗场双偶极子光刻（DDL）的方法和装置
公开(公告)号：US07824826B2
公开(公告)日：2010-11-02
申请号：US11783261
申请日：2007-04-06
申请人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
发明人： Duan-Fu Stephen Hsu , Sangbong Park , Douglas Van Den Broeke , Jang Fung Chen
IPC分类号： G03F1/00 , G03F1/14 , G03F7/20 , G06F17/50
CPC分类号： G03F1/36 , G03F1/70 , G03F7/70125 , G03F7/70466
摘要： A method of generating complementary dark field masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.This method is enabled by a non-transitory computer readable medium configured to store program instructions for execution by a processor. The complementary dark field masks are used for patterning a layer of radiation-sensitive material in a device manufacturing method.
摘要翻译：一种产生用于暗场双偶极成像过程的互补暗场掩模的方法。该方法包括以下步骤：识别具有多个特征的目标图案，包括水平和垂直特征; 基于目标图案生成水平掩模，其中水平掩模包括低对比度垂直特征。水平掩模的生成包括优化包含在水平掩模中的低对比度垂直特征的偏压的步骤; 并将辅助特征应用于水平掩模。该方法还包括基于目标图案生成垂直掩模，其中垂直掩模包含低对比度水平特征。垂直掩模的产生包括优化垂直掩模中包含的低对比度水平特征的偏差的步骤; 并将辅助特征应用于垂直掩模。该方法由配置为存储用于由处理器执行的程序指令的非暂时计算机可读介质启用。互补暗场掩模用于在器件制造方法中图案化一层辐射敏感材料。

10. 发明授权

US07116411B2 Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems 有权
标题翻译：执行抗蚀剂工艺校准/优化和DOE优化的方法，以提供不同光刻系统之间的OPE匹配
公开(公告)号：US07116411B2
公开(公告)日：2006-10-03
申请号：US10926400
申请日：2004-08-26
申请人： Sangbong Park , Jang Fung Chen , Armin Liebchen
发明人： Sangbong Park , Jang Fung Chen , Armin Liebchen
IPC分类号： G01B9/00 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70458 , G03F7/70108 , G03F7/705 , G03F7/70525
摘要： A method of optimizing a process for use with a plurality of lithography systems. The method includes the steps of: (a) determining a calibrated resist model for a given process and a target pattern utilizing a first lithography system; (b) selecting a second lithography system to be utilized to image the target pattern utilizing the given process, the second lithography system capable of being configured with one of a plurality of diffractive optical elements, each of the plurality of diffractive optical elements having corresponding variable parameters for optimizing performance of the given diffractive optical element; (c) selecting one of the plurality of diffractive optical elements and simulating the imaging performance of the second lithography system utilizing the selected one of the plurality of diffractive optical elements, the calibrated resist model and the target pattern; and (d) optimizing the imaging performance of the selected one of the plurality of diffractive optical elements by executing a genetic algorithm which identifies the values of the parameters of the selected one of the plurality of diffractive optical elements that optimizes the imaging of the target pattern.
摘要翻译：一种优化用于多个光刻系统的工艺的方法。该方法包括以下步骤：（a）使用第一光刻系统确定用于给定过程的校准抗蚀剂模型和目标图案; （b）选择待利用的第二光刻系统，以利用所述给定的处理对所述目标图案进行成像，所述第二光刻系统能够被配置为具有多个衍射光学元件中的一个衍射光学元件，所述多个衍射光学元件中的每一个具有对应的变量用于优化给定衍射光学元件的性能的参数; （c）选择多个衍射光学元件中的一个并利用所选择的多个衍射光学元件中的所选择的一个衍射光学元件，校准的抗蚀剂模型和目标图案来模拟第二光刻系统的成像性能; 以及（d）通过执行遗传算法来优化所述多个衍射光学元件中所选择的一个衍射光学元件的成像性能，所述遗传算法识别所述多个衍射光学元件中所选择的一个的参数的值，其优化所述目标图案的成像。

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