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    • 6. 发明申请
    • SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREOF, AND ELECTRONIC DEVICE
    • 固态成像装置及其制造方法及电子装置
    • US20110058075A1
    • 2011-03-10
    • US12869933
    • 2010-08-27
    • Takeshi YanagitaKeiji Mabuchi
    • Takeshi YanagitaKeiji Mabuchi
    • H04N5/335H01L31/18
    • H01L27/14623H01L27/14609H01L27/14621H01L27/14641H01L27/14643H01L27/14685H04N5/37457H04N9/045
    • A solid-state imaging device includes: photoelectric conversion units provided on an imaging face of a semiconductor substrate; a color filter provided on the imaging face; and a light shielding portion provided on the imaging face; wherein photoelectric conversion units are arrayed on the imaging face in a first direction a second direction; and wherein the color filter includes a first filter layer having high light transmissivity regarding a first wavelength band, and a second filter layer having high light transmissivity regarding a second wavelength band, with the first and second filter layers arrayed above the photoelectric conversion units arrayed in the first direction so as to extend in the first direction and be arrayed adjacently in the second direction; and wherein the light shielding portion extends in the first direction between the photoelectric conversion units arrayed in the second direction, between the first filter layer and the second filter layer.
    • 固态成像装置包括:设置在半导体衬底的成像面上的光电转换单元; 设置在成像面上的滤色器; 以及设在所述摄像面上的遮光部; 其中光电转换单元沿第一方向排列在成像面上的第二方向上; 并且其中所述滤色器包括关于第一波长带具有高透光率的第一滤光层和关于第二波长带的具有高透光率的第二滤光层,其中所述第一和第二滤光层排列在所述光电转换单元的上方 所述第一方向沿所述第一方向延伸并且在所述第二方向上相邻排列; 并且其中所述遮光部分沿所述第一方向在所述第二方向排列的所述光电转换单元之间,在所述第一过滤层和所述第二过滤层之间延伸。