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1. 发明授权

US08628896B2 Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate 有权
标题翻译：遮光膜用构件，使用其的掩模膜的制造方法以及感光性树脂印刷版的制造方法
公开(公告)号：US08628896B2
公开(公告)日：2014-01-14
申请号：US13258573
申请日：2010-03-25
申请人： Takeshi Ikeda , Toshihiro Tsutsui , Masafumi Mitsuhashi
发明人： Takeshi Ikeda , Toshihiro Tsutsui , Masafumi Mitsuhashi
IPC分类号： G03F7/09 , G03F7/26
CPC分类号： G03F7/202 , G03F1/68 , G03F7/20
摘要： A member for masking films including a base film transparent to ultraviolet rays, an ultraviolet-shielding resin layer capable of being removed by irradiation with a laser light beam and having an average thickness of 0.1 to 30 μm, and a protective layer having a thickness of 0.05 to 1.5 μm and comprising, as a resin component, a polyester-base resin having a glass-transition temperature of not less than 40° C. laminated to a surface of the outermost layer of the ultraviolet-shielding resin layer, wherein the ultraviolet-shielding resin layer is a multilayer structure composed of two or more layers including a resin layer (A) having a high carbon black content and a resin layer (B) having a low carbon black content, the layer (A) and the layer (B) being located on the base-film side and on the printing-plate side of the ultraviolet-shielding resin layer, respectively.
摘要翻译：一种用于掩蔽膜的构件，其包括对紫外线透明的基膜，能够通过照射激光而被去除的平均厚度为0.1-30μm的紫外线屏蔽树脂层，以及厚度为 0.05〜1.5μm，并且包含作为树脂组分的玻璃化转变温度不低于40℃的聚酯基树脂层压到紫外线屏蔽树脂层的最外层的表面上，其中紫外线覆层树脂层是由具有高炭黑含量的树脂层（A）和具有低炭黑含量的树脂层（B）的两层或多层构成的多层结构，层（A）和层（ B）分别位于紫外线屏蔽树脂层的基膜侧和印版侧。

2. 发明申请

US20120015288A1 MEMBER FOR MASKING FILM, PROCESS FOR PRODUCING MASKING FILM USING THE SAME, AND PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN PRINTING PLATE 有权
标题翻译：用于掩膜的成员，用于生产遮蔽膜的方法，以及用于生产感光树脂印刷板的方法
公开(公告)号：US20120015288A1
公开(公告)日：2012-01-19
申请号：US13258573
申请日：2010-03-25
申请人： Takeshi Ikeda , Toshihiro Tsutsui , Masafumi Mitsuhashi
发明人： Takeshi Ikeda , Toshihiro Tsutsui , Masafumi Mitsuhashi
IPC分类号： G03F7/20
CPC分类号： G03F7/202 , G03F1/68 , G03F7/20
摘要： A member for masking films which includes a base film transparent to ultraviolet rays and, on one surface thereof, an ultraviolet-shielding resin layer capable of being removed by irradiation with laser light beams and having an average thickness of 0.1 to 30 μm, wherein the ultraviolet-shielding resin layer is a multilayer structure composed of two or more layers including a resin layer (A) having a high carbon black content and a resin layer (B) having a low carbon black content, the layer (A) and the layer (B) being located on the base-film side and on the printing-plate side of ultraviolet-shielding resin layer, respectively, and the ultraviolet-shielding resin layer has specific optical properties. This member for masking films has the following features: the accurate and precise removal of the ultraviolet-shielding resin layer using a low-energy laser beam gives areas with uniform light transmittance; the ultraviolet-shielding resin is resistant to scratches; and positioning is easy, and when making close contact with a plate, air trapping is less likely to occur so that the entire surface easily comes into close contact with a printing material.
摘要翻译：一种用于掩蔽膜的构件，其包括对紫外线透明的基膜，并且在其一个表面上具有能够通过照射激光而被去除的平均厚度为0.1至30μm的紫外线屏蔽树脂层，其中，紫外线屏蔽树脂层是由具有高炭黑含量的树脂层（A）和具有低炭黑含量的树脂层（B）的两层或更多层构成的多层结构，层（A）和层（B）分别位于紫外线屏蔽树脂层的基膜侧和印版侧，紫外线屏蔽树脂层具有特定的光学特性。用于掩模薄膜的部件具有以下特点：使用低能激光束精确和精确地去除紫外线屏蔽树脂层，使区域具有均匀的透光率; 紫外线屏蔽树脂耐划痕; 并且定位容易，并且当与板紧密接触时，不太可能发生空气捕获，使得整个表面容易与印刷材料紧密接触。

3. 发明授权

US08815477B2 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask 有权
标题翻译：彩色滤光片制造方法，图案化基板制造方法和小型光掩模
公开(公告)号：US08815477B2
公开(公告)日：2014-08-26
申请号：US12926433
申请日：2010-11-17
申请人： Takeshi Ikeda , Eishi Aoki , Genki Harada
发明人： Takeshi Ikeda , Eishi Aoki , Genki Harada
IPC分类号： G03F7/20 , G02B5/20
CPC分类号： G02B5/223 , G02B5/201 , G03F1/50 , G03F7/0007 , G03F7/105 , G03F7/2002
摘要： A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.
摘要翻译：一种滤色器制造方法，用于通过重复至少一个用感光树脂层涂覆基底的涂布步骤，通过图案曝光固化感光性树脂层的图案曝光步骤，形成过滤器段和黑色矩阵，显影步骤曝光的感光性树脂层和使显影的感光性树脂层热固化的烧结工序，其次为多次，其特征在于，在曝光工序中，使用激光作为光源，进行接近曝光通过光掩模重复地发射激光，使得累积曝光量为1〜150mJ / cm 2。

4. 发明授权

US08465886B2 Color filter substrate for liquid crystal display devices and liquid crystal display devices 有权
标题翻译：用于液晶显示装置和液晶显示装置的滤色器基板
公开(公告)号：US08465886B2
公开(公告)日：2013-06-18
申请号：US12926034
申请日：2010-10-21
申请人： Mie Shimizu , Takeshi Ikeda , Hidesato Hagiwara , Koichi Minato
发明人： Mie Shimizu , Takeshi Ikeda , Hidesato Hagiwara , Koichi Minato
IPC分类号： G02B5/20 , G02F1/1335
CPC分类号： G02B5/201 , G02F1/133514
摘要： Disclosed is a color filter substrate which exhibits color filter contrast of not less than 9000 and includes a transparent substrate, and a plurality of color pixels differing in color and formed on the transparent substrate, wherein each of the plurality of color pixels is formed of a photosensitive color composition containing two or more kinds of pigments, a birefringence Δn of a pigment dispersion represented by following equation (1) and a content of pigments contained in the photosensitive composition satisfies prescribed conditions, and, an absolute value of retardation in thickness direction (Rth) of the color pixels which is represented by following equation (2) is confined to a range of 0-3 nm. Δn=nXY−nZ (1) Rth={(Nx+Ny)/2−Nz}×d (2)
摘要翻译：公开了一种滤色器基板，其具有不小于9000的滤色器对比度，并且包括透明基板和在透明基板上形成的彩色不同的多个彩色像素，其中，多个彩色像素中的每一个由含有两种或更多种颜料的光敏颜色组合物，由下式（1）表示的颜料分散体的双折射Deltan和感光组合物中所含的颜料含量满足规定条件，并且厚度方向的延迟绝对值 Rth）由以下等式（2）表示的彩色像素被限制在0-3nm的范围内。 Deltan = nXY-nZ（1）Rth = {（Nx + Ny）/ 2-Nz}×d（2）

5. 发明申请

US20120225731A1 GOLF CLUB 有权
标题翻译：高尔夫俱乐部
公开(公告)号：US20120225731A1
公开(公告)日：2012-09-06
申请号：US13503523
申请日：2010-10-12
申请人： Hiroshi Suwa , Daisuke Saito , Naoto Honma , Takeshi Ikeda , Yorihisa Oi
发明人： Hiroshi Suwa , Daisuke Saito , Naoto Honma , Takeshi Ikeda , Yorihisa Oi
IPC分类号： A63B53/02
CPC分类号： A63B53/02 , A63B60/00 , A63B2053/027
摘要： Disclosed is a golf club having a structure with which optional angle adjustment can be easily and firmly performed by a user himself/herself without changing the direction of a shaft along the circumference thereof with respect to a head. To this end, the distal end portion of the shaft to which a plug member is fixed is fitted into a shaft insertion hole of a hosel portion from above, an angle adjusting member is fitted from below, and a fixing bolt is fitted into a bolt insertion hole of the angle adjusting member and screwed into an internal thread portion of the plug member. A radial clearance is left between the outer circumferential surface of a lower end portion of the plug member fitted into the shaft insertion hole and the inner circumferential surface of the shaft insertion hole corresponding to the outer circumferential surface, and a spacer portion partially formed on the angle adjusting member along the circumference of the angle adjusting member is fitted into a part of the radial clearance along the circumference of the radial clearance. The fixing angle of the head body with respect to the shaft can be adjusted by the circumferential position of the spacer portion fitted into the radial clearance.
摘要翻译：公开了一种具有结构的高尔夫球杆，其结构可以由用户自己容易且牢固地执行任意角度的调节，而不改变轴沿其圆周相对于头部的方向。为此，将固定有塞子部件的轴的前端部从上方嵌入到插鞘部的轴插入孔内，从下方嵌入角度调整部件，将固定螺栓嵌入螺栓角度调节构件的插入孔并拧入插塞构件的内螺纹部分。插入到轴插入孔的插头构件的下端部的外周面与对应于外周面的轴插入孔的内周面之间留有径向间隙，沿着角度调节构件的圆周的角度调节构件沿着径向间隙的圆周嵌合在径向间隙的一部分中。头体相对于轴的固定角度可以通过装配到径向间隙中的间隔件部分的周向位置来调节。

6. 发明授权

US08110329B2 Charge controlling agent and toner 有权
标题翻译：充电控制剂和调色剂
公开(公告)号：US08110329B2
公开(公告)日：2012-02-07
申请号：US11557823
申请日：2006-11-08
申请人： Akiko Tominaga , Tatsuki Fukui , Takashi Kenmoku , Ako Kusakari , Masato Minami , Tetsuya Yano , Takeshi Ikeda , Norikazu Fujimoto , Atsushi Tani
发明人： Akiko Tominaga , Tatsuki Fukui , Takashi Kenmoku , Ako Kusakari , Masato Minami , Tetsuya Yano , Takeshi Ikeda , Norikazu Fujimoto , Atsushi Tani
IPC分类号： G03G9/087
CPC分类号： G03G9/09733 , C07C309/15 , C07C309/51 , C07C309/69 , C07C309/76 , C07C309/77 , G03G9/09758 , G03G9/09775
摘要： A charge controlling agent is provided as a compound in which an amide group is introduced together with a sulfonic group or a derivative thereof. The charge controlling agent is characterized by including at least one compound represented by the chemical formula (2) in which an amide group is introduced together with at least one of a sulfonic group, a sulfonic acid ester, a sulfonic acid salt, and a sulfonic acid halide.
摘要翻译：提供电荷控制剂作为其中酰胺基与磺酸基或其衍生物一起引入的化合物。电荷控制剂的特征在于包括至少一种由化学式（2）表示的化合物，其中酰胺基与磺酸基，磺酸酯，磺酸盐和磺酸中的至少一种一起引入酰卤。

7. 发明授权

US07876169B2 Modulating circuit 有权
标题翻译：调制电路
公开(公告)号：US07876169B2
公开(公告)日：2011-01-25
申请号：US11995453
申请日：2006-02-08
申请人： Takeshi Ikeda , Hiroshi Miyagi
发明人： Takeshi Ikeda , Hiroshi Miyagi
IPC分类号： H03C1/00 , H03C3/00
CPC分类号： H04L27/364 , H04L27/206
摘要： There are included a first quadrature modulation part (5) that divides an input signal into an I signal and a Q signal having a phase orthogonal to the phase thereof and uses a baseband frequency to perform frequency conversions of the I and Q signals, thereby performing a quadrature modulation; and a second quadrature modulation part (8) that uses in-phase and quadrature carriers of FM frequencies, which are 90 degrees out of phase with respect to each other, to perform frequency conversions of the I and Q signals, which are generated by the first quadrature modulation part (5), thereby performing a quadrature modulation. Thus, the phases of the I and Q signals, which are shifted by 90 degrees with respect to each other by the first quadrature modulation part (5), are further shifted by 90 degrees with respect to each other by the second quadrature modulation part (8), thereby providing frequency components the phases of which have been inverted, whereby the unwanted harmonic components at the spurious sides of a target frequency can be attenuated.
摘要翻译：包括将输入信号分割为I信号的第一正交调制部分（5）和具有与其相位正交的相位的Q信号，并且使用基带频率来执行I和Q信号的频率转换，由此执行正交调制; 以及第二正交调制部分（8），其使用相对于彼此相差90度的FM频率的同相和正交载波，以执行由所述I和Q信号产生的I和Q信号的频率转换第一正交调制部分（5），从而执行正交调制。因此，通过第一正交调制部（5）相对于彼此偏移90度的I和Q信号的相位通过第二正交调制部分（...）相对于彼此进一步偏移90度 8），从而提供其相位已被反转的频率分量，从而可以衰减目标频率的杂散侧的不需要的谐波分量。

8. 发明申请

US20100283385A1 ORGANIC EL DEVICE 审中-公开
标题翻译：有机EL设备
公开(公告)号：US20100283385A1
公开(公告)日：2010-11-11
申请号：US12771292
申请日：2010-04-30
申请人： Norihisa Maeda , Takeshi Ikeda
发明人： Norihisa Maeda , Takeshi Ikeda
IPC分类号： H01L51/54
CPC分类号： H01L51/5265 , H01L27/3216
摘要： According to one embodiment, an organic EL device includes a first organic EL element having a first pixel electrode, a counter-electrode, and a first organic multiplayer structure, a second organic EL element having a second pixel electrode, a counter-electrode, and a second organic multiplayer structure, a third organic EL element having a third pixel electrode, a counter-electrode, and a third organic multiplayer structure. The first organic multiplayer structure includes a first organic layer, a first hole transport layer, and a first electron transport layer. The second organic multiplayer structure includes a second organic layer, a first hole transport layer, and a first electron transport layer. The third organic multiplayer structure includes a third organic layer, a first hole transport layer, a second hole transport layer, a first electron transport layer, and a second electron transport layer.
摘要翻译：根据一个实施例，有机EL器件包括具有第一像素电极，对电极和第一有机多层结构的第一有机EL元件，具有第二像素电极的第二有机EL元件，对电极和第二有机多人结构，具有第三像素电极的第三有机EL元件，对电极和第三有机多玩家结构。第一有机多层结构包括第一有机层，第一空穴传输层和第一电子传输层。第二有机多层结构包括第二有机层，第一空穴传输层和第一电子传输层。第三有机多层结构包括第三有机层，第一空穴传输层，第二空穴传输层，第一电子传输层和第二电子传输层。

9. 发明申请

US20100020189A1 IMAGE PICKUP APPARATUS HAVING IRIS MEMBER AND FILTER UNITS 有权
标题翻译：具有IRIS会员和过滤器单元的图像拾取装置
公开(公告)号：US20100020189A1
公开(公告)日：2010-01-28
申请号：US12574917
申请日：2009-10-07
申请人： Takeshi Ikeda
发明人： Takeshi Ikeda
IPC分类号： H04N5/225 , H04N5/238
CPC分类号： H04N5/23232 , H04N5/23245 , H04N5/2352 , H04N5/238
摘要： An image pickup apparatus capable of preventing a decline of resolution of a still image while keeping a dynamic range of exposure control. The image pickup apparatus capable of photographing with changing over a moving image and a still image, includes an iris mechanism for changing an amount of light input to an image pickup element by changing an aperture diameter, a filter unit, having a single density or a plurality of densities, for changing the amount of the light input to the image pickup element by its advancing towards and withdrawing from the aperture diameter of the iris mechanism, a unit for driving the iris mechanism and the filter unit independently, and a control unit for setting the filter unit in one of two types of states such as fully covering the aperture diameter of the iris mechanism and fully withdrawing from the aperture diameter in the still image photography.
摘要翻译：一种能够在保持动态曝光控制范围的同时防止静止图像的分辨率下降的摄像装置。能够通过改变运动图像和静止图像拍摄的图像拾取装置包括：虹膜机构，用于通过改变孔直径来改变输入到图像拾取元件的光量;滤光器单元，具有单一密度或多个密度，用于通过其向虹膜机构的孔径的前进方向前进和退出来改变输入到图像拾取元件的光量，用于独立地驱动虹膜机构和滤光单元的单元，以及用于将过滤器单元设置为两种状态之一，例如完全覆盖光圈机构的孔径直径并从静止图像摄影中的孔直径完全退出。

10. 发明申请

US20100015398A1 Substrate with Partition Pattern and Process for Producing the Same 审中-公开
标题翻译：具有分割图案的底物及其制造方法
公开(公告)号：US20100015398A1
公开(公告)日：2010-01-21
申请号：US12305938
申请日：2007-06-19
申请人： Junichi Kaminaga , Hiroyuki Miura , Takeshi Ikeda , Yuji Kubo , Eishi Aoki
发明人： Junichi Kaminaga , Hiroyuki Miura , Takeshi Ikeda , Yuji Kubo , Eishi Aoki
IPC分类号： G02B5/20 , B32B3/02 , B05D3/06
CPC分类号： G02B5/20 , G02B5/201 , G02B5/223 , Y10T428/24562
摘要： One embodiment of the present invention is a substrate with a partition wall pattern, the partition wall pattern formed on a predetermined position of the substrate, the partition wall pattern having a material including a fluorine compound, wherein a ratio of a detected intensity of a fragment ion of F− (M/Z=19) to total detected intensity of all minus ions is 25%-60% in the case where analysis of minus ions of an upper surface of the partition wall is performed using a time-of-flight secondary ion mass spectrometry (TOF-SIMS).
摘要翻译：本发明的一个实施方案是具有分隔壁图案的基板，形成在基板的预定位置上的分隔壁图案，分隔壁图案具有包含氟化合物的材料，其中检测到的片段强度的比率在使用飞行时间执行分隔壁的上表面的负离子的情况下，F-（M / Z = 19）的离子与全部负离子的总检测强度为25％-60％二次离子质谱（TOF-SIMS）。

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