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1. 发明授权

US5295380A Edging mill for section rolling 失效
标题翻译：磨边机用于轧制
公开(公告)号：US5295380A
公开(公告)日：1994-03-22
申请号：US928435
申请日：1992-08-12
申请人： Takeshi Hioki , Toru Ikezaki , Yasushi Horiuchi , Kazufumi Hirose , Yoshun Yamamoto , Masanori Fujiwara
发明人： Takeshi Hioki , Toru Ikezaki , Yasushi Horiuchi , Kazufumi Hirose , Yoshun Yamamoto , Masanori Fujiwara
IPC分类号： B21B1/08 , B21B27/02 , B21B31/26 , B21B31/16
CPC分类号： B21B1/0886 , B21B27/028 , B21B31/26
摘要： An edging mill for section rolling has a pair of horizontal rolls, each horizontal roll including a pair of axially spaced horizontal roll segments supported by driven horizontal roll shafts. Eccentric rings are disposed between the two horizontal roll segments making up each horizontal roll and are rotatably mounted on the horizontal roll shaft. The eccentric rings are eccentric to the horizontal rolls. Web-restraining ring rolls each comprise a pair of web-restraining roll segments rotatably fitted over the periphery of the eccentric rings concentrically thereto. A web-restraining ring roll positioning device rotates the eccentric rings. While the horizontal rolls roll the flange edges of the section, the web-restraining ring rolls hold the web of the section therebetween. The position of the web-restraining ring rolls with respect to the horizontal rolls changes with the rotating angle of the eccentric rings. The position of the web-restraining ring rolls is adjusted according to the flange thickness of the section.
摘要翻译：用于截面轧制的磨边机具有一对水平辊，每个水平辊包括由从动水平辊轴支撑的一对轴向间隔开的水平辊段。偏心环设置在构成每个水平辊的两个水平辊段之间并且可旋转地安装在水平辊轴上。偏心环与水平辊偏心。卷筒纸限制环卷每一个包括一对卷筒纸限制卷筒部分，其可旋转地装配在与其同心的偏心环的周边上。卷筒纸限定环辊定位装置使偏心环旋转。当横向辊滚动该部分的凸缘边缘时，幅材限制环辊保持该部分的腹板。卷筒纸限制环相对于水平卷筒的位置随偏心环的旋转角度而变化。纤维网限制环辊的位置根据截面的凸缘厚度进行调整。

2. 发明授权

US5191778A Process for producing thin-webbed H-beam steel 失效
标题翻译：生产薄网H型钢的工艺
公开(公告)号：US5191778A
公开(公告)日：1993-03-09
申请号：US719122
申请日：1991-06-20
申请人： Akira Inagaki , Masao Kurokawa , Hiroyuki Hasegawa , Toshihiro Ishibashi , Hiroaki Hadano , Takeshi Hioki , Yoshimi Toriyama , Kazuo Fujita , Yasushi Takeshima , Teruyuki Wakatsuki , Yasushi Horiuchi
发明人： Akira Inagaki , Masao Kurokawa , Hiroyuki Hasegawa , Toshihiro Ishibashi , Hiroaki Hadano , Takeshi Hioki , Yoshimi Toriyama , Kazuo Fujita , Yasushi Takeshima , Teruyuki Wakatsuki , Yasushi Horiuchi
IPC分类号： C21D8/00 , C21D9/00
CPC分类号： C21D8/00 , C21D9/0068
摘要： A thin-webbed H-beam steel having a web thinner that flanges is produced by forcibly water cooling the outer surface of the flanges during an intermediate hot rolling prior to a final hot rolling by cooling to less than 700.degree. C., interrupting the cooling to return the temperature to greater than 700.degree. C., and repeating the cooling and interrupting in order to refine the microstructure of the surface of the flanges to a predetermined depth from the surface; final-hot rolling the intermediate-hot rolled H-beam steel; and forcibly water cooling the flanges of the final-hot rolled H-beam steel in a manner such that the web does not wave during this forcible water cooling, and such that upon completion of the forcible water cooling, thermal stress, generated in the web during air cooling to room temperature, does not exceed the buckling strength of the web.

3. 发明授权

US5259229A Apparatus for cooling thin-webbed H-beam steel 失效
标题翻译：用于冷却薄网H型钢钢的设备
公开(公告)号：US5259229A
公开(公告)日：1993-11-09
申请号：US992402
申请日：1992-12-18
申请人： Akira Inagaki , Masao Kurokawa , Hiroyuki Hasegawa , Toshihiro Ishibashi , Hiroaki Hadano , Takeshi Hioki , Yoshimi Toriyama , Kazuo Fujita , Yasushi Takeshima , Teruyuki Wakatsuki , Yasushi Horiuchi
发明人： Akira Inagaki , Masao Kurokawa , Hiroyuki Hasegawa , Toshihiro Ishibashi , Hiroaki Hadano , Takeshi Hioki , Yoshimi Toriyama , Kazuo Fujita , Yasushi Takeshima , Teruyuki Wakatsuki , Yasushi Horiuchi
IPC分类号： C21D8/00 , C21D9/00 , B21B45/02
CPC分类号： C21D8/00 , C21D9/0068
摘要： An apparatus for cooling thin-webbed H-beam steel includes means for forcibly spray cooling the flanges of the H-beam in intermediate and final hot rolling zones. The cooling is based upon tracking information with respect to predetermined positions along the length of the H-beam. A plurality of flow quantity control blocks are disposed in parallel with each having a three way valve having a water supply side port, a nozzle side port, and a water drain port. A plurality of on-off valves connect the nozzle side port to nozzles in a nozzle group to select nozzles based upon the flange width of the H-beam. A variable throttle mechanism maintains pressure loss at the water drain side equal to pressure loss at the nozzle side. Switching of the three way valve of one flow quantity control block can be carried out without affecting other flow quantity control blocks.
摘要翻译：用于冷却薄腹板H型钢钢的装置包括在中间和最终热轧区域强制喷射冷却H型钢束的凸缘的装置。冷却是基于沿着H型梁的长度的预定位置的跟踪信息。多个流量控制块与具有供水侧端口，喷嘴侧端口和排水口的三通阀并联配置。多个开关阀将喷嘴侧端口连接到喷嘴组中的喷嘴，以基于H型梁的凸缘宽度来选择喷嘴。可变节气门机构保持排水侧的压力损失等于喷嘴侧的压力损失。一个流量控制块的三通阀的切换可以在不影响其他流量控制块的情况下进行。

4. 发明授权

US5792585A Radiation-sensitive positive resist composition 失效
标题翻译：辐射敏感正光刻胶组合物
公开(公告)号：US5792585A
公开(公告)日：1998-08-11
申请号：US217892
申请日：1994-03-25
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

5. 发明授权

US4769494A Process for producing O,O-di-lower-alkylchlorothiophosphate 失效
标题翻译： O，O-二低级烷基氯代硫代磷酸酯的制备方法
公开(公告)号：US4769494A
公开(公告)日：1988-09-06
申请号：US11009
申请日：1987-02-05
申请人： Motomasa Ohsu , Koichi Kamemoto , Manabu Yahata , Tooru Tokumaru , Takeshi Hioki , Hiroshi Ueda
发明人： Motomasa Ohsu , Koichi Kamemoto , Manabu Yahata , Tooru Tokumaru , Takeshi Hioki , Hiroshi Ueda
IPC分类号： C07F9/20 , C07F9/02
CPC分类号： C07F9/20
摘要： A continuous process for producing O,O-di-lower alkylchlorothiophosphate very important as an intermediate for organo-phosphate series agricultural chemicals which comprises continuously reacting phosphorus sulfochloride with a lower alcohol in the presence of caustic soda according to a multi-stage reaction form comprising from 3 to 8 stages in which the following conditions are satisfied:(1) The amounts of caustic soda and a lower alcohol used shall be from 2 to 2.2 moles and 10 moles or more, respectively, based on 1 mole of phosphorus sulfochloride.(2) Caustic soda, water and the lower alcohol shall be used as a caustic soda/water/lower alcohol solution, and besides the caustic soda concentration of the aqueous caustic soda in said solution shall be from 30.0 to 99.5 wt.%.(3) To the 1st reaction stage shall be continuously supplied the whole amount of phosphorus sulfochloride required and from 45 to 85 wt.% each of the amounts of caustic soda and the lower alcohol required; and to the 2nd and subsequent reaction stages shall be continuously supplied the residual caustic soda and lower alcohol in divided portions so that the substantial amounts supplied become successively small toward the final reaction stage.(4) The temperature of the reaction system shall be -5.degree. C. or lower.(5) The residence time in the reaction system shall be within 4 hours.
摘要翻译：一种用于生产作为有机磷酸酯系农药的中间体非常重要的O，O-二低级烷基氯硫代磷酸酯的连续方法，其包括在苛性钠存在下，根据多阶段反应形式连续地使磷酰氯与低级醇反应，包括从3到8个阶段，其中满足以下条件：（1）基于1摩尔磷酰氯，苛性钠和低级醇的用量分别为2至2.2摩尔和10摩尔或更多。（2）苛性钠，水和低级醇应用作苛性钠/水/低级醇溶液，除了所述溶液中的苛性钠水溶液的苛性钠浓度外还应为30.0至99.5重量％。（3）向第一反应阶段连续供应所需的全部硫磺磷酸盐和每一种苛性钠和所需的低级醇的45至85重量％; 并且连续向第二和随后的反应阶段连续地供应残留的苛性钠和低级醇，使得所供应的实质量向着最终反应阶段依次小。（4）反应体系的温度应在-5℃以下。（5）反应体系中的停留时间应在4小时内。

6. 发明授权

US5354644A Photoresist compositions comprising styryl compound 失效
标题翻译：包含苯乙烯基化合物的光致抗蚀剂组合物
公开(公告)号：US5354644A
公开(公告)日：1994-10-11
申请号：US937684
申请日：1992-09-01
申请人： Takanori Yamamoto , Shinji Konishi , Ryotaro Hanawa , Akihiro Furuta , Takeshi Hioki , Jun Tomioka
发明人： Takanori Yamamoto , Shinji Konishi , Ryotaro Hanawa , Akihiro Furuta , Takeshi Hioki , Jun Tomioka
IPC分类号： C07C229/44 , C07C255/34 , C07C255/42 , C07C309/14 , C07C311/05 , C07C317/48 , C07F7/18 , G03F7/022 , G03F7/09 , G03C1/72 , G03C1/52
CPC分类号： C07C229/44 , C07C255/34 , C07C255/42 , C07C309/14 , C07C311/05 , C07C317/48 , C07F7/1856 , G03F7/0226 , G03F7/091 , Y10S430/127
摘要： A photoresist composition which includes a sensitizing compound, a resin and, as a light absorber, a styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15.
摘要翻译：一种光致抗蚀剂组合物，其包含敏化化合物，树脂和作为光吸收剂的下式的苯乙烯基化合物：其中R 1，R 2和R 11（ⅰ）或其中R 1，R 2和R 11 相同或不同，氢原子，任选取代的烷基，烯基或芳烷基或R 1和R 2可以与它们所键合的氮原子一起形成环，该环除了含有至少一个杂原子所述氮原子; R 10是任选取代的亚烷基; R3是-OH，-OCOR5或-OSi（R5）3，其中R5是烷基; R 12和R 13独立地为氢原子，任选取代的低级烷基或烷氧基，酰胺基或卤素原子; X，Y，W和Z相同或不同，为吸电子基团，n为2-15个数。

7. 发明授权

US5077264A Cyan dye-donor element used in thermal transfer and thermal transfer sheet using it 失效
标题翻译： CYAN DYE-DONOR元件用于热转印和热转印片使用它
公开(公告)号：US5077264A
公开(公告)日：1991-12-31
申请号：US451318
申请日：1989-12-15
申请人： Yoshiaki Hayashi , Taira Fujita , Takehiro Kusumoto , Takeshi Hioki
发明人： Yoshiaki Hayashi , Taira Fujita , Takehiro Kusumoto , Takeshi Hioki
IPC分类号： B41M5/035 , B41M5/26 , B41M5/385 , B41M5/39
CPC分类号： B41M5/3858 , B41M5/3852 , B41M5/3854 , B41M5/39 , Y10S428/913 , Y10S428/914
摘要： A cyan dye-donor element which gives good printed images to a thermal-transfer sheet and a thermal-transfer sheet comprising a substrate sheet and a layer containing said cyan dye-donor and being laid on one side of the substrate sheet are provided. The cyan dye-donor element comprises cyan dyes dispersed or dissolved in a polymeric binder wherein said cyan dyes comprise: ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group; at least one dye represented by the following formula (II): ##STR2## wherein R.sub.3 and R.sub.4 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted, and R.sub.5 represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group; and at least one dye selected from the group consisting of dyes represented by the following formula (III): ##STR3## wherein R.sub.6 and R.sub.7 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted, R.sub.8 represents a hydrogen atom, a C.sub.1 -C.sub.6 alkyl group which may be substituted, an alkoxy group which may be substituted or an acylamino group which may be substituted and R.sub.9 represents a hydrogen atom, a C.sub.1 -C.sub.6 alkyl group which may be substituted or an aryl group which may be substituted, dyes represented by the following formula (IV): ##STR4## wherein R.sub.10 represents a hydrogen atom, a C.sub.1 -C.sub.6 alkyl group which may be substituted, an aryl group which may be substituted or a cyclohexyl group, R.sub.11 -R.sub.13 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted, and R.sub.14 represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted or an alkoxy group which may be substituted, and dyes represented by the following formula (V): ##STR5## wherein R.sub.15 and R.sub.16 each represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group which may be substituted.

8. 发明授权

US07264912B2 Method of producing photoresist 失效
标题翻译：光致抗蚀剂的制造方法
公开(公告)号：US07264912B2
公开(公告)日：2007-09-04
申请号：US10117248
申请日：2002-04-08
申请人： Takeshi Hioki , Kota Tokuhara , Yukio Hanamoto
发明人： Takeshi Hioki , Kota Tokuhara , Yukio Hanamoto
IPC分类号： G03C1/73 , G03F7/00
CPC分类号： G03F7/0045 , G03F7/022 , G03F7/0392
摘要： Provided are a method of producing a photoresist comprising a process of filtrating a raw resist solution containing resist constituent components and a resist solvent dissolving them, using a filter made of at least one resin selected from fluorine-based resins and polyolefins, wherein this filter has been used for filtration of the same or different kind of other raw resist solution and has been washed with a solvent containing the resist solvent toward the reverse direction to the filtration direction, and a method of sequentially producing two or more photoresists using the same production apparatus, wherein this production apparatus is washed with the resist solvent, a solvent other than this resist solvent capable of dissolving or decomposing the resist constituent components, and the resist solvent, in this order, after production of the photoresist and before production of the subsequent photoresist.
摘要翻译：提供一种光致抗蚀剂的制造方法，其特征在于，使用由选自氟系树脂和聚烯烃中的至少一种树脂制成的过滤器，过滤由含有抗蚀剂构成成分的原始抗蚀剂溶液和溶解了抗蚀剂溶剂的抗蚀剂溶剂的方法，用于过滤相同或不同种类的其他原始抗蚀剂溶液，并且已经用含有抗蚀剂溶剂的溶剂朝向与过滤方向相反的方向进行过滤，以及使用相同的生产设备依次生产两个或更多个光致抗蚀剂的方法其中，该制造装置在制造光致抗蚀剂之后并且在制造后续的光致抗蚀剂之前，依次用抗蚀剂溶剂，除了能够溶解或分解抗蚀剂构成成分的抗蚀剂溶剂之外的溶剂和抗蚀剂溶剂洗涤。

9. 发明授权

US5736292A Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups 失效
标题翻译：包含由间甲酚，2,3,5-三甲基苯酚和任选的对甲酚制成的碱溶性树脂和具有烷基或烷氧基侧基的多酚化合物的辐射敏感性正性抗蚀剂组合物
公开(公告)号：US5736292A
公开(公告)日：1998-04-07
申请号：US490511
申请日：1995-06-14
申请人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Ayako Ida , Haruyoshi Osaki , Takeshi Hioki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C07C39/15 , G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30
CPC分类号： G03F7/022 , C07C39/15 , G03F7/0226 , G03F7/0236
摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, l, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.
摘要翻译：包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R1，R2和R3分别为C1-C5烷基或C1-C5烷氧基，l，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

10. 发明授权

US5403696A Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol 失效
标题翻译：包含由叔丁基 - 甲基苯酚制成的碱溶性树脂的辐射敏感正性抗蚀剂组合物
公开(公告)号：US5403696A
公开(公告)日：1995-04-04
申请号：US047374
申请日：1993-04-19
申请人： Takeshi Hioki , Seiko Kurio , Yasunori Uetani , Yasunori Doi
发明人： Takeshi Hioki , Seiko Kurio , Yasunori Uetani , Yasunori Doi
IPC分类号： C08G8/24 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24
摘要： A positive resist composition comprising a 1,2-quinone diazide compound and an alkali-soluble resin which comprises a resin (I) obtainable through a condensation reaction of an aldehyde with a phenol mixture containing m-cresol and at least one selected from the group consisting of 2-tert.-butyl-4-methylphenol and 2-tert.-butyl-6-methylphenol, which has well balanced properties.
摘要翻译：包含1,2-醌二叠氮化合物和碱溶性树脂的正型抗蚀剂组合物，其包含通过醛与含有间甲酚的酚混合物和选自下组中的至少一种的缩合反应获得的树脂（I）由2-叔丁基-4-甲基苯酚和2-叔丁基-6-甲基苯酚组成，其具有良好的平衡性能。

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