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1. 发明申请

US20120321999A1 GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK BLANK BY EMPLOYING THE SAME 有权
标题翻译：玻璃基板保持工具及通过使用其制造EUV掩蔽层的方法
公开(公告)号：US20120321999A1
公开(公告)日：2012-12-20
申请号：US13475459
申请日：2012-05-18
申请人： Takahiro MITSUMORI , Hirotoshi ISE , Takeru KINOSHITA
发明人： Takahiro MITSUMORI , Hirotoshi ISE , Takeru KINOSHITA
IPC分类号： H01L21/683 , G03F1/24
CPC分类号： H01L21/6831 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： A glass substrate-holding tool, adapted to be employed during the production of a reflective mask blank for EUV lithography (EUVL), includes an electrostatic chuck and a supporting member. The chuck attracts a rear surface of a glass substrate in a non-contact manner by electrostatic attractive force. The supporting member partly supports the rear surface. An area ratio of a projected area of an active surface of the chuck for providing the electrostatic force to an area of a quality-guaranteed region of the rear surface is from 0.5 to 1.0. The active surface is apart from the rear surface by more than 20 μm. The supporting member is configured to support only a region including at least two of four sides defining an outer portion outside the quality-guaranteed region.
摘要翻译：适用于制造用于EUV光刻（EUVL）的反射掩模板的玻璃基板保持工具包括静电卡盘和支撑部件。卡盘通过静电吸引力以非接触的方式吸引玻璃基板的后表面。支撑构件部分地支撑后表面。用于提供静电力的卡盘的有效表面的投影面积与后表面的质量保证区域的面积的面积比为0.5至1.0。活性表面离后表面超过20μm。支撑构件被构造成仅支撑包括在质量保证区域外部限定外部部分的四个侧面中的至少两个的区域。

2. 发明申请

US20110266140A1 PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY 审中-公开
标题翻译：用于生成用于EUV光刻的反射掩模空白的方法
公开(公告)号：US20110266140A1
公开(公告)日：2011-11-03
申请号：US13180611
申请日：2011-07-12
申请人： Takeru KINOSHITA , Hirotoshi Ise
发明人： Takeru KINOSHITA , Hirotoshi Ise
IPC分类号： C23C14/06 , C23C14/34
CPC分类号： H01L21/6831 , G03F1/24 , G03F7/70708
摘要： Provision of a process for producing an EUV mask blank wherein formation of scars of a glass substrate surface or a chuck surface due to sandwiching of foreign objects such as particles between an electrostatic chuck and the glass substrate, is suppressed.A process for producing an EUV mask blank wherein an electrostatic chuck for clamping a glass substrate has a main body and a lower dielectric layer made of an organic polymer film, and electrode portion made of an electrically conductive material and an upper dielectric layer made of an organic polymer film provided in this order on the main body, wherein the upper dielectric layer includes an anode and a cathode.
摘要翻译：提供用于制造EUV掩模坯料的方法，其中由于在静电卡盘和玻璃基板之间夹杂异物诸如颗粒而形成玻璃基板表面或卡盘表面的疤痕。一种用于制造EUV掩模坯料的方法，其中用于夹持玻璃基板的静电卡盘具有主体和由有机聚合物膜制成的下介电层，以及由导电材料制成的电极部分和由有机聚合物膜在该主体上依次设置，其中上部电介质层包括阳极和阴极。

3. 发明申请

US20100329735A1 IMAGE FORMING APPARATUS 有权
标题翻译：图像形成装置
公开(公告)号：US20100329735A1
公开(公告)日：2010-12-30
申请号：US12825665
申请日：2010-06-29
申请人： Takeru KINOSHITA
发明人： Takeru KINOSHITA
IPC分类号： G03G15/08
CPC分类号： G03G15/0898
摘要： A developing unit is pivotally supported by a pivot pin so as to be swingable, and a forcing lever forces a developing roller towards a photosensitive drum so that an outer circumferential surface of a DS roller makes contact with an outer circumferential surface of the photosensitive drum. This maintains, at a specified value, a developing gap between the photosensitive drum and the developing roller. A sympathetic vibration prevention member in which an elastic member is provided on an upper surface of the base member is inserted between a lower portion of a housing of the developing unit and a guide rail provided under the lower portion. This prevents the developing unit from vibrating in sympathetic with vibration during the transportation of the image forming apparatus, which prevents the toner from spilling out.
摘要翻译：显影单元由枢转销可枢转地支撑以便可摆动，并且迫使杆将显影辊推向感光鼓，使得DS辊的外圆周表面与感光鼓的外圆周表面接触。这在特定值下保持感光鼓和显影辊之间的显影间隙。在该基体的上表面上设有弹性部件的交感防振部件插入在显影部的壳体的下部与设置在下部的下方的导轨之间。这防止显影单元在图像形成装置的输送过程中与振动交错振动，这防止调色剂溢出。

4. 发明申请

US20100330470A1 REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND REFLECTIVE MASK FOR EUV LITHOGRAPHY 失效
标题翻译：用于EUV光刻的反射掩模和反射掩模
公开(公告)号：US20100330470A1
公开(公告)日：2010-12-30
申请号：US12878202
申请日：2010-09-09
申请人： Takeru KINOSHITA
发明人： Takeru KINOSHITA
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00
摘要： To provide an EUV mask of which a decrease in the contrast of reflected light at the mask pattern boundary, particularly a decrease in the contrast of reflected light at the boundary on the mask pattern outer edge, is suppressed, and an EUV mask blank to be used for production of the EUV mask.A reflective mask blank for EUV lithography, comprising:a substrate, and a reflective layer to reflect EUV light, and an absorber layer to absorb EUV light, formed in this order over the substrate, a step on at least a part of the substrate being provided between a first portion where the absorber layer is removed at the time of patterning, and a second portion where the absorber layer is not removed at the time of patterning, adjacent to the first portion where the absorber layer is removed
摘要翻译：为了提供防止掩模图案边界处的反射光的对比度的降低的EUV掩模，特别是抑制掩模图案外边缘上的边界处的反射光的对比度的降低，并且EUV掩模空白为用于生产EUV面膜。一种用于EUV光刻的反射掩模板，包括：基板和反射EUV光的反射层;以及吸收层，用于吸收在该基板上依次形成的EUV光，基板的至少一部分上的步骤为设置在图案化时除去吸收体层的第一部分与在图案化时不除去吸收体层的第二部分相邻于吸收层被除去的第一部分

5. 发明申请

US20100142994A1 IMAGE FORMING APPARATUS 有权
标题翻译：图像形成装置
公开(公告)号：US20100142994A1
公开(公告)日：2010-06-10
申请号：US12631525
申请日：2009-12-04
申请人： Takeru KINOSHITA
发明人： Takeru KINOSHITA
IPC分类号： G03G21/16 , G03G15/04
CPC分类号： G03G21/1842 , G03G2221/1654 , G03G2221/1815
摘要： An image forming apparatus includes: a photoreceptor unit having a photoreceptor drum on which an electrostatic latent image is formed; a developing unit for developing the electrostatic latent image formed on the photoreceptor drum; a developing unit supporting shaft for rotatably supporting the developing unit; a pressing lever for pushing and rotating the developing unit to press the developing unit against the photoreceptor unit; a rotatable pressing lever shaft for supporting the pressing lever; and a holding member for holding the developing unit supporting shaft and the pressing lever shaft to maintain a fixed distance between the developing unit supporting shaft and the pressing lever shaft.
摘要翻译：图像形成装置包括：感光体单元，其具有形成有静电潜像的感光鼓; 用于使形成在感光鼓上的静电潜像显影的显影单元; 用于可旋转地支撑显影单元的显影单元支撑轴; 用于推动和旋转显影单元以将显影单元压靠在感光单元上的按压杆; 用于支撑所述按压杆的可旋转按压杆轴; 以及用于保持显影单元支撑轴和按压杆轴以保持显影单元支撑轴和按压杆轴之间的固定距离的保持构件。

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