会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 6. 发明授权
    • Silicone resin and photosensitive resin composition containing the same
    • 硅树脂和含有它的感光性树脂组合物
    • US06767983B1
    • 2004-07-27
    • US09937598
    • 2001-09-28
    • Takeshi FujiyamaTakero Teramoto
    • Takeshi FujiyamaTakero Teramoto
    • C08G7714
    • C08L83/14C08G77/04C08G77/045C08G77/14C08G77/38C08L83/06
    • This invention relates to photosensitive silicone resins and resin compositions containing the same. Silicone resins of this invention are characterized by that a triorganosilyl group represented by the following general formula (1) wherein R is a divalent organic group and R′ is a divalent group or a direct bond is linked to all or a part of the ends of the backbone of polyorganosilsesquioxanes. Photosensitive resin compositions of this invention are formulated from the aforementioned silicone resins and a photogenerator of acid. The aforementioned silicone resins and photosensitive resin compositions show excellent performance as resist materials for multi-level resist processes and for forming barriers of PDP and, on account of their excellent plasma resistance (resistance to O2-RIE), yield patterns of a high aspect ratio.
    • 本发明涉及感光性有机硅树脂和含有它的树脂组合物。 本发明的硅氧烷树脂的特征在于,由以下通式(1)表示的三有机甲硅烷基(其中R是二价有机基团,R'是二价基团或直接键合)与全部或一部分末端连接 聚有机倍半硅氧烷的骨架。 本发明的感光树脂组合物由上述有机硅树脂和酸的光发生剂配制。 上述有机硅树脂和感光性树脂组合物显示出优异的性能,作为用于多层抗蚀剂工艺的抗蚀剂材料和用于形成PDP的屏障,并且由于其优异的等离子体电阻(耐O2-RIE的耐受性),高纵横比的屈服图案 。