会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Method of manufacturing semiconductor device comprising the step of doping semiconductor film through contact hole
    • 制造半导体器件的方法包括通过接触孔掺杂半导体膜的步骤
    • US08435892B2
    • 2013-05-07
    • US12908521
    • 2010-10-20
    • Atsuo IsobeKeiko SaitoTomohiko Sato
    • Atsuo IsobeKeiko SaitoTomohiko Sato
    • H01L21/44
    • H01L29/4908H01L29/66757H01L29/78621
    • It is an object of an invention disclosed in the present specification to provide a transistor having low contact resistance. In the transistor, a semiconductor film including an impurity element imparting P-type or N-type conductivity, an insulating film formed thereover, and an electrode or a wiring that is electrically connected to the semiconductor film through a contact hole formed at least in the insulating film are included; the semiconductor film has a first range of a concentration of the impurity element (1×1020/cm3 or less) that is included in a deeper region than predetermined depth, and a second range of a concentration of the impurity element (more than 1×1020/cm3) that is included in a shallower region than the predetermined depth; and a deeper region than a portion in contact with the electrode or the wiring in the semiconductor film is in the first range of the concentration of the impurity element.
    • 本说明书中公开的发明的目的是提供具有低接触电阻的晶体管。 在晶体管中,包括赋予P型或N型导电性的杂质元素的半导体膜,形成在其上的绝缘膜,以及电极或布线,其通过至少形成在所述半导体膜上的接触孔与半导体膜电连接 包括绝缘膜; 半导体膜具有包含在比预定深度更深的区域中的杂质元素的浓度的第一范围(1×10 20 / cm 3以下),并且杂质元素的浓度的第二范围(大于1× 1020 / cm3),其被包括在比预定深度更浅的区域中; 并且比半导体膜中与电极或布线接触的部分更深的区域在杂质元素的浓度的第一范围内。
    • 7. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE
    • 液晶显示装置
    • US20110007060A1
    • 2011-01-13
    • US12828432
    • 2010-07-01
    • Werapong JarupoonpholTakeya TakeuchiTomohiko Sato
    • Werapong JarupoonpholTakeya TakeuchiTomohiko Sato
    • G09G5/00
    • G09G3/3655G09G3/3614G09G2310/08G09G2320/0247
    • A liquid crystal display device is provided, which may reduce flicker in all display gray levels. The liquid crystal display device includes a scan line drive circuit, a signal line drive circuit and a common connection line drive circuit. The common connection line drive circuit applies a voltage, the voltage having polarity opposite to polarity of the signal line, to a common connection line corresponding to a liquid crystal element as a selection object in a write period for writing into the liquid crystal element as a selection object, and applies one or multiple voltages, each voltage having a value different from a center value between an upper limit value and a lower limit value of voltages applied to the common connection lines in the write period, to the common connection lines in a holding period after writing into the liquid crystal element as a selection object is performed.
    • 提供了一种可以减少所有显示灰度级闪烁的液晶显示装置。 液晶显示装置包括扫描线驱动电路,信号线驱动电路和公共连接线驱动电路。 公共连接线路驱动电路将与极性相反的电压作为选择对象施加到与液晶元件对应的公共连接线上,该写入期间写入液晶元件为 选择对象,并且施加一个或多个电压,每个电压具有不同于在写入周期中施加到公共连接线的电压的上限值和下限值之间的中心值的值到一个或多个电压中的公共连接线 写入作为选择对象的液晶元件之后的保持期间被执行。
    • 9. 发明申请
    • Display device
    • 显示设备
    • US20060284184A1
    • 2006-12-21
    • US11513300
    • 2006-08-31
    • Hideo SatoShigeyuki NishitaniTomohiko SatoMutsuko Hatano
    • Hideo SatoShigeyuki NishitaniTomohiko SatoMutsuko Hatano
    • H01L29/04
    • H01L29/78696G02F1/13454G09G3/3648G09G3/3688H01L27/1285H01L27/1296H01L29/04H01L29/66757H01L29/78675
    • The irregularities of characteristics of a pair of transistors, which are prepared by a pseudo single crystallizing technique, are reduced. To achieve this, semiconductor layers are formed on a substrate and have pseudo single crystal regions therein, and a plurality of thin film transistors are arranged inside the pseudo single crystal regions. Two or more of the plurality of thin film transistors, which are required to exhibit small irregularities relative to each other as characteristics thereof, have the direction of the length of the gates of the respective thin film transistors arranged at an inclination of within ±20 degree with respect to the longitudinal direction of the strip-like grown crystals, and they are arranged such that, when channel regions of respective thin film transistors are imaginarily extended in parallel to the growth direction of the strip-like grown crystals, at least portions of the channel regions are superposed on each other.
    • 通过伪单结晶技术制备的一对晶体管的特性不均匀性降低。 为了实现这一点,半导体层形成在基板上并且在其中具有伪单晶区域,并且多个薄膜晶体管布置在伪单晶区域内部。 多个薄膜晶体管中的两个或更多个需要以相对于彼此的特性表现出小的不规则性,其各自的薄膜晶体管的栅极的长度方向以±20度的倾斜度 相对于带状生长晶体的纵向方向,并且它们被布置成使得当相应的薄膜晶体管的沟道区域被想象地平行于条状生长晶体的生长方向延伸时,至少部分 通道区域彼此重叠。
    • 10. 发明授权
    • Display device
    • 显示设备
    • US07102170B2
    • 2006-09-05
    • US10743706
    • 2003-12-24
    • Hideo SatoShigeyuki NishitaniTomohiko SatoMutsuko Hatano
    • Hideo SatoShigeyuki NishitaniTomohiko SatoMutsuko Hatano
    • H01L29/04
    • H01L29/78696G02F1/13454G09G3/3648G09G3/3688H01L27/1285H01L27/1296H01L29/04H01L29/66757H01L29/78675
    • The irregularities of characteristics of a pair of transistors, which are prepared by a pseudo single crystallizing technique, are reduced. To achieve this, semiconductor layers are formed on a substrate and have pseudo single crystal regions therein, and a plurality of thin film transistors are arranged inside of the pseudo single crystal regions. Two or more of the plurality of thin film transistors, which are required to exhibit small irregularities relative to each other as characteristics thereof, have the direction of the length of the gates of the respective thin film transistors arranged at an inclination of within ±20 degree with respect to the longitudinal direction of the strip-like grown crystals, and they are arranged such that, when channel regions of respective thin film transistors are imaginarily extended in parallel to the growth direction of the strip-like grown crystals, at least portions of the channel regions are superposed on each other.
    • 通过伪单结晶技术制备的一对晶体管的特性不均匀性降低。 为了实现这一点,半导体层形成在基板上并且在其中具有伪单晶区域,并且多个薄膜晶体管布置在伪单晶区域的内部。 多个薄膜晶体管中的两个或更多个需要以相对于彼此的特性表现出小的不规则性,其各自的薄膜晶体管的栅极的长度方向以±20度的倾斜度 相对于带状生长晶体的纵向方向,并且它们被布置成使得当相应的薄膜晶体管的沟道区域被想象地平行于条状生长晶体的生长方向延伸时,至少部分 通道区域彼此重叠。