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    • 2. 发明申请
    • Thin Film Forming Sputtering Target, Dielectric Thin Film, Optical Disc and Production Method Therefor
    • 薄膜形成溅射靶,介电薄膜,光盘及其制造方法
    • US20080271988A1
    • 2008-11-06
    • US11630984
    • 2005-05-18
    • Yasuo HosodaTakanobu HiguchiTakashi Ueno
    • Yasuo HosodaTakanobu HiguchiTakashi Ueno
    • C23C14/00
    • G11B7/266C23C14/3414
    • Diffusion of water or oxygen present in the dielectric protection film is restrained by eliminating free oxygen in an oxide thin film while maintaining the characteristics of a dielectric protection film. As the dielectric material for forming a dielectric protection film for an optical disc or the like, an oxide mixture thin film of a niobium oxide and one of a silicon oxide and a titanium oxide is used. In a preferable example, a target made of a niobium oxide as the main component with 1 to 30% by weight of a silicon oxide added is used for formation of an oxide thin film by sputtering. Moreover, the oxide thin film is formed preferably in a nitrogen atmosphere. A nitrogen containing oxide thin film is produced by carrying out sputtering using a target with the oxygen lacked and a minute amount of nitrogen added. Thereby, a thin film having little reducing function and a high barrier property while having the characteristics comparable to a complete oxide can be produced.
    • 通过在保持电介质保护膜的特性的同时消除氧化物薄膜中的游离氧来抑制介电保护膜中存在的水或氧的扩散。 作为用于形成用于光盘等的介电保护膜的电介质材料,使用氧化铌氧化物和氧化硅和氧化钛之一的氧化物混合物薄膜。 在优选的例子中,使用以氧化硅为1〜30重量%的氧化铌为主要成分的靶,通过溅射形成氧化物薄膜。 此外,优选在氮气气氛中形成氧化物薄膜。 通过使用缺氧的靶和加入微量氮进行溅射来制造含氮氧化物薄膜。 因此,可以制造具有与完全氧化物相当的特性的几乎没有减少功能和高阻隔性的薄膜。
    • 9. 发明申请
    • Information recording medium and process for producing the same
    • 信息记录介质及其制造方法
    • US20050233247A1
    • 2005-10-20
    • US10516244
    • 2003-05-23
    • Yasuo HosodaAyumi MitsumoriMegumi SatoMasataka YamaguchiTomoaki IzumiSatoshi JinnoYoichi Okumura
    • Yasuo HosodaAyumi MitsumoriMegumi SatoMasataka YamaguchiTomoaki IzumiSatoshi JinnoYoichi Okumura
    • G11B7/243B41M5/26G11B7/26G11B7/24
    • G11B7/266G11B7/243G11B2007/24306G11B2007/24312G11B2007/24314G11B2007/24322Y10S430/146
    • An information recording medium has an excellent jitter characteristic with a considerable difference in reflectance between prior to and subsequent to recording. The information recording medium includes a recording layer which contains a material having a reflectance which varies by irradiation of a light beam, on which information is recorded as reflectance variations, and a substrate for supporting the recording layer, the recording layer including a metal nitride as a major component. In a method of manufacturing the information recording medium having a recording layer which includes a material having a reflectance which varies by irradiation of a light beam, on which information is recorded as reflectance variations, and the substrate for supporting the recording layer, the recording layer including a metal nitride as a major component, the method includes a recording layer forming step for forming the recording layer by a reactive sputtering method which uses a target comprised of a metal constituting a metal nitride, wherein a flow ratio Ar:N2 in an atmosphere including Ar and N2 in the recording layer forming step is set within the range of 80:10 to 10:80.
    • 信息记录介质具有优异的抖动特性,在记录之前和之后具有相当大的反射率差异。 该信息记录介质包括一记录层,该记录层含有具有反射率的材料,其反射率随着光束的照射而变化,信息被记录为反射率变化,以及用于支撑该记录层的基板,该记录层包括一金属氮化物 一个主要组成部分。 在制造具有记录层的信息记录介质的方法中,记录层包括具有通过照射光束而变化的反射率的材料,其上记录信息作为反射率变化,以及用于支撑记录层的基板,记录层 包括金属氮化物作为主要成分,该方法包括用反应溅射法形成记录层的记录层形成步骤,该方法使用由构成金属氮化物的金属组成的靶,其中流动比Ar: 在记录层形成步骤中包括Ar和N 2 的气氛中,将其设定在80:10至10:80的范围内。