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1. 发明授权

US09023583B2 Monolayer or multilayer forming composition 有权
标题翻译：单层或多层形成组合物
公开(公告)号：US09023583B2
公开(公告)日：2015-05-05
申请号：US13879125
申请日：2011-10-07
申请人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
IPC分类号： G03F7/075 , G03F7/20 , G03F7/30 , C07F7/18 , C09D183/08 , G03F7/16 , C08G77/28
CPC分类号： G03F7/0752 , C07F7/1804 , C08G77/28 , C09D183/08 , G03F7/0751 , G03F7/165 , G03F7/20 , G03F7/30
摘要： There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
摘要翻译：提供了在基材上形成单层或多层的组合物。用于形成单层的组合物或含有式（1A）或式（1B）的硅烷化合物的多层：[其中R 1独立地是甲基或乙基; X独立地为C1-10连接基团; 并且Z独立地为C1-10烷基或任选具有取代基的苯基，其中X任选地在其主链中含有至少一个氧原子或硫原子，当Z为烷基时，至少一个氢原子的烷基任选被氟原子取代]和有机溶剂。

2. 发明申请

US20130216956A1 MONOLAYER OR MULTILAYER FORMING COMPOSITION 有权
标题翻译：单层或多层成型组合物
公开(公告)号：US20130216956A1
公开(公告)日：2013-08-22
申请号：US13879125
申请日：2011-10-07
申请人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
发明人： Takahiro Kishioka , Daisuke Sakuma , Shigeo Kimura , Hirokazu Nishimaki , Tomoya Ohashi , Yuki Usui
IPC分类号： G03F7/075 , G03F7/20
CPC分类号： G03F7/0752 , C07F7/1804 , C08G77/28 , C09D183/08 , G03F7/0751 , G03F7/165 , G03F7/20 , G03F7/30
摘要： There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
摘要翻译：提供了在基材上形成单层或多层的组合物。用于形成单层的组合物或含有式（1A）或式（1B）的硅烷化合物的多层：[其中R 1独立地是甲基或乙基; X独立地为C1-10连接基团; 并且Z独立地为C1-10烷基或任选具有取代基的苯基，其中X任选地在其主链中含有至少一个氧原子或硫原子，当Z为烷基时，至少一个氢原子的烷基任选被氟原子取代]和有机溶剂。

3. 发明授权

US09340561B2 Organic silicon compound and silane coupling agent containing the same 有权
标题翻译：有机硅化合物和含硅烷偶联剂
公开(公告)号：US09340561B2
公开(公告)日：2016-05-17
申请号：US14345002
申请日：2012-08-28
申请人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
发明人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
IPC分类号： C07F7/08 , A61L27/28 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/08 , A61L31/16 , C09D5/16 , C07F7/18
CPC分类号： C07F7/081 , A61L27/28 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/08 , A61L31/16 , A61L2300/424 , C07F7/1804 , C09D5/1625
摘要： There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A− is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).
摘要翻译：提供了可用于硅烷偶联剂的新型有机硅化合物。式（1）的有机硅化合物：其中A-是式（2）或式（3）：E是式（4）或式（5）：R 1和R 2各自独立地为C 1-5烷基， R3是氢原子或甲基，R4和R5各自独立地为C1-5烷基，m，n和p各自独立地为1〜5的整数，q为1〜3的整数）。

4. 发明申请

US20140370182A1 ORGANIC SILICON COMPOUND AND SILANE COUPLING AGENT CONTAINING THE SAME 有权
标题翻译：有机硅化合物和含有它们的硅烷偶联剂
公开(公告)号：US20140370182A1
公开(公告)日：2014-12-18
申请号：US14345002
申请日：2012-08-28
申请人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
发明人： Makiko Umezaki , Daisuke Sakuma , Taito Nishino , Takahiro Kishioka , Yoshiomi Hiroi , Shigeo Kimura , Tomoya Ohashi , Yuki Usui
IPC分类号： C07F7/08 , C09D5/16
CPC分类号： C07F7/081 , A61L27/28 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/08 , A61L31/16 , A61L2300/424 , C07F7/1804 , C09D5/1625
摘要： There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A− is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).
摘要翻译：提供了可用于硅烷偶联剂的新型有机硅化合物。式（1）的有机硅化合物：其中A-是式（2）或式（3）：E是式（4）或式（5）：R 1和R 2各自独立地为C 1-5烷基， R3是氢原子或甲基，R4和R5各自独立地为C1-5烷基，m，n和p各自独立地为1〜5的整数，q为1〜3的整数）。

5. 发明授权

US09524871B2 Silicon-containing resist underlayer film-forming composition having sulfone structure 有权
标题翻译：具有砜结构的含硅抗蚀剂下层膜形成组合物
公开(公告)号：US09524871B2
公开(公告)日：2016-12-20
申请号：US14236136
申请日：2012-08-10
申请人： Makoto Nakajima , Daisuke Sakuma , Yuta Kanno , Takahiro Kishioka
发明人： Makoto Nakajima , Daisuke Sakuma , Yuta Kanno , Takahiro Kishioka
IPC分类号： H01L21/027 , G03F7/11 , C07F7/18 , G03F7/075 , G03F7/09 , H01L21/311
CPC分类号： H01L21/0274 , C07F7/1804 , G03F7/0752 , G03F7/091 , G03F7/094 , H01L21/0276 , H01L21/31133
摘要： A composition for forming a resist underlayer film for lithography, including: as a silane, a hydrolyzable organosilane, a hydrolysate of the hydrolyzable organosilane, or a hydrolysis-condensation product of the hydrolyzable organosilane, wherein the hydrolyzable organosilane is a compound of Formula (1): [(R1)aSi(R2)(3−a)]b(R3) Formula (1) [in Formula (1), R3 is an organic group having a sulfonyl group and a light-absorbing group and is bonded to a Si atom through a Si—C bond; R1 is an alkyl, aryl, aralkyl, halogenated alkyl, halogenated aryl, halogenated aralkyl, alkenyl, an organic group having an epoxy, acryloyl, methacryloyl, mercapto, alkoxyaryl, acyloxyaryl, isocyanurate, hydroxy, cyclic amino, or a cyano group, or a combination of any of these groups and is bonded to a Si atom through a Si—C bond; R2 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 0 to 2; and b is an integer of 1 to 3].

6. 发明授权

US09291900B2 Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group 有权
标题翻译：用于形成抗蚀剂下层膜的组合物，其含有含有二酮结构的有机基团的硅
公开(公告)号：US09291900B2
公开(公告)日：2016-03-22
申请号：US13981142
申请日：2012-01-24
申请人： Yuta Kanno , Daisuke Sakuma , Makoto Nakajima
发明人： Yuta Kanno , Daisuke Sakuma , Makoto Nakajima
IPC分类号： G03F7/075 , G03F7/09 , G03F7/20 , G03F7/30 , G03F7/36 , G03F7/11 , C09D183/06 , C08L83/06 , H01L21/308 , C09D4/00 , C08G77/14
CPC分类号： G03F7/0752 , C08G77/14 , C08L83/06 , C09D4/00 , C09D183/06 , G03F7/0755 , G03F7/0757 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/36 , H01L21/3081 , H01L21/3088 , Y10T428/31663
摘要： A composition for forming a lithographic resist underlayer film, including, as a silane, a hydrolyzable organosilane, a hydrolysate thereof, or a hydrolytic condensate thereof, wherein the silane includes a hydrolyzable organosilane of Formula (1) below: [(R1)aSi(R2)(3-a)]b(R3) Formula (1) [where R3 is a group of Formula (2), (3), or (4): (in Formulae (2), (3), and (4), at least one from among R4, R5, and R6 is a group bonded to a silicon atom directly or through a linking group.), R1 is an alkyl group, an aryl group, an aralkyl group, an alkyl halide group, an aryl halide group, an aralkyl halide group, an alkenyl group, or an organic group having an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, or a cyano group, or a combination thereof, R2 is an alkoxy group, an acyloxy group, or a halogen atom].
摘要翻译：一种用于形成光刻抗蚀剂下层膜的组合物，其包含作为硅烷的可水解的有机硅烷，其水解物或其水解缩合物，其中所述硅烷包括下述式（1）的可水解的有机硅烷：[（R1）aSi（ R2）（3-a）] b（R3）式（1）[其中R3是式（2），（3）或（4）的基团：（在式（2），（3） 4）中，R4，R5和R6中的至少一个是直接或通过连接基与硅原子键合的基团。），R1是烷基，芳基，芳烷基，烷基卤基，芳基卤基，芳烷基卤基，烯基或具有环氧基，丙烯酰基，甲基丙烯酰基，巯基，氨基或氰基的有机基团，或其组合，R 2 是烷氧基，酰氧基或卤素原子]。

7. 发明申请

US20130302991A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP 有权
标题翻译：用于形成耐下层膜的组合物，含有含有酮结构的有机组织的硅
公开(公告)号：US20130302991A1
公开(公告)日：2013-11-14
申请号：US13981142
申请日：2012-01-24
申请人： Yuta Kanno , Daisuke Sakuma , Makoto Nakajima
发明人： Yuta Kanno , Daisuke Sakuma , Makoto Nakajima
IPC分类号： H01L21/308
CPC分类号： G03F7/0752 , C08G77/14 , C08L83/06 , C09D4/00 , C09D183/06 , G03F7/0755 , G03F7/0757 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/36 , H01L21/3081 , H01L21/3088 , Y10T428/31663
摘要： A composition for forming a lithographic resist underlayer film, including, as a silane, a hydrolyzable organosilane, a hydrolysate thereof, or a hydrolytic condensate thereof, wherein the silane includes a hydrolyzable organosilane of Formula (1) below: [(R1)aSi(R2)(3-a)]b(R3) Formula (1) [where R3 is a group of Formula (2), (3), or (4): (in Formulae (2), (3), and (4), at least one from among R4, R5, and R6 is a group bonded to a silicon atom directly or through a linking group.), R1 is an alkyl group, an aryl group, an aralkyl group, an alkyl halide group, an aryl halide group, an aralkyl halide group, an alkenyl group, or an organic group having an epoxy group, an acryloyl group, a methacryloyl group, a mercapto group, an amino group, or a cyano group, or a combination thereof, R2 is an alkoxy group, an acyloxy group, or a halogen atom].
摘要翻译：一种用于形成光刻抗蚀剂下层膜的组合物，其包含作为硅烷的可水解的有机硅烷，其水解物或其水解缩合物，其中所述硅烷包括下述式（1）的可水解的有机硅烷：[（R1）aSi（ R2）（3-a）] b（R3）式（1）[其中R3是式（2），（3）或（4）的基团：（在式（2），（3） 4）中，R4，R5和R6中的至少一个是直接或通过连接基与硅原子键合的基团。），R1是烷基，芳基，芳烷基，烷基卤基，芳基卤基，芳烷基卤基，烯基或具有环氧基，丙烯酰基，甲基丙烯酰基，巯基，氨基或氰基的有机基团，或其组合，R 2 是烷氧基，酰氧基或卤素原子]。

8. 发明申请

US20150287528A1 PROCESS FOR PRODUCING RARE-EARTH MAGNET 审中-公开
标题翻译：生产稀土磁铁的方法
公开(公告)号：US20150287528A1
公开(公告)日：2015-10-08
申请号：US14441695
申请日：2013-11-13
申请人： Kazuaki Haga , Noritaka Miyamoto , Tetsuya Shoji , Daisuke Sakuma
发明人： Kazuaki Haga , Noritaka Miyamoto , Tetsuya Shoji , Daisuke Sakuma
IPC分类号： H01F41/00
CPC分类号： H01F41/00 , C22C1/00 , C22C38/00 , C22C2202/00 , H01F1/0576 , H01F41/0293
摘要： Provided is a method for manufacturing a rare-earth magnet enabling effective penetrant-diffusion of a melt of modifier alloy powder without generating oxidation reaction or hydroxylation reaction when the modifier alloy powder is used for a better coercive force as well. The method for manufacturing a rare-earth magnet includes: a step of producing a compact S by hot press processing using magnetic powder B including a RE-T-B main phase MP (RE: at least one type of Nd, Pr, and Y) and a grain boundary phase BP around the main phase MP, and performing hot deformation processing to the compact S to produce a rare-earth magnet precursor C; and a step of bringing modifier alloy powder M including a RE-M alloy (M: a metallic element that does not include heavy rare-earth elements) and having an average grain size of 30 μm or more into contact with a surface of the rare-earth magnet precursor C, followed by heating, so that a melt of the modifier alloy powder M is penetrant-diffused into the rare-earth magnet precursor C, to produce the rare-earth magnet RM.
摘要翻译：本发明提供一种稀土类磁铁的制造方法，其能够在改性合金粉末用于更好的矫顽力的同时，在不产生氧化反应或羟基化反应的情况下，能够对改性剂合金粉末的熔融物进行有效的渗透扩散。稀土类磁铁的制造方法包括：使用包含RE-TB主相MP（RE：至少一种Nd，Pr，Y）的磁性粉末B通过热压加工制造压块S的工序;以及围绕主相MP的晶界相BP，并对压块S进行热变形处理以制备稀土磁体前体C; 将包含RE-M合金（M：不含重稀土类元素的金属元素）和平均粒径为30μm以上的改性剂合金粉末M与稀有金属的表面接触的工序然后加热，使得改性剂合金粉末M的熔体渗透扩散到稀土磁体前体C中，以制备稀土磁体RM。

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