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    • 1. 发明申请
    • GAS-SUPPLY SYSTEM AND METHOD
    • 气体供应系统和方法
    • US20150177745A1
    • 2015-06-25
    • US14203788
    • 2014-03-11
    • Taiwan Semiconductor Manufacturing Co., Ltd
    • Yung-Long CHENChun-Feng HSUHeng-Yi TSENGChieh-Jan HUANGChin-Hsing SUYung-Ching CHEN
    • G05D16/20H01L21/67
    • G05D16/204H01L21/67017Y10T137/0379Y10T137/2567Y10T137/2569Y10T137/7761
    • A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.
    • 气体供给系统包括填充有气体的气体容器,连接到气体容器的气体流量控制器以及与气体流量控制器电连接的操作装置。 气体供应系统还包括连接到气体流量控制器并被配置为经由气体流量控制器从气体容器接收气体的缓冲罐。 此外,压力传感器设置在缓冲罐上,并被配置为根据缓冲罐中的气体的压力向操作装置产生压力信号。 操作装置被配置为根据压力信号向气体流量控制器生成控制信号,并且气体流量控制器被配置为根据控制信号调节气体的流量,以将气体的压力保持在缓冲器 罐在预定的压力范围内。