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1. 发明申请

US20100085624A1 Apparatus for driving electrochromic device and method thereof 有权
标题翻译：用于驱动电致变色装置的装置及其方法
公开(公告)号：US20100085624A1
公开(公告)日：2010-04-08
申请号：US12310733
申请日：2007-09-03
申请人： Tae-Joong Lee , Jae-Dong Park , Hyun-Woo Shin
发明人： Tae-Joong Lee , Jae-Dong Park , Hyun-Woo Shin
IPC分类号： G02F1/163
CPC分类号： G09G3/38
摘要： An apparatus for driving an electrochromic device (ECD) includes a driving volt age output unit for selectively applying a coloring or decoloring voltage between upper and lower electrodes of an ECD; a timer for counting an applying time of the coloring or decoloring voltage in a memory type driving mode and then outputting a voltage application completion signal after the counted time exceeds a preset time, the timer bypassing the counting operation in a non-memory type driving mode; and a driving controller for selectively inputting a coloring or decoloring signal to the driving voltage output unit such that the driving voltage output unit is controlled to output a coloring or decoloring voltage corresponding to the signal, the driving controller receiving the voltage application completion signal to stop the input of the coloring or decoloring signal. Thus, memory type and non-memory type ECDs may be driven automatically using only one apparatus.
摘要翻译：一种用于驱动电致变色装置（ECD）的装置包括用于选择性地在ECD的上电极和下电极之间施加着色或消色电压的驱动电压输出单元; 计时器，用于在存储器类型驱动模式中计数着色或消色电压的施加时间，然后在计数时间之后输出电压施加完成信号超过预设时间，该定时器绕过非存储器类型驱动模式中的计数操作 ; 以及驱动控制器，用于向驱动电压输出单元选择性地输入着色或消色信号，使得驱动电压输出单元被控制以输出对应于该信号的着色或消色电压，驱动控制器接收电压施加完成信号以停止输入着色或消色信号。因此，可以仅使用一个装置自动驱动存储器类型和非存储器类型的ECD。

2. 发明授权

US08378927B2 Apparatus for driving electrochromic device and method thereof 有权
标题翻译：用于驱动电致变色装置的装置及其方法
公开(公告)号：US08378927B2
公开(公告)日：2013-02-19
申请号：US12310733
申请日：2007-09-03
申请人： Tae-Joong Lee , Jae-Dong Pakr , Hyun-Woo Shin
发明人： Tae-Joong Lee , Jae-Dong Pakr , Hyun-Woo Shin
IPC分类号： G09G3/19
CPC分类号： G09G3/38
摘要： An apparatus for driving an electrochromic device (ECD) includes a driving volt age output unit for selectively applying a coloring or decoloring voltage between upper and lower electrodes of an ECD; a timer for counting an applying time of the coloring or decoloring voltage in a memory type driving mode and then outputting a voltage application completion signal after the counted time exceeds a preset time, the timer bypassing the counting operation in a non-memory type driving mode; and a driving controller for selectively inputting a coloring or decoloring signal to the driving voltage output unit such that the driving voltage output unit is controlled to output a coloring or decoloring voltage corresponding to the signal, the driving controller receiving the voltage application completion signal to stop the input of the coloring or decoloring signal. Thus, memory type and non-memory type ECDs may be driven automatically using only one apparatus.
摘要翻译：一种用于驱动电致变色装置（ECD）的装置包括用于选择性地在ECD的上电极和下电极之间施加着色或消色电压的驱动电压输出单元; 计时器，用于在存储器类型驱动模式下对着色或消色电压的施加时间进行计数，然后在计数时间之后输出电压施加完成信号超过预设时间，该定时器绕过非存储器类型驱动模式中的计数操作 ; 以及驱动控制器，用于向驱动电压输出单元选择性地输入着色或消色信号，使得驱动电压输出单元被控制以输出对应于该信号的着色或消色电压，驱动控制器接收电压施加完成信号以停止输入着色或消色信号。因此，可以仅使用一个装置自动驱动存储器类型和非存储器类型的ECD。

3. 发明申请

US20100279233A1 METHOD FOR LASER INTERFERENCE LITHOGRAPHY USING DIFFRACTION GRATING 有权
标题翻译：使用衍射光栅的激光干涉计算方法
公开(公告)号：US20100279233A1
公开(公告)日：2010-11-04
申请号：US12738598
申请日：2008-10-08
申请人： Tae-Su Kim , Jae-Jin Kim , Hyun-Woo Shin
发明人： Tae-Su Kim , Jae-Jin Kim , Hyun-Woo Shin
IPC分类号： G03F7/20
CPC分类号： G03F7/70408 , G02B5/1809 , G02B5/1814
摘要： A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from λ/ng to λ/n0 (λ is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.
摘要翻译：使用衍射光栅的激光干涉光刻方法包括：（a）在要形成重复精细图案的工件基板上形成光致抗蚀剂层; （b）在光致抗蚀剂层上形成折射率匹配材料层; （c）在折射率匹配材料层上形成具有λ/ ng至λ/ n0范围内的衍射光栅周期的衍射光栅层（λ为激光束的波长，ng为衍射光栅的折射率，n0是空气中或真空中的折射率）; 和（d）通过垂直于衍射光栅层输入激光束，通过相同绝对值的正和负衍射光的相互干涉来使光致抗蚀剂层曝光。该方法允许实现具有更高分辨率的干涉图案并且使用具有较低相干性的激光源。

4. 发明授权

US07999991B2 Electrode comprising lithium nickel oxide layer, method for preparing the same, and electrochromic device comprising the same 有权
标题翻译：包含锂镍氧化物层的电极，其制备方法和包含该电极的电致变色器件
公开(公告)号：US07999991B2
公开(公告)日：2011-08-16
申请号：US12448909
申请日：2008-01-22
申请人： Ki-Seok Jang , Hyun-Woo Shin , Jae-Hong Kim
发明人： Ki-Seok Jang , Hyun-Woo Shin , Jae-Hong Kim
IPC分类号： G02F1/153
CPC分类号： G02F1/1506 , G02F1/155
摘要： Disclosed is a method of preparing an electrode, which can lead to uniform electrochromism of a lithium nickel oxide layer by applying a voltage in all directions of the electrode during a formatting process, an electrode prepared by the same, and an electrochromic device including the electrode.
摘要翻译：公开了一种制备电极的方法，其可以在格式化过程期间通过在电极的所有方向施加电压，由其制备的电极以及包括电极的电致变色器件而导致锂镍氧化物层的均匀电致变色。

5. 发明申请

US20100014145A1 ELECTRODE COMPRISING LITHIUM NICKEL OXIDE LAYER, METHOD FOR PREPARING THE SAME, AND ELECTROCHROMIC DEVICE COMPRISING THE SAME 有权
标题翻译：包含锂镍氧化物层的电极，其制备方法和包含其的电致发光器件
公开(公告)号：US20100014145A1
公开(公告)日：2010-01-21
申请号：US12448909
申请日：2008-01-22
申请人： Ki-Seok Jang , Hyun-Woo Shin , Jae-Hong Kim
发明人： Ki-Seok Jang , Hyun-Woo Shin , Jae-Hong Kim
IPC分类号： G02F1/155 , B05D3/06
CPC分类号： G02F1/1506 , G02F1/155
摘要： Disclosed is a method of preparing an electrode, which can lead to uniform electrochromism of a lithium nickel oxide layer by applying a voltage in all directions of the electrode during a formatting process, an electrode prepared by the same, and an electrochromic device including the electrode.
摘要翻译：公开了一种制备电极的方法，其可以在格式化过程期间通过在电极的所有方向施加电压，由其制备的电极以及包括电极的电致变色器件而导致锂镍氧化物层的均匀电致变色。

6. 发明授权

US08399184B2 Method for laser interference lithography using diffraction grating 有权
$Method for laser interference lithography using diffraction grating$
标题翻译：使用衍射光栅的激光干涉光刻方法
公开(公告)号：US08399184B2
公开(公告)日：2013-03-19
申请号：US12738598
申请日：2008-10-08
申请人： Tae-Su Kim , Jae-Jin Kim , Hyun-Woo Shin
发明人： Tae-Su Kim , Jae-Jin Kim , Hyun-Woo Shin
IPC分类号： G03F7/20
CPC分类号： G03F7/70408 , G02B5/1809 , G02B5/1814
摘要： A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from λ/ng to λ/n0 (λ is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.
摘要翻译：使用衍射光栅的激光干涉光刻方法包括：（a）在要形成重复精细图案的工件基板上形成光致抗蚀剂层; （b）在光致抗蚀剂层上形成折射率匹配材料层; （c）在折射率匹配材料层上形成具有λ/ ng至λ/ n0范围内的衍射光栅周期的衍射光栅层（λ为激光束的波长，ng为衍射光栅的折射率，n0是空气中或真空中的折射率）; 和（d）通过垂直于衍射光栅层输入激光束，通过相同绝对值的正和负衍射光的相互干涉来使光致抗蚀剂层曝光。该方法允许实现具有更高分辨率的干涉图案并且使用具有较低相干性的激光源。

7. 发明授权

US08213086B2 Coating composition for antireflection with resistance and antireflection characteristic and antireflection film prepared by using the same 有权
标题翻译：用于具有电阻和抗反射特性的抗反射涂料组合物和使用其制备的抗反射膜
公开(公告)号：US08213086B2
公开(公告)日：2012-07-03
申请号：US12448589
申请日：2007-12-28
申请人： Yeong-Rae Chang , Young-Jun Hong , Young-Eun Lee , Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin
发明人： Yeong-Rae Chang , Young-Jun Hong , Young-Eun Lee , Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin
IPC分类号： G02B1/10
CPC分类号： G02B1/111
摘要： A coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.
摘要翻译：一种抗反射用涂料组合物，其包含折射率为1.2〜1.45的低折射率热固性树脂，折射率为1.46〜2的高折射紫外线固化性树脂和紫外线吸收剂; 使用该涂料组合物制造的防反射膜; 以及制造防反射膜的方法。抗反射膜具有优异的耐磨性和抗反射特性。此外，由于可以在一个涂布工艺中制造抗反射膜，所以可以降低制造成本。

8. 发明申请

US20130230937A1 METHOD FOR MANUFACTURING PERPENDICULAR LED 审中-公开
标题翻译：制造全能LED的方法
公开(公告)号：US20130230937A1
公开(公告)日：2013-09-05
申请号：US13988325
申请日：2011-05-25
申请人： Hyun-Woo Shin , Kyo-Sun Ku , Byung-Du Oh
发明人： Hyun-Woo Shin , Kyo-Sun Ku , Byung-Du Oh
IPC分类号： H01L33/00
CPC分类号： H01L33/005 , H01L33/0079
摘要： A method for manufacturing a perpendicular LED for preventing bending of a wafer while reducing the time required for manufacturing to improve the mass production yield of perpendicular LEDs includes: growing an LED compound semiconductor structure on a sapphire substrate; forming an adhesive layer which is stacked on the LED compound semiconductor structure in the order of a first solder layer, a heat-emitting layer, and a second solder layer; forming a conductive substrate on the adhesive layer; coupling the first solder layer and the second solder layer by means of the heat which is generated from reacting the heat-emitting layer; and removing the sapphire substrate.
摘要翻译：一种用于制造用于防止晶片弯曲的垂直LED的方法，同时减少制造所需的时间以提高垂直LED的批量生产成本，包括：在蓝宝石衬底上生长LED化合物半导体结构; 以第一焊料层，发热层和第二焊料层的顺序形成层叠在LED化合物半导体结构上的粘合层; 在所述粘合剂层上形成导电基板; 通过由发热层反应而产生的热耦合第一焊料层和第二焊料层; 并去除蓝宝石衬底。

9. 发明申请

US20100020272A1 Mirror effect liquid crystal display device using reflection polarizer 有权
标题翻译：镜面效果液晶显示装置采用反射偏振片
公开(公告)号：US20100020272A1
公开(公告)日：2010-01-28
申请号：US12310785
申请日：2007-09-07
申请人： Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin , Jac-Jin Kim
发明人： Tae-Su Kim , Hyun-Woo Shin , Bu-Gon Shin , Jac-Jin Kim
IPC分类号： G02F1/1335
CPC分类号： G02F1/133536
摘要： A LCD (Liquid Crystal Display) device includes a backlight unit, a lower polarizer positioned on the backlight unit, a liquid crystal layer positioned on the lower polarizer, and an upper reflection polarizer positioned on the liquid crystal layer. The upper reflection polarizer is configured such that a regularly arranged metallic lattice is formed on a support this LCD device may give a good mirror effect when power is intercepted, and also give a clear display with high brightness even at a bright place when power is supplied to operate the LCD device.
摘要翻译： LCD（液晶显示器）装置包括背光单元，位于背光单元上的下偏振器，位于下偏振器上的液晶层和位于液晶层上的上反射偏振器。上反射偏振片被配置为使得在支撑件上形成规则排列的金属格子，该LCD装置在断电时可以给出良好的镜面效果，并且即使在供电时在明亮的地方也提供高亮度的清晰显示操作LCD设备。

10. 发明申请

US20090323156A1 Method of forming electrochromic layer pattern, method of manufacturing electrochromic device using the same, and electrochromic device including electrochromic layer pattern 审中-公开
标题翻译：电致变色层图案的形成方法，使用其的电致变色装置的制造方法以及电致变色层图案的电致变色装置
公开(公告)号：US20090323156A1
公开(公告)日：2009-12-31
申请号：US12310734
申请日：2007-09-04
申请人： Hyun-Woo Shin , Ki-Seok Jang , Jin-Young Park , Min-Ho Choi , Tae-Su Kim , Su-Hee Lee , Jae-Hong Kim , Boo-Kyung Kim
发明人： Hyun-Woo Shin , Ki-Seok Jang , Jin-Young Park , Min-Ho Choi , Tae-Su Kim , Su-Hee Lee , Jae-Hong Kim , Boo-Kyung Kim
IPC分类号： G02F1/15 , G03F7/20
CPC分类号： G02F1/153
摘要： A method for forming an electrochromic layer pattern includes forming a transparent electrode layer and a photoresist layer on a transparent substrate, forming a photoresist pattern by laser interference lithography, and depositing an electrochromic layer pattern on the transparent electrode through openings defined by the photoresist pattern by depositing an electrochromic layer on a front surface of the substrate and then lifting up the photoresist pattern. An insulation layer may be further formed between the transparent layer and the photoresist layer. Here, the electrochromic layer may be formed after an insulation layer pattern is formed using the photoresist pattern as an etching mask. In this case, the electrochromic layer pattern is formed in openings defined by the insulation layer pattern. As a result, a contact surface area between the electrochromic layer pattern and the ion conductive layer is increased to ensure a rapid response speed.
摘要翻译：形成电致变色层图案的方法包括在透明基板上形成透明电极层和光致抗蚀剂层，通过激光干涉光刻形成光致抗蚀剂图案，并通过由光致抗蚀剂图案限定的开口在透明电极上沉积电致变色层图案在基板的前表面上沉积电致变色层，然后提起光致抗蚀剂图案。可以在透明层和光致抗蚀剂层之间进一步形成绝缘层。这里，可以在使用光致抗蚀剂图案作为蚀刻掩模形成绝缘层图案之后形成电致变色层。在这种情况下，电致变色层图案形成在由绝缘层图案限定的开口中。结果，增加了电致变色层图案和离子传导层之间的接触表面积，以确保快速的响应速度。

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