发明申请
US20090323156A1 Method of forming electrochromic layer pattern, method of manufacturing electrochromic device using the same, and electrochromic device including electrochromic layer pattern
审中-公开
基本信息:
- 专利标题： Method of forming electrochromic layer pattern, method of manufacturing electrochromic device using the same, and electrochromic device including electrochromic layer pattern
- 专利标题（中）：电致变色层图案的形成方法，使用其的电致变色装置的制造方法以及电致变色层图案的电致变色装置
- 申请号：US12310734 申请日：2007-09-04
- 公开(公告)号：US20090323156A1 公开(公告)日：2009-12-31
- 发明人： Hyun-Woo Shin , Ki-Seok Jang , Jin-Young Park , Min-Ho Choi , Tae-Su Kim , Su-Hee Lee , Jae-Hong Kim , Boo-Kyung Kim
- 申请人： Hyun-Woo Shin , Ki-Seok Jang , Jin-Young Park , Min-Ho Choi , Tae-Su Kim , Su-Hee Lee , Jae-Hong Kim , Boo-Kyung Kim
- 优先权： KR10-2006-0085616 20060906
- 国际申请： PCT/KR2007/004256 WO 20070904
- 主分类号： G02F1/15
- IPC分类号： G02F1/15 ; G03F7/20
摘要：
A method for forming an electrochromic layer pattern includes forming a transparent electrode layer and a photoresist layer on a transparent substrate, forming a photoresist pattern by laser interference lithography, and depositing an electrochromic layer pattern on the transparent electrode through openings defined by the photoresist pattern by depositing an electrochromic layer on a front surface of the substrate and then lifting up the photoresist pattern. An insulation layer may be further formed between the transparent layer and the photoresist layer. Here, the electrochromic layer may be formed after an insulation layer pattern is formed using the photoresist pattern as an etching mask. In this case, the electrochromic layer pattern is formed in openings defined by the insulation layer pattern. As a result, a contact surface area between the electrochromic layer pattern and the ion conductive layer is increased to ensure a rapid response speed.
摘要（中）：
形成电致变色层图案的方法包括在透明基板上形成透明电极层和光致抗蚀剂层，通过激光干涉光刻形成光致抗蚀剂图案，并通过由光致抗蚀剂图案限定的开口在透明电极上沉积电致变色层图案 在基板的前表面上沉积电致变色层，然后提起光致抗蚀剂图案。 可以在透明层和光致抗蚀剂层之间进一步形成绝缘层。 这里，可以在使用光致抗蚀剂图案作为蚀刻掩模形成绝缘层图案之后形成电致变色层。 在这种情况下，电致变色层图案形成在由绝缘层图案限定的开口中。 结果，增加了电致变色层图案和离子传导层之间的接触表面积，以确保快速的响应速度。