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1. 发明授权

US08107138B2 Image sensing apparatus 有权
标题翻译：影像传感装置
公开(公告)号：US08107138B2
公开(公告)日：2012-01-31
申请号：US12984112
申请日：2011-01-04
申请人： Tadashi Minobe , Hiroyuki Kawano , Izumi Mikami , Takafumi Endo
发明人： Tadashi Minobe , Hiroyuki Kawano , Izumi Mikami , Takafumi Endo
IPC分类号： H04N1/04 , H04N1/46
CPC分类号： H04N1/0318 , H04N1/02815 , H04N1/02835 , H04N1/1017 , H04N1/193 , H04N2201/03112 , H04N2201/03129 , H04N2201/03137 , H04N2201/03145
摘要： An image sensing apparatus having a large depth of focus (DOF) and being compact in size is provided. The image sensing apparatus includes a plurality of light sources that shines light beams on an illumination portion of a document; a first mirror that receives incident light scattered by reflection from the document, to reflect the scattered light in the secondary scan direction; a plurality of first concaved aspheric mirrors that collimates light beams from the first mirror, to reflect therefrom the collimated light beams as substantially collimated light fluxes; an aperture mirror that reflects therefrom the light beams from the respective first aspheric mirrors, through apertures each having a light-shielded portion formed therearound and selectively passing the light beams therethrough; a plurality of second concaved aspheric mirrors that receives the light beams incident from the respective aperture mirror, to reflect the incident light beams as converging light beams; a second mirror that reflects the light beams in a direction perpendicular to the surface of the document, disposed on a path of the light beams to be converged by means of the second aspheric mirrors; a plurality of light receivers each having a light-receiving area that receives the light beams from the second mirrors, to form images according to the light beams from the respective apertures; and a casing where the first and second aspheric mirrors are disposed on a first side of the casing in the secondary scan direction, and the aperture mirror is disposed on a second side thereof in the secondary scan direction.
摘要翻译：提供了具有较大焦距（DOF）并且尺寸紧凑的图像感测装置。图像感测装置包括将光束照射在文件的照明部分上的多个光源; 第一反射镜，其接收从原稿反射散射的入射光，以反射二次扫描方向上的散射光; 多个第一凹入非球面镜，其准直来自第一反射镜的光束，从而将准直光束反射为基本上准直的光束; 一个孔径反射镜，从其反射来自各个第一非球面反射镜的光束，通过各孔具有形成在其周围的光屏蔽部分，并选择性地使光束通过其中; 多个第二凹面非球面镜，其接收从相应孔径镜入射的光束，以将入射光束反射为会聚光束; 第二反射镜，其在垂直于文件表面的方向上反射光束，设置在通过第二非球面镜聚焦的光束的路径上; 多个光接收器，每个光接收器具有接收来自第二反射镜的光束的光接收区域，以根据来自各孔的光束形成图像; 以及壳体，其中所述第一和第二非球面镜在所述副扫描方向上设置在所述壳体的第一侧上，并且所述孔径反射镜被设置在所述副扫描方向的第二侧上。

2. 发明申请

US20090147321A1 IMAGE SENSING APPARATUS 有权
标题翻译：图像感应装置
公开(公告)号：US20090147321A1
公开(公告)日：2009-06-11
申请号：US12261520
申请日：2008-10-30
申请人： Tadashi MINOBE , Hiroyuki Kawano , Izumi Mikami , Takafumi Endo
发明人： Tadashi MINOBE , Hiroyuki Kawano , Izumi Mikami , Takafumi Endo
IPC分类号： H04N1/04
CPC分类号： H04N1/0318 , H04N1/02815 , H04N1/02835 , H04N1/1017 , H04N1/193 , H04N2201/03112 , H04N2201/03129 , H04N2201/03137 , H04N2201/03145
摘要： An image sensing apparatus having a large depth of focus (DOF) and being compact in size is provided. The image sensing apparatus includes a plurality of light sources that shines light beams on an illumination portion of a document; a first mirror that receives incident light scattered by reflection from the document, to reflect the scattered light in the secondary scan direction; a plurality of first concaved aspheric mirrors that collimates light beams from the first mirror, to reflect therefrom the collimated light beams as substantially collimated light fluxes; an aperture mirror that reflects therefrom the light beams from the respective first aspheric mirrors, through apertures each having a light-shielded portion formed therearound and selectively passing the light beams therethrough; a plurality of second concaved aspheric mirrors that receives the light beams incident from the respective aperture mirror, to reflect the incident light beams as converging light beams; a second mirror that reflects the light beams in a direction perpendicular to the surface of the document, disposed on a path of the light beams to be converged by means of the second aspheric mirrors; a plurality of light receivers each having a light-receiving area that receives the light beams from the second mirrors, to form images according to the light beams from the respective apertures; and a casing where the first and second aspheric mirrors are disposed on a first side of the casing in the secondary scan direction, and the aperture mirror is disposed on a second side thereof in the secondary scan direction.
摘要翻译：提供了具有较大焦距（DOF）并且尺寸紧凑的图像感测装置。图像感测装置包括将光束照射在文件的照明部分上的多个光源; 第一反射镜，其接收从原稿反射散射的入射光，以反射二次扫描方向上的散射光; 多个第一凹入非球面镜，其准直来自第一反射镜的光束，从而将准直光束反射为基本上准直的光束; 一个孔径反射镜，从其反射来自各个第一非球面反射镜的光束，通过各孔具有形成在其周围的光屏蔽部分，并选择性地使光束通过其中; 多个第二凹面非球面镜，其接收从相应孔径镜入射的光束，以将入射光束反射为会聚光束; 第二反射镜，其在垂直于文件表面的方向上反射光束，设置在通过第二非球面镜聚焦的光束的路径上; 多个光接收器，每个光接收器具有接收来自第二反射镜的光束的光接收区域，以根据来自各孔的光束形成图像; 以及壳体，其中所述第一和第二非球面镜在所述副扫描方向上设置在所述壳体的第一侧上，并且所述孔径反射镜被设置在所述副扫描方向的第二侧上。

3. 发明授权

US07884976B2 Image sensing apparatus 有权
标题翻译：影像传感装置
公开(公告)号：US07884976B2
公开(公告)日：2011-02-08
申请号：US12261520
申请日：2008-10-30
申请人： Tadashi Minobe , Hiroyuki Kawano , Izumi Mikami , Takafumi Endo
发明人： Tadashi Minobe , Hiroyuki Kawano , Izumi Mikami , Takafumi Endo
IPC分类号： H04N1/04 , H04N1/46
CPC分类号： H04N1/0318 , H04N1/02815 , H04N1/02835 , H04N1/1017 , H04N1/193 , H04N2201/03112 , H04N2201/03129 , H04N2201/03137 , H04N2201/03145
摘要： An image sensing apparatus having a large depth of focus (DOF) and being compact in size is provided. The image sensing apparatus includes a plurality of light sources that shines light beams on an illumination portion of a document; a first mirror that receives incident light scattered by reflection from the document, to reflect the scattered light in the secondary scan direction; a plurality of first concaved aspheric mirrors that collimates light beams from the first mirror, to reflect therefrom the collimated light beams as substantially collimated light fluxes; an aperture mirror that reflects therefrom the light beams from the respective first aspheric mirrors, through apertures each having a light-shielded portion formed therearound and selectively passing the light beams therethrough; a plurality of second concaved aspheric mirrors that receives the light beams incident from the respective aperture mirror, to reflect the incident light beams as converging light beams; a second mirror that reflects the light beams in a direction perpendicular to the surface of the document, disposed on a path of the light beams to be converged by means of the second aspheric mirrors; a plurality of light receivers each having a light-receiving area that receives the light beams from the second mirrors, to form images according to the light beams from the respective apertures; and a casing where the first and second aspheric mirrors are disposed on a first side of the casing in the secondary scan direction, and the aperture mirror is disposed on a second side thereof in the secondary scan direction.
摘要翻译：提供了具有较大焦距（DOF）并且尺寸紧凑的图像感测装置。图像感测装置包括将光束照射在文件的照明部分上的多个光源; 第一反射镜，其接收从原稿反射散射的入射光，以反射二次扫描方向上的散射光; 多个第一凹入非球面镜，其准直来自第一反射镜的光束，从而将准直光束反射为基本上准直的光束; 一个孔径反射镜，从其反射来自各个第一非球面反射镜的光束，通过各孔具有形成在其周围的光屏蔽部分，并选择性地使光束通过其中; 多个第二凹面非球面镜，其接收从相应孔径镜入射的光束，以将入射光束反射为会聚光束; 第二反射镜，其在垂直于文件表面的方向上反射光束，设置在通过第二非球面镜聚焦的光束的路径上; 多个光接收器，每个光接收器具有接收来自第二反射镜的光束的光接收区域，以根据来自各孔的光束形成图像; 以及壳体，其中所述第一和第二非球面镜在所述副扫描方向上设置在所述壳体的第一侧上，并且所述孔径反射镜被设置在所述副扫描方向的第二侧上。

4. 发明授权

US08962234B2 Resist underlayer film forming composition and method for forming resist pattern using the same 有权
标题翻译：抗蚀剂下层膜形成组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US08962234B2
公开(公告)日：2015-02-24
申请号：US14003480
申请日：2012-03-08
申请人： Ryuji Ohnishi , Takafumi Endo , Rikimaru Sakamoto
发明人： Ryuji Ohnishi , Takafumi Endo , Rikimaru Sakamoto
IPC分类号： G03F7/004 , G03F7/11 , C08G63/60
CPC分类号： G03F7/09 , C08G59/1455 , C08G59/4223 , G03F7/11 , G03F7/38
摘要： A resist underlayer film forming composition for lithography, includes: a polymer including a structure of formula (1) below at a terminal of a polymer chain; a cross-linking agent; a compound that promotes a cross-linking reaction; and an organic solvent: (where R1, R2, and R3 are each independently a hydrogen atom, a linear or branched hydrocarbon group having a carbon atom number of 1 to 13, or a hydroxy group; at least one of R1, R2, and R3 is the hydrocarbon group; m and n are each independently 0 or 1; and a main chain of the polymer is bonded to a methylene group when n is 1 and bonded to a group represented by —O— when n is 0).
摘要翻译：用于光刻的抗蚀剂下层膜形成组合物包括：在聚合物链的末端包含下式（1）结构的聚合物; 交联剂; 促进交联反应的化合物; 和有机溶剂：（其中，R 1，R 2和R 3各自独立地为氢原子，碳原子数为1〜13的直链或支链烃基或羟基; R1，R2和 R3是烃基; m和n各自独立地为0或1;当n为1时，聚合物的主链与亚甲基结合，当n为0时，与-O - 表示的基团键合。

5. 发明授权

US08435721B2 Resist underlayer film forming composition and forming method of resist pattern using the same 有权
标题翻译：抗蚀剂下层膜形成组合物和使用其的抗蚀剂图案的形成方法
公开(公告)号：US08435721B2
公开(公告)日：2013-05-07
申请号：US12866831
申请日：2009-02-19
申请人： Rikimaru Sakamoto , Takafumi Endo
发明人： Rikimaru Sakamoto , Takafumi Endo
IPC分类号： G03F7/11 , C08G59/42 , H01L21/027
CPC分类号： G03F7/091 , C08G59/1455 , C08G63/20 , C08G63/42 , C08G63/668 , C08G63/6854
摘要： It is an object to provide a resist underlayer film forming composition having a large selection ratio of a dry etching rate, and having a k value and an n value at a short wavelength such as an ArF excimer laser, both of which exhibit desired values. There is provided a resist underlayer film forming composition containing a polymer obtained by reacting at least a tetracarboxylic dianhydride having an alicyclic structure or an aliphatic structure and a diepoxy compound having two epoxy groups with an organic solvent containing an alcohol-based compound having an OH group, and a solvent.
摘要翻译：本发明的目的是提供一种抗蚀剂下层膜形成组合物，其具有大的干蚀刻速率选择比，并且在诸如ArF准分子激光器的短波长处具有k值和n值，这两者都表现出期望的值。提供一种抗蚀剂下层膜形成组合物，其含有通过使至少具有脂环结构或脂肪族结构的四羧酸二酐和具有两个环氧基的二环氧化合物与含有具有OH基的醇系化合物的有机溶剂反应而获得的聚合物，和溶剂。

6. 发明授权

US08383320B2 Resist underlayer film forming composition and method of forming resist pattern using the same 有权
标题翻译：抗蚀剂下层成膜组合物和使用其形成抗蚀剂图案的方法
公开(公告)号：US08383320B2
公开(公告)日：2013-02-26
申请号：US12682819
申请日：2008-10-16
申请人： Rikimaru Sakamoto , Yoshiomi Hiroi , Tomohisa Ishida , Takafumi Endo
发明人： Rikimaru Sakamoto , Yoshiomi Hiroi , Tomohisa Ishida , Takafumi Endo
IPC分类号： G03F7/11 , G03F7/20 , C08G59/14 , H01L21/027
CPC分类号： C08G63/664 , C08G59/1438 , C08L63/00 , G03F7/091
摘要： There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.
摘要翻译：提供了一种用于形成抗蚀剂下层膜的组合物，其不仅具有大的干蚀刻速率选择比，而且在短波长（如ArF准分子的波长）下表现出k值和折射率n的期望值激光。一种用于光刻的抗蚀剂下层膜形成组合物，包括：线性聚合物; 和溶剂，其中线性聚合物的主链具有通过酯键和醚键引入2,4-二羟基苯甲酸的单元结构。

7. 发明授权

US08059315B2 Image reading device 有权
标题翻译：图像读取装置
公开(公告)号：US08059315B2
公开(公告)日：2011-11-15
申请号：US12466808
申请日：2009-05-15
申请人： Takafumi Endo , Yohei Nokami
发明人： Takafumi Endo , Yohei Nokami
IPC分类号： H04N1/04 , G06K7/10
CPC分类号： H04N1/02815 , G07D7/121 , H04N1/02855 , H04N1/02865 , H04N2201/0418
摘要： An image reading device having a compact plane-shaped illumination portion is provided, by which a portion of a target to be light-irradiated can be irradiated with light whose oblique angles are different from each other, and a transmission part of the target can be read. The image reading device includes a conveying means for conveying in a conveying direction a target to be light-irradiated including a transparent portion, a lens assembly, arranged on one side of the target, for focusing transmission light having passed through the transparent portion of the target, a sensor for receiving the transmission light focused by the lens assembly, a light source, positioned on the other side of the target, arranged in a main-scanning direction, and a light guide for guiding light from the light source in a sub-scanning direction, and the light guide having a reflective portion for reflecting the guided light and then irradiating a portion to be irradiated with the reflected light.
摘要翻译：提供一种具有紧凑的平面状照明部的图像读取装置，通过该图像，能够使倾斜角度彼此不同的光照射被照射的被照射部的一部分，并且目标的透射部可以读。图像读取装置包括：传送装置，用于在传送方向上传送包括透明部分的光照射对象物，透镜组件，布置在目标物体的一侧，用于聚焦穿过透明部分的透射光目标，用于接收由透镜组件聚焦的透射光的传感器，位于靶的另一侧的光源，沿主扫描方向布置;以及光导，用于将来自光源的光引导到子扫描并且所述光导具有反射部分，用于反射所述被引导的光，然后照射被照射的反射光的部分。

8. 发明申请

US20100221657A1 RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD OF FORMING RESIST PATTERN USING THE SAME 有权
标题翻译：抗静电膜形成组合物及其形成耐力图案的方法
公开(公告)号：US20100221657A1
公开(公告)日：2010-09-02
申请号：US12682819
申请日：2008-10-16
申请人： Rikimaru Sakamoto , Yoshiomi Hiroi , Tomohisa Ishida , Takafumi Endo
发明人： Rikimaru Sakamoto , Yoshiomi Hiroi , Tomohisa Ishida , Takafumi Endo
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： C08G63/664 , C08G59/1438 , C08L63/00 , G03F7/091
摘要： There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.
摘要翻译：提供了一种用于形成抗蚀剂下层膜的组合物，其不仅具有大的干蚀刻速率选择比，而且在短波长（如ArF准分子的波长）下表现出k值和折射率n的期望值激光。一种用于光刻的抗蚀剂下层膜形成组合物，包括：线性聚合物; 和溶剂，其中线性聚合物的主链具有通过酯键和醚键引入2,4-二羟基苯甲酸的单元结构。

9. 发明申请

US20070133858A1 Image reading apparatus 失效
标题翻译：图像读取装置
公开(公告)号：US20070133858A1
公开(公告)日：2007-06-14
申请号：US11400201
申请日：2006-04-10
申请人： Takafumi Endo , Shigeru Toyota
发明人： Takafumi Endo , Shigeru Toyota
IPC分类号： G06K9/00
CPC分类号： G07D7/121 , G06Q20/042
摘要： An image reading apparatus includes a carrying unit that carries an irradiated object having a reflecting portion and a transmitting portion in a carrying direction, a first light source arranged on one face side of the irradiated object that irradiates light to an irradiated portion in a path of carrying the irradiated object, a second light source arranged on other face side that irradiates light to the irradiated portion, a detecting unit arranged to be spaced apart from the irradiated portion by a predetermined distance that detects the transmitting portion, a lighting control unit that controls to put on the second light source during a time period of passing the transmitting portion through the irradiated portion, a lens array arranged on one face side of the irradiated object that converges reflecting light reflected by the reflecting portion and transmitting light, and a sensor that receives converged light.
摘要翻译：图像读取装置包括承载单元，其承载具有反射部分和传送部分在运送方向上的被照射物体，第一光源布置在照射物体的一个正面上，该照射物体照射到照射部分的照射部分，携带被照射物体的第二光源，布置在照射部分上的光的另一面侧的第二光源;检测单元，被布置成与所述照射部分隔开预定距离，所述检测单元检测所述发射部分;控制单元，在使发送部通过照射部的时间期间放置在第二光源上;透镜阵列，其布置在被照射物体的一个正面侧，会聚反射部反射的反射光并透射光;传感器，接收会聚光。

10. 发明授权

US09240327B2 Resist underlayer film-forming composition for EUV lithography containing condensation polymer 有权
标题翻译：用于含有缩聚物的EUV光刻的抗蚀下层成膜组合物
公开(公告)号：US09240327B2
公开(公告)日：2016-01-19
申请号：US14236719
申请日：2012-07-31
申请人： Rikimaru Sakamoto , Noriaki Fujitani , Takafumi Endo , Ryuji Ohnishi , Bangching Ho
发明人： Rikimaru Sakamoto , Noriaki Fujitani , Takafumi Endo , Ryuji Ohnishi , Bangching Ho
IPC分类号： G03F7/11 , H01L21/308 , H01L21/027 , C08G73/06 , G03F7/09
CPC分类号： H01L21/3081 , C08G73/06 , G03F7/091 , G03F7/094 , G03F7/11 , H01L21/0274 , H01L21/3086
摘要： There is provided a resist underlayer film composition for EUV lithography that is used in a device production process using EUV lithography, reduces adverse effects of EUV, and is effective for obtaining a good resist pattern, and to a method for forming a resist pattern that uses the resist underlayer film composition for EUV lithography. A resist underlayer film-forming composition for EUV lithography, including: a polymer having a repeating unit structure of formula (1): [where each of A1, A2, A3, A4, A5, and A6 is a hydrogen atom, a methyl group, or an ethyl group; X1 is formula (2), formula (3), formula (4), or formula (0): Q is formula (5) or formula (6): and a solvent. A resist underlayer film-forming composition for EUV lithography, comprising: the polymer having the repeating unit structure of formula (1); a crosslinkable compound; and a solvent.
摘要翻译：提供了用于EUV光刻的抗蚀剂下层膜组合物，其用于使用EUV光刻的器件制造工艺，减少EUV的不利影响，并且对获得良好的抗蚀剂图案是有效的，以及形成使用的抗蚀剂图案的方法用于EUV光刻的抗蚀剂下层膜组合物。一种用于EUV光刻的抗蚀剂下层膜形成组合物，包括：具有式（1）的重复单元结构的聚合物：[其中A1，A2，A3，A4，A5和A6各自为氢原子，甲基，或乙基; X1是式（2），式（3），式（4）或式（0）：Q是式（5）或式（6）：和溶剂。一种用于EUV光刻的抗蚀剂下层膜形成组合物，包括：具有式（1）的重复单元结构的聚合物; 可交联化合物; 和溶剂。

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