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    • 1. 发明授权
    • Photographic processing composition and bleaching or bleach-fixing method
    • 摄影处理组合物和漂白或漂白固定方法
    • US5338649A
    • 1994-08-16
    • US120461
    • 1993-09-14
    • Tadashi InabaHisashi OkadaRyo SuzukiYasuhiro KatsuokaHiroyuki Seki
    • Tadashi InabaHisashi OkadaRyo SuzukiYasuhiro KatsuokaHiroyuki Seki
    • C09K3/00G03C7/42G03C7/00G03C5/38G03C5/42G03C5/44
    • G03C7/42Y10S430/164
    • A process for bleaching or bleach-fixing an imagewise exposed silver halide photographic material is provided, comprising developing in a color developing solution and bleaching or bleach-fixing in a processing composition having a bleaching capacity containing as a bleaching agent a metal chelate compound of a chelate-forming compound or salt thereof and a metal ion selected from the group consisting of Fe(III), Mn(III), Co(III), Rh(II), Rh(III), Au(II), Au(III) and Ce(IV), the chelate-forming compound or salt thereof is represented by formula (I): ##STR1## wherein G.sub.1 and G.sub.2 each represents a carboxyl group, a phosphono group, a sulfo group, a hydroxyl group, a mercapto group, an aryl group, a heterocyclic group, an alkylthio group, an amidino group, a guanidino group or a carbamoyl group; L.sub.1, L.sub.2 and L.sub.3 each represents a divalent aliphatic group, a divalent aromatic group or a divalent connecting group formed by a combination of a divalent aliphatic group and a divalent aromatic group; m and n each represents an integer 0 or 1; R represents a hydrogen atom, an aliphatic group or an aromatic group; and M represents a hydrogen atom or a cation.
    • 提供了一种用于漂白或漂白固定成像曝光的卤化银照相材料的方法,包括在彩色显影溶液中显影并漂白或漂白固定在具有漂白能力的处理组合物中,所述漂白能力含有作为漂白剂的金属螯合化合物 螯合形成化合物或其盐和选自Fe(III),Mn(III),Co(III),Rh(II),Rh(III),Au(II),Au(III) )和Ce(IV),螯合形成化合物或其盐由式(I)表示:其中G1和G2各自表示羧基,膦酰基,磺基,羟基 巯基,芳基,杂环基,烷硫基,脒基,胍基或氨基甲酰基; L1,L2和L3各自表示二价脂族基团,二价芳族基团或通过二价脂族基团和二价芳族基团的组合形成的二价连接基团; m和n各自表示整数0或1; R表示氢原子,脂族基或芳基; M表示氢原子或阳离子。
    • 7. 发明授权
    • Hybrid silicon wafer
    • 混合硅片
    • US08512868B2
    • 2013-08-20
    • US13499304
    • 2010-10-28
    • Ryo SuzukiHiroshi Takamura
    • Ryo SuzukiHiroshi Takamura
    • B32B9/04B32B13/04C01B33/02
    • C30B29/06C30B11/00C30B28/06C30B33/06
    • A hybrid silicon wafer which is a silicon wafer having a structure wherein the main plane orientation of polycrystalline silicon that is prepared by a unidirectional solidification/melting method is (311), and monocrystalline silicon is embedded in the polycrystalline silicon. The hybrid silicon wafer according to any one of claims 1 to 6, wherein the purity of the polycrystalline silicon portion excluding gas components is 6N or higher, the total amount of metal impurities is 1 wtppm or less, and, among the metal impurities, Cu, Fe, Ni, and Al are respectively 0.1 wtppm or less. Thus, a hybrid silicon wafer having the functions of both a polycrystalline silicon wafer and a monocrystalline silicon wafer is provided and the occurrence of polish bumps and macro-sized unevenness between the polycrystalline silicon and the monocrystalline silicon are prevented.
    • 具有以下结构的硅晶片的混合硅晶片,其中通过单向凝固/熔融法制备的多晶硅的主平面取向为(311),单晶硅嵌入多晶硅中。 7.根据权利要求1〜6中任一项所述的复合硅晶片,其特征在于,除了气体成分以外的多晶硅部分的纯度为6N以上,金属杂质的总量为1重量ppm以下,在金属杂质中,Cu ,Fe,Ni,Al分别为0.1重量ppm以下。 因此,提供了具有多晶硅晶片和单晶硅晶片的功能的混合硅晶片,并且防止了多晶硅和单晶硅之间的抛光凸起和宏观尺寸的不均匀性的出现。
    • 8. 发明申请
    • VEHICLE ENGINE CONTROL DEVICE
    • 车用发动机控制装置
    • US20130196820A1
    • 2013-08-01
    • US13818004
    • 2010-08-20
    • Ryo SuzukiAkiyoshi NegishiShinichi TakeuchiTakeshi KainoKatsuya Kobayashi
    • Ryo SuzukiAkiyoshi NegishiShinichi TakeuchiTakeshi KainoKatsuya Kobayashi
    • B60W10/02B60W10/06
    • B60W10/02B60W10/06F02D29/02F02D41/022F02D41/123F02D2200/101F02D2200/602Y10T477/79
    • A vehicle engine control device stopping fuel injection if a predetermined fuel cut condition is satisfied, is provided, during running with the fuel injection stopped, when inertia of a power transmission system rotating with the engine has a smaller rate of inertia of the power transmission system acting on rotation of an output shaft of the engine, the fuel injection being started at a lower engine rotation speed as compared to the case of a larger rate of inertia of the power transmission system acting on rotation of the output shaft of the engine, a clutch capable of connecting and interrupting power transmission between the engine and the power transmission system being interposed between the engine and the power transmission system, a rate of inertia of the power transmission system acting on rotation of the output shaft of the engine being configured to decrease as a clutch stroke of the clutch that is an operation amount of a clutch pedal increases, and an engine rotation speed for starting the fuel injection being set to a lower value as the clutch stroke increases.
    • 在满足规定的燃料切断条件的情况下,设置停止燃料喷射的车辆发动机控制装置,在停止燃料的行驶中,当与发动机一起旋转的动力传递系统的惯性具有较小的动力传递系统的惯量 作用于发动机的输出轴的旋转,与作为发动机的输出轴的旋转的动力传递系统的较大惯量的情况相比,燃料喷射以较低的发动机转速开始, 能够连接和中断发动机和动力传递系统之间的动力传递的离合器插入在发动机和动力传动系统之间,作用在发动机的输出轴的旋转上的动力传动系统的惯性率被配置为减小 作为离合器的作为离合器踏板的操作量的离合器行程增加,并且发动机旋转 d随着离合器行程的增加而将燃油喷射设定为较低的值。
    • 9. 发明授权
    • Sintered sputtering target made of refractory metals
    • 由难熔金属制成的烧结溅射靶
    • US08118984B2
    • 2012-02-21
    • US12279067
    • 2007-02-22
    • Ryo Suzuki
    • Ryo Suzuki
    • C23C14/00C25B11/00C25B13/00
    • C23C14/3414C22C1/0466C22C5/04C22C27/00C22C27/02C22C27/04C22C30/00
    • Proposed is a sintered sputtering target containing two or more types of refractory metals. In particular, proposed is a sintered sputtering target of refractory metals that is able to improve the target structure to prevent the dropout of metal particles other than the matrix-forming major component, improve the deposition quality as well as the workability of the target by reducing impurities such as gas components, enhancing the density and eliminating the generation of arcing and particles in sputtering. This sintered sputtering target of refractory metals is composed of one or more types of minor components selected from W, Ta and Hf at less than 50 at % as well as at least one or more major components selected from Ru, Rh and Ir and inevitable impurities as the remainder. The metal structure of the major component comprises a granular minor component metal phase, or an alloy phase or a compound phase of the major and the minor component having an average grain size of 100 μm to 500 μm.
    • 提出的是含有两种以上难熔金属的烧结溅射靶。 特别地,提出了一种难熔金属的烧结溅射靶,其能够改善目标结构以防止除基体形成主要成分之外的金属颗粒的脱落,通过减少来提高沉积质量以及靶的可加工性 诸如气体组分的杂质,增强了密度并消除了溅射中电弧和颗粒的产生。 难熔金属的烧结溅射靶由小于50at%的选自W,Ta和Hf的一种或多种次要组分以及选自Ru,Rh和Ir中的至少一种或多种主要成分和不可避免的杂质构成 作为剩余部分。 主要成分的金属组织包括平均粒径为100μm〜500μm的粒状次成分金属相或主成分和次要成分的合金相或化合物相。
    • 10. 发明申请
    • Hybrid Silicon Wafer and Method of Producing the Same
    • 混合硅晶片及其制造方法
    • US20120009374A1
    • 2012-01-12
    • US12832150
    • 2010-07-08
    • Hiroshi TakamuraRyo Suzuki
    • Hiroshi TakamuraRyo Suzuki
    • B32B3/02B29D7/00C01B33/02
    • C30B33/06C01B32/05C30B11/00C30B29/06Y10T428/21
    • Provided is a hybrid silicon wafer in which molten state polycrystalline silicon and solid state single-crystal silicon are mutually integrated, comprising fine crystals having an average crystal grain size of 8 mm or less at a polycrystalline portion within 10 mm from a boundary with a single-crystal portion. Additionally provided is a method of manufacturing a hybrid silicon wafer, wherein a columnar single-crystal silicon ingot is sent in a mold in advance, molten silicon is cast around and integrated with the single-crystal ingot to prepare an ingot complex of single-crystal silicon and polycrystalline silicon, and a wafer shape is cut out therefrom. The provided hybrid silicon wafer comprises the functions of both a polycrystalline silicon wafer and a single-crystal wafer.
    • 提供了一种混合硅晶片,其中熔融状态的多晶硅和固态单晶硅相互整合,包括在与单个边界的边界10mm以内的多晶部分处具有8mm或更小的平均晶粒尺寸的细晶体 晶体部分。 另外提供了一种制造混合硅晶片的方法,其中预先在模具中输送柱状单晶硅锭,将熔融硅铸造并与单晶锭一体化以制备单晶锭锭 硅和多晶硅,并从其中切出晶片形状。 所提供的混合硅晶片包括多晶硅晶片和单晶晶片的功能。