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1. 发明授权

US06927012B2 Polyamic acid resin composition 有权
标题翻译：聚酰胺酸树脂组合物
公开(公告)号：US06927012B2
公开(公告)日：2005-08-09
申请号：US10484719
申请日：2002-07-15
申请人： Tadashi Hatanaka , Sahade Daniel Antonio , Takayasu Nihira
发明人： Tadashi Hatanaka , Sahade Daniel Antonio , Takayasu Nihira
IPC分类号： C08G73/10 , C08L79/08 , G03F7/004 , G03F7/023 , G03F7/037 , G03F7/038 , G03F7/075
CPC分类号： G03F7/0757 , C08G73/10 , C08G73/1039 , C08L79/08 , C08L2205/02 , G03F7/0046 , G03F7/0233 , G03F7/037 , G03F7/0387 , C08L2666/20
摘要： Provided is a polyamic acid resin composition for formation of a bank, which provides excellent film characteristics and adhesion to a substrate, which can undergo patterning with use of a positive type photoresist, and which can be transformed into a polyimide after the patterning to yield a polyimide resin with upper part of film having a low surface energy. It is achieved by a polyamic acid resin composition comprising a polyamic acid [a] as a base and a polyamic acid [b] having a fluorine-containing alkyl group with a carbon number of at least 2, and containing the polyamic acid [b] in an amount of from 0.1 to 30 wt % to the total amount of the polyamic acid [a] and the polyamic acid [b].
摘要翻译：提供一种用于形成堤的聚酰胺酸树脂组合物，其提供优异的膜特性和对基材的粘附性，其可以使用正型光致抗蚀剂进行图案化，并且可以在图案化之后转变成聚酰亚胺，得到具有低表面能的膜的上部的聚酰亚胺树脂。通过聚酰胺酸树脂组合物实现，所述聚酰胺酸树脂组合物包含聚酰胺酸[a]作为碱和具有碳原子数至少为2的含氟烷基的聚酰胺酸[b]，并含有聚酰胺酸[b] 相对于聚酰胺酸[a]和聚酰胺酸[b]的总量为0.1〜30重量％。

2. 发明申请

US20050147914A1 Positively photosensitive resin composition and method of pattern formation 有权
标题翻译：积极感光树脂组合物和图案形成方法
公开(公告)号：US20050147914A1
公开(公告)日：2005-07-07
申请号：US10510704
申请日：2003-04-18
申请人： Tadashi Hatanaka , Takayasu Nihira
发明人： Tadashi Hatanaka , Takayasu Nihira
IPC分类号： G03C1/76 , G03F7/00 , G03F7/022 , G03F7/023 , G03F7/039 , G03F7/40
CPC分类号： G03F7/0233 , G03F7/0007 , G03F7/0226
摘要： The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a method for arbitrarily forming a pattern having a semicircular or trapezoidal section by using the composition. The positive photosensitive resin composition of the present invention comprises an alkali-soluble resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant, and the alkali-soluble resin is a copolymer comprising a carboxylic group-containing acrylic monomer, a hydroxyl group-containing acrylic monomer and an N-substituted maleimide as essential components. By changing the postbake conditions, the composition can arbitrarily form a pattern having a semicircular or trapezoidal section.
摘要翻译：本发明提供一种能够以通常浓度的四甲基氢氧化铵水溶液显影，具有高灵敏度和优异分辨率的正型感光性树脂组合物，耐热性，平坦化性，透明性，低吸水性等优异。此外，本发明提供一种通过使用该组合物任意形成具有半圆形或梯形截面的图案的方法。本发明的正型感光性树脂组合物包含碱溶性树脂，1,2-醌二叠氮化合物，具有至少两个环氧基的交联化合物和表面活性剂，碱溶性树脂是包含羧酸的共聚物基团的丙烯酸类单体，含羟基的丙烯酸类单体和N-取代的马来酰亚胺作为必需成分。通过改变后烘烤条件，组合物可任意形成具有半圆形或梯形截面的图案。

3. 发明授权

US06875554B2 Positive photosensitive polyimide resin composition 有权
标题翻译：正光敏聚酰亚胺树脂组合物
公开(公告)号：US06875554B2
公开(公告)日：2005-04-05
申请号：US10381736
申请日：2001-10-03
申请人： Tadashi Hatanaka , Tomonari Nakayama , Takayasu Nihira
发明人： Tadashi Hatanaka , Tomonari Nakayama , Takayasu Nihira
IPC分类号： G03F7/037 , C08G73/10 , C08L79/08 , G03F7/022 , G03F7/023 , G03F7/004 , G03F7/038
CPC分类号： G03F7/0233
摘要： A positive photosensitive polyimide resin composition comprising: (a) a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one solvent solubilizing functional group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, (b) a photosensitive orthoquinonediazide compound, and (c) from 0.1 to 50 wt %, based on the total weight of all polymers of the composition, of a component (c1) or (c2), wherein: component (c1) is a solvent-soluble polyimide comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g, and component (c2) is a polyamic acid comprised of from 1 to 100 mol % of a bivalent organic group derived from a diamine, that has at least one functional group selected from the group consisting of a long chain alkyl group having at least 6 carbon atoms and a fluorinated alkyl group, the polyimide having a reduced viscosity ranging from 0.05 to 5.0 dl/g.
摘要翻译：一种正型光敏聚酰亚胺树脂组合物，其包含：（a）由1至100摩尔％的衍生自二胺的二价有机基团的溶剂可溶性聚酰亚胺，其具有至少一种溶剂增溶官能团，所述聚酰亚胺具有比浓粘度范围为0.05至5.0dl / g，（b）光敏正二叠氮化合物，和（c）基于组合物的所有聚合物的总重量，0.1至50重量％的组分（c1）或（c2）其中：成分（c1）是由1〜100摩尔％的来自二胺的二价有机基团构成的溶剂可溶性聚酰亚胺，其具有至少1个选自由以下组成的组中的官能团：长链烷基，至少6个碳原子和氟化烷基，所述聚酰亚胺的比浓粘度范围为0.05-5.0dl / g，组分（c2）是由1至100mol％的衍生自二胺，至少有o 选自具有至少6个碳原子的长链烷基和氟化烷基的官能团，所述聚酰亚胺的比浓粘度为0.05-5.0dl / g。

4. 发明授权

US07001705B2 Positively photosensitive resin composition and method of pattern formation 有权
标题翻译：积极感光树脂组合物和图案形成方法
公开(公告)号：US07001705B2
公开(公告)日：2006-02-21
申请号：US10510704
申请日：2003-04-18
申请人： Tadashi Hatanaka , Takayasu Nihira
发明人： Tadashi Hatanaka , Takayasu Nihira
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/0007 , G03F7/0226
摘要： The present invention provides a positive photosensitive resin composition which can be developed with a tetramethylammonium hydroxide aqueous solution with a usual concentration, has high sensitivity and excellent resolution, and is excellent in heat resistance, planarization properties, transparency, low water absorption or the like. Further, the present invention provides a method for arbitrarily forming a pattern having a semicircular or trapezoidal section by using the composition. The positive photosensitive resin composition of the present invention comprises an alkali-soluble resin, a 1,2-quinone diazide compound, a crosslinking compound having at least two epoxy groups and a surfactant, and the alkali-soluble resin is a copolymer comprising a carboxylic group-containing acrylic monomer, a hydroxyl group-containing acrylic monomer and an N-substituted maleimide as essential components. By changing the postbake conditions, the composition can arbitrarily form a pattern having a semicircular or trapezoidal section.
摘要翻译：本发明提供一种能够以通常浓度的四甲基氢氧化铵水溶液显影，具有高灵敏度和优异分辨率的正型感光性树脂组合物，耐热性，平坦化性，透明性，低吸水性等优异。此外，本发明提供一种通过使用该组合物任意形成具有半圆形或梯形截面的图案的方法。本发明的正型感光性树脂组合物包含碱溶性树脂，1,2-醌二叠氮化合物，具有至少两个环氧基的交联化合物和表面活性剂，碱溶性树脂是包含羧酸的共聚物基团的丙烯酸类单体，含羟基的丙烯酸类单体和N-取代的马来酰亚胺作为必需成分。通过改变后烘烤条件，组合物可任意形成具有半圆形或梯形截面的图案。

5. 发明授权

US09733519B2 Composition for forming thermoset film having photo alignment properties 有权
公开(公告)号：US09733519B2
公开(公告)日：2017-08-15
申请号：US13377331
申请日：2010-06-21
申请人： Tadashi Hatanaka , Isao Adachi
发明人： Tadashi Hatanaka , Isao Adachi
IPC分类号： G02F1/13363 , C08L33/06 , G02F1/1335 , C08F220/30
CPC分类号： G02F1/13363 , B32B2457/202 , C08F2220/302 , C08L33/066 , G02F2001/133519 , G02F2001/133633 , G02F2202/025 , Y10T428/1005 , C08F220/20
摘要： A material from which a cured film exhibiting high solvent resistance, liquid crystal-alignment performance, heat resistance and high transparency can be formed. A composition for forming a thermoset film having photo alignment properties, including: a component (A) that is an acrylic copolymer having a photodimerizing moiety and a thermal cross-linking moiety; and a component (B) that is a cross-linking agent.

6. 发明申请

US20070020559A1 Positive-type photosensitive resin composition and cured film manufactured therefrom 有权
标题翻译：正型感光性树脂组合物及其制造的固化膜
公开(公告)号：US20070020559A1
公开(公告)日：2007-01-25
申请号：US11491156
申请日：2006-07-24
申请人： Tadashi Hatanaka
发明人： Tadashi Hatanaka
IPC分类号： G03C1/00
CPC分类号： G03F7/168 , G03F7/027 , G03F7/0392 , G03F7/2004 , Y10S430/128
摘要： A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000 to 30,000; component (B): a compound having two or more vinyl ether groups per molecule; component (C): a compound having two or more blocked isocyanate groups per molecule; component (D): a photoacid generator; and component (E): a solvent. A production process of the positive-type photosensitive resin composition comprising mixing the above-mentioned components and maintaining the mixture at a temperature higher than room temperature. A cured film manufactured by using the positive-type photosensitive resin composition. The composition has a high sensitivity and little film reduction of unexposed part, maintains a high transmittance even after baking at a high temperature or resist stripping treatment, and cause no reduction of film thickness. Therefore, the composition provides a cured film suited as a film material for several displays.
摘要翻译：一种正型感光性树脂组合物，其特征在于，含有成分（A）：具有与组分（B）的化合物进行热交联反应的官能团的碱溶性树脂，用于膜固化的官能团，其与组分（C），数均分子量为2,000至30,000; 组分（B）：每分子具有两个或多个乙烯基醚基团的化合物; 组分（C）：每分子具有两个或多个封端异氰酸酯基团的化合物; 组分（D）：光酸产生剂; 和组分（E）：溶剂。正型感光性树脂组合物的制造方法包括混合上述组分并将混合物保持在高于室温的温度。使用正型感光性树脂组合物制造的固化膜。该组合物具有高的敏感性和较少的未曝光部分的膜的还原，即使在高温下烘烤或抗蚀剂剥离处理也保持高透射率，并且不会降低膜厚度。因此，组合物提供适合作为几种显示器的膜材料的固化膜。

7. 发明授权

US09193861B2 Composition for forming thermoset film having photo-alignment properties 有权
标题翻译：用于形成具有光取向特性的热固性膜的组合物
公开(公告)号：US09193861B2
公开(公告)日：2015-11-24
申请号：US13639529
申请日：2011-04-05
申请人： Tadashi Hatanaka , Mitsumasa Kondo
发明人： Tadashi Hatanaka , Mitsumasa Kondo
IPC分类号： C09K19/00 , C08L61/28 , G02F1/13363 , G02F1/1337 , G02F1/1335
CPC分类号： C08L61/28 , G02F1/13363 , G02F1/133711 , G02F1/133788 , G02F2001/133519 , Y10T428/1005
摘要： There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties and containing a component (A) that is a compound having a photo-aligning group and a hydroxy group, a component (B) that is a melamine formaldehyde resin, and a component (C) that is a crosslinker.
摘要翻译：提供了在形成固化膜之后表现出高耐溶剂性的材料，相对于聚合性液晶具有优异的光取向性，耐热性良好，透明度高，而且可溶于二醇系溶剂，酮类溶剂或乳液酯类溶剂，其可用于在形成固化膜期间制造滤色器的外涂层。用于形成具有光取向性的热固性膜的组合物，并且含有作为具有光取向基和羟基的化合物的组分（A），作为三聚氰胺甲醛树脂的组分（B）和组分（C ）是交联剂。

8. 发明授权

US08501393B2 Anti-reflective coating forming composition containing vinyl ether compound 失效
标题翻译：含有乙烯基醚化合物的抗反射涂层成型组合物
公开(公告)号：US08501393B2
公开(公告)日：2013-08-06
申请号：US11596391
申请日：2005-05-11
申请人： Tadashi Hatanaka , Shigeo Kimura , Tomoyuki Enomoto
发明人： Tadashi Hatanaka , Shigeo Kimura , Tomoyuki Enomoto
IPC分类号： G03F7/11 , G03F7/20 , G03F7/38 , H01L21/027
CPC分类号： G03F7/0392 , G03F7/091 , G03F7/095 , G03F7/11 , G03F7/168
摘要： There is provided an anti-reflective coating forming composition for use in a lithography of the manufacture of semiconductor devices and for forming an anti-reflective coating that can be developed with an alkaline developer for photoresist, and a method for forming photoresist pattern by use of the anti-reflective coating forming composition. The anti-reflective coating forming composition comprises a compound having at least two vinyl ether groups, an alkali-soluble compound having at least two phenolic hydroxy groups or carboxyl groups, a photoacid generator, and a solvent.
摘要翻译：提供了一种用于制造半导体器件的光刻中的抗反射涂层形成组合物和用于形成可用用于光致抗蚀剂的碱性显影剂显影的抗反射涂层，以及通过使用抗反射涂层形成组合物。抗反射涂层形成组合物包含具有至少两个乙烯基醚基团的化合物，具有至少两个酚羟基或羧基的碱溶性化合物，光致酸产生剂和溶剂。

9. 发明授权

US5587486A 1-amino-2-cyclohexene derivative and production process therefor 失效
标题翻译： 1-氨基-2-环己烯衍生物及其制备方法
公开(公告)号：US5587486A
公开(公告)日：1996-12-24
申请号：US497086
申请日：1995-06-30
申请人： Naoshi Nakagawa , Tadashi Hatanaka , Tatsuhiko Hayashibara , Manzo Shiono
发明人： Naoshi Nakagawa , Tadashi Hatanaka , Tatsuhiko Hayashibara , Manzo Shiono
IPC分类号： C07D209/88 , C07D307/79 , C07D333/54 , C07D209/56 , C07D333/50
CPC分类号： C07D307/79 , C07D209/88 , C07D333/54
摘要： 1-amino-2-cyclohexene compounds represented by the following formula (I): ##STR1## wherein the substituents are as defined in the specification, a process for preparing the compounds and their use as intermediates in the production of medicinal and agricultural agents is disclosed.
摘要翻译：由下式（I）表示的1-氨基-2-环己烯化合物：其中取代基如说明书中所定义，化合物的制备方法及其在制备药物和农药中的用途是：披露

10. 发明授权

US09238705B2 Composition for forming thermoset film having photo-alignment properties 有权
标题翻译：用于形成具有光取向特性的热固性膜的组合物
公开(公告)号：US09238705B2
公开(公告)日：2016-01-19
申请号：US13639727
申请日：2011-04-05
申请人： Tadashi Hatanaka , Mitsumasa Kondo
发明人： Tadashi Hatanaka , Mitsumasa Kondo
IPC分类号： C09K19/00 , C08G18/77 , C08G18/62 , G02F1/13363 , G02F1/1337 , G02B5/30
CPC分类号： C08G18/778 , C08G18/6216 , G02B5/3083 , G02F1/13363 , G02F1/133711 , G02F1/133788 , G02F2202/025 , Y10T428/1005
摘要： There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties, including: a component (A) that is a compound having a photo-aligning group and a hydroxy group; and a component (B) that is a silicon isocyanate compound. A liquid crystal alignment layer formed from the thermoset film forming composition, and an optical device with a retardation layer obtained by use of the thermoset film forming composition.
摘要翻译：提供了在形成固化膜之后表现出高耐溶剂性的材料，相对于聚合性液晶具有优异的光取向性，耐热性良好，透明度高，而且可溶于二醇系溶剂，酮类溶剂或乳液酯类溶剂，其可用于在形成固化膜期间制造滤色器的外涂层。一种用于形成具有光取向性能的热固性薄膜的组合物，包括：具有光取向基团和羟基的化合物的组分（A）; 和作为硅异氰酸酯化合物的成分（B）。由热固性膜形成组合物形成的液晶取向层，以及使用该热固性膜形成用组合物得到的具有延迟层的光学装置。

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