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    • 1. 发明授权
    • Semiconductor devices utilizing silicide reaction
    • 利用硅化物反应的半导体器件
    • US6051851A
    • 2000-04-18
    • US917675
    • 1997-08-26
    • Tadahiro OhmiMamoru MiyawakiYoshio NakamuraHiroshi SuzukiTakeo Yamashita
    • Tadahiro OhmiMamoru MiyawakiYoshio NakamuraHiroshi SuzukiTakeo Yamashita
    • H01L21/82G11C17/16H01L23/525H01L27/10H01L31/0328H01L31/0336H01L31/072H01L31/109
    • H01L27/112G11C17/16H01L23/5252H01L27/11206H01L2924/0002H01L2924/3011
    • Cheap semiconductor memory devices are provided so as to enable high-speed writing and reading but rarely to malfunction, thus being high in reliability. In a semiconductor device which comprises a plurality of cells each having a semiconductor layer between a pair of conductors, at least one of the pair of conductors is made of a metal, and the semiconductor layer comprises an amorphous silicon that can form a silicide region with the metal as reacting at a reaction rate of not less than 10 m/sec. Another device is characterized in that the semiconductor layer is an amorphous silicon, in that at least one of the pair of conductors is made of a metal silicide-reacting with the amorphous silicon, and in that the silicide region formed is conic. Another device is characterized in that the semiconductor layer is an amorphous silicon, in that at least one of the pair of conductors is formed of a metal silicide-reacting with the amorphous silicon, and in that a film-formed surface is produced without being exposed to an oxide atmosphere, between a step of forming the amorphus silicon and a step of forming the metal.
    • 提供廉价的半导体存储器件,以便能够进行高速写入和读取,但很少发生故障,因此可靠性高。 在包括多个单元的半导体器件中,每个单元各自在一对导体之间具有半导体层,所述一对导体中的至少一个导体由金属制成,并且所述半导体层包括可形成硅化物区域的非晶硅, 金属以不小于10m /秒的反应速率反应。 另一种器件的特征在于,半导体层是非晶硅,其中该对导体中的至少一个导体由与非晶硅反应的金属硅化物制成,并且形成的硅化物区域是圆锥形。 另一种器件的特征在于,半导体层是非晶硅,其中该对导体中的至少一个导体由与非晶硅反应的金属硅化物形成,并且由此形成膜形成表面而不暴露 在氧化物气氛之间,形成无定形硅的步骤和形成金属的步骤。