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    • 4. 发明授权
    • Recording apparatus
    • 记录装置
    • US08628170B2
    • 2014-01-14
    • US13072751
    • 2011-03-27
    • Kengo TakedaShigeki Kato
    • Kengo TakedaShigeki Kato
    • B41J2/165
    • B41J2/16538B41J2/16544
    • A recording apparatus, including: a recording head; a conveying member for conveying a recording medium in a conveyance direction; a wiper whose distal end is to come into contact with and separate away from the surface; a wiper driving mechanism for driving the wiper to conduct a wiping operation in which the distal end is brought into contact with the surface and the wiper is moved relative to the surface in an intersecting direction that intersects the conveyance direction for wiping the surface; a retainer for giving, to the conveying member, a retaining force for preventing a movement of the conveying member in the intersecting direction; and a controller for controlling the retainer to give the retaining force to the conveying member and for controlling the driving mechanism to conduct the wiping operation, in a state in which the movement of the conveying member in the conveyance direction is halted.
    • 一种记录装置,包括:记录头; 用于在传送方向上传送记录介质的传送构件; 一个其前端与表面接触并远离表面的擦拭器; 擦拭器驱动机构,其用于驱动所述擦拭器进行所述前端与所述表面接触的擦拭动作,并且所述擦拭器相对于所述表面沿与所述输送方向相交的交叉方向移动以擦拭所述表面; 保持器,用于向输送构件施加用于防止输送构件沿相交方向移动的保持力; 以及控制器,用于在传送构件在传送方向上的移动被停止的状态下,控制保持器以向保持件施加保持力并控制驱动机构进行擦拭操作。
    • 5. 发明授权
    • Ink jet recording apparatus
    • 喷墨记录装置
    • US08596778B2
    • 2013-12-03
    • US12892718
    • 2010-09-28
    • Shigeki Kato
    • Shigeki Kato
    • B41J2/01B41J29/38
    • B41J11/007
    • An ink jet recording apparatus may include a conveying device configured to move a conveying belt including a conveying surface to convey a recording medium. The ink jet recording apparatus may include a recording head configured to discharge ink onto the recording medium. The ink jet recording apparatus may include an attraction device including first and second electrodes facing a surface opposite the conveying surface and configured to apply a voltage between the first and second electrodes. The ink jet recording apparatus may include a contact member which comes into contact with the conveying surface. The first and second electrodes may be disposed at a distance from each other in the width direction of the conveying belt. A contacting area of the conveying surface with which the contact member comes into contact may not extend over the first and second electrodes in the width direction.
    • 喷墨记录装置可以包括:输送装置,其构造成移动包括输送表面的输送带以输送记录介质。 喷墨记录装置可以包括将墨水排放到记录介质上的记录头。 喷墨记录装置可以包括吸引装置,其包括面向与输送表面相对的表面的第一电极和第二电极,并且被配置为在第一和第二电极之间施加电压。 喷墨记录装置可以包括与输送表面接触的接触构件。 第一和第二电极可以在输送带的宽度方向上彼此间隔一定距离设置。 与接触构件接触的输送面的接触区域不能在第一和第二电极的宽度方向上延伸。
    • 6. 发明授权
    • Double pass interferometer with tilted mirrors
    • 带倾斜镜的双通道干涉仪
    • US08582112B2
    • 2013-11-12
    • US13608960
    • 2012-09-10
    • Shigeki Kato
    • Shigeki Kato
    • G01B11/02
    • G01B9/02018G01B9/02059G01B11/14
    • An interferometer of the present invention includes a PBS2 which splits light into reference light and measurement light, a reference mirror which reflects the reference light entering the reference mirror from a first direction, a measurement mirror which reflects the measurement light entering the measurement mirror from a second direction, a lens system which reflected lights from the reference mirror and the measurement light enter, a reflective device which reflects light from the lens system, and a light receiving device which receives multiplexed light, wherein the reference mirror and the measurement mirror are in a conjugate relation with respect to the reflective device, and at least one of the reference mirror and the measurement mirror is tilted so that its normal direction differs from the first and the second direction.
    • 本发明的干涉仪包括将光分解为参考光和测量光的PBS2,从第一方向反射参考反射镜的参考光的参考反射镜,将来自测量镜的测量光反射的测量镜 第二方向,反射来自参考反射镜的光和测量光进入的透镜系统,反射来自透镜系统的光的反射装置和接收复用光的光接收装置,其中参考反射镜和测量镜处于 相对于反射装置的共轭关系,并且参考镜和测量镜中的至少一个被倾斜,使得其法线方向与第一和第二方向不同。
    • 8. 发明申请
    • Inkjet Recording Apparatus
    • 喷墨记录装置
    • US20100245432A1
    • 2010-09-30
    • US12705241
    • 2010-02-12
    • Kengo TakedaShigeki Kato
    • Kengo TakedaShigeki Kato
    • B41J29/38
    • B41J2/16552B41J29/17B41J29/38
    • An inkjet recording apparatus includes at least one inkjet head having an ejection surface, a feeding mechanism which includes a feed member having a feed surface that is opposed to the ejection surface and which drives the feed member to feed a recording medium on the feed surface in a feeding direction, a wiper blade which removes ink that is adhered to the feed surface by contacting the feed surface, a judging portion which judges whether cleaning of the feed surface is necessary, and a controller which controls the at least one inkjet head and the feeding mechanism, in a case where the judging portion judges that the cleaning of the feed surface is necessary, to perform a first operation in which ink is ejected to the feed surface and a second operation in which the feed member is driven.
    • 喷墨记录装置包括具有喷射表面的至少一个喷墨头,进给机构包括具有与喷射表面相对的进给表面的进给构件,并且驱动进给构件以在进给表面上供给记录介质 进给方向,通过接触供给面去除附着于供给面的油墨的刮水片,判断是否需要进行供给面的清洗的判断部,以及控制上述至少一个喷墨头和 进给机构,在所述判断部判断需要对所述进给面进行清洁的情况下,进行向所述进给面喷射墨的第一操作和所述进给部件被驱动的第二操作。
    • 9. 发明授权
    • Method of detecting porous material defect
    • 检测多孔材料缺陷的方法
    • US07755750B2
    • 2010-07-13
    • US12235204
    • 2008-09-22
    • Shigeki Kato
    • Shigeki Kato
    • G01N21/00
    • G01N15/08G01N15/0205G01N15/082G01N21/95692G01N2015/084
    • A method of detecting a defect in a porous body (1) includes applying a light beam (13) to fine particles (12) discharged from the porous body (1), and detecting the light and shade of scattered light caused by the fine particles (12) to detect the position of a defect, wherein the light and shade of the scattered light is detected at a position facing the light beam (13). When a light source that emits the light beam (13) is defined as an origin (11), a position in a plane formed by the light beam (13) corresponding to a center of an end face of the porous body (1) through which the fine particles (12) are discharged is defined as a center point (C2), a straight line that extends from the origin (11) toward the center point (C2) is defined as 11, a straight line that extends from the origin (11) toward a detection position (16) of the scattered light is defined as 12, and the angle formed by the straight line 11 and the straight line 12 in the plane formed by the light beam (13) is defined as θ1, the light and shade of the scattered light is preferably detected at a detection position (16) at which the angle θ1 is 0 to 80°. According to this method, a defect can be detected with high sensitivity.
    • 检测多孔体(1)中的缺陷的方法包括向从多孔体(1)排出的细颗粒(12)施加光束(13),并检测由微粒引起的散射光的光和阴影 (12),以检测缺陷的位置,其中在面向光束(13)的位置处检测散射光的光和阴影。 当发射光束(13)的光源被定义为原点(11)时,由与多孔体(1)的端面的中心对应的光束(13)形成的平面中的位置通过 将细粒子(12)排出的部分定义为中心点(C2),将从原点(11)朝向中心点(C2)延伸的直线定义为11,从原点延伸的直线 (11)被定义为12,并且由光束(13)形成的平面中由直线11和直线12形成的角度被定义为< 1 优选地,在角度θ为0〜80°的检测位置(16)检测散射光的亮度和阴影。 根据该方法,可以高灵敏度地检测缺陷。
    • 10. 发明授权
    • Absolute position measurement apparatus
    • 绝对位置测量装置
    • US07554671B2
    • 2009-06-30
    • US11459861
    • 2006-07-25
    • Hidejiro KadowakiKo IshizukaShigeki Kato
    • Hidejiro KadowakiKo IshizukaShigeki Kato
    • G01B11/02
    • G01B9/02012G01B9/02007G01B9/02018G01B9/0209G01B2290/45G01B2290/70
    • A first beam having high coherence and a second beam having low coherence and having a central wavelength difference from that of the first beam are multiplexed onto the same optical axis. First and second multiplexed beams obtained by beam splitting are emitted at a measurement reflection plane and a reference plane, respectively. The reflected first and second multiplexed beams are multiplexed and interfere with each other. The interference generates a first interference signal that is obtained from the first beams at the interference unit and that relates to information on the distance to the measurement reflection plane and a second interference signal that is obtained from the second beams. The first and second interference signals are used to carry out calculations for determining the position of a measurement origin for the measurement reflection plane.
    • 具有高相干性的第一光束和具有低相干性并且具有与第一光束的中心波长不同的第二光束被复用到同一光轴上。 通过分束获得的第一和第二多路复用波束分别在测量反射平面和参考平面处发射。 反射的第一和第二多路复用波束被多路复用并彼此干扰。 干扰产生从干扰单元的第一波束获得的第一干扰信号,其涉及到与测量反射平面的距离的信息和从第二波束获得的第二干扰信号。 第一和第二干涉信号用于执行用于确定测量反射平面的测量原点的位置的计算。