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    • 2. 发明申请
    • Solid-state imaging device and manufacturing method thereof
    • 固态成像装置及其制造方法
    • US20060157756A1
    • 2006-07-20
    • US11263973
    • 2005-11-02
    • Syouji TanakaRyohei MiyagawaKazunari KogaTatsuya HirataHiroki Nagasaki
    • Syouji TanakaRyohei MiyagawaKazunari KogaTatsuya HirataHiroki Nagasaki
    • H01L31/113H01L21/00
    • H01L27/14643H01L27/14632H01L27/14687H01L27/14689H01L31/035236
    • An object of the present invention is to provide a solid-state imaging device which can increase the amount of signal charge accumulation in a photodiode, and a manufacturing method thereof. The solid-state imaging device according to the present invention includes: a gate electrode formed on a p-type semiconductor substrate; an n-type signal accumulation region which accumulates the signal charge obtained through a photo-electrical conversion, and is formed in the semiconductor substrate so that a portion of the signal accumulation region is positioned below the gate electrode; an n-type drain region which is positioned in the semiconductor substrate so that the n-type drain region is positioned opposite the signal accumulation region across the gate electrode; and a p-type punch-through stopper region which has a higher impurity concentration than the semiconductor substrate, and is formed in the semiconductor substrate so that the p-type punch-through region is positioned below the drain region, wherein an end of the punch-through stopper region is positioned closer to the signal accumulation region than the end of the drain region.
    • 本发明的目的是提供一种能够增加光电二极管中的信号电荷积聚量的固态成像装置及其制造方法。 根据本发明的固态成像装置包括:形成在p型半导体衬底上的栅电极; 累积通过光电转换获得的信号电荷的n型信号存储区域,并形成在半导体衬底中,使得信号存储区域的一部分位于栅电极下方; 位于所述半导体衬底中的n型漏极区,使得所述n型漏极区域与所述栅电极相交的所述信号聚集区域相对; 以及具有比半导体衬底更高的杂质浓度的p型穿通止挡区域,并且形成在半导体衬底中,使得p型穿通区域位于漏极区域的下方,其中, 穿通停止区域比漏极区域的端部更靠近信号聚集区域。
    • 4. 发明申请
    • Solid-state image sensing apparatus and fabrication method therefor
    • 固态摄像装置及其制造方法
    • US20070241374A1
    • 2007-10-18
    • US11651022
    • 2007-01-09
    • Tatsuya HirataShouzi TanakaRyohei MiyagawaKazunari Koga
    • Tatsuya HirataShouzi TanakaRyohei MiyagawaKazunari Koga
    • H01L31/113
    • H01L27/14643H01L27/14632H01L27/14687H01L27/14689
    • A solid-state image sensing apparatus has a signal storage portion of a second conductivity type provided within a semiconductor substrate or a well each of a first conductivity type to store a signal charge obtained through a photoelectric conversion, a surface shield layer of the first conductivity type provided in a surface portion of the semiconductor substrate or the well which is located above the signal storage portion, a gate electrode provided over the semiconductor substrate or the well in adjacent relation to at least one end of the signal storage portion, and a drain region of the second conductivity type provided in a surface portion of the semiconductor substrate or the well which is on the side opposite to the surface shield layer when viewed from the gate electrode. A read control layer of the first conductivity type is further provided in a surface portion of the semiconductor substrate or the well which is located under the gate electrode in adjacent relation to one end of the surface shield layer.
    • 固态摄像装置具有设置在半导体衬底内的第二导电类型的信号存储部分或者是通过光电转换获得的信号电荷的第一导电类型的阱,第一导电性的表面屏蔽层 设置在半导体衬底或位于信号存储部分上方的阱的表面部分中的栅极电极,设置在半导体衬底或阱上的栅电极相邻于信号存储部分的至少一端,漏极 所述第二导电类型的区域设置在所述半导体衬底或所述阱的表面部分中,所述第二导电类型的区域在从所述栅电极观察时位于与所述表面屏蔽层相反的一侧。 第一导电类型的读取控制层进一步设置在半导体衬底的表面部分中,或位于栅电极下方的与邻近表面屏蔽层的一端相邻的阱中。
    • 8. 发明授权
    • Responder in movable-object identification system
    • 可移动物体识别系统中的响应者
    • US5247305A
    • 1993-09-21
    • US918123
    • 1992-07-23
    • Tatsuya HirataYoshiyuki Kago
    • Tatsuya HirataYoshiyuki Kago
    • G01S13/75G06K7/00
    • G06K7/0008G01S13/758
    • A movable-object identification system includes an interrogator for transmitting an interrogation signal, and a responder mounted on a movable object for transmitting a reply signal in response to the interrogation signal. The reply signal contains identification information. The responder includes an antenna for receiving the interrogation signal from the interrogator and for radiating the reply signal; and an input device connected to the antenna for receiving an electric power of the interrogation signal received by the antenna. The input device includes a receiving element for dividing the received electric power into a first separation electric power and a second separation electric power corresponding to a traveling and reflected wave of the interrogation signal, respectively. The receiving element has an impedance. The responder further includes a generating device for generating predetermined identification information using the first separation electric power; and a modulating device, connected in parallel with the input device and connected to the antenna, for varying the impedance of the receiving element in accordance with the generated identification information, for modulating the second separation electric power of the interrogation signal in accordance with the identification information to generate the reply signal, and for feeding the reply signal to the antenna.
    • 可移动物体识别系统包括用于发送询问信号的询问器,以及安装在可移动物体上的应答器,用于响应询问信号发送应答信号。 答复信号包含识别信息。 应答器包括用于从询问器接收询问信号并发射回复信号的天线; 以及连接到天线的输入装置,用于接收由天线接收的询问信号的电力。 所述输入装置包括:接收元件,用于将接收到的电力分别分成与所述询问信号的行进和反射波相对应的第一分离电力和第二分离电力。 接收元件具有阻抗。 响应者还包括用于使用第一分离电力产生预定识别信息的生成装置; 以及与输入装置并联连接并连接到天线的调制装置,用于根据所生成的识别信息改变接收元件的阻抗,用于根据识别信号调制询问信号的第二分离电力 用于生成应答信号的信息,以及将该应答信号馈送到天线。
    • 10. 发明申请
    • Element for solid-state imaging device
    • 用于固态成像装置的元件
    • US20070200148A1
    • 2007-08-30
    • US11653919
    • 2007-01-17
    • Tatsuya HirataShouzi Tanaka
    • Tatsuya HirataShouzi Tanaka
    • H01L29/768
    • H01L27/1463H01L27/14609H01L27/14623
    • In an element for a MOS type solid-state imaging device, a leakage current caused by a stress generated in a vicinity of an element isolation region having an STI structure is reduced. The element for the MOS type solid-state imaging device comprises: a signal accumulation region 102, of a second conductivity type, provided in an interior of a semiconductor substrate or well 101 of a first conductivity type, for accumulating a signal charge generated by performing photoelectric convention; agate electrode 104 provided on the semiconductor substrate or well 101; a drain region 105, of a second conductivity type, provided on a surface portion, of the semiconductor substrate or well 101, on which the gate electrode is formed; and an element isolation region 201 provided on the surface portion, of the semiconductor substrate or well 101, on which the gate electrode is formed. The element isolation region 201 has the STI structure, and a cavity 202 is formed in an interior of the element isolation region 201.
    • 在用于MOS型固态成像器件的元件中,由具有STI结构的元件隔离区域附近产生的应力引起的漏电流减小。 用于MOS型固态成像器件的元件包括:设置在半导体衬底或第一导电类型的阱101的内部的第二导电类型的信号聚集区域102,用于累积通过执行产生的信号电荷 光电会议; 设置在半导体衬底或阱101上的玛瑙电极104; 设置在其上形成栅电极的半导体衬底或阱101的表面部分上的第二导电类型的漏极区域105; 以及设置在形成有栅电极的半导体衬底或阱101的表面部分上的元件隔离区域201。 元件隔离区域201具有STI结构,并且在元件隔离区域201的内部形成空腔202。