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1. 发明授权

US4631169A Alloys for exhaust valves 失效
标题翻译：排气阀合金
公开(公告)号：US4631169A
公开(公告)日：1986-12-23
申请号：US719102
申请日：1985-04-02
申请人： Susumu Isobe , Kenkichi Matsunaga , Yoshiaki Takagi , Norikatsu Sato
发明人： Susumu Isobe , Kenkichi Matsunaga , Yoshiaki Takagi , Norikatsu Sato
IPC分类号： C22C19/05 , F01L3/02 , F02B1/04
CPC分类号： C22C19/058 , F01L3/02 , F02B1/04
摘要： An alloy for use in exhaust valves is disclosed, which consists by weight percentage of 0.01.about.0.15% of C, not more than 2.0% of Si, not more than 2.5% of Mn, 53.about.65% of Ni, 15.about.25% of Cr, 0.3.about.3.0% of Nb, 2.0.about.3.5% of Ti, 0.2.about.1.5% of Al, 0.0010.about.0.020% of B, and the remainder being substantially Fe. If necessary, the alloy further contains at least one element selected from 0.001.about.0.030% of Mg, 0.001.about.0.030% of Ca and 0.001.about.0.050% of REM.
摘要翻译：公开了一种用于排气阀的合金，其重量百分比为0.01％C，不超过2.0％的Si，不超过Mn的2.5％，53％的Ni为65％，15％为25％的Cr，0.3差异Nb的3.0％，2.0差异3.5％的Ti，0.2差异的1.5％的Al，0.0010差异为0.020％，其余为实质上的Fe。如果需要，合金还含有至少一种元素，选自0.001％Mg，0.001％，0.030％的Ca和0.001％的差异为0.050％的REM。

2. 发明申请

US20100203250A1 DEVELOPING DEVICE, DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US20100203250A1
公开(公告)日：2010-08-12
申请号：US12699228
申请日：2010-02-03
申请人： Norikatsu Sato , Hirofumi Takeguchi
发明人： Norikatsu Sato , Hirofumi Takeguchi
IPC分类号： B05D1/36 , B05C5/00
CPC分类号： H01L21/6715 , G03F7/3028
摘要： A developer nozzle supplies a developer onto the surface of a substrate rotating around a vertical axis, while a pure water nozzle supplies pure water onto the surface of the rotating substrate. The pure water nozzle is spaced apart from the developer nozzle and located on an outer side of the substrate with respect to the developer nozzle. The pure water restricts flow of the developer on the substrate and causes the developer to spread toward a clockwise side of the substrate when the substrate rotates in a clockwise direction. A liquid film containing the developer and the pure water is formed on the substrate. The developer nozzle and the pure water nozzle are spaced apart from each other to suppress splattering of the developer and the pure water due to collision of the developer with the pure water.
摘要翻译：显影剂喷嘴将显影剂供给到围绕垂直轴线旋转的基板的表面上，而纯水喷嘴将纯水供应到旋转基板的表面上。纯水喷嘴与显影剂喷嘴间隔开并且相对于显影剂喷嘴位于基板的外侧。纯水限制衬底上显影剂的流动，并且当衬底沿顺时针方向旋转时，使显影剂向衬底的顺时针侧扩展。在基板上形成含有显影剂和纯水的液膜。显影剂喷嘴和纯水喷嘴彼此间隔开以抑制由于显影剂与纯水的碰撞而引起的显影剂和纯水的飞溅。

3. 发明授权

US08440266B2 Developing device, developing method and storage medium 有权
标题翻译：开发设备，开发方法和存储介质
公开(公告)号：US08440266B2
公开(公告)日：2013-05-14
申请号：US12699228
申请日：2010-02-03
申请人： Norikatsu Sato , Hirofumi Takeguchi
发明人： Norikatsu Sato , Hirofumi Takeguchi
IPC分类号： B05D1/36 , B05D7/00 , B05D3/12 , B05C11/00 , B05C11/02 , B05B7/06
CPC分类号： H01L21/6715 , G03F7/3028
摘要： A developer nozzle supplies a developer onto the surface of a substrate rotating around a vertical axis, while a pure water nozzle supplies pure water onto the surface of the rotating substrate. The pure water nozzle is spaced apart from the developer nozzle and located on an outer side of the substrate with respect to the developer nozzle. The pure water restricts flow of the developer on the substrate and causes the developer to spread toward a clockwise side of the substrate when the substrate rotates in a clockwise direction. A liquid film containing the developer and the pure water is formed on the substrate. The developer nozzle and the pure water nozzle are spaced apart from each other to suppress splattering of the developer and the pure water due to collision of the developer with the pure water.
摘要翻译：显影剂喷嘴将显影剂供给到围绕垂直轴线旋转的基板的表面上，而纯水喷嘴将纯水供应到旋转基板的表面上。纯水喷嘴与显影剂喷嘴间隔开并且相对于显影剂喷嘴位于基板的外侧。纯水限制衬底上显影剂的流动，并且当衬底沿顺时针方向旋转时，使显影剂向衬底的顺时针侧扩展。在基板上形成含有显影剂和纯水的液膜。显影剂喷嘴和纯水喷嘴彼此间隔开以抑制由于显影剂与纯水的碰撞而引起的显影剂和纯水的飞溅。

4. 发明授权

US06593045B2 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US06593045B2
公开(公告)日：2003-07-15
申请号：US09902159
申请日：2001-07-11
申请人： Norikatsu Sato , Kunie Ogata , Yoshio Kimura , Hiroshi Tomita , Seiji Nakashima , Hidehiko Kamiya
发明人： Norikatsu Sato , Kunie Ogata , Yoshio Kimura , Hiroshi Tomita , Seiji Nakashima , Hidehiko Kamiya
IPC分类号： G03F900
CPC分类号： H01L21/67161 , G01N21/9501 , H01L21/67178 , H01L21/67184 , H01L21/67778 , H01L21/67781 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： A cassette station, a processing station having a coating unit and a developing unit, and an inspecting station having a film thickness inspecting apparatus and a defect inspecting apparatus are disposed in the direction approximately perpendicular to the direction of the disposition of cassettes of the cassette station in such a manner that the inspecting station is disposed midway between the cassette station and the processing station. In the structure, the inspecting station and the processing station are connected and wafers are automatically transferred among the stations, operations from the substrate process to the inspection can be simplified and the time period necessary therefore can be shortened.
摘要翻译：具有涂布单元和显影单元的盒式磁带站，具有膜厚度检查装置和缺陷检查装置的检查站沿大致垂直于盒式磁带机的盒的方向的方向设置以这样的方式，使得检查站位于盒站和处理站之间的中间。在结构中，检测站和处理站连接，晶片自动转移到站之间，可以简化从基板处理到检查的操作，从而可以缩短所需的时间。

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