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1. 发明授权

US08186297B2 Nozzle and apparatus and method for processing substrate using the nozzle 有权
标题翻译：喷嘴以及使用喷嘴处理基板的设备和方法
公开(公告)号：US08186297B2
公开(公告)日：2012-05-29
申请号：US12620699
申请日：2009-11-18
申请人： Sung-Woon Park , Sang Uk Park , Jae Seung Go
发明人： Sung-Woon Park , Sang Uk Park , Jae Seung Go
IPC分类号： B05C11/02 , B05B7/06
CPC分类号： H01L21/67178 , H01L21/6715
摘要： A substrate processing apparatus is provided. The substrate processing apparatus includes a substrate supporting member including a spin head on which a substrate is placed, a nozzle discharging processing liquid to the substrate placed on the spin head, and a processing liquid supplying source supplying the processing liquid to the nozzle. The nozzle includes a nozzle main body that has a plurality of discrete discharging openings and an integration discharging opening. The discrete discharging openings have a slit-shaped cross section having a first length and are arrayed in series in a predetermined direction. The integration discharging opening is formed by connecting the discrete discharging openings to each other in a single slot shape having a length greater than the first length, and finally discharges the processing liquid.
摘要翻译：提供了一种基板处理装置。基板处理装置包括：衬底支撑构件，其包括其上放置有衬底的旋转头，向放置在旋转头上的衬底的喷嘴排出处理液;以及将处理液供给到喷嘴。喷嘴包括具有多个离散排出口和一体排放口的喷嘴主体。离散排出口具有第一长度的狭缝状横截面并且沿预定方向串联排列。集成排放口通过以大于第一长度的长度的单个狭槽形状彼此连接而形成，最后将处理液排出。

2. 发明授权

US09184068B2 Substrate treating apparatus for adjusting temperature of treating liquid 有权
标题翻译：用于调节处理液温度的底物处理装置
公开(公告)号：US09184068B2
公开(公告)日：2015-11-10
申请号：US12621022
申请日：2009-11-18
申请人： Sang Uk Park , Jae Seung Go
发明人： Sang Uk Park , Jae Seung Go
IPC分类号： B05B7/16 , H01L21/67 , B05C11/10 , B05B9/00 , G03F7/16
CPC分类号： H01L21/67103 , B05B9/002 , B05C11/1042 , G03F7/162 , H01L21/67051 , H01L21/6708 , H01L21/67109 , H01L21/6715 , H05B2203/032
摘要： Provided are a treating liquid supplying unit, and a substrate processing apparatus and method using the same. Temperature of treating liquid in a treating liquid pipe built into a nozzle arm can be maintained, through heat transfer between the nozzle arm and a standby port and heat transfer between the nozzle arm and a nozzle moving unit, while the nozzle arm is standing by in standby position, while processing is being performed at a processing position, and during movement between the standby position and a processing position. Thus, treating liquid supplied from a nozzle can be maintained at a predetermined temperature by the treating liquid supplying unit, and the substrate processing apparatus and method using the same.
摘要翻译：提供处理液供给单元，以及使用该处理液供给单元的基板处理装置和方法。通过喷嘴臂和备用口之间的热传递以及喷嘴臂和喷嘴移动单元之间的热传递，可以保持内置在喷嘴臂中的处理液管中的处理液的温度，同时喷嘴臂处于待机位置，同时在处理位置执行处理，并且在待机位置和处理位置之间移动期间。因此，由喷嘴供给的处理液体可以通过处理液体供给单元和基板处理装置及其使用方法保持在预定温度。

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