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    • 1. 发明授权
    • Method of fabricating a magnetic shift register
    • 制造磁移位寄存器的方法
    • US07598097B2
    • 2009-10-06
    • US12114636
    • 2008-05-02
    • Tze-chiang ChenStuart S. P. Parkin
    • Tze-chiang ChenStuart S. P. Parkin
    • H01L21/00
    • H01L29/82G11C11/14G11C19/02G11C19/0808G11C19/0841
    • A magnetic data track used in a magnetic shift register memory system may be fabricated by forming a multilayered stack of alternating dielectric and/or silicon layers. A trench is etched in the multi-layer stack structure. A selective etching process is used to corrugate the walls of trench. A seed layer is applied to the walls and bottom of the trench; the seed layer is covered with a magnetic layer. The trench is filled with an insulating material. A patterned layer is applied and portions of insulating material exposed by the pattern are removed, forming holes. Magnetic material and seed layer exposed in holes is selectively removed. The holes are filled with insulating material and connecting leads are attached to data tracks.
    • 用于磁移位寄存器存储器系统的磁数据磁道可以通过形成交替的电介质层和/或硅层的多层叠层来制造。 在多层堆叠结构中蚀刻沟槽。 使用选择性蚀刻工艺来使沟槽的壁波纹化。 种子层施加到沟槽的壁和底部; 种子层被磁性层覆盖。 沟槽填充绝缘材料。 施加图案层,去除由图案露出的部分绝缘材料,形成孔。 选择性地除去暴露在孔中的磁性材料和种子层。 孔中填充绝缘材料,连接引线连接到数据轨道。
    • 2. 发明授权
    • Method of fabricating a magnetic shift register
    • 制造磁移位寄存器的方法
    • US07416905B2
    • 2008-08-26
    • US11252384
    • 2005-10-17
    • Tze-chiang ChenStuart S. P. Parkin
    • Tze-chiang ChenStuart S. P. Parkin
    • H01L21/00
    • H01L29/82G11C11/14G11C19/02G11C19/0808G11C19/0841
    • A magnetic data track used in a magnetic shift register memory system may be fabricated by forming a multilayered stack of alternating dielectric and/or silicon layers. A trench is etched in the multi-layer stack structure. A selective etching process is used to corrugate the walls of trench. A seed layer is applied to the walls and bottom of the trench; the seed layer is covered with a magnetic layer. The trench is filled with an insulating material. A patterned layer is applied and portions of insulating material exposed by the pattern are removed, forming holes. Magnetic material and seed layer exposed in holes is selectively removed. The holes are filled with insulating material and connecting leads are attached to data tracks.
    • 用于磁移位寄存器存储器系统的磁数据磁道可以通过形成交替的电介质层和/或硅层的多层叠层来制造。 在多层堆叠结构中蚀刻沟槽。 使用选择性蚀刻工艺来使沟槽的壁波纹化。 种子层施加到沟槽的壁和底部; 种子层被磁性层覆盖。 沟槽填充绝缘材料。 施加图案层,去除由图案露出的部分绝缘材料,形成孔。 选择性地除去暴露在孔中的磁性材料和种子层。 孔中填充绝缘材料,连接引线连接到数据轨道。
    • 8. 发明授权
    • Method of fabricating data tracks for use in a magnetic shift register memory device
    • 制造用于磁移位寄存器存储器件的数据轨道的方法
    • US06955926B2
    • 2005-10-18
    • US10788190
    • 2004-02-25
    • Tze-chiang ChenStuart S. P. Parkin
    • Tze-chiang ChenStuart S. P. Parkin
    • G11C11/15G11C19/02G11C19/08H01L21/00
    • G11C19/02G11C19/0841
    • A magnetic data track used in a magnetic shift register memory system may be fabricated by forming a multilayered stack of alternating dielectric and/or silicon layers. Vias of approximately 10 microns tall with a cross-section on the order of 100 nm×100 nm are etched in this multilayered stack of alternating layers. Vias may be etched form smooth or notched walls. Vias are filled by electroplating layers of alternating types of ferromagnetic or ferrimagnetic metals. The alternating ferromagnetic or ferrimagnetic layers are comprised of magnetic materials with different magnetization or magnetic exchange or magnetic anisotropies. These different magnetic characteristics allow the pinning of magnetic domain walls at the boundaries between these layers. Alternatively, vias are filled with a homogeneous ferromagnetic material. Magnetic domain walls are formed by the discontinuity in the ferromagnetic or ferromagnetic material that occurs at the notches or at the protuberances along the via walls.
    • 用于磁移位寄存器存储器系统的磁数据磁道可以通过形成交替的电介质层和/或硅层的多层叠层来制造。 在该多层交替层中蚀刻约10微米高的具有100nm×100nm量级的横截面的通孔。 通孔可能被蚀刻形成平滑或缺口的墙壁。 通孔由交替类型的铁磁或亚铁磁性金属的电镀层填充。 交替的铁磁或亚铁磁层由具有不同磁化或磁交换或磁各向异性的磁性材料组成。 这些不同的磁特性允许磁畴壁在这些层之间的边界处的钉扎。 或者,通孔用均匀的铁磁材料填充。 磁畴壁由铁氧体或铁磁材料中的不连续部分形成,这些不规则发生在沿着通孔壁的凹口或凸起处。
    • 9. 发明授权
    • System and method for writing to a magnetic shift register
    • 用于写入磁移位寄存器的系统和方法
    • US06898132B2
    • 2005-05-24
    • US10458147
    • 2003-06-10
    • Stuart S. P. Parkin
    • Stuart S. P. Parkin
    • G11C11/14G11C19/08H01F10/14H01F41/26G11C7/00
    • G11C19/0841G11C11/14G11C19/0808H01F10/14H01F41/26
    • A writing device can change the direction of the magnetic moment in a magnetic shift register, thus writing information to the domains or bits in the magnetic shift register. Associated with each domain wall are large magnetic fringing fields. The domain wall concentrates the change in magnetism from one direction to another in a very small space. Depending on the nature of the domain wall, very large dipolar fringing fields can emanate from the domain wall. This characteristic of magnetic domains is used to write to the magnetic shift register. When the domain wall is moved close to another magnetic material, the large fields of the domain wall change the direction of the magnetic moment in the magnetic material, effectively “writing” to the magnetic material.
    • 写装置可以改变磁移位寄存器中磁矩的方向,从而将信息写入磁移位寄存器中的域或位。 与每个畴壁相关的是大磁场。 畴壁在非常小的空间中将磁性的变化从一个方向集中到另一个方向。 根据畴壁的性质,非常大的偶极边缘场可以从畴壁发出。 磁畴的这种特性用于写入磁性移位寄存器。 当畴壁移动靠近另一种磁性材料时,畴壁的大场改变磁性材料中磁矩的方向,有效地“写入”磁性材料。