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1. 发明申请

US20090021717A1 Radiation Detector, Method of Manufacturing a Radiation Detector, and Lithographic Apparatus Comprising a Radiation Detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包含辐射检测器的平版印刷设备
公开(公告)号：US20090021717A1
公开(公告)日：2009-01-22
申请号：US12144874
申请日：2008-06-24
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus, Joshepus, Maria Kemper , Marc Antonius, Maria Haast , Gerardus Wilhelmus, Petrus, Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas, Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus, Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus, Joshepus, Maria Kemper , Marc Antonius, Maria Haast , Gerardus Wilhelmus, Petrus, Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas, Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus, Maria Scholtes
IPC分类号： G03B27/80 , H01L31/00 , H01L21/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.
摘要翻译：放射线检测器，制造放射线检测器的方法以及包括放射线检测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对10-200nm和带电粒子之间的辐射波长敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

2. 发明授权

US08426831B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
标题翻译：放射线检测器，辐射检测器的制造方法以及包括放射线检测器的光刻设备
公开(公告)号：US08426831B2
公开(公告)日：2013-04-23
申请号：US13399560
申请日：2012-02-17
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.
摘要翻译：在一个实施例中，提供了一种包括至少一个检测器的组件。所述至少一个检测器中的每一个包括具有第一导电类型的掺杂区的衬底，位于衬底上的第二导电类型的掺杂剂材料层，形成在衬底内并与掺杂剂层接触的扩散层材料和衬底的掺杂区域，其中代表扩散层的掺杂材料浓度的掺杂分布从衬底的掺杂区域增加到掺杂剂材料层，第一电极连接到掺杂剂材料和连接到该衬底的第二电极。扩散层被布置成形成辐射敏感表面。

3. 发明授权

US07586108B2 Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包括放射线检测器的光刻设备
公开(公告)号：US07586108B2
公开(公告)日：2009-09-08
申请号：US11819160
申请日：2007-06-25
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： H01L31/103 , G03F7/7085 , G03F7/70958 , H01L31/02161 , H01L31/022408 , H01L31/022416 , H01L31/1185 , H01L31/1804 , Y02E10/547
摘要： The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.
摘要翻译：本发明涉及一种辐射检测器，一种制造辐射探测器的方法和一种包括辐射探测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对波长在10-200nm之间的辐射敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

4. 发明申请

US20080315121A1 Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector 有权
标题翻译：辐射检测器，辐射检测器的制造方法和包括放射线检测器的光刻设备
公开(公告)号：US20080315121A1
公开(公告)日：2008-12-25
申请号：US11819160
申请日：2007-06-25
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00 , H01L31/028 , H01L31/18
CPC分类号： H01L31/103 , G03F7/7085 , G03F7/70958 , H01L31/02161 , H01L31/022408 , H01L31/022416 , H01L31/1185 , H01L31/1804 , Y02E10/547
摘要： The invention relates to a radiation detector, a method of manufacturing a radiation detector and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation-sensitive surface. The radiation-sensitive surface is sensitive for radiation with a wavelength between 10-200 nm. The radiation detector has a silicon substrate, a dopant layer, a first electrode and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer which is in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the Silicon substrate.
摘要翻译：本发明涉及一种辐射检测器，一种制造辐射探测器的方法和一种包括辐射探测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对波长在10-200nm之间的辐射敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

5. 发明授权

US08324598B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
公开(公告)号：US08324598B2
公开(公告)日：2012-12-04
申请号：US13399560
申请日：2012-02-17
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Josephus Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
摘要： In one an embodiment, there is provided an assembly comprising at least one detector. Each of the at least one detector includes a substrate having a doped region of a first conduction type, a layer of dopant material of a second conduction type located on the substrate, a diffusion layer formed within the substrate and in contact with the layer of dopant material and the doped region of the substrate, wherein a doping profile, which is representative of a doping material concentration of the diffusion layer, increases from the doped region of the substrate to the layer of dopant material, a first electrode connected to the layer of dopant material, and a second electrode connected to the substrate. The diffusion layer is arranged to form a radiation sensitive surface.

6. 发明授权

US08138485B2 Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detector 有权
标题翻译：放射线检测器，辐射检测器的制造方法以及包括放射线检测器的光刻设备
公开(公告)号：US08138485B2
公开(公告)日：2012-03-20
申请号：US12144874
申请日：2008-06-24
申请人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Joseph Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
发明人： Stoyan Nihtianov , Arie Johan Van Der Sijs , Bearrach Moest , Petrus Wilhelmus Joseph Maria Kemper , Marc Antonius Maria Haast , Gerardus Wilhelmus Petrus Baas , Lis Karen Nanver , Francesco Sarubbi , Antonius Andreas Johannes Schuwer , Gregory Micha Gommeren , Martijn Pot , Thomas Ludovicus Maria Scholtes
IPC分类号： G21K5/00
CPC分类号： G03F7/7085 , H01L21/67225 , H01L31/103
摘要： A radiation detector, a method of manufacturing a radiation detector, and a lithographic apparatus comprising a radiation detector. The radiation detector has a radiation sensitive surface. The radiation sensitive surface is sensitive to radiation wavelengths between 10-200 nm and charged particles. The radiation detector has a silicon substrate, a dopant layer, a first electrode, and a second electrode. The silicon substrate is provided in a surface area at a first surface side with doping profile of a certain conduction type. The dopant layer is provided on the first surface side of the silicon substrate. The dopant layer has a first layer of dopant material and a second layer. The second layer is a diffusion layer in contact with the surface area at the first surface side of the silicon substrate. The first electrode is connected to dopant layer. The second electrode is connected to the silicon substrate.
摘要翻译：放射线检测器，制造放射线检测器的方法以及包括放射线检测器的光刻设备。辐射检测器具有辐射敏感表面。辐射敏感表面对10-200nm和带电粒子之间的辐射波长敏感。辐射检测器具有硅衬底，掺杂剂层，第一电极和第二电极。硅衬底在第一表面侧的表面区域设置有一定导电类型的掺杂分布。掺杂剂层设置在硅衬底的第一表面侧上。掺杂剂层具有掺杂剂材料的第一层和第二层。第二层是与硅衬底的第一表面侧的表面区域接触的扩散层。第一电极连接到掺杂剂层。第二电极连接到硅衬底。

7. 发明授权

US07304715B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译：公开了一种光刻设备。该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。

8. 发明授权

US07190437B2 Wireless signaling in a lithographic apparatus 有权
标题翻译：光刻设备中的无线信令
公开(公告)号：US07190437B2
公开(公告)日：2007-03-13
申请号：US10747615
申请日：2003-12-30
申请人： Hans Butler , Stoyan Nihtianov , Petrus Wilhelmus Josephus Maria Kemper
发明人： Hans Butler , Stoyan Nihtianov , Petrus Wilhelmus Josephus Maria Kemper
IPC分类号： G03B27/72 , G03B27/42 , G03B27/32
CPC分类号： G03F7/709 , G03B27/72 , G03F7/70991
摘要： A lithographic apparatus capable of wirelessly communicating control and power signals, is presented herein. In one embodiment, the apparatus comprises an illumination system to provide a beam of radiation, a support structure configured to support a patterning device that imparts the beam of radiation with a pattern in its cross-section, a substrate holder configured to hold a substrate, a projection system to project the patterned beam radiation onto a target portion of the substrate, and a wireless signaling system configured to transmit and receive information-bearing electromagnetic radiation. The wireless system comprises at least a transmitter to transmit the electromagnetic radiation and a first transducer configured to receive and convert the electromagnetic radiation into a first electrical signal containing the information which is used to control at least a portion of the support structure, the substrate table, the projection system, and the illumination system.
摘要翻译：本文提供了能够无线地传送控制和功率信号的光刻设备。在一个实施例中，该装置包括用于提供辐射束的照明系统，被配置为支撑图案形成装置的支撑结构，所述图案形成装置以其横截面中的图案赋予辐射束;衬底保持器，其构造成保持衬底，投影系统，用于将图案化的束辐射投影到基板的目标部分上;以及无线信号系统，被配置为发送和接收带信息的电磁辐射。所述无线系统至少包括用于传输电磁辐射的发射器和被配置为接收并将电磁辐射转换成包含用于控制支撑结构的至少一部分的信息的第一电信号的第一换能器，所述衬底台，投影系统和照明系统。

9. 发明授权

US07830495B2 Lithographic apparatus and position sensor 有权
标题翻译：平版印刷设备和位置传感器
公开(公告)号：US07830495B2
公开(公告)日：2010-11-09
申请号：US11822867
申请日：2007-07-10
申请人： Olaf Hubertus Wilhelmus Van Bruggen , Marcel Koenraad Marie Baggen , Johannes Roland Dassel , Remko Wakker , Stoyan Nihtianov , Frank Auer , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
发明人： Olaf Hubertus Wilhelmus Van Bruggen , Marcel Koenraad Marie Baggen , Johannes Roland Dassel , Remko Wakker , Stoyan Nihtianov , Frank Auer , Frits Van Der Meulen , Patrick David Vogelsang , Martinus Cornelis Reijnen , Tom Van Zutphen
IPC分类号： G03B27/42 , G01B7/14
CPC分类号： G03F7/70758 , G01D5/145 , G01D5/2451 , G03F7/70775
摘要： A lithographic apparatus having a stationary magnet motor to drive a support such as a substrate support or a patterning device support, may be provided with a measurement system to measure a position of the support in question, e.g., to provide a safety system to prevent a collision of the support with another part. The measurement system may be configured to measure a magnetic field strength of an alternating magnetic field generated by the magnet assembly of the stationary magnet motor, and/or measure generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measure light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter.
摘要翻译：具有用于驱动诸如衬底支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备可以设置有测量系统以测量所讨论的支撑件的位置，例如提供安全系统以防止支撑与另一部分的碰撞。测量系统可以被配置为测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度，和/或测量金属层中产生的涡流，屏蔽磁体组件与电感测量产生导致涡流的交变磁场的电磁体，和/或使用位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。

10. 发明申请

US20060033892A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060033892A1
公开(公告)日：2006-02-16
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Cadee , Joost Ottens , Jeroen Johannes Mertens , Frederick De Jong , Koen Goorman , Boris Menchtchikov , Marco Stavenga , Martin Smeets , Aschwin Lodewijk Van Meer , Bart Schoondermark , Patricius Tinnemans , Stoyan Nihtianov
发明人： Theodorus Cadee , Joost Ottens , Jeroen Johannes Mertens , Frederick De Jong , Koen Goorman , Boris Menchtchikov , Marco Stavenga , Martin Smeets , Aschwin Lodewijk Van Meer , Bart Schoondermark , Patricius Tinnemans , Stoyan Nihtianov
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译：公开了一种光刻设备。该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。

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