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    • 1. 发明授权
    • Dynamic chuck for semiconductor wafer or other substrate
    • 用于半导体晶片或其他基板的动态卡盘
    • US06167893A
    • 2001-01-02
    • US09248169
    • 1999-02-09
    • Steven W. TaatjesJohn F. Ostrowski
    • Steven W. TaatjesJohn F. Ostrowski
    • B08B302
    • H01L21/68728Y10S134/902Y10S414/141
    • A dynamic chuck for holding a semiconductor wafer or other substrate includes a plurality of clamping arms mounted radially about a central axis of rotation of the wafer or other substrate. Each of the arms is mounted such that it is free to pivot about a horizontal axis. As the chuck rotates the substrate, a centrifugal force acts on each of the arms, causing it to pivot about its axis of rotation and thereby forcing a holding surface of the arm against a peripheral edge of the substrate. The dynamic chuck is applicable to any type of device in which a semiconductor wafer or other substrate must be held in a centered positioned while it is being spun, including wafer cleaning and rinsing apparatus.
    • 用于保持半导体晶片或其它基板的动态卡盘包括围绕晶片或其他基板的中心旋转轴线径向安装的多个夹持臂。 每个臂被安装成使得其可绕水平轴自由枢转。 当卡盘旋转基板时,离心力作用在每个臂上,使得其绕其旋转轴线枢转,从而迫使臂的保持表面抵靠基板的周边边缘。 动态卡盘适用于任何类型的装置,其中半导体晶片或其它基板必须在被旋转的同时保持在居中定位状态,包括晶片清洗和冲洗装置。