会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • Surface inspection method
    • 表面检查方法
    • US20050105791A1
    • 2005-05-19
    • US10977138
    • 2004-10-28
    • Ken LeeJames Xu
    • Ken LeeJames Xu
    • G01N21/47G01N21/95G01N21/956G06K9/00
    • G01N21/956G01N21/47G01N21/9501
    • A method of inspecting surface of an article is disclosed. A first mode of operation and a second mode of operation are provided. The first mode of operation is adapted for inspection of surface of an unpatterned article. The second mode of operation is adapted for inspection of surface of a patterned article. A switching means is provided to switch between the first mode of operation and the second mode of operation. In the first mode, the surface is scanned in a spiral pattern to identify defect location in a first resolution. Then, the defect location is scanned in a raster pattern identify defect location in a second resolution. In the second mode, the surface is scanned in a spiral pattern, raster pattern, or both to obtain pixel values. The pixel values are compared to reference pixels to identify defect location or to classify the defect.
    • 公开了一种检查制品表面的方法。 提供了第一操作模式和第二操作模式。 第一种操作模式用于检查未图案的物品的表面。 第二操作模式适用于检查图案制品的表面。 提供切换装置以在第一操作模式和第二操作模式之间切换。 在第一模式中,以螺旋图案扫描表面以在第一分辨率中识别缺陷位置。 然后,以光栅图案扫描缺陷位置,以第二分辨率识别缺陷位置。 在第二模式中,以螺旋图案,光栅图案或二者扫描表面以获得像素值。 将像素值与参考像素进行比较以识别缺陷位置或对缺陷进行分类。
    • 5. 发明申请
    • Defect review system and method
    • 缺陷审查制度和方法
    • US20050094136A1
    • 2005-05-05
    • US10977144
    • 2004-10-28
    • James XuKen Lee
    • James XuKen Lee
    • G01N21/21G01N21/47G01N21/95G01N21/956G01N21/88
    • G01N21/956G01N21/21G01N21/47G01N21/8806G01N21/9501G01N2021/8825
    • A defect review system includes a stage, a light source, a turning mirror, and a ring of collectors. The stage supports and moves an article for inspection, the article having a surface. The light source provides light. The turning mirror turns the light toward the surface at an oblique incident angle whereby the light illuminates a spot on the surface and the light scatters from the spot. The ring of collectors is adapted to collect scattering light. A method of reviewing surface of a wafer is disclosed. The method provides a dark-field mode of operation adapted to inspect the surface by illuminating a spot on the surface at an oblique angle and collecting scattering light from the surface. Further, the method provides a bright-field mode of operation adapted to inspect the surface by illuminating a spot on the surface at a normal angle to examine the reflecting light.
    • 缺陷检查系统包括舞台,光源,转向镜和收集器圈。 舞台支持并移动文章进行检查,文章具有表面。 光源提供光。 转向镜以倾斜的入射角将光朝向表面转动,由此光照射表面上的斑点,并且光从点散射。 收集器的环适用于收集散射光。 公开了一种检查晶片表面的方法。 该方法提供了适于通过以倾斜角照射表面上的斑点并从表面收集散射光来检查表面的暗场模式。 此外,该方法提供适于通过以正常角度照射表面上的斑点来检查表面以检查反射光的明场操作模式。