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1. 发明授权

US08279402B2 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same 有权
标题翻译：用于具有疏水性涂层的浸没式光刻的光学布置，以及包括其的投影曝光设备
公开(公告)号：US08279402B2
公开(公告)日：2012-10-02
申请号：US12403132
申请日：2009-03-12
申请人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
发明人： Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
IPC分类号： G03F7/207
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706
摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
摘要翻译：一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

2. 发明申请

US20090233233A1 OPTICAL ARRANGEMENT FOR IMMERSION LITHOGRAPHY WITH A HYDROPHOBIC COATING, AS WELL AS PROJECTION EXPOSURE APPARATUS COMPRISING THE SAME 有权
标题翻译：用于疏水涂层的光学装置，作为包括其的投影曝光装置
公开(公告)号：US20090233233A1
公开(公告)日：2009-09-17
申请号：US12403132
申请日：2009-03-12
申请人： Stephan SIX , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
发明人： Stephan SIX , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
IPC分类号： G03F7/20 , G03B27/54 , G03F7/004
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/706
摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
摘要翻译：一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

3. 发明授权

US09298111B2 Optical arrangement in a projection exposure apparatus for EUV lithography 有权
标题翻译：用于EUV光刻的投影曝光装置中的光学布置
公开(公告)号：US09298111B2
公开(公告)日：2016-03-29
申请号：US13405882
申请日：2012-02-27
申请人： Viktor Kulitzki , Bernhard Gellrich , Stefan Xalter , Yim-Bun Patrick Kwan , Peter Deufel , Andreas Wurmbrand
发明人： Viktor Kulitzki , Bernhard Gellrich , Stefan Xalter , Yim-Bun Patrick Kwan , Peter Deufel , Andreas Wurmbrand
IPC分类号： G03B27/52 , G03B27/54 , G03B27/32 , G03F7/20 , G02B7/00
CPC分类号： G03F7/70916 , G02B7/00 , G03F7/70233 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.
摘要翻译：光学装置包括多个光学元件和承载光学元件的载体结构。载体结构由至少两个可释放地互连的模块组成。每个模块由至少一个载体结构子元件组成。子载体由多个载体结构子元件和/或模块产生。子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络到投影曝光装置的像平面。用于EUV光刻的投影曝光装置包括这种光学装置。

4. 发明授权

US08860922B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08860922B2
公开(公告)日：2014-10-14
申请号：US13356231
申请日：2012-01-23
申请人： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
发明人： Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
摘要翻译：将液体供应到光刻设备的投影系统和基板之间的空间。朝向真空入口的气体流阻止湿气逸出到光刻设备的其它部分。这可能有助于保护光刻设备的复杂部分免受潮湿气体的损坏。

5. 发明授权

US08542346B2 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations 有权
标题翻译：光学系统，具有可更换的可操作的校正装置，用于减少图像像差
公开(公告)号：US08542346B2
公开(公告)日：2013-09-24
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/52
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

6. 发明授权

US08456616B2 Optical system for microlithography 有权
标题翻译：光刻系统
公开(公告)号：US08456616B2
公开(公告)日：2013-06-04
申请号：US12993540
申请日：2009-04-07
申请人： Daniel Kraehmer , Wilhelm Ulrich , Matthias Manger , Bernhard Gellrich
发明人： Daniel Kraehmer , Wilhelm Ulrich , Matthias Manger , Bernhard Gellrich
IPC分类号： G02B3/02 , G02B7/02 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70308
摘要： An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.
摘要翻译：用于微光刻的光学系统，特别是投影物镜具有光轴和至少一个光学校正装置，其具有第一光学校正元件和至少一个第二光学校正元件，其中第一校正元件设置有第一非球面表面轮廓，并且其中所述第二校正元件设置有第二非球面轮廓，其中所述第一表面轮廓和所述第二表面轮廓至少近似为零，其中所述校正装置具有至少一个驱动器，两个校正元素中的至少一个。在这种情况下，两个校正元件中的至少一个可以围绕至少近似平行于光轴的旋转轴线旋转，并且至少一个驱动器是用于一个或两个校正元件旋转的旋转驱动器旋转轴。

7. 发明申请

US20120188523A1 OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY 有权
标题翻译：投影曝光装置的光学布置
公开(公告)号：US20120188523A1
公开(公告)日：2012-07-26
申请号：US13405882
申请日：2012-02-27
申请人： Viktor Kulitsky , Bernhard Gellrich , Stefan Xalter , Yim-Bun Patrick Kwan , Peter Deufel , Andreas Wurmbrand
发明人： Viktor Kulitsky , Bernhard Gellrich , Stefan Xalter , Yim-Bun Patrick Kwan , Peter Deufel , Andreas Wurmbrand
IPC分类号： G03B27/70 , G02B7/182
CPC分类号： G03F7/70916 , G02B7/00 , G03F7/70233 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.
摘要翻译：光学装置包括多个光学元件和承载光学元件的载体结构。载体结构由至少两个可释放地互连的模块组成。每个模块由至少一个载体结构子元件组成。子载体由多个载体结构子元件和/或模块产生。子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状，可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络到投影曝光装置的像平面。用于EUV光刻的投影曝光装置包括这种光学装置。

8. 发明申请

US20090197211A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090197211A1
公开(公告)日：2009-08-06
申请号：US12422140
申请日：2009-04-10
申请人： Christiaan Alexander HOOGENDAM , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
发明人： Christiaan Alexander HOOGENDAM , Erik Roelof Loopstra , Bob Streefkerk , Bernhard Gellrich , Andreas Wurmbrand
IPC分类号： G03F7/22 , G03B27/52
CPC分类号： G03F7/70341
摘要： Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
摘要翻译：将液体供应到光刻设备的投影系统和基板之间的空间。朝向真空入口的气体流阻止湿气逸出到光刻设备的其它部分。这可能有助于保护光刻设备的复杂部分免受潮湿气体的损坏。

9. 发明申请

US20090027638A1 Lithographic appararus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20090027638A1
公开(公告)日：2009-01-29
申请号：US12232861
申请日：2008-09-25
申请人： Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Antonius Johannes Van Der Net , Yuri Johannes Gabriel Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
发明人： Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Antonius Johannes Van Der Net , Yuri Johannes Gabriel Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
IPC分类号： G03B27/52 , G01N7/00
CPC分类号： G03F7/70933 , G03F7/70908
摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.
摘要翻译：光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。投影系统包括第一气体调节子环境和第二气体调节子环境。该装置包括：气体控制单元，被配置为控制经由第一子环境将调节气体进入第一子环境并进入第二子环境，以防止从第二子环境到第一子环境的污染，环境。该装置包括：门，该门被配置为以从第二子环境到环境大气的速率泄漏经调节的气体;以及检测器，被配置为检测第二气体条件环境的至少一个性质。

10. 发明申请

US20080225247A1 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 有权
标题翻译：光学元件曝光过程
公开(公告)号：US20080225247A1
公开(公告)日：2008-09-18
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03B27/54 , G03B27/52 , G02B23/16
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：公开了一种包括第一光学元件模块和密封装置的光学元件单元。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和第二个空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

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