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1. 发明授权

US07224440B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07224440B2
公开(公告)日：2007-05-29
申请号：US11019525
申请日：2004-12-23
申请人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
发明人： Stefan Geerte Kruijswijk , Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Heine Melle Mulder
IPC分类号： G03B27/52
CPC分类号： G03F7/70108 , G03F7/70275
摘要： A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
摘要翻译：光刻设备包括被配置为提供辐射束的照明系统; 图案形成装置，其被配置成图案化所述辐射束以形成图案化的辐射束; 以及投影系统，被配置为将图案化的辐射束投影到基板上。光学组件包括在辐射源和图案形成装置之间二维布置的多个光学元件，以产生辐射束的预定角度分布。为了提高辐射束的均匀性，光学元件从具有不同形状和/或尺寸的预定数量的光学元件中选择。

2. 发明授权

US07148952B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07148952B2
公开(公告)日：2006-12-12
申请号：US10976314
申请日：2004-10-29
申请人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
发明人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70075
摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
摘要翻译：本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法，其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。

3. 发明授权

US09188881B2 Lithographic apparatus and method for reducing stray radiation 有权
标题翻译：用于减少杂散辐射的平版印刷设备和方法
公开(公告)号：US09188881B2
公开(公告)日：2015-11-17
申请号：US13376761
申请日：2010-05-04
申请人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Antonie Hendrik Verweij
发明人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Antonie Hendrik Verweij
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/70941 , G03F7/70066 , G03F7/70075 , G03F7/70283
摘要： A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.
摘要翻译：光刻设备包括用于提供极紫外辐射束的照明系统，用于通过辐射束控制图案形成装置的照明的掩模装置，用于支撑图案形成装置的支撑件，所述图案形成装置被配置成赋予辐射束的图案，用于保持基板的基板台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。掩模装置包括掩模刀片，该掩模刀片包括被配置为限定图案形成装置上的照明区域的边界的掩模边缘。遮蔽刀片被配置为反射入射在掩蔽刀片上的极紫外辐射，使得反射辐射的至少一部分不被投影系统捕获。

4. 发明授权

US08252487B2 Device manufacturing method and mask for use therein 有权
标题翻译：装置制造方法及其使用面罩
公开(公告)号：US08252487B2
公开(公告)日：2012-08-28
申请号：US10736779
申请日：2003-12-17
申请人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Donis George Flagello
发明人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Donis George Flagello
IPC分类号： G03F1/14
CPC分类号： G03F1/54
摘要： A device manufacturing method, is presented herein. In one embodiment, the device manufacturing method includes a mask for use with DUV having a quartz substrate and chrome absorber. The chrome absorber has a thickness of about 700 nm which causes increased TE polarization in the transmitted light and improves contrast at the substrate level.
摘要翻译：本文提供了一种器件制造方法。在一个实施例中，器件制造方法包括用于具有石英衬底和铬吸收体的DUV的掩模。铬吸收体具有约700nm的厚度，这导致透射光中的TE偏振增加并且改善了衬底水平的对比度。

5. 发明授权

US07333178B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07333178B2
公开(公告)日：2008-02-19
申请号：US11139990
申请日：2005-05-31
申请人： Marcel Mathijs Theodore Marie Dierichs , Hako Botma , Markus Franciscus Antonius Eurlings
发明人： Marcel Mathijs Theodore Marie Dierichs , Hako Botma , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70091 , G03F7/70108 , G03F7/702
摘要： A lithographic apparatus includes an illumination system including a field faceted mirror including a plurality of field facets and configured to receive radiation from a radiation source and form a plurality of images of the radiation source on corresponding pupil facets of a pupil faceted mirror. Each of the field facets is configured to provide an illumination slit at a level of a patterning device. The illumination slits are summed together at the level of the patterning device to illuminate the patterning device. First blades are configured to block radiation from a radiation source and each first blade is selectively actuable to cover a portion of a selectable number of field facets. The field faceted mirror further comprises partial field facets, the partial field facets being configured to produce a partial illumination slit at the level of the patterning device, and the pupil faceted mirror further includes pupil facets corresponding to the partial field facets. The partial field facets are configured to produce an illumination slit that is summed with the summed illumination slits of the field facets and/or correct for non-uniformity in the summed illumination slits of the field facets. Second blades are selectively actuable to cover a portion of a selectable number of partial field facets.
摘要翻译：光刻设备包括照明系统，该照明系统包括包括多个场面的场分面反射镜，并且被配置为从辐射源接收辐射并且在瞳孔面镜的相应光瞳面上形成辐射源的多个图像。每个场面被配置为在图案形成装置的水平面上提供照明狭缝。照明狭缝在图案形成装置的水平面相加在一起，以照亮图案形成装置。第一刀片被配置为阻挡来自辐射源的辐射，并且每个第一刀片可选择性地致动以覆盖可选择数量的场面的一部分。场分面镜还包括部分场面，部分场面被配置为在图案形成装置的高度处产生局部照明狭缝，并且瞳孔面镜还包括对应于部分场面的光瞳面。部分场面被配置为产生与场面的相加的照明狭缝相加的照明狭缝和/或校正场面的相加的照明狭缝中的不均匀性。第二刀片可选择性地致动以覆盖可选数量的部分场面的一部分。

6. 发明申请

US20120075610A1 LITHOGRAPHIC APPARATUS AND METHOD FOR REDUCING STRAY RADIATION 有权
标题翻译：光栅设备和减少辐射辐射的方法
公开(公告)号：US20120075610A1
公开(公告)日：2012-03-29
申请号：US13376761
申请日：2010-05-04
申请人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Antonie Hendrik Verweij
发明人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Antonie Hendrik Verweij
IPC分类号： G03B27/54
CPC分类号： G03F7/70941 , G03F7/70066 , G03F7/70075 , G03F7/70283
摘要： A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.
摘要翻译：光刻设备包括用于提供极紫外辐射束的照明系统，用于通过辐射束控制图案形成装置的照明的掩模装置，用于支撑图案形成装置的支撑件，所述图案形成装置被配置成赋予辐射束的图案，用于保持基板的基板台，以及用于将图案化的辐射束投影到基板的目标部分上的投影系统。掩模装置包括掩模刀片，该掩模刀片包括被配置为限定图案形成装置上的照明区域的边界的掩模边缘。遮蔽刀片被配置为反射入射在掩蔽刀片上的极紫外辐射，使得反射辐射的至少一部分不被投影系统捕获。

7. 发明授权

US07113261B2 Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：辐射系统，光刻设备，器件制造方法和由此制造的器件
公开(公告)号：US07113261B2
公开(公告)日：2006-09-26
申请号：US10862819
申请日：2004-06-08
申请人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Olav Waldemar Vladimir Frijns
发明人： Marcel Mathijs Theodore Marie Dierichs , Markus Franciscus Antonius Eurlings , Olav Waldemar Vladimir Frijns
IPC分类号： G03B27/74 , G03B27/68 , G03B27/42 , G01B11/00
CPC分类号： G03F7/70141
摘要： A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam of radiation relative to the illumination system and a projecting device configured to redirect only a part of a cross section of the beam of radiation to the beam measuring system. The beam measuring system may include several position sensors, the readouts of which can be used to determine incorrect alignment of the radiation source with respect to the illumination system. Diaphragms are connected to the collector of the radiation generator, so that in addition to X, Y, and Z corrections, Rx, Ry and Rz corrections are possible.
摘要翻译：辐射系统包括用于产生辐射的辐射发生器，源和被配置为接收辐射并提供辐射束的照明系统。所述照明系统包括：束测量系统，被配置为测量所述辐射束相对于所述照明系统的位置和倾斜中的至少一个;以及投影装置，其被配置为仅将所述辐射束的横截面的一部分重定向到所述光束测量系统。光束测量系统可以包括几个位置传感器，其读出可用于确定辐射源相对于照明系统的不正确对准。隔膜连接到辐射发生器的收集器，因此除了X，Y和Z校正之外，Rx，Ry和Rz校正是可能的。

8. 发明授权

US06927004B2 Mask for use in lithography, method of making a mask, lithographic apparatus, and device manufacturing method 有权
标题翻译：用于光刻的掩模，制造掩模的方法，光刻设备和器件制造方法
公开(公告)号：US06927004B2
公开(公告)日：2005-08-09
申请号：US10379999
申请日：2003-03-06
申请人： Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Mathijs Theodore Marie Dierichs
发明人： Markus Franciscus Antonius Eurlings , Antonius Johannes Josephus Van Dijsseldonk , Marcel Mathijs Theodore Marie Dierichs
IPC分类号： G03F1/00 , G03F1/24 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/24 , G03F7/70283
摘要： A reflective mask has a sub-resolution texture applied to absorbing areas to reduce the amount of power in the specular reflection. The texture may form a phase contrast grating or may be a diffuser. The same technique may be applied to the other absorbers in a lithographic apparatus.
摘要翻译：反射掩模具有应用于吸收区域的亚分辨率纹理以减少镜面反射中的光焦度。纹理可以形成相差光栅，或者可以是扩散器。相同的技术可以应用于光刻设备中的其它吸收体。

9. 发明申请

US20180203364A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20180203364A1
公开(公告)日：2018-07-19
申请号：US15918575
申请日：2018-03-12
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sofia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sofia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

10. 发明授权

US09110389B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09110389B2
公开(公告)日：2015-08-18
申请号：US13241837
申请日：2011-09-23
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

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