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1. 发明授权

US07459148B2 Cosmetic agent containing at least one copolymer having N-vinyllactam units 失效
标题翻译：含有至少一种具有N-乙烯基内酰胺单元的共聚物的化妆品
公开(公告)号：US07459148B2
公开(公告)日：2008-12-02
申请号：US10497164
申请日：2002-12-10
申请人： Son Nguyen-Kim , Peter Hoessel , Walter Schunter
发明人： Son Nguyen-Kim , Peter Hoessel , Walter Schunter
IPC分类号： A61Q5/00 , A61Q5/06 , A61Q7/00 , A61K8/73
CPC分类号： A61Q5/12 , A61K8/817 , A61K8/8182 , A61K8/87 , A61Q5/02 , A61Q5/06 , A61Q19/00
摘要： The present invention relates to a cosmetic composition which comprises at least one water-soluble or water-dispersible copolymer which is obtainable by free-radical copolymerization of at least one N-vinyllactam, at least one anionogenic monomer and optionally further α,β-ethylenically unsaturated compounds copolymerizable therewith, in the presence of a polymer component with repeat units which have ether groups or which are derived from vinyl alcohol.
摘要翻译：本发明涉及化妆品组合物，其包含至少一种水溶性或水分散性共聚物，其可通过至少一种N-乙烯基内酰胺，至少一种阴离子发生单体和任选的另外的α，β-烯属的自由基共聚获得在具有醚基团或衍生自乙烯醇的重复单元的聚合物组分的存在下，可与其共聚的不饱和化合物。

2. 发明授权

US08747824B2 Cosmetic product comprising at least one water-soluble copolymer which contains (meth)acrylamide units 有权
标题翻译：包含至少一种含（甲基）丙烯酰胺单元的水溶性共聚物的化妆品
公开(公告)号：US08747824B2
公开(公告)日：2014-06-10
申请号：US10511594
申请日：2003-05-02
申请人： Son Nguyen-Kim , Peter Hoessel , Gabi Mueller
发明人： Son Nguyen-Kim , Peter Hoessel , Gabi Mueller
IPC分类号： A61K8/81
CPC分类号： C08F251/00 , A61K8/8158 , A61K8/8182 , A61Q5/06 , A61Q5/12 , C08F220/56 , C08F283/06 , C08F220/54
摘要： The invention relates to a cosmetic product containing at least one water-soluble copolymer which is obtained by radical copolymerization of acrylamide and/or methacrylamide and other water-soluble a,β-ethylenically unsaturated compounds which are copolymerizable therewith, optionally in the presence of a water-soluble polymeric graft base.
摘要翻译：本发明涉及一种含有至少一种水溶性共聚物的化妆品，其通过丙烯酰胺和/或甲基丙烯酰胺与其可共聚的其它水溶性a，b-烯属不饱和化合物自由基共聚获得，任选地在水溶性聚合物接枝基质。

3. 发明授权

US06335003B1 Use of cationic polyurethanes and polyureas as ingredients of cosmetic preparations 失效
标题翻译：使用阳离子聚氨酯和聚脲作为化妆品制剂的成分
公开(公告)号：US06335003B1
公开(公告)日：2002-01-01
申请号：US08424527
申请日：1995-05-30
申请人： Son Nguyen Kim , Axel Sanner , Karin Sperling-Vietmeier , Peter Hoessel
发明人： Son Nguyen Kim , Axel Sanner , Karin Sperling-Vietmeier , Peter Hoessel
IPC分类号： A61K711
CPC分类号： C08G18/603 , A61K8/87 , A61K47/34 , A61Q5/06 , C08G18/0814 , C08G18/4277 , C08G18/4283
摘要： Cationic polyurethanes and polyureas formed from (a) at least one diisocyanate or reaction product thereof with one or more compounds containing two or more active hydrogen atoms per molecule, and (b) at least one diol, primary or secondary amino alcohol, primary or secondary diamine or primary or secondary triamine each with one or more tertiary, quaternary or protonated tertiary amine nitrogen atoms and having a glass transition temperature of at least 25 ° C. and an amine number of from 50 to 200, based on the non-quaternized or -protonated compounds, or other salts of these polyurethanes and polyureas, are useful as ingredients of cosmetic and pharmaceutical preparations.
摘要翻译：由（a）至少一种二异氰酸酯或其反应产物与每分子含有两个或多个活性氢原子的一种或多种化合物形成的阳离子聚氨酯和聚脲，和（b）至少一种二醇，伯或仲氨基醇，伯或仲二胺或伯或仲三胺各自具有一个或多个叔胺，季铵或质子化叔胺氮原子，并且玻璃化转变温度为至少25℃，胺数为50至200，基于非季铵化或 - 质子化合物或这些聚氨酯和聚脲的其它盐可用作化妆品和药物制剂的成分。

4. 发明授权

US5356511A Production of a polymer/metal or polymer/semiconductor composite 失效
标题翻译：生产聚合物/金属或聚合物/半导体复合材料
公开(公告)号：US5356511A
公开(公告)日：1994-10-18
申请号：US92494
申请日：1993-07-16
申请人： Peter Hoessel , Klaus Harth , Gerhard Hoffmann , Hartmut Hibst
发明人： Peter Hoessel , Klaus Harth , Gerhard Hoffmann , Hartmut Hibst
IPC分类号： B05D7/00 , B05D7/14 , B32B15/08 , C08J5/12 , C23C14/12 , C23F1/02 , H01L21/312 , H05K1/05 , H05K3/02 , H05K3/38 , B32B31/00
CPC分类号： B05D7/51 , B05D7/14 , B32B15/08 , C23F1/02 , H05K3/388 , H01L2924/0002 , H05K2201/0355 , H05K3/022 , H05K3/383
摘要： A process for producing a polymer/metal or polymer/semiconductor composite having an adhesive layer between the polymer and the metal or between the polymer and the semiconductor in which a layer of at least two different chemical elements is applied to the metal or semiconductor by vapor-deposition or cathode sputtering, then selectively or partially removing at least one chemical element of this layer in an etching process, and then applying the polymer.
摘要翻译：一种制备聚合物/金属或聚合物/半导体复合材料的方法，该聚合物/聚合物/半导体复合材料在聚合物和金属之间或聚合物和半导体之间具有粘合剂层，其中通过蒸气将至少两种不同的化学元素的层施加到金属或半导体 - 沉积或阴极溅射，然后在蚀刻工艺中选择性或部分地去除该层的至少一种化学元素，然后施加聚合物。

5. 发明授权

US5059660A Self-bonding enamel solution for heat-resistant coatings 失效
标题翻译：自粘式ENAMEL解决方案用于耐热涂料
公开(公告)号：US5059660A
公开(公告)日：1991-10-22
申请号：US521030
申请日：1990-05-09
申请人： Peter Hoessel , Hans Schupp , Klaus Lienert , Helmut Lehmann
发明人： Peter Hoessel , Hans Schupp , Klaus Lienert , Helmut Lehmann
IPC分类号： C08G18/75 , C08G18/34 , C08G18/60 , C08G18/72 , C08G18/80 , C09D5/25 , C09D175/00 , C09D175/04 , H01B3/30
CPC分类号： H01B3/302 , C08G18/341 , C08G18/603 , C08G18/724 , C08G18/8074 , H01B3/305
摘要： Self-bonding enamel solutions containA) from 5 to 80% by weight of a copolyamide composed of units which are derived fromA.sub.1) organic dicarboxylic acids ##STR1## where R.sup.1 is an aliphatic radical of 1 to 20 carbon atoms or an aromatic radical of 5 to 25 carbon atoms,andA.sub.2) a mixture of diisocyanates, consisting ofa.sub.21) from 20 to 95 mol % of a diisocyanate of the general formulaOCN--R.sup.2 --NCO where R.sup.2 is an aromatic radical of 5 to 25 carbon atoms,a.sub.22) from 5 to 70 mol % of a diisocyanate of the general formulaOCN--R.sup.3 --NCO where R.sup.3 is ##STR2## or a linear aliphatic radical of 3 to 30 carbon atoms which is substituted by 1 to 3 C.sub.1 -C.sub.4 -alkyl groups and R.sup.4 and R.sup.5 independently of one another are each C.sub.1 -C.sub.4 -alkyl or hydrogen, anda.sub.23) from 0 to 20 mol % of a diisocyanate of the general formulaOCN--(CH.sub.2).sub.y --NCO where y is an integer of from 1 to 20, andB) from
摘要翻译：自粘搪瓷溶液包含A）5至80重量％的由衍生自A1）有机二羧酸的单体组成的共聚酰胺，其中R 1是1至20个碳原子的脂族基团或芳族基团的芳族基团 5〜25个碳原子，A2）二异氰酸酯的混合物，由以下组分组成：a）20〜95摩尔％的通式为OCN-R2-NCO的二异氰酸酯，其中R 2为5〜25个碳原子的芳族基团，a22 ）5〜70摩尔％的通式为OCN-R3-NCO的二异氰酸酯，其中R 3为3或3个碳原子的直链脂族基团，其被1至3个C 1 -C 4 - 烷基取代， R 4和R 5彼此独立地各自为C 1 -C 4烷基或氢，和a 23）0至20摩尔％的通式为OCN-（CH 2）y -NCO的二异氰酸酯，其中y为1至 20和B）在有机溶剂或溶剂混合物中的<0.5至30重量％的封端二异氰酸酯或多异氰酸酯。

6. 发明授权

US5518865A Production of microstructure elements 失效
标题翻译：微结构元素的生产
公开(公告)号：US5518865A
公开(公告)日：1996-05-21
申请号：US400011
申请日：1995-03-06
申请人： Peter Hoessel , Gerhard Hoffmann , Juergen Langen , Holger Reinecke
发明人： Peter Hoessel , Gerhard Hoffmann , Juergen Langen , Holger Reinecke
IPC分类号： C08G63/08 , B29C35/08 , B29C59/16 , G03F7/039 , G03F7/20 , G03C5/00 , G03C1/492 , G03C1/494 , G03C1/76
CPC分类号： B29C59/16 , G03F7/039 , G03F7/2039 , B29C2035/0844 , B29K2067/043 , B29K2067/046 , Y10S430/109 , Y10S430/167 , Y10S430/168
摘要： The invention relates to a process for producing microstructure elements having structure depths of from several .mu.m to the mm region by imagewise irradiation of polymers with X-rays, where the polymers employed are aliphatic polyesters.
摘要翻译：本发明涉及通过使用X射线的聚合物的成像照射来生产具有几μm到mm区域的结构深度的微结构元件的方法，其中使用的聚合物是脂族聚酯。

7. 发明授权

US5415977A Production of micromoldings having a high aspect ratio 失效
标题翻译：生产具有高纵横比的微胶印
公开(公告)号：US5415977A
公开(公告)日：1995-05-16
申请号：US102519
申请日：1993-08-05
申请人： Thomas Wuensch , Peter Hoessel , Gerhard Hoffmann , Juergen Langen
发明人： Thomas Wuensch , Peter Hoessel , Gerhard Hoffmann , Juergen Langen
IPC分类号： C08G2/08 , B29C35/08 , C08J3/28 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： B29C35/08 , G03F7/039 , G03F7/2039 , B29C2035/0844 , B29C2035/0877 , B29K2059/00 , Y10S430/168
摘要： A process for the production of micromoldings having a high aspect ratio by imagewise irradiation of a polymer with high-energy, parallel radiation from an X-ray source employs, as the polymer, a homo- or copolyoxymethylene.
摘要翻译：通过使用来自X射线源的高能量并行辐射的聚合物的成像照射，制造具有高纵横比的微显微镜的方法使用均聚或共聚聚甲醛作为聚合物。

8. 发明授权

US5302421A Production of microstructure elements 失效
标题翻译：微结构元素的生产
公开(公告)号：US5302421A
公开(公告)日：1994-04-12
申请号：US87902
申请日：1993-07-09
申请人： Peter Hoessel , Gerhard Hoffmann
发明人： Peter Hoessel , Gerhard Hoffmann
IPC分类号： B01J19/00 , B29C35/08 , B29C59/16 , G03F7/039 , G03F7/16 , G03F7/20 , H01L21/027 , B05D5/12
CPC分类号： G03F7/039 , B01J19/0093 , B29C59/16 , G03F7/16 , G03F7/2039 , B01J2219/00783 , B01J2219/00833 , B29C2035/0844 , Y10S430/168
摘要： A process for the production of microstructure elements having structure depths of from several .mu.m into the mm range by imagewise irradiation of polymers with X-rays and removal of the areas of the polymers which have been irradiated imagewise, comprises applying the polymers, before the imagewise irradiation, to an electroconductive substrate in a layer thickness of from several .mu.m into the mm range by melting under pressure, thus firmly anchoring the polymers.The process according to the invention is particularly suitable for the production of microstructure elements having structure depths of from 3 to 2000 .mu.m and lateral dimensions of less than 10 .mu.m.
摘要翻译：通过用X射线成像照射聚合物并去除已经成像照射的聚合物的区域，通过将结构深度从几μm制成到mm范围内的微结构元件的制造方法包括在通过在压力下熔融，将层厚度从几μm到mm范围内的导电性基板，从而牢固地锚定聚合物。根据本发明的方法特别适用于生产具有3至2000μm结构深度和小于10μm的横向尺寸的微结构元件。

9. 发明授权

US5298367A Production of micromoldings having a high aspect ratio 失效
标题翻译：生产具有高纵横比的微胶印
公开(公告)号：US5298367A
公开(公告)日：1994-03-29
申请号：US847125
申请日：1992-03-06
申请人： Peter Hoessel , Gerhard Hoffmann , Thomas Wuensch , Juergen Langen
发明人： Peter Hoessel , Gerhard Hoffmann , Thomas Wuensch , Juergen Langen
IPC分类号： B29C35/08 , B29C39/00 , B29C43/00 , B29C45/00 , B29C47/00 , B29C59/16 , C08G75/22 , G03F7/039 , G03F7/20 , G03F7/30 , G03C5/16
CPC分类号： C08G75/22 , B29C59/16 , G03F7/039 , G03F7/2039 , B29C2035/0844 , B29C2035/0877 , B29C39/00 , B29C43/00 , B29C45/00 , B29C47/00 , B29C47/0009 , B29K2081/00 , Y10S430/168
摘要： A process for the production of micromoldings having a high aspect ratio by imagewise irradiation of a polymer with high-energy, parallel radiation from an X-ray source employs, as the polymer, a copolymer comprising SO.sub.2 and one or more ethylenically unsaturated organic compounds.
摘要翻译：通过使用来自X射线源的高能量并行辐射的聚合物的成像照射，制造具有高纵横比的微显微镜的方法使用包含SO 2和一种或多种烯属不饱和有机化合物的共聚物作为聚合物。

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