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1. 发明授权

US06642901B2 Horn antenna apparatus 失效
公开(公告)号：US06642901B2
公开(公告)日：2003-11-04
申请号：US10082114
申请日：2002-02-26
申请人： Soichi Matsumoto , Hiroshi Shigesawa , Mikio Tsuji , Hiroyuki Deguchi
发明人： Soichi Matsumoto , Hiroshi Shigesawa , Mikio Tsuji , Hiroyuki Deguchi
IPC分类号： H01Q1300
CPC分类号： H01Q13/02
摘要： In a horn antenna apparatus for use in an antenna system for radar, some of the excited radio waves in a TE11 mode in a radio-wave input portion 1 are converted to those in a higher mode in a waveguide portion 5. As the inclination of a line of intersection S of the waveguide portion 5 is not fixed but continuously varied, the higher mode such as a TM11 mode and TE12 mode and the like is excited everywhere in the direction of the axis Z of the waveguide portion 5. Then the configuration of the line of intersection is determined so that an amplitude and a phase as the generated quantity of higher mode such as the TM11 mode generated in the waveguide portion 5 conform to desired values with respect to each higher mode.

2. 发明授权

US07538640B2 Waveguide and attenuation pole waveguide bandpass filter 有权
标题翻译：波导和衰减极波导带通滤波器
公开(公告)号：US07538640B2
公开(公告)日：2009-05-26
申请号：US11665337
申请日：2005-12-26
申请人： Mikio Tsuji , Hiroyuki Deguchi , Masataka Ohira
发明人： Mikio Tsuji , Hiroyuki Deguchi , Masataka Ohira
IPC分类号： H01P3/00 , H01P3/12 , H01P1/00 , H01P1/08
CPC分类号： H01P1/207
摘要： A waveguide and an attenuation pole waveguide bandpass filter with a simple structure without any additional structure such as a negative cross coupling between resonators.The attenuation pole waveguide bandpass filter arranged at right angle to the longitudinal direction (radio wave propagation direction) is composed only of conductors. The conductor comprises depressions each opening outwardly and having a non-conducting region which continues from the inside of the opening section to the outside, and a window in the conductor section between these opposed depressions. In an alternative embodiment, such conductor shall be covered by a dielectric such as a resin.
摘要翻译：具有简单结构的波导和衰减极波导带通滤波器，没有任何附加结构，例如谐振器之间的负交叉耦合。与纵向成直角（无线电波传播方向）布置的衰减极波导带通滤波器仅由导体构成。导体包括凹陷，每个凹陷均向外开口，并且具有从开口部分的内部延伸到外部的非导电区域，以及在这些相对的凹部之间的导体部分中的窗口。在替代实施例中，这种导体将被诸如树脂之类的电介质覆盖。

3. 发明申请

US20080197944A1 Waveguide and Attenuation Pole Waveguide Bandpass Filter 有权
标题翻译：波导和衰减极波导带通滤波器
公开(公告)号：US20080197944A1
公开(公告)日：2008-08-21
申请号：US11665337
申请日：2005-12-26
申请人： Mikio Tsuji , Hiroyuki Deguchi , Masataka Ohira
发明人： Mikio Tsuji , Hiroyuki Deguchi , Masataka Ohira
IPC分类号： H01P1/207
CPC分类号： H01P1/207
摘要： A waveguide and an attenuation pole waveguide bandpass filter with a simple structure without any additional structure such as a negative cross coupling between resonators.The attenuation pole waveguide bandpass filter arranged at right angle to the longitudinal direction (radio wave propagation direction) is composed only of conductors. The conductor comprises depressions each opening outwardly and having a non-conducting region which continues from the inside of the opening section to the outside, and a window in the conductor section between these opposed depressions. In an alternative embodiment, such conductor shall be covered by a dielectric such as a resin.
摘要翻译：具有简单结构的波导和衰减极波导带通滤波器，没有任何附加结构，例如谐振器之间的负交叉耦合。与纵向成直角（无线电波传播方向）布置的衰减极波导带通滤波器仅由导体构成。导体包括凹陷，每个凹陷均向外开口，并且具有从开口部分的内部延伸到外部的非导电区域，以及在这些相对的凹部之间的导体部分中的窗口。在替代实施例中，这种导体将被诸如树脂之类的电介质覆盖。

4. 发明授权

US5676760A Method for wet processing of a semiconductor substrate 失效
标题翻译：半导体衬底的湿法处理方法
公开(公告)号：US5676760A
公开(公告)日：1997-10-14
申请号：US408082
申请日：1995-03-23
申请人： Hidemitsu Aoki , Makoto Morita , Mikio Tsuji
发明人： Hidemitsu Aoki , Makoto Morita , Mikio Tsuji
IPC分类号： C09K13/00 , B08B3/08 , B08B3/10 , C02F1/46 , C02F1/461 , H01L21/304 , H01L21/306 , H01L21/308 , B08B7/00
CPC分类号： H01L21/02052 , B08B3/08 , B08B3/10 , B08B3/102 , C02F1/4618 , C02F2001/46133 , C02F2201/46115 , C02F2201/4618 , C02F2201/4619 , C02F2209/04 , C02F2209/06
摘要： Electrolyzed waters, including an anode water and a cathode water, having either oxidizing or reducing activity and having either acidity or alkalescency, which is obtained by electrolysis of an aqueous solution prepared by addition of a minute amount of electrolytes, is applied wet processings including cleaning, etching and rinsing processings of semiconductor wafers. The effects of the electrolyzed waters are not lower than those the conventional acidic or alkalic chemicals provide, and remarkably reduces quantity of chemicals used in wet processings in semiconductor manufacturing.
摘要翻译：包括通过电解通过加入微量电解质制备的水溶液获得的具有氧化或还原活性并且具有酸度或碱度的阳极水和阴极水的电解水被施加湿处理，包括清洗，半导体晶片的蚀刻和漂洗处理。电解水的效果不低于传统的酸性或碱性化学品提供的效果，并且显着降低了在半导体制造中湿法处理中使用的化学品的量。

5. 发明授权

US5454901A Process for treating semiconductor substrates 失效
标题翻译：处理半导体衬底的工艺
公开(公告)号：US5454901A
公开(公告)日：1995-10-03
申请号：US703726
申请日：1991-05-21
申请人： Mikio Tsuji
发明人： Mikio Tsuji
IPC分类号： H01L21/304 , H01L21/306 , H01L21/00
CPC分类号： H01L21/02052 , Y10S438/974
摘要： Semiconductor substrates are treated in a treating solution consisting of hydrofluoric acid, hydrogen peroxide and a purified water or in a treating solution consisting of hydrofluoric acid, ammonium fluoride, hydrogen peroxide and a purified water, wherein the treating solution preferably has a hydrofluoric acid concentration of 0.1 to 10 wt % and a hydrogen peroxide concentration of 0.1 to 15 wt %. A process for treating semiconductor substrates is provided according to this invention, which allows less inclusion of metallic impurities from the treating solution and has excellent ability of removing metallic impurities with a very small amount of microparticles deposited on the substrate. The number of microparticles deposited on the semiconductor substrates can be reduced to about 1/10 the level in the conventional process.
摘要翻译：半导体衬底在由氢氟酸，过氧化氢和净化水组成的处理溶液中或在由氢氟酸，氟化铵，过氧化氢和纯化水组成的处理溶液中处理，其中处理溶液的氢氟酸浓度优选为 0.1〜10重量％，过氧化氢浓度为0.1〜15重量％。根据本发明提供了一种用于处理半导体衬底的方法，其允许从处理溶液中更少地包含金属杂质，并且具有优异的去除沉积在衬底上的微量微粒的金属杂质的能力。沉积在半导体衬底上的微粒的数量可以降低到常规工艺中的约1/10的水平。

6. 发明授权

US4901504A Filling and casing system 失效
标题翻译：灌装和套管系统
公开(公告)号：US4901504A
公开(公告)日：1990-02-20
申请号：US180896
申请日：1988-04-13
申请人： Mikio Tsuji , Kazuo Yoshitomi , Shingo Noro , Masayuki Hayashi , Hiroyasu Murase , Naoyoshi Kato , Kazunori Araki , Kenjiro Tanaka
发明人： Mikio Tsuji , Kazuo Yoshitomi , Shingo Noro , Masayuki Hayashi , Hiroyasu Murase , Naoyoshi Kato , Kazunori Araki , Kenjiro Tanaka
IPC分类号： B65B7/28 , B65B21/18
CPC分类号： B65B21/18 , B65B7/2807
摘要： An improved filling and casing system is disclosed herein, which comprises a case conveying device for conveying cases, a carrier conveying device disposed adjacent to and in parallel to the case conveying device for conveying carriers capable of accommodating and holding containers, an uncasing station including a container gripper movable between the case and the carrier for taking out the containers from the case and accommodating them in the carrier, a filling station including a filling head for performing a filling operation for the containers accommodated and held in the carrier, and a capping station including a capping head for performing a capping operation for the filled containers. The uncasing station, the filling station and the capping station are disposed in succession along the case conveying device and the carrier conveying device. An improved capping machine available in the capping station of the above-described filling and casing system, and an improved container gripper device available in the uncasing station as well as a casing station of the above-described filing and casing system, are also disclosed herein.
摘要翻译：本文公开了一种改进的填充和套管系统，其包括用于输送箱的壳体输送装置，与壳体输送装置相邻并平行布置的载体输送装置，用于输送能够容纳和保持容器的载体，包括容器夹具可在壳体和托架之间移动，用于从容器中取出容器并将其容纳在托架中;一个加料站，包括用于对容纳和保持在托架中的容器执行填充操作的填充头，以及封盖站包括用于对填充的容器执行封盖操作的封盖头。防盗站，加油站和加盖站沿着箱体输送装置和载体输送装置连续布置。本发明还公开了一种在上述填充和套管系统的封盖站中可用的改进的封盖机，以及在不合格站中可用的改进的容器夹持装置以及上述填充和套管系统的套管站。。

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