会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • THERMOCHROMIC COATINGS
    • 热敏涂料
    • US20070048438A1
    • 2007-03-01
    • US11424821
    • 2006-06-16
    • Ivan ParkinTroy Manning
    • Ivan ParkinTroy Manning
    • C23C28/00B05D5/12
    • C03C17/245C01G31/00C01P2002/50C03C2217/218C03C2218/152C23C16/405
    • The present invention provides the use of atmospheric pressure chemical vapour deposition (APCVD) for producing a film of thermochmmic transition metal-doped vanadium (iN) oxide on a substrate. Specifically, the invention prevides a method of producing a film of thermochromic transition metal-doped vanadium (IV) oxide on a substrate by atmospheric pressure chemical vapour deposition comprising the steps of: (i) reacting together (a) a vanadium precursor, (b) a transition metal dopant precursor, and (c) an oxygen precursor in an atmospheric pressure chemical vapour deposition reactor to form thermochromic transition metal-doped vanadium (IV) oxide, and (ii) depositing the thermochromic transition metal-doped vanadium (IV) oxide onto the substrate. A preferred transition metal dopant is tungsten. The invention also provides transition metal-doped vanadium (TV) oxide, films thereof and substrates (e.g., glass substrates) coated with a film of transition metal-doped vanadium (IV) oxide. Intelligent window systems, infrared modulators and data storage devices comprising such substrates are also provided.
    • 本发明提供大气压化学气相沉积(APCVD)用于在衬底上生产热过渡金属掺杂钒(iN)的薄膜的用途。 具体地说,本发明预先通过大气压化学气相沉积法在基底上制造热致变色金属过渡金属掺杂氧化钒(IV)的膜的方法,包括以下步骤:(i)使(a)钒前体,(b )过渡金属掺杂剂前体,和(c)在大气压化学气相沉积反应器中的氧前体,以形成热变色金属掺杂的氧化钒(IV),和(ii)沉积热变色过渡金属掺杂的钒(IV) 氧化物到基板上。 优选的过渡金属掺杂剂是钨。 本发明还提供了过渡金属掺杂的钒(TV)氧化物,其膜和涂覆有过渡金属掺杂的氧化钒(IV)的膜的衬底(例如,玻璃衬底)。 还提供了包括这种基板的智能窗系统,红外调制器和数据存储装置。