会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Vacuum deposition apparatus
    • 真空沉积装置
    • US6132516A
    • 2000-10-17
    • US289438
    • 1999-04-09
    • Hiroshi HayashiShunji AmanoYasunori Kin
    • Hiroshi HayashiShunji AmanoYasunori Kin
    • C23C14/34C23C14/56C23C16/44C23C16/455C23C16/50C23C16/54H01L21/205H01L21/31C23C16/00
    • C23C14/34C23C14/562C23C16/455C23C16/545
    • Disclosed herein is a vacuum deposition apparatus including a vacuum chamber having an opening, a substrate to form a thin film thereon provided in the vacuum chamber, an evacuating device connected to the vacuum chamber for evacuating the vacuum chamber, a moving unit provided movably relative to the opening of the vacuum chamber, the moving unit having a cover for openably closing the opening of the vacuum chamber and a supporting member projecting from the cover, a reactor unit removably mounted on the supporting member of the moving unit for forming a thin film on the substrate in the condition where the reactor unit is moved into the vacuum chamber by the moving unit, and a positioning device provided in the vacuum chamber and having a retainer for separating the reactor unit from the supporting member of the moving unit and for retaining the rector unit with a given gap defined between the reactor unit and the substrate. With this configuration, a thin film can be accurately formed on the substrate, and the maintenance of the reactor unit can be easily carried out.
    • 本发明公开了一种真空沉积装置,包括具有开口的真空室,在真空室中形成薄膜的基板,连接到真空室的抽真空装置,用于抽空真空室;移动单元,相对于 真空室的打开,移动单元具有用于可打开地关闭真空室的开口的盖和从盖突出的支撑构件,可移除地安装在移动单元的支撑构件上用于形成薄膜的反应器单元 在反应器单元通过移动单元移动到真空室中的状态下的基板和设置在真空室中并具有用于将反应器单元与移动单元的支撑构件分离的保持器的定位装置, 具有在反应器单元和基板之间限定的给定间隙的反馈单元。 利用这种构造,可以在基板上精确地形成薄膜,并且可以容易地进行反应器单元的维护。
    • 3. 发明授权
    • Thin-film forming method and thin-film forming apparatus
    • 薄膜形成方法和薄膜形成装置
    • US06447652B1
    • 2002-09-10
    • US09463004
    • 2000-04-05
    • Shunji AmanoHiroshi HayashiRyoichi Hiratsuka
    • Shunji AmanoHiroshi HayashiRyoichi Hiratsuka
    • C23C1434
    • C23C16/52C23C14/547C23C14/562G01N21/65G01N21/8422G01N2021/656G11B5/72G11B5/8408
    • A Raman spectrum of a thin film which must be formed is measured in a thin-film forming step for forming the thin film on a member to be processed in an atmosphere, the pressure of which has been reduced. Moreover, the conditions under which the thin film is formed are controlled in accordance with a result of measurement of the Raman spectrum. At this time, the measurement of the Raman spectrum is continuously performed in an in-line manner while the thin film is being continuously formed on the elongated-sheet-like member to be processed. The measurement of the Raman spectrum is performed while the focal point of a probe of a Raman spectrometer is being controlled with respect to the member to be processed or while the output of a laser beam from the Raman spectrometer is being controlled. The thin film which must be. formed is, for example, a protective film of a magnetic recording medium. The protective film is, for example, a hard carbon film (a DLC film).
    • 必须形成的薄膜的拉曼光谱是在薄膜形成步骤中测量的,该薄膜形成步骤用于在压力被降低的气氛中在待加工的构件上形成薄膜。 此外,根据拉曼光谱的测量结果来控制形成薄膜的条件。 此时,在被处理的细长片状构件上连续地形成薄膜的同时,以直线方式连续进行拉曼光谱的测定。 当拉曼光谱仪的探针的焦点相对于待加工的构件被控制或者来自拉曼光谱仪的激光束的输出被控制时,进行拉曼光谱的测量。 薄膜一定是。 形成例如是磁记录介质的保护膜。 保护膜例如是硬质碳膜(DLC膜)。