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    • 1. 发明申请
    • PELLICLE AND MASK ADHESIVE THEREFOR
    • 油漆和面膜粘合剂
    • US20120202144A1
    • 2012-08-09
    • US13500513
    • 2010-10-06
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • G03F1/62C09J123/20
    • C09J123/10C08L23/10C08L23/142C08L23/145C08L23/18C08L2205/02C08L2666/06C08L2666/08C09J153/025G03F1/64
    • Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.
    • 公开了一种具有适当柔软度的掩模粘合剂层的防护薄膜组件,在从掩模剥离之后具有小的粘合剂残留物,并且具有良好的处理特性; 以及用于防止图案的位置偏移的防护薄片,特别是在双重图案化中。 本发明的防护薄膜组件包括防护薄膜组件框架,设置在防护膜框架的一个端面上的防护薄膜组件和设置在防护薄膜组件框架的另一个端面上的掩模粘合剂层; 其中,所述掩模粘合剂层每100重量份苯乙烯树脂(A)含有35〜170重量份含有聚丙烯(b1)和丙烯系弹性体(b2)的硬度调节剂(B) 并且在掩模粘合剂层的电子显微镜照片中,观察到苯乙烯树脂(A)的连续相的相分离结构和硬度调节剂(B)的不连续相。
    • 2. 发明授权
    • Pellicle and mask adhesive therefor
    • 防护薄膜和面膜粘合剂
    • US08685598B2
    • 2014-04-01
    • US13500513
    • 2010-10-06
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • G03F1/00C08L23/00
    • C09J123/10C08L23/10C08L23/142C08L23/145C08L23/18C08L2205/02C08L2666/06C08L2666/08C09J153/025G03F1/64
    • Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.
    • 公开了一种具有适当柔软度的掩模粘合剂层的防护薄膜组件,在从掩模剥离之后具有小的粘合剂残留物,并且具有良好的处理特性; 以及用于防止图案的位置偏移的防护薄片,特别是在双重图案化中。 本发明的防护薄膜组件包括防护薄膜组件框架,设置在防护膜框架的一个端面上的防护薄膜组件和设置在防护薄膜组件框架的另一个端面上的掩模粘合剂层; 其中,所述掩模粘合剂层每100重量份苯乙烯树脂(A)含有35〜170重量份含有聚丙烯(b1)和丙烯系弹性体(b2)的硬度调节剂(B) 并且在掩模粘合剂层的电子显微镜照片中,观察到苯乙烯树脂(A)的连续相的相分离结构和硬度调节剂(B)的不连续相。
    • 3. 发明申请
    • PELLICLE FRAME AND PELLICLE CONTAINING SAME
    • 油脂框架和包含它的油脂
    • US20120122025A1
    • 2012-05-17
    • US13383891
    • 2010-07-06
    • Shuichi MurakamiTakashi Kozeki
    • Shuichi MurakamiTakashi Kozeki
    • G03F1/64B32B15/08B32B3/00B32B27/38
    • G03F1/64Y10T428/265Y10T428/31511Y10T428/31529
    • Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy resin coating is formed on the surface of the pellicle frame. In the infrared absorption spectrum of said epoxy resin coating, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 1200 cm−1 and 1275 cm−1 is at least 0.5 and at most 3; also, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 905 cm−1 and 930 cm−1 is at least 1 and less than 7.
    • 提供了具有合适的膜强度,高耐化学性和低硫酸根离子产生和脱气的防护薄膜组件。 提供的防护薄膜框架支撑防护薄膜组件的外缘,并且在防护薄膜组件框架的表面上形成环氧树脂涂层。 在所述环氧树脂涂层的红外吸收光谱中,1450cm -1和1550cm -1之间的峰的吸光度与在1200cm -1和1275cm -1之间范围内的峰的吸光度的比率, 1至少为0.5,最多为3; 另外,在1450cm -1与1550cm -1之间的峰的吸光度与在905cm -1和930cm -1之间的峰的吸光度的比率也至少为1且小于7 。
    • 4. 发明授权
    • Pellicle frame and pellicle containing same
    • 防护薄膜组件和含有相同的防护薄膜
    • US08507158B2
    • 2013-08-13
    • US13383891
    • 2010-07-06
    • Shuichi MurakamiTakashi Kozeki
    • Shuichi MurakamiTakashi Kozeki
    • G03F1/00
    • G03F1/64Y10T428/265Y10T428/31511Y10T428/31529
    • Provided is a pellicle that has appropriate membrane strength, high resistance to chemicals, and a low degree of sulfate ion generation and outgassing. A provided pellicle frame supports the outer rim of a pellicle membrane, and an epoxy resin coating is formed on the surface of the pellicle frame. In the infrared absorption spectrum of said epoxy resin coating, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 1200 cm−1 and 1275 cm−1 is at least 0.5 and at most 3; also, the ratio of the absorbance of a peak in the range between 1450 cm−1 and 1550 cm−1 to the absorbance of a peak in the range between 905 cm−1 and 930 cm−1 is at least 1 and less than 7.
    • 提供了具有合适的膜强度,高耐化学性和低硫酸根离子产生和脱气的防护薄膜组件。 提供的防护薄膜框架支撑防护薄膜组件的外缘,并且在防护薄膜组件框架的表面上形成环氧树脂涂层。 在所述环氧树脂涂层的红外吸收光谱中,1450cm -1和1550cm -1之间的峰的吸光度与在1200cm -1和1275cm -1之间范围内的峰的吸光度的比率, 1至少为0.5,最多为3; 另外,在1450cm -1与1550cm -1之间的峰的吸光度与在905cm -1和930cm -1之间的峰的吸光度的比率也至少为1且小于7 。