专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5912193A Thermoplastic polyurethanes and molded articles comprising them 失效
标题翻译：热塑性聚氨酯和包含它们的模制品
公开(公告)号：US5912193A
公开(公告)日：1999-06-15
申请号：US033653
申请日：1998-03-03
申请人： Shizuo Iwata , Shinya Katoh , Kimio Nakayama , Tetsuya Ashida , Hisao Yoneda , Michihiro Ishiguro , Koji Hirai
发明人： Shizuo Iwata , Shinya Katoh , Kimio Nakayama , Tetsuya Ashida , Hisao Yoneda , Michihiro Ishiguro , Koji Hirai
IPC分类号： C08G18/08 , C08G18/42 , C08G18/66 , D01F6/70 , B32B27/04
CPC分类号： D01F6/70 , C08G18/0895 , C08G18/42 , C08G18/4238 , C08G18/664 , Y10S428/904 , Y10T428/24446 , Y10T428/31551 , Y10T442/2025 , Y10T442/2352 , Y10T442/68
摘要： Disclosed are thermoplastic polyurethanes obtainable by reacting (a) a polyester-polyol that satisfies all the following requirements (1) to (4):(1) its ester group content (number of ester bonds/number of all carbon atoms) is from 0.08 to 0.17;(2) it has hydroxyl groups of from 2.01 to 2.08 per one molecule;(3) it has a number average molecular weight of from 1000 to 7000; and(4) it has a crystallization enthalpy (.DELTA.H) of 70 J/g or less,(b) an organic diisocyanate and (c) a chain extender at a ratio that satisfies the following numerical formula (i):1.00.ltoreq.b/(a+c).ltoreq.1.10 (i)where a indicates the number of mols of the polyester-polyol, b indicates the number of mols of the organic diisocyanate, and c indicates the number of mols of the chain extender, and methods for producing them; molded articles comprising such thermoplastic polyurethanes; resilient fibers comprising such thermoplastic polyurethanes and methods for producing the fibers; and laminates composed of melt-molded layers of such thermoplastic polyurethanes and fibrous base layers. The thermoplastic polyurethanes of the invention have excellent heat resistance, friction melt resistance, cold resistance, hydrolysis resistance and compression set and have excellent melt-moldability. The resilient polyurethane fibers of the invention have excellent heat resistance, wet heat resistance, hot water resistance, restorability of resiliency and homogeneousness. The laminates of the invention have a soft hand and have excellent friction melt resistance, abrasion resistance, bleeding resistance and whitening resistance.
摘要翻译：公开了通过（a）满足以下所有要求（1）至（4）的聚酯多元醇反应得到的热塑性聚氨酯：（1）其酯基含量（酯键数/全部碳原子数）为0.08 至0.17; （2）每一分子具有2.01〜2.08的羟基; （3）数均分子量为1000〜7000; （4）其结晶焓（DELTA H）为70J / g以下，（b）有机二异氰酸酯和（c）扩链剂，其比例满足以下数值式（i）：1.00 < = b /（a + c）

2. 发明授权

US5780573A Thermoplastic polyurethanes and molded articles comprising them 失效
标题翻译：热塑性聚氨酯和包含它们的模制品
公开(公告)号：US5780573A
公开(公告)日：1998-07-14
申请号：US652131
申请日：1996-05-23
申请人： Shizuo Iwata , Shinya Katoh , Kimio Nakayama , Tetsuya Ashida , Hisao Yoneda , Michihiro Ishiguro , Koji Hirai
发明人： Shizuo Iwata , Shinya Katoh , Kimio Nakayama , Tetsuya Ashida , Hisao Yoneda , Michihiro Ishiguro , Koji Hirai
IPC分类号： C08G18/08 , C08G18/42 , C08G18/66 , D01F6/70 , C08C75/04
CPC分类号： D01F6/70 , C08G18/0895 , C08G18/42 , C08G18/4238 , C08G18/664 , Y10S428/904 , Y10T428/24446 , Y10T428/31551 , Y10T442/2025 , Y10T442/2352 , Y10T442/68
摘要： Disclosed are thermoplastic polyurethanes obtainable by reacting (a) a polyester-polyol that satisfies all the following requirements (1) to (4):(1) its ester group content (number of ester bonds/number of all carbon atoms) is from 0.08 to 0.17; (2) it has hydroxyl groups of from 2.01 to 2.08 per one molecule; (3) it has a number average molecular height of from 1000 to 7000; and (4) it has a crystallization enthalpy (.DELTA.H) of 70 J/g or less, (b) an organic diisocyanate and (c) a chain extender at a ratio that satisfies the following numerical formula (i): 1.00.ltoreq.b/(a+c).ltoreq.1.10 (i) where a indicates the number of mols of the polyester-polyol, b indicates the number of mols of the organic diisocyanate, and c indicates the number of mols of the chain extender, and methods for producing them; molded articles comprising such thermoplastic polyurethanes; resilient fibers comprising such thermoplastic polyurethanes and methods for producing the fibers; and laminates composed of melt-molded layers of such thermoplastic polyurethanes and fibrous base layers. The thermoplastic polyurethanes of the invention have excellent heat resistance, friction melt resistance, cold resistance, hydrolysis resistance and compression set and have excellent melt-moldability.
摘要翻译：公开了通过（a）满足以下所有要求（1）至（4）的聚酯多元醇反应得到的热塑性聚氨酯：（1）其酯基含量（酯键数/全部碳原子数）为0.08 至0.17; （2）每一分子具有2.01〜2.08的羟基; （3）数均分子量为1000〜7000; （4）其结晶焓（DELTA H）为70J / g以下，（b）有机二异氰酸酯和（c）扩链剂，其比例满足以下数值式（i）：1.00 < = b /（a + c）

3. 发明授权

US4806456A Dry development method for a resist film and an apparatus therefor 失效
标题翻译：抗蚀剂膜的干式显影方法及其设备
公开(公告)号：US4806456A
公开(公告)日：1989-02-21
申请号：US147590
申请日：1988-01-21
申请人： Shinya Katoh
发明人： Shinya Katoh
IPC分类号： B63B9/04 , B63B25/08 , B63B35/44 , G03F7/36 , G03C5/16
CPC分类号： G03F7/36 , B63B9/04 , Y10S430/143
摘要： A negative type electron beam sensitive resist film of CMS (chloro-methyl poly-styrene) is developed in a dry environment without using a vacuum system. The resist film is selectively exposed to an electron beam to form a latent image of a desired pattern therein and, then, subjected to irradiation by deep UV having a spectral component of 2537 .ANG. or shorter in an oxidizing gas such as atmospheric air. The average thickness decrease speeds during the dry development are 12 .ANG./min and 300 .ANG./min respectively for the portions exposed and unexposed to the electron beam, revealing a contrast ratio of 100 to 4 in terms of the remaining resist film thickness. A film of PGMA (poly-glycidyl metha-acrylate), and other negative type electron beam sensitive resists, may also be developed by the same method.
摘要翻译： CMS（氯甲基聚苯乙烯）的负型电子束敏感膜在不使用真空系统的干燥环境下显影。抗蚀剂膜选择性地暴露于电子束以在其中形成期望图案的潜像，然后在诸如大气中的氧化气体中经受具有2537或更短的光谱分量的深UV的照射。干式显影时的平均厚度减少速度分别为曝光和未暴露于电子束的部分分别为12安培/分钟和300安培/分钟，显示了剩余抗蚀剂膜厚度的对比度为100至4。也可以通过相同的方法开发PGMA（聚缩水甘油基甲基丙烯酸酯）和其它负型电子束敏感抗蚀剂的膜。

4. 发明授权

US06856374B1 Display and method for repairing defects thereof 有权
标题翻译：修复缺陷的显示方法和方法
公开(公告)号：US06856374B1
公开(公告)日：2005-02-15
申请号：US09627194
申请日：2000-07-27
申请人： Kiyoshi Ozaki , Tsuyoshi Kamada , Kunio Matsubara , Shinya Katoh , Yoshihisa Taguchi , Katsushige Asada , Shogo Hayashi
发明人： Kiyoshi Ozaki , Tsuyoshi Kamada , Kunio Matsubara , Shinya Katoh , Yoshihisa Taguchi , Katsushige Asada , Shogo Hayashi
IPC分类号： B23K26/00 , G02F1/1345 , G02F1/136 , G02F1/1362 , G09F9/00 , H01L29/786 , G02F1/13 , G02F1/1333
CPC分类号： G02F1/136259 , G02F2001/136263
摘要： It is an object of the invention to provide a display and a method for repairing defects of the same in which defects such as inter-layer short-circuits and short-circuits in a single that have occurred at steps for manufacturing the display can be easily repaired to provide a good product with a probability higher than that in the related art. Laser irradiation is carried out as a first cycle of laser irradiation by forming a slit S1 in a region where a drain bus line 220 completely covers a gate bus line 218 to form a cut portion longer than the width of the gate bus line 218 adjacent to an inter-layer short-circuit 290 such that it splits an intersecting portion of the drain bus line 220 into two parts as shown in FIG. 5b. Next, as shown in FIG. 5c, slits S2 and S3 are respectively used for second and third cycles of laser irradiation to cut the drain bus line 220 at both ends of the cut portion (indicated by S1), thereby isolating the inter-layer short-circuit 290 of the drain bus line 220.
摘要翻译：本发明的一个目的是提供一种用于修复缺陷的显示器和方法，其中可以容易地在制造显示器的步骤中发生的单层短路和短路等缺陷修复以提供比现有技术更高的概率的良好产品。通过在漏极总线220完全覆盖栅极总线218的区域中形成狭缝S1以形成比栅极总线218的宽度更长的切割部分，将激光照射作为激光照射的第一周期进行。层间短路290，使得其将漏极总线220的交叉部分分成两部分，如图3所示。 5b。接下来，如图1所示。如图5c所示，狭缝S2和S3分别用于激光照射的第二和第三循环，以在切割部分的两端切割漏极总线220（由S1表示），从而隔离漏极的层间短路290 总线220。

5. 发明授权

US5835697A Information processing system 失效
公开(公告)号：US5835697A
公开(公告)日：1998-11-10
申请号：US674786
申请日：1996-07-03
申请人： Toru Watabe , Yasutomo Sakurai , Takumi Kishino , Yoshio Hirose , Koichi Odahara , Kazuhiro Nonomura , Takumi Takeno , Shinya Katoh , Takato Noda
发明人： Toru Watabe , Yasutomo Sakurai , Takumi Kishino , Yoshio Hirose , Koichi Odahara , Kazuhiro Nonomura , Takumi Takeno , Shinya Katoh , Takato Noda
IPC分类号： G06F11/00 , G06F11/14 , G06F11/16 , G06F11/18 , G06F11/20 , G06F11/22 , G06F13/00
CPC分类号： G06F11/1658 , G06F11/1679 , G06F11/18 , G06F11/182 , G06F11/2041 , G06F11/1402 , G06F11/1675 , G06F11/22
摘要： A TMR unit connects a plurality of processors by a bus and simultaneously executes the same processing operation. Among the plurality of processors, one of them is a master and the remaining processors are slaves. Information formed by only the master processor is outputted to the bus. Each processor has a multiplex control circuit. The multiplex control circuit compares output information formed by itself with bus information outputted to the bus, thereby detecting a failure and allowing an internal circuit to execute necessary processes.

6. 发明申请

US20110223337A1 Extrusion coating apparatus and coating method as well as coating film forming method 审中-公开
标题翻译：挤出涂布装置和涂布方法以及涂膜成型方法
公开(公告)号：US20110223337A1
公开(公告)日：2011-09-15
申请号：US13064273
申请日：2011-03-15
申请人： Hiroki Yanagawa , Kenichi Yasuda , Shinya Katoh , Kazuhiro Oki
发明人： Hiroki Yanagawa , Kenichi Yasuda , Shinya Katoh , Kazuhiro Oki
IPC分类号： B05D3/12 , B05C11/00
CPC分类号： B05D1/265 , B05C5/0266 , B05C11/023 , B05D3/0493
摘要： The present invention provides an extrusion coating apparatus which can control the coating shape in end portions regardless of the coating thickness and can suppress high edges. The extrusion coating apparatus includes a coating width regulating plate inserted into both end portions of a slit, a slit die discharging the coating solution from a discharge opening of the slit, and a chamber depressurizing in a web running direction on an upstream side. The coating width regulating plate has a protruded portion bent toward the web downstream side and facing the web. The coating solution is applied to the web in a state in which the coating solution is oozed on a web facing surface of the protruded portion of the coating width regulating plate by depressurization of the chamber.
摘要翻译：本发明提供一种可以控制端部的涂层形状而与涂层厚度无关的挤出涂布装置，并且可以抑制高边缘。挤出涂布装置包括插入狭缝的两个端部的涂布宽度调节板，从狭缝的排出口排出涂布溶液的狭缝模，以及在上游侧沿纸幅移动方向减压的室。涂布宽度调节板具有朝向纸幅下游侧弯曲并面向幅材的突出部分。通过对室进行减压，将涂布液以涂布宽度调节板的突出部的面向卷筒纸表面的渗透状态施加到卷材上。

7. 发明申请

US20050078235A1 Display and method for repairing defects thereof 有权
公开(公告)号：US20050078235A1
公开(公告)日：2005-04-14
申请号：US10968292
申请日：2004-10-19
申请人： Kiyoshi Ozaki , Tsuyoshi Kamada , Kunio Matsubara , Shinya Katoh , Yoshihisa Taguchi , Katsushige Asada , Shogo Hayashi
发明人： Kiyoshi Ozaki , Tsuyoshi Kamada , Kunio Matsubara , Shinya Katoh , Yoshihisa Taguchi , Katsushige Asada , Shogo Hayashi
IPC分类号： B23K26/00 , G02F1/1345 , G02F1/136 , G02F1/1362 , G09F9/00 , H01L29/786 , G02F1/13 , G02F1/1343
CPC分类号： G02F1/136259 , G02F2001/136263
摘要： It is an object of the invention to provide a display and a method for repairing defects of the same in which defects such as inter-layer short-circuits and short-circuits in a single that have occurred at steps for manufacturing the display can be easily repaired to provide a good product with a probability higher than that in the related art. Laser irradiation is carried out as a first cycle of laser irradiation by forming a slit S1 in a region where a drain bus line 220 completely covers a gate bus line 218 to form a cut portion longer than the width of the gate bus line 218 adjacent to an inter-layer short-circuit 290 such that it splits an intersecting portion of the drain bus line 220 into two parts as shown in FIG. 5b. Next, as shown in FIG. 5c, slits S2 and S3 are respectively used for second and third cycles of laser irradiation to cut the drain bus line 220 at both ends of the cut portion (indicated by S1), thereby isolating the inter-layer short-circuit 290 of the drain bus line 220.

8. 发明授权

US6073249A Information processing system 有权
标题翻译：信息处理系统
公开(公告)号：US6073249A
公开(公告)日：2000-06-06
申请号：US140797
申请日：1998-08-26
申请人： Toru Watabe , Yasutomo Sakurai , Takumi Kishino , Yoshio Hirose , Koichi Odahara , Kazuhiro Nonomura , Takumi Takeno , Shinya Katoh , Takato Noda
发明人： Toru Watabe , Yasutomo Sakurai , Takumi Kishino , Yoshio Hirose , Koichi Odahara , Kazuhiro Nonomura , Takumi Takeno , Shinya Katoh , Takato Noda
IPC分类号： G06F11/00 , G06F11/14 , G06F11/16 , G06F11/18 , G06F11/20 , G06F11/22 , G06F13/00
CPC分类号： G06F11/1658 , G06F11/1679 , G06F11/18 , G06F11/182 , G06F11/2041 , G06F11/1402 , G06F11/1675 , G06F11/22
摘要： A TMR unit connects a plurality of processors by a bus and simultaneously executes the same processing operation. Among the plurality of processors, one of them is a master and the remaining processors are slaves. Information formed by only the master processor is outputted to the bus. Each processor has a multiplex control circuit. The multiplex control circuit compares output information formed by itself with bus information outputted to the bus, thereby detecting a failure and allowing an internal circuit to execute necessary processes.
摘要翻译： TMR单元通过总线连接多个处理器，并且同时执行相同的处理操作。在多个处理器中，其中之一是主机，其余的处理器是从机。仅由主处理器形成的信息被输出到总线。每个处理器具有多路复用控制电路。多路复用控制电路将自身形成的输出信息与输出到总线的总线信息进行比较，从而检测故障并允许内部电路执行必要的处理。

9. 发明授权

US5716753A Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same 失效
标题翻译：含有有机磷化合物和胺的正性醌醌二叠氮化物抗蚀剂组合物和使用其形成精细图案的方法
公开(公告)号：US5716753A
公开(公告)日：1998-02-10
申请号：US675056
申请日：1996-07-03
申请人： Hiroshi Yoshimoto , Nobuo Suzuki , Wataru Ishii , Shinya Katoh , Hiroaki Matsuura
发明人： Hiroshi Yoshimoto , Nobuo Suzuki , Wataru Ishii , Shinya Katoh , Hiroaki Matsuura
IPC分类号： G03F7/022 , G03F7/029 , G03F7/085 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/085
摘要： A positive-working photosensitive composition comprises: (1) an alkali-soluble resin; (2) a quinonediazide compound; (3) an organic phosphoric compound; and (4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.
摘要翻译：正性感光性组合物包含：（1）碱溶性树脂; （2）醌二叠氮化合物; （3）有机磷化合物; 和（4）苯二胺化合物及其衍生物中的至少一种，2-氨基-1-苯基乙醇，N-苯基二乙醇胺，N-苯基乙醇胺，N-乙基二乙醇胺和N-乙基乙醇胺。抗蚀剂组合物显示出比以往更高的对基材的粘附性，以提供在蚀刻期间的加工精度更高的精度，使得能够随后将更细的图案忠实地转移到基底。

10. 发明授权

US07187423B2 Display and method for repairing defects thereof 有权
标题翻译：修复缺陷的显示方法和方法
公开(公告)号：US07187423B2
公开(公告)日：2007-03-06
申请号：US10968292
申请日：2004-10-19
申请人： Kiyoshi Ozaki , Tsuyoshi Kamada , Kunio Matsubara , Shinya Katoh , Yoshihisa Taguchi , Katsushige Asada , Shogo Hayashi
发明人： Kiyoshi Ozaki , Tsuyoshi Kamada , Kunio Matsubara , Shinya Katoh , Yoshihisa Taguchi , Katsushige Asada , Shogo Hayashi
IPC分类号： G02F1/13 , G02F1/1333 , G02F1/1345 , G09G3/36
CPC分类号： G02F1/136259 , G02F2001/136263
摘要： It is an object of the invention to provide a display and a method for repairing defects of the same in which defects such as inter-layer short-circuits and short-circuits in a single that have occurred at steps for manufacturing the display can be easily repaired to provide a good product with a probability higher than that in the related art. Laser irradiation is carried out as a first cycle of laser irradiation by forming a slit S1 in a region where a drain bus line 220 completely covers a gate bus line 218 to form a cut portion longer than the width of the gate bus line 218 adjacent to an inter-layer short-circuit 290 such that it splits an intersecting portion of the drain bus line 220 into two parts as shown in FIG. 5b. Next, as shown in FIG. 5c, slits S2 and S3 are respectively used for second and third cycles of laser irradiation to cut the drain bus line 220 at both ends of the cut portion (indicated by S1), thereby isolating the inter-layer short-circuit 290 of the drain bus line 220.
摘要翻译：本发明的一个目的是提供一种用于修复缺陷的显示器和方法，其中可以容易地在制造显示器的步骤中发生的单层短路和短路等缺陷修复以提供比现有技术更高的概率的良好产品。通过在漏极总线220完全覆盖栅极总线218的区域中形成狭缝S1以形成比相邻的栅极总线218的宽度更长的切割部分，在激光照射的第一周期中进行激光照射到层间短路290，使得其将漏极总线220的交叉部分分成两部分，如图3所示。 5 b。接下来，如图1所示。如图5c所示，狭缝S 2和S 3分别用于激光照射的第二和第三循环，以在切割部分的两端（由S 1表示）切断排出母线220，从而隔离层间短路 290的漏极总线220。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式