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1. 发明授权

US5716753A Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same 失效
标题翻译：含有有机磷化合物和胺的正性醌醌二叠氮化物抗蚀剂组合物和使用其形成精细图案的方法
公开(公告)号：US5716753A
公开(公告)日：1998-02-10
申请号：US675056
申请日：1996-07-03
申请人： Hiroshi Yoshimoto , Nobuo Suzuki , Wataru Ishii , Shinya Katoh , Hiroaki Matsuura
发明人： Hiroshi Yoshimoto , Nobuo Suzuki , Wataru Ishii , Shinya Katoh , Hiroaki Matsuura
IPC分类号： G03F7/022 , G03F7/029 , G03F7/085 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/085
摘要： A positive-working photosensitive composition comprises: (1) an alkali-soluble resin; (2) a quinonediazide compound; (3) an organic phosphoric compound; and (4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.
摘要翻译：正性感光性组合物包含：（1）碱溶性树脂; （2）醌二叠氮化合物; （3）有机磷化合物; 和（4）苯二胺化合物及其衍生物中的至少一种，2-氨基-1-苯基乙醇，N-苯基二乙醇胺，N-苯基乙醇胺，N-乙基二乙醇胺和N-乙基乙醇胺。抗蚀剂组合物显示出比以往更高的对基材的粘附性，以提供在蚀刻期间的加工精度更高的精度，使得能够随后将更细的图案忠实地转移到基底。

2. 发明授权

US4737438A Negative-working photosensitive composition comprising a diphenylamine-melamine condensate and an azide compound 失效
标题翻译：包含二苯胺 - 三聚氰胺缩合物和叠氮化合物的负性感光组合物
公开(公告)号：US4737438A
公开(公告)日：1988-04-12
申请号：US921790
申请日：1986-10-21
申请人： Naoki Ito , Koichiro Hashimoto , Wataru Ishii , Hisashi Nakane
发明人： Naoki Ito , Koichiro Hashimoto , Wataru Ishii , Hisashi Nakane
IPC分类号： G03F7/012 , G03F7/038 , H01L21/027 , G03C1/52
CPC分类号： G03F7/012
摘要： The negative-working photosensitive composition of the invention, which is suitable as a photoresist material in the photolithographic processing of semiconductor devices, comprises (a) a condensation product of a hydroxy-substituted diphenylamine compound such as 4-hydroxy diphenylamine and a methylol melamine or alkoxylated methylol melamine by the reaction in a medium of phosphoric or sulfuric acid and (b) an azide compound capable of strongly absorbing UV or far UV light. The composition gives a photoresist layer having high resistance against heat in the post-baking and the attack of gas plasma encountered in the dry etching for semiconductor processing.
摘要翻译：在半导体器件的光刻处理中适合作为光致抗蚀剂材料的本发明的负作用光敏组合物包含（a）羟基取代的二苯胺化合物如4-羟基二苯胺和羟甲基三聚氰胺的缩合产物或通过在磷酸或硫酸的介质中的反应和（b）能够强烈吸收UV或远紫外光的叠氮化合物的反应而得到的烷氧基化羟甲基三聚氰胺。该组合物提供在后烘烤中具有高耐热性的光致抗蚀剂层和在用于半导体处理的干蚀刻中遇到的气体等离子体的侵蚀。

3. 发明授权

US06542063B2 Electric fuse 有权
公开(公告)号：US06542063B2
公开(公告)日：2003-04-01
申请号：US09774759
申请日：2001-01-31
申请人： Kaoru Kawashima , Yoshihisa Tada , Wataru Ishii , Takahiro Matsuda
发明人： Kaoru Kawashima , Yoshihisa Tada , Wataru Ishii , Takahiro Matsuda
IPC分类号： H01H8543
CPC分类号： H01H85/0417 , H01H85/0082 , H01H85/43
摘要： A pair of electrodes are provided through a base. A cap and the base constitute a chamber, and are connected to each other by fitting projections provided on the base, into locking grooves formed in the cap. A fuse element is connected to upper portions of the electrodes, located in the chamber, by appropriate means such as soldering or welding. The base is in the form of a rectangle having long sides and short sides. A pair of semi-elliptic air pass holes are formed in substantially central portions of the base along the respective long sides, and opposed to each other.

4. 发明授权

US5829727A Powered seat slide device 失效
标题翻译：动力座椅滑动装置
公开(公告)号：US5829727A
公开(公告)日：1998-11-03
申请号：US660474
申请日：1996-06-07
申请人： Isamu Chinomi , Masao Sebata , Wataru Ishii
发明人： Isamu Chinomi , Masao Sebata , Wataru Ishii
IPC分类号： B60N2/06 , F16H25/20 , F16M13/00
CPC分类号： B60N2/067
摘要： A powered seat slide device comprises upper and lower guide rails slidably fitted to each other, and a rail drive mechanism with a reversible motor and a reduction gear box. The drive mechanism includes a screw-threaded shaft being rotatable about its axis through the motor and the gear box and installed on one of the upper and lower guide rails, and a nut member being installed on another rail and screwed into the screw-threaded shaft for a relative axial motion of said screw-threaded shaft with respect to said nut member. An elastic shock-absorbing damper assembly (including essentially annular elastomeric damper) is supported on the screw-threaded shaft in front and in rear of the nut member. The damper assembly includes at least a plastic washer interposed between the nut member and the damper. The plastic washer has a radially and inwardly tapered and circumferentially curved face to define a substantially frusto-conical hollow facing to the flat side wall of the damper, and thus provide an elastic-deformation permissible space of the damper.
摘要翻译：动力座椅滑动装置包括彼此可滑动地配合的上下导轨，以及具有可逆电动机和减速齿轮箱的轨道驱动机构。驱动机构包括螺纹轴，其可绕其轴线旋转通过马达和齿轮箱，并安装在上导轨和下导轨中的一个上，螺母部件安装在另一导轨上并拧入螺纹轴用于所述螺纹轴相对于所述螺母构件的相对轴向运动。弹性减震阻尼器组件（包括基本上环形的弹性阻尼器）支撑在螺母构件前后的螺纹轴上。阻尼器组件至少包括插入螺母构件和阻尼器之间的塑料垫圈。塑料垫圈具有径向和向内的锥形和周向弯曲的表面，以限定面向阻尼器的平坦侧壁的基本截头圆锥形的空心，从而提供阻尼器的弹性变形允许空间。

5. 发明授权

US4902770A Undercoating material for photosensitive resins 失效
标题翻译：感光树脂底漆材料
公开(公告)号：US4902770A
公开(公告)日：1990-02-20
申请号：US52466
申请日：1987-05-20
申请人： Wataru Ishii , Shozo Miyazawa , Shinji Tsuchiya , Hisashi Nakane , Akira Yokota
发明人： Wataru Ishii , Shozo Miyazawa , Shinji Tsuchiya , Hisashi Nakane , Akira Yokota
IPC分类号： G03F7/09 , G03F7/11
CPC分类号： G03F7/11 , G03F7/094
摘要： The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.
摘要翻译：本发明的底涂层组合物可用作在基材表面上提供感光性抗蚀剂层的顶涂层的底涂层，其主要成分为通过羟基取代的二苯胺和在氮原子上被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物。获得的组合物的底漆对于施加在其上的外涂层溶液的侵蚀是高度抗性的，使得由于在底漆和面漆之间的界面处没有任何障碍，通过光刻技术的图案再现的保真度被大大提高层。当底涂层组合物还包含光致纤维素剂，例如，染料，其表面涂层的光敏抗蚀剂具有敏感性的波长区域具有吸收性。

6. 发明授权

US4588675A Method for fine pattern formation on a photoresist 失效
标题翻译：在光致抗蚀剂上精细图案形成的方法
公开(公告)号：US4588675A
公开(公告)日：1986-05-13
申请号：US672764
申请日：1984-11-19
申请人： Hisashi Nakane , Akira Yokota , Mitsuo Yabuta , Wataru Ishii
发明人： Hisashi Nakane , Akira Yokota , Mitsuo Yabuta , Wataru Ishii
IPC分类号： C23C16/50 , C23F1/00 , C23F4/00 , G03F7/36 , G03F7/38 , H01L21/31 , G03F7/26
CPC分类号： G03F7/36 , G03F7/38 , Y10S430/168
摘要： A method for high fidelity patterning of a photoresist layer involving a dry-process development by exposure to a plasma gas. A photoresist layer which had been irradiated in a pattern with actinic rays is heated at a temperature in the range from 200.degree. to 500.degree. C. by applying heat to the surface of the substrate opposite to the surface bearing the photoresist layer, for example, by placing the substrate on a hot plate with the uncoated surface in contact with the hot plate. Subsequent exposure to plasma gas gives a patterned resist layer with a very high residual film thickness.
摘要翻译：涉及通过暴露于等离子体气体的干法显影的光致抗蚀剂层的高保真图案化的方法。用光化射线照射的光致抗蚀剂层在200〜500℃的温度范围内，通过向与该光致抗蚀剂层的表面相反的表面施加热，例如，通过将基板放置在热板上，使未涂覆的表面与热板接触。随后暴露于等离子体气体得到具有非常高的残余膜厚度的图案化抗蚀剂层。

7. 发明授权

US07302934B2 Saddle-straddling type motor vehicle 失效
标题翻译：马鞍式机动车
公开(公告)号：US07302934B2
公开(公告)日：2007-12-04
申请号：US10598685
申请日：2005-03-24
申请人： Wataru Ishii , Hiroyuki Tsuzuku , Toshiharu Hanajima
发明人： Wataru Ishii , Hiroyuki Tsuzuku , Toshiharu Hanajima
IPC分类号： B62K111/00 , F02M51/00
CPC分类号： F02M69/047 , B62K2202/00 , F02B61/02 , F02B75/005 , F02B2275/16 , F02M53/08 , F02M69/044 , Y02T10/123
摘要： An air-cooled engine is hung and fixed under a rear part of a backbone of a body frame. The engine is disposed so that the center axis of a cylinder in its cylinder block extends approximately horizontally and so that its cylinder head is directed toward the front. A fuel injection device is located between an intake valve and an intake port in the cylinder head. An injection nozzle of the fuel injection device and an intake valve opening are placed at a short distance. While the vehicle is idling or running at low speed, the vicinity of the tip of an injector of the fuel injection device is cooled by assist air supplied from a throttle body through a secondary passage, and when the vehicle runs normally or at high speed, the fuel injection device is cooled by the wind that hits the cylinder head.
摘要翻译：空气冷却发动机悬挂并固定在车身框架的骨架的后部。发动机被设置成使得其气缸体中的气缸的中心轴线大致水平地延伸，并且使其气缸盖朝向前方。燃料喷射装置位于气缸盖中的进气门和进气口之间。燃料喷射装置的喷射喷嘴和进气门开口被放置在短距离处。当车辆空转或低速行驶时，燃料喷射装置的喷射器的前端附近被从节气门体通过副通路供给的辅助空气冷却，当车辆正常或高速行驶时，燃料喷射装置被撞击气缸盖的风冷却。

8. 发明申请

US20070175688A1 Saddle-straddling type motor vehicle 失效
公开(公告)号：US20070175688A1
公开(公告)日：2007-08-02
申请号：US10598685
申请日：2005-03-24
申请人： Wataru Ishii , Hiroyuki Tsuzuku , Toshiharu Hanajima
发明人： Wataru Ishii , Hiroyuki Tsuzuku , Toshiharu Hanajima
IPC分类号： B62K11/00 , F02M51/00 , F02B23/00
CPC分类号： F02M69/047 , B62K2202/00 , F02B61/02 , F02B75/005 , F02B2275/16 , F02M53/08 , F02M69/044 , Y02T10/123
摘要： An air-cooled engine is hung and fixed under a rear part of a backbone of a body frame. The engine is disposed so that the center axis of a cylinder in its cylinder block extends approximately horizontally and so that its cylinder head is directed toward the front. A fuel injection device is located between an intake valve and an intake port in the cylinder head. An injection nozzle of the fuel injection device and an intake valve opening are placed at a short distance. While the vehicle is idling or running at low speed, the vicinity of the tip of an injector of the fuel injection device is cooled by assist air supplied from a throttle body through a secondary passage, and when the vehicle runs normally or at high speed, the fuel injection device is cooled by the wind that hits the cylinder head.

9. 发明授权

US5380618A Micropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solvent 失效
标题翻译：具有低分子量酚醛清漆树脂，醌二叠氮磺酰酯和溶剂的微图案形成材料
公开(公告)号：US5380618A
公开(公告)日：1995-01-10
申请号：US230020
申请日：1994-04-19
申请人： Tadayoshi Kokubo , Kazuya Uenishi , Shiro Tan , Wataru Ishii
发明人： Tadayoshi Kokubo , Kazuya Uenishi , Shiro Tan , Wataru Ishii
IPC分类号： C08K5/42 , C09D161/06 , G03F7/022 , G03F7/023 , H01L21/027 , H01L21/30 , G03F7/30
CPC分类号： G03F7/0236 , C08K5/42 , C09D161/06 , G03F7/022
摘要： A micropattern-forming, light sensitive resin composition is disclosed. The composition comprises (a) a novolak resin comprising a condensate between formaldehyde and a mixture of m-cresol and p-cresol with a m-cresol to p-cresol charging weight ratio of from 45/55 to 60/40, wherein the novolak resin has the following characteristics: (i) a dissolving rate of 20 to 800 .ANG./sec in an aqueous solution of tetramethylammonium hydroxide (TMAH) and an alkali activity of 0.131N, (ii) a weight average molecular weight of 1000 to 6000 calculated as polystyrene equivalent, and (iii) a non-exposed dissolving rate of equal to or more than 100 .ANG./sec in an aqueous solution of TMAH with an alkali activity of 0.262N; (b) a light-sensitive substance of 1,2-naphthoquinonediazide-4-sulfonyl ester, and (c) a solvent capable of dissolving the novolak resin and the light-sensitive substance; wherein the novolak resin, the light-sensitive substance, and the solvent are present in such amounts that a 1.0 micron thick resist formed of the material has an optical density at 382 nm of 0.1 to 0.4 .mu.m.sup.-1. Also described is a micropattern-forming process having the steps of: (1) spin coating a substrate with the light-sensitive resin composition; (2) drying the light-sensitive composition; (3) exposing the dried light-sensitive composition using deep UV having a wavelength not longer than about 320 nm; and (4) developing the exposed light-sensitive composition.
摘要翻译：公开了一种形成微图案的光敏树脂组合物。所述组合物包含（a）包含甲醛与间甲酚与对甲酚的混合物之间的缩合物的酚醛清漆树脂，间甲酚与对甲酚的重量比为45/55至60/40，其中酚醛清漆树脂具有以下特征：（i）在四甲基氢氧化铵（TMAH）的水溶液中的溶解速率为20-800μG/ s，碱性活性为0.131N，（ii）重均分子量为1000〜6000的计算值作为聚苯乙烯当量，和（iii）在碱性活性为0.262N的TMAH的水溶液中等于或大于100安培/秒的未暴露的溶解速率; （b）1,2-萘醌二叠氮化物-4-磺酰基酯的光敏物质，和（c）可溶解酚醛清漆树脂和光敏物质的溶剂; 其中酚醛清漆树脂，感光物质和溶剂的存在量使得由该材料形成的1.0微米厚的抗蚀剂的光密度在382nm为0.1至0.4μm-1。还描述了一种微图案形成方法，其具有以下步骤：（1）用感光树脂组合物旋涂基材; （2）干燥感光组合物; （3）使用波长不大于约320nm的深UV曝光干燥的感光组合物; 和（4）显影曝光的感光组合物。

10. 发明授权

US4702992A Method of preparing photoresist material with undercoating of photoextinction agent and condensation product 失效
标题翻译：光致抗蚀剂材料的制备方法，其中包括光降解剂和缩合产物
公开(公告)号：US4702992A
公开(公告)日：1987-10-27
申请号：US708940
申请日：1985-03-06
申请人： Wataru Ishii , Shozo Miyazawa , Shinji Tsuchiya , Hisashi Nakane , Akira Yokota
发明人： Wataru Ishii , Shozo Miyazawa , Shinji Tsuchiya , Hisashi Nakane , Akira Yokota
IPC分类号： H01L21/027 , G03F7/00 , G03F7/075 , G03F7/09 , G03F7/11 , G03C1/76 , G03C1/74
CPC分类号： G03F7/11 , G03F7/094
摘要： The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.
摘要翻译：本发明的底涂层组合物可用作在基材表面上提供感光性抗蚀剂层的顶涂层的底涂层，其主要成分为通过羟基取代的二苯胺和在氮原子上被羟甲基和/或烷氧基甲基取代的三聚氰胺化合物。获得的组合物的底漆对于施加在其上的外涂层溶液的侵蚀是高度抗性的，使得由于在底漆和面漆之间的界面处没有任何障碍，通过光刻技术的图案再现的保真度被大大提高层。当底涂层组合物还包含光致纤维素剂，例如，染料，其表面涂层的光敏抗蚀剂具有敏感性的波长区域具有吸收性。

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