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    • 5. 发明申请
    • ZOOM LENS AND IMAGING APPARATUS
    • 变焦镜头和成像装置
    • US20100289926A1
    • 2010-11-18
    • US12777917
    • 2010-05-11
    • Takashi TANAKA
    • Takashi TANAKA
    • H04N5/262G02B15/14G02B27/64
    • H04N5/23248G02B15/173G02B27/646H04N5/23287
    • A zoom lens includes a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power, which are arranged in this order from an object side. The gap between the lens groups is changed to change power. The third lens group includes at least two partial lens groups. One of the partial lens groups is a camera shake correction group and is moved in a direction vertical to an optical axis to correct a camera shake. The camera shake correction group includes two single lenses, and at least one of the single lenses is a plastic lens.
    • 变焦透镜包括具有正折光力的第一透镜组,具有负折光力的第二透镜组,具有正折射光焦度的第三透镜组和具有正折射光焦度的第四透镜组, 从物体方面的顺序。 改变透镜组之间的间隙以改变功率。 第三透镜组包括至少两个部分透镜组。 部分透镜组中的一个是相机抖动校正组,并且在垂直于光轴的方向上移动以校正相机抖动。 相机抖动校正组包括两个单个透镜,并且单个透镜中的至少一个是塑料透镜。
    • 8. 发明申请
    • METHOD FOR FORMING MAGNETIC LAYER, MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING AND REPRODUCING APPARATUS
    • 形成磁层,磁记录介质,磁记录和再现装置的方法
    • US20100128390A1
    • 2010-05-27
    • US12614999
    • 2009-11-09
    • Takashi TANAKA
    • Takashi TANAKA
    • G11B5/127C23C14/34G11B5/66
    • G11B5/851C23C14/0036C23C14/0688C23C14/3492G11B5/65H01F41/18
    • The invention provides a method of forming a magnetic layer with stable magnetic properties and stable recording-and-reproducing properties, by uniformizing the distribution of oxygen radical concentration upon reactive sputtering, and thereby uniformizing the concentration of oxygen to be taken into the magnetic layer along the plane direction. That is, the invention relates to a method of forming a magnetic layer by reactive sputtering, which comprises: placing a substrate in a reaction container; arranging a pair of electrode units comprising sputtering electrodes and targets which are disposed on surfaces of the sputtering electrodes and which contain chromium other than the oxide thereof, so that the electrode units respectively face both sides of the substrate while the targets are on the substrate sides; feeding an argon-water mixture gas to vicinities of the respective surfaces on the substrate sides of the pair of electrode units; and applying reactive sputtering so that the chromium other than the oxide thereof contained in the targets can be made into chromium oxide as a constituent to form the magnetic layer having the granular structure.
    • 本发明提供了一种形成具有稳定的磁特性和稳定的记录和再现性能的磁性层的方法,通过使反应溅射时氧自由基浓度的分布均匀化,从而使得被引入到磁性层中的氧浓度均匀化 平面方向。 也就是说,本发明涉及通过反应溅射形成磁性层的方法,其包括:将基板放置在反应容器中; 布置一对电极单元,其包括溅射电极和靶,其设置在溅射电极的表面上并且包含除了其氧化物之外的铬,使得电极单元分别面对基板的两侧,同时靶位于基板侧 ; 将氩 - 水混合气体供给到所述一对电极单元的基板侧上的各个表面的附近; 并施加反应性溅射使得靶中包含的除其氧化物之外的铬可以制成氧化铬作为组分,以形成具有颗粒结构的磁性层。
    • 9. 发明申请
    • COATING TREATMENT METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND COATING TREATMENT APPARATUS
    • 涂层处理方法,计算机可读存储介质和涂层处理设备
    • US20080057194A1
    • 2008-03-06
    • US11847805
    • 2007-08-30
    • Takashi TANAKA
    • Takashi TANAKA
    • B05D1/40B05C9/08
    • H01L21/6715G03F7/162
    • In the present invention, a substrate is first rotated at a first rotation speed, and a resist solution is applied to the rotated substrate. Subsequently, the rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. The rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. In this event, the solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.
    • 在本发明中,基板首先以第一转速旋转,并且将抗蚀剂溶液施加到旋转的基板上。 随后,将基板的旋转减速到低于第一旋转速度的第二转速,使得基板以低速旋转以平滑基板上的抗蚀剂溶液。 然后将基板的旋转加速到高于第二转速的第三转速,并且将涂布溶液和/或干燥气体的溶剂供给到基板上的抗蚀剂溶液。 在这种情况下,将溶剂气体供给到比设定厚度厚的基板上的抗蚀剂溶液的一部分,并且将干燥气体供给到比设定厚度更薄的基板上的一部分涂布液。 这使得抗蚀剂溶液的较厚部分变薄并使较薄部分变稠以使抗蚀剂溶液均匀。