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1. 发明申请

US20100171049A1 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US20100171049A1
公开(公告)日：2010-07-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H05G2/00 , G01N21/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光生成室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

2. 发明授权

US08294129B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08294129B2
公开(公告)日：2012-10-23
申请号：US13081899
申请日：2011-04-07
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

3. 发明授权

US08173984B2 Extreme ultraviolet light source apparatus 有权
公开(公告)号：US08173984B2
公开(公告)日：2012-05-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

4. 发明授权

US07923705B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07923705B2
公开(公告)日：2011-04-12
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： G21G4/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

5. 发明申请

US20100176310A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

6. 发明申请

US20080073598A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20080073598A1
公开(公告)日：2008-03-27
申请号：US11902596
申请日：2007-09-24
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
IPC分类号： H05G2/00
CPC分类号： H05G2/001
摘要： An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.
摘要翻译： EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括：具有窗口的EUV光产生室，产生激光束的驱动激光器，放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中，并且反射准直激光束以将激光束收集到目标材料上，调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构，收集EUV光的EUV聚光镜，以及净化气体供给单元，其供给用于保护窗口和抛物面凹面镜的吹扫气体。

7. 发明授权

US07683355B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07683355B2
公开(公告)日：2010-03-23
申请号：US11902596
申请日：2007-09-24
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani
IPC分类号： H05G2/00 , G21G4/00 , A61N5/06 , G01J3/10
CPC分类号： H05G2/001
摘要： An EUV light source apparatus capable of preventing the efficiency of generation of EUV light from decreasing due to deterioration of a window of an EUV light generation chamber. The EUV light source apparatus includes an EUV light generation chamber provided with a window, a driver laser which generates a laser beam, a concave lens which enlarges the laser beam, a convex lens which collimates the enlarged laser beam, a parabolic concave mirror which is arranged in the EUV light generation chamber and reflects the collimated laser beam to collect the laser beam to a target material, a parabolic concave mirror adjusting mechanism which adjusts position and angle of the parabolic concave mirror, an EUV light collector mirror which collects EUV light, and a purge gas supply unit which supplies a purge gas for protecting the window and the parabolic concave mirror.
摘要翻译： EUV光源装置能够防止由于EUV光产生室的窗口的劣化导致的EUV光的产生效率降低。 EUV光源装置包括：具有窗口的EUV光产生室，产生激光束的驱动激光器，放大激光束的凹透镜;使激光束准直的凸透镜;抛物面凹面镜; 布置在EUV光产生室中，并且反射准直激光束以将激光束收集到目标材料上，调整抛物面凹面镜的位置和角度的抛物面凹面镜调节机构，收集EUV光的EUV聚光镜，以及净化气体供给单元，其供给用于保护窗口和抛物面凹面镜的吹扫气体。

8. 发明授权

US08450706B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08450706B2
公开(公告)日：2013-05-28
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： G21F5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译：即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解。该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽构件，用于将诸如集电镜支架的结构构件与从等离子体产生的离子相屏蔽。

9. 发明授权

US08477412B2 Collector mirror exchanging apparatus and method for extreme ultraviolet light source apparatus 有权
标题翻译：用于极紫外光源装置的集光镜交换装置和方法
公开(公告)号：US08477412B2
公开(公告)日：2013-07-02
申请号：US11979513
申请日：2007-11-05
申请人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
发明人： Hiroshi Someya , Tamotsu Abe , Takashi Suganuma , Hideo Hoshino , Akira Sumitani
IPC分类号： G02B15/14
CPC分类号： G21K1/06 , B82Y10/00 , G02B7/18 , G02B7/183 , G02B13/14 , G02B15/14 , G02B15/173 , G03F1/146 , G03F1/22 , G03F7/70175 , G03F7/702 , G03F7/70975 , G21K1/10 , G21K2201/067 , H05G2/001 , Y10T29/49895 , Y10T29/53087 , Y10T29/53539
摘要： A collector mirror exchanging apparatus is capable of safely and easily exchanging a collector mirror for collecting extreme ultra violet light emitted from plasma generated within a chamber of an extreme ultra violet light source apparatus. The collector mirror exchanging apparatus includes: a supporting base for supporting a collector mirror or a collector mirror structure; and a guiding rail disposed on the supporting base and regulating a moving direction of the collector mirror or the collector mirror structure; wherein at least the collector mirror is taken out of the chamber by moving the collector mirror or the collector mirror structure along the guiding rail on the supporting base.
摘要翻译：集光镜交换装置能够安全且容易地交换收集器反射镜，用于收集从极紫外光源装置的室内产生的等离子体发出的极紫外光。集电镜更换装置包括：支撑集电镜或收集镜结构的支撑基座; 以及导轨，其设置在所述支撑基座上并且调节所述集光镜或所述集光镜结构的移动方向; 其特征在于，通过使所述集光镜或所述集光镜结构沿着所述支撑基座上的导轨移动，至少将所述集光镜从所述室取出。

10. 发明申请

US20090272919A1 Exreme ultraviolet light source apparatus 有权
标题翻译：最高紫外光源设备
公开(公告)号：US20090272919A1
公开(公告)日：2009-11-05
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译：即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解。该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集器反射镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽部件，用于将诸如集电镜支架的结构部件与从等离子体产生的离子相屏蔽。

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