专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5805866A Alignment method 失效
标题翻译：对齐方法
公开(公告)号：US5805866A
公开(公告)日：1998-09-08
申请号：US826064
申请日：1997-03-24
申请人： Nobutaka Magome , Shinji Mizutani
发明人： Nobutaka Magome , Shinji Mizutani
IPC分类号： G03F7/20 , G03F9/00 , H01L21/68 , G06F9/455
CPC分类号： G03F7/70858 , G03F9/70 , H01L21/68
摘要： An alignment method for achieving accurate alignment by accurately eliminating an isolated area with a large nonlinear component of an alignment error from sample areas. A conversion parameter is calculated by statistical processing on the basis of a result obtained by measuring the position of each sample area on a substrate to be processed in advance, and each area on the substrate is aligned on the basis of arrangement coordinate values calculated using the conversion parameter. This method relates to a method of aligning each of a plurality of areas to be processed arranged on the substrate on the basis of arrangement coordinates on a first coordinate system (x, y) set on the substrate to a predetermined process position in a second coordinate system (X, Y) for defining the moving position of the substrate.
摘要翻译：一种对准方法，用于通过准确地消除具有来自样本区域的对准误差的大的非线性分量的隔离区域来实现精确对准。基于通过预先对要处理的基板上的每个样品区域的位置进行测量而得到的结果，通过统计处理来计算转换参数，并且基于使用转换参数。该方法涉及基于在基板上设置的第一坐标系（x，y）上的排列坐标到第二坐标中的预定处理位置来对准被布置在基板上的多个待处理区域中的每一个的方法系统（X，Y），用于限定衬底的移动位置。

2. 发明授权

US5907405A Alignment method and exposure system 失效
标题翻译：对准方法和曝光系统
公开(公告)号：US5907405A
公开(公告)日：1999-05-25
申请号：US985906
申请日：1997-12-05
申请人： Shinji Mizutani , Nobutaka Magome
发明人： Shinji Mizutani , Nobutaka Magome
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00
CPC分类号： G03F7/70425 , G03F9/70
摘要： Alignment is performed with a high degree of accuracy by detecting an offset in the Z position of a wafer mark. A focal position detecting system of a multipoint type is provided which irradiates spot beams on a plurality of measurement points substantially equally distributed on the exposure field of an projection optical system and detects the heights or levels of the irradiated positions. An alignment illumination beam for detecting the position of the wafer mark is irradiated as a slit beam from an alignment sensor, and the spot beams are set so as to be overlaid with the irradiated position of the slit beam. A sample shot where the measured value of a level at the irradiated position of the spot beam exceeds an allowable range of the measured value of a level at another measurement point is excluded from alignment data, and the coordinate positions of each shot area on a wafer are calculated by an EGA method.
摘要翻译：通过检测晶片标记的Z位置的偏移，以高精度执行对准。提供一种多点式的焦点位置检测系统，其将基本上均匀地分布在投影光学系统的曝光场上的多个测量点上的点光束照射并检测照射位置的高度或水平。用于检测晶片标记的位置的对准照明光束作为来自对准传感器的狭缝光束照射，并且将点光束设定为与狭缝光束的照射位置重叠。点光源的照射位置处的电平的测量值超过另一测量点处的电平的测量值的允许范围的采样镜头被排除在对准数据之外，并且晶片上每个照射区域的坐标位置通过EGA方法计算。

3. 发明授权

US07911582B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07911582B2
公开(公告)日：2011-03-22
申请号：US12010824
申请日：2008-01-30
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

4. 发明申请

US20090015816A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20090015816A1
公开(公告)日：2009-01-15
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

5. 发明授权

US07460207B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07460207B2
公开(公告)日：2008-12-02
申请号：US11147288
申请日：2005-06-08
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341
摘要： An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译：一种曝光装置，其中通过用液体填充投影光学系统和基板（P）之间的空间的至少一部分并将图案的图像投影到基板上来进行基板（P）的曝光（ P）通过投影光学系统和液体包括气泡检测器（20），其检测投影光学系统和基板（P）之间的液体中的气泡或气泡。因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。

6. 发明申请

US20070263196A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070263196A1
公开(公告)日：2007-11-15
申请号：US11878076
申请日：2007-07-20
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
摘要翻译：光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。

7. 发明申请

US20070035710A1 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20070035710A1
公开(公告)日：2007-02-15
申请号：US11583946
申请日：2006-10-20
申请人： Hiroyuki Nagasaka , Nobutaka Magome
发明人： Hiroyuki Nagasaka , Nobutaka Magome
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/709
摘要： A device manufacturing method includes the steps of providing an immersion liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by the substrate, the non-radiation sensitive material being at least partially transparent to radiation and being of a different material than the immersion liquid, the non-radiation sensitive material being provided over at least a part of a radiation sensitive layer of the substrate; and projecting a patterned beam of radiation, through the immersion liquid, onto a target portion of the substrate using the projection system.
摘要翻译：一种器件制造方法，包括以下步骤：在衬底与光刻投影设备的投影系统的至少一部分之间提供浸没液体，其中非辐射敏感材料由衬底承载，非辐射敏感材料为对辐射至少部分透明并且是与浸没液体不同的材料，所述非辐射敏感材料设置在所述基底的辐射敏感层的至少一部分上; 以及使用所述投影系统将图案化的辐射束通过所述浸没液投射到所述基板的目标部分上。

8. 发明授权

US06650421B2 Method and apparatus for inspecting optical device 失效
标题翻译：检测光学元件的方法和装置
公开(公告)号：US06650421B2
公开(公告)日：2003-11-18
申请号：US09842226
申请日：2001-04-26
申请人： Nobutaka Magome
发明人： Nobutaka Magome
IPC分类号： G01B902
CPC分类号： G03F7/706 , G01M11/0264 , G01M11/0271
摘要： In an interferometer for detecting interference light between light flux passed through an object to be inspected and reference light to be generated from a portion of the light flux passed therethrough, a phase of the interference light is detected with high precision. The light flux passed through the optical system to be inspected forms a spot image on a pinhole formed in a plate. Measuring light from the spot image and the reference-light diffracted out of the light flux from the spot image at the pinhole create interference light which in turn is received by an observation system. An image of interference fringes formed by the interference light is taken with an image pickup element. Further, heterodyne interference light is created by vibrating the plate in the direction intersecting the light flux or in the direction along the light path of the light flux, thereby detecting a phase of each portion of the interference fringes with high precision.
摘要翻译：在用于检测通过待检测物体的光通量和从通过的光束的一部分产生的参考光之间的干涉光的干涉仪中，以高精度检测干涉光的相位。通过要检查的光学系统的光通量在形成在板上的针孔上形成斑点图像。从斑点图像测量光和从针孔处的斑点图像衍射出的光通量的参考光产生干涉光，而干涉光又由观察系统接收。由摄像元件拍摄由干涉光形成的干涉条纹的图像。此外，通过在与光束相交的方向或沿着光束的光路的方向振动板来产生外差干涉光，从而以高精度检测干涉条纹的每个部分的相位。

9. 发明授权

US06583853B1 Method of measuring exposure condition in projection exposure apparatus 失效
标题翻译：在投影曝光装置中测量曝光条件的方法
公开(公告)号：US06583853B1
公开(公告)日：2003-06-24
申请号：US09435367
申请日：1999-11-08
申请人： Nobutaka Magome , Osamu Furukawa
发明人： Nobutaka Magome , Osamu Furukawa
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70025 , G03F7/70041 , G03F7/70558
摘要： A method of obtaining an optimum exposure condition of a step-and-scan exposure apparatus, the step-and-scan exposure apparatus synchronously moving a mask and a substrate relative to an illumination light to transfer a pattern of the mask onto a plurality of shot areas on the substrate, the method comprising the steps of determining an unevenness of an illuminance of the illumination light, adjusting the illumination light to change the illuminance within a predetermined range, inputting a plurality of first exposure conditions into the step-and-scan exposure apparatus, testing the plurality of first exposure condition in a step-and-repeat mode.
摘要翻译：一种获得逐步扫描曝光装置的最佳曝光条件的方法，所述步进扫描曝光装置相对于照明光同步移动掩模和基板，以将掩模的图案转印到多个拍摄所述方法包括以下步骤：确定所述照明光的照度的不均匀性，调整照明光以将照度改变在预定范围内，将多个第一曝光条件输入到所述逐步扫描曝光中装置，以逐步重复模式测试多个第一曝光条件。

10. 发明授权

US06356343B1 Mark for position detection and mark detecting method and apparatus 失效
标题翻译：标记位置检测和标记检测方法和装置
公开(公告)号：US06356343B1
公开(公告)日：2002-03-12
申请号：US09366565
申请日：1999-08-04
申请人： Naomasa Shiraishi , Nobutaka Magome
发明人： Naomasa Shiraishi , Nobutaka Magome
IPC分类号： G03B2742
CPC分类号： G03F9/70 , G03F9/00
摘要： A mark for position detection formed on a substrate has a first pattern disposed near the center of the mark and having periodicity in a Y-axis direction, and second patterns respectively disposed near both sides of the first pattern in an X-axis direction and each having periodicity in the X-axis direction. The position of the first pattern is detected by aligning the detection center of a detecting optical system, that is, the minimal aberration point of the detecting optical system, with the center of the first pattern. The positions of the second patterns are detected at respective points symmetric with respect to the minimal aberration point, and the detected values for the positions of the second patterns are averaged. An apparatus for detecting the mark for position detection detects the first and second patterns by image processing when the mark is in a stationary state.
摘要翻译：在基板上形成的用于位置检测的标记具有设置在标记中心附近并具有Y轴方向的周期性的第一图案，以及分别设置在X轴方向上的第一图案的两侧附近的第二图案，具有X轴方向的周期性。通过将检测光学系统的检测中心即检测光学系统的最小像差点与第一图案的中心对准来检测第一图案的位置。在相对于最小像差点对称的各个点处检测第二图案的位置，并且对第二图案的位置的检测值进行平均。用于检测位置检测标记的装置在标记处于静止状态时通过图像处理检测第一和第二图案。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式