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    • 6. 发明授权
    • Process for preparing organic smectite by solid-solid reaction
    • 固相反应制备有机蒙皂石的方法
    • US5028351A
    • 1991-07-02
    • US515305
    • 1990-04-27
    • Chuzo KatoKazuyuki KurodaMakoto Ogawa
    • Chuzo KatoKazuyuki KurodaMakoto Ogawa
    • C04B33/00B28C1/10C01B33/40C01B33/44
    • C01B33/44
    • A process for preparing organic smectite applied for thickener, protective colloid, dispersant and binder. The present invention features the process for preparing the organic smectite by mixing smectite incluidng 0 to 20% by weight of interlayer water in the interlayer spaces of said smectite with organic cation-supplying substance selected from at least one of aliphatic alkylamine salts, aromatic amine salts and basic organic compound having pyridine nucleus, and/or basic organic molecule in a mixing ratio of the latter to the former of 10 to 500 milliequivalents per 100 g smectite, and stirring the resulting mixture at a temperature of 5.degree. to 50.degree. C. under an applied pressure of 0.5 to 10 kg/cm.sup.2 to cause a solid-solid reaction. By the process of the present invention, exchangeable organic cations and/or basic organic molecules as a guest substance are intercalated int he interlayer spaces of the smectite as a host substance, thus the hydrophilic smectite can convert to the organic smectite by a more simplified solid-solid reaction than a liquid-liquid reaction.
    • 一种制备有机蒙皂石的方法,用于增稠剂,保护胶体,分散剂和粘合剂。 本发明的特征在于通过将含有0-20%重量的层间水的蒙皂石与所述蒙皂石的层间空间中的有机阳离子供应物质混合,所述有机阳离子供体物质选自以下中的至少一种:脂族烷基胺盐,芳族胺盐 和具有吡啶核的碱性有机化合物和/或碱性有机分子,其混合比例相对于每100克蒙皂石的10-500毫当量的混合比,并在5℃至50℃的温度下搅拌所得混合物。 在0.5〜10kg / cm2的施加压力下进行固体 - 固体反应。 通过本发明的方法,作为客体物质的交换性有机阳离子和/或碱性有机分子以蒙脱石的层间空间作为主体物质嵌入,因此亲水性绿土可以通过更简单的固体转化为有机蒙皂石 固液反应比液 - 液反应。
    • 8. 发明申请
    • Mesostructured film, mesoporous material film, and production methods for the same
    • 中等结构膜,介孔材料膜及其制备方法
    • US20060204758A1
    • 2006-09-14
    • US10544109
    • 2004-08-05
    • Hirokatsu MiyataYasuhiro KawashimaKazuyuki Kuroda
    • Hirokatsu MiyataYasuhiro KawashimaKazuyuki Kuroda
    • B32B9/04
    • G21K1/06C01B37/02Y10T428/24322Y10T428/24496Y10T428/249967Y10T428/249969Y10T428/31504
    • A mesostructured film is provided having a structure in which surfactant molecular assemblies are regularly arranged three-dimensionally. A polymer compound thin film is formed on the substrate surface through spin coating or the like, and a rotating roller wrapped with a cloth is pressed against the polymer film for rubbing in one direction. The polymer material includes polyimide, polyamide, and polystyrene. The substrate includes a silica glass substrate and a silicon substrate. The mesostructured film can be formed by retaining the substrate in an aqueous solution containing a surfactant, silicon alkoxide, and acid. After being retained in the solution, the substrate is heated at about 60 to 120° C. for several hours to several days for reaction. The surfactant includes C18H37 (OCH2CH2)200H and C16H33 (OCH2CH2) 200H. The alkoxide included tetraethoxysilane, tetramethoxysilane, and tetrapropoxysilane. Hydrochloric acid, nitric acid, or sulfuric acid is used as a catalyst.
    • 提供了具有其中表面活性剂分子组件被三维规则地排列的结构的介孔结构膜。 通过旋涂等在基材表面上形成高分子化合物薄膜,将用布覆盖的旋转辊按压在聚合物膜上以在一个方向上摩擦。 聚合物材料包括聚酰亚胺,聚酰胺和聚苯乙烯。 基板包括石英玻璃基板和硅基板。 可以通过将基材保持在含有表面活性剂,硅醇盐和酸的水溶液中来形成介孔结构膜。 保留在溶液中后,将基底在约60至120℃加热数小时至数天以进行反应。 表面活性剂包括C 18 H 23(OCH 2 CH 2)2 O 20 H和C 16 H 33(OCH 2 CH 2)20 H 2 O 醇盐包括四乙氧基硅烷,四甲氧基硅烷和四丙氧基硅烷。 使用盐酸,硝酸或硫酸作为催化剂。