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    • 2. 发明授权
    • Multi-reflector antenna
    • 多反射天线
    • US4811029A
    • 1989-03-07
    • US833338
    • 1986-02-25
    • Shinichi NomotoYoshihiko MizuguchiFumio Watanabe
    • Shinichi NomotoYoshihiko MizuguchiFumio Watanabe
    • H01Q19/17H01Q19/19H01Q15/16
    • H01Q19/192H01Q19/17
    • A multi-reflector antenna is disclosed which is arranged so that a main reflector surface, a subreflector surface and a primary radiator are electro-magnetically coupled together. When the main reflector is represented by a coordinate z=z(.rho., .psi.) using cylindrical coordinate system (z, .rho., .psi.) in which the direction of radiation of a main beam of the main reflector surface is in correspondence with the z-axis and the subreflector surface is represented by a coordinate r=r(.theta., .phi.) in a vector system using a spherical coordinate system (r, .theta., .phi.) in which the Snell's reference direction of the primary radiator is set to .theta.=0, the said z(.rho., .psi.) and r(.theta., .phi.) are so determined as to satisfy the law of reflection, a condition of constant path length and the following relation:.psi.=-.phi.+.psi..sub.0.rho.=.rho..sub.0 tan.theta./2where .psi..sub.0 and .rho..sub.0 are constants. The primary radiator is comprised of a plurality of horns.
    • 公开了一种多反射器天线,其被布置成使得主反射器表面,副反射器表面和主辐射器被电磁耦合在一起。 当使用圆柱坐标系(z,rho,psi)的坐标z = z(rho,psi)表示主反射器时,主反射器表面的主光束的辐射方向与z- 轴和亚反射器表面由矢量系统中的坐标r = r(θ,phi)表示,其中使用球面坐标系(r,theta,phi),其中主辐射器的Snell参考方向被设置为θ= 0 ,所述z(rho,psi)和r(θ,phi)被确定为满足反射定律,恒定路径长度的条件和以下关系:psi = -phi + psi 0 rho =rho0tanθ / 2其中psi 0和rho 0是常数。 主辐射器由多个喇叭组成。
    • 7. 发明申请
    • ROTATION DRIVE DEVICE
    • 旋转驱动装置
    • US20120285168A1
    • 2012-11-15
    • US13555077
    • 2012-07-20
    • Fumio Watanabe
    • Fumio Watanabe
    • F03G3/00
    • F03G3/00
    • In a rotation drive device (10), each of rotating units (20) has a swing arm (23) which is supported so as to be swingable around a swing center axis (23A) provided in a support table (22), a weight (24) is provided at a position at which a length of an arm from the swing center axis (23A) of the swing arm (23) is longer, and a connection point in a fluid cylinder (25) side is provided at a position at which the length of the arm from the swing center axis (23A) is shorter.
    • 在旋转驱动装置(10)中,每个旋转单元(20)具有摆动臂(23),所述摆动臂(23)被支撑成围绕设置在支撑台(22)中的摆动中心轴线(23A)摆动, (24)设置在从摆臂(23)的摆动中心轴(23A)的臂的长度较长的位置,并且在液压缸(25)侧的连接点设置在位置 其中臂从摆动中心轴线(23A)的长度较短。
    • 8. 发明授权
    • Quadrupole mass spectrometer and vacuum device using the same
    • 四极杆质谱仪和使用相同的真空装置
    • US07332714B2
    • 2008-02-19
    • US11375063
    • 2006-03-15
    • Fumio WatanabeReiki Watanabe
    • Fumio WatanabeReiki Watanabe
    • H01J49/42H01J49/28
    • H01J49/147H01J41/10H01J49/4215
    • In a quadrupole mass spectrometer which measures partial pressure strength according to a gas type in a vacuum system from ion current intensity, a quadrupole mass spectrometer with a total pressure measurement electrode has a total pressure measurement electrode for examining an ion density disposed in a demarcation space which is comprised of a grid electrode and an ion focusing electrode. And, a vacuum system is provided with only the quadrupole mass spectrometer which measures partial pressure strength according to a gas type in the vacuum system from an ion current intensity and does not have an ionization vacuum gauge other than the quadrupole mass spectrometer.
    • 在根据离子电流强度根据真空系统中的气体类型测量分压强度的四极杆质谱仪中,具有总压力测量电极的四极质谱仪具有用于检查设置在分界空间中的离子密度的总压力测量电极 其由栅电极和离子聚焦电极组成。 并且,仅具有四极质谱仪的真空系统,其根据离子电流强度根据真空系统中的气体类型测量分压强度,并且除四极质谱仪之外不具有电离真空计。
    • 9. 发明授权
    • Material for vacuum device, vacuum device, vacuum apparatus, manufacturing method of material for vacuum device, processing method of vacuum device, and processing method of vacuum apparatus
    • 真空装置的材料,真空装置,真空装置,真空装置的材料的制造方法,真空装置的加工方法以及真空装置的加工方法
    • US07297419B2
    • 2007-11-20
    • US10862358
    • 2004-06-08
    • Fumio Watanabe
    • Fumio Watanabe
    • D02G3/00
    • C23C8/36C22F1/02C22F1/08C23C8/02C23C28/048C23C30/00Y10T428/30
    • The present invention relates to a manufacturing method of a material for vacuum device used in a vacuum apparatus that generates ultra-high vacuum and performs processing. Its constitution has the steps of: reducing pressure around the alloy of Cu and a doping element; increasing the temperature of the alloy to outgas hydrogen from the alloy, and gathering the doping element near the surface of the alloy and precipitating the doping element; and exposing the alloy to single oxygen, single nitrogen, mixed gas of oxygen and nitrogen, ozone (O3), oxygen content compound, nitrogen content compound or oxygen-nitrogen content compound, or a combination of them, or a plasma thereof while the temperature of the alloy is maintained at a range of room temperature or higher and the temperature of the alloy increased for outgassing hydrogen or lower, whereby it is reacted with the precipitated doping element so that one of an oxide film, a nitride film and an oxide-nitride film of the doping element is formed on a surface layer of the alloy.
    • 本发明涉及一种用于真空装置的真空装置的制造方法,该真空装置产生超高真空并进行处理。 其结构具有以下步骤:减少Cu和掺杂元素周围的合金压力; 提高合金的温度以从合金中排出氢气,并将掺杂元素聚集在合金表面附近并沉淀掺杂元素; 并将合金暴露于单氧,单氮,氧和氮的混合气体,臭氧(O 3 3 N),氧含量化合物,氮含量化合物或氧 - 氮含量化合物或它们的组合 或其等离子体,同时合金的温度保持在室温以上的范围内,并且合金的温度升高以使除气氢或更低,由此其与沉淀的掺杂元素反应,使得氧化物膜 在合金的表面层上形成掺杂元素的氮化物膜和氧化物氮化物膜。