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1. 发明授权

US06262491B1 Control system for hybrid vehicle 有权
标题翻译：混合动力汽车控制系统
公开(公告)号：US06262491B1
公开(公告)日：2001-07-17
申请号：US09453961
申请日：1999-12-03
申请人： Shinichi Kitajima , Atsushi Izumiura , Keisuke Uchida , Katsuhiro Kumagai , Asao Ukai , Hironao Fukuchi , Kazutomo Sawamura , Hideyuki Oki , Kenji Nakano , Fumihiko Konno , Takashi Kiyomiya , Nobuyuki Irie
发明人： Shinichi Kitajima , Atsushi Izumiura , Keisuke Uchida , Katsuhiro Kumagai , Asao Ukai , Hironao Fukuchi , Kazutomo Sawamura , Hideyuki Oki , Kenji Nakano , Fumihiko Konno , Takashi Kiyomiya , Nobuyuki Irie
IPC分类号： F02M5100
CPC分类号： B60W20/13 , B60K6/48 , B60K6/485 , B60L11/12 , B60W20/00 , B60W2510/0671 , B60W2510/244 , Y02T10/6226 , Y02T10/7005 , Y02T10/7077 , Y10S903/918
摘要： The control system of the present invention is provided for a hybrid vehicle with an engine, a motor, and a power storage unit. The control system selects one of an air intake passage pressure assist mode (PB assist mode) corresponding to a partial load range of the engine and a throttle assist mode corresponding to the opening state of a throttle. The control system comprises: an assist mode determining device for determining whether the vehicle is in the PB assist mode or in the throttle assist mode, based on the opening state of a throttle; a PB assist amount determining device for determining a base assist amount in the PB assist mode, based on the rotational speed of the engine and an air intake passage pressure (PB); a throttle assist amount determining device for determining the base assist amount in the throttle assist mode, based on the rotational speed of the engine, the base assist amount including a range defined by an upper threshold value and a lower threshold value; and a throttle assist amount changer for gradually changing the assist amount determined by the throttle assist amount determining device between the upper threshold value and the lower threshold value when the vehicle runs through a partial load range to a full load range of the engine.
摘要翻译：本发明的控制系统用于具有发动机，电动机和蓄电单元的混合动力车辆。控制系统选择与发动机的部分负荷范围相对应的进气通道压力辅助模式（PB辅助模式）和对应于节流阀的打开状态的节气门辅助模式之一。控制系统包括：辅助模式确定装置，用于基于节气门的打开状态来确定车辆是否处于PB辅助模式或节气门辅助模式; 一个PB辅助量确定装置，用于基于发动机的转速和进气通道压力（PB）确定在PB辅助模式中的基准辅助量; 用于基于所述发动机的转速来确定所述节气门辅助模式下的所述辅助辅助量的所述辅助量判定装置，所述辅助辅助量包括由上阈值和下阈值所限定的范围; 以及节气门辅助量变更器，用于当车辆经过部分负荷范围到发动机的满载范围时，逐渐改变由节气门辅助量确定装置确定的辅助量在上限阈值和下阈值之间。

2. 发明授权

US06842225B1 Exposure apparatus, microdevice, photomask, method of exposure, and method of production of device 有权
标题翻译：曝光装置，微型装置，光掩模，曝光方法和装置的制造方法
公开(公告)号：US06842225B1
公开(公告)日：2005-01-11
申请号：US09959676
申请日：2000-04-11
申请人： Nobuyuki Irie
发明人： Nobuyuki Irie
IPC分类号： G03F7/20 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70475
摘要： A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate (4) while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor (126) on the substrate stage (6), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).
摘要翻译：一种缝合式曝光装置，用于在覆盖基板的表面的不同区域上连续曝光标线图案的图像，同时覆盖其上的部分，其中具有光衰减部分的密度滤光器（Fj）在掩模版（Ri）附近设置用于以倾斜方式减少图案的重叠部分的光量的量，将浓度滤光片（Fj）保持在用于调节姿势的滤光片（FS）通过衬底台（6）上的照度均匀性传感器（126）检测密度滤波器（Fj）的姿势，并且将密度滤波器（Fj）的姿势与掩模版（Ri）的姿势相匹配过滤器级（FS）。

3. 发明授权

US06731029B2 Canned linear motor 有权
标题翻译：罐装直线电机
公开(公告)号：US06731029B2
公开(公告)日：2004-05-04
申请号：US10203651
申请日：2002-08-26
申请人： Toru Shikayama , Shusaku Yoshida , Nobuyuki Irie , JianPing Yu
发明人： Toru Shikayama , Shusaku Yoshida , Nobuyuki Irie , JianPing Yu
IPC分类号： H02K900
CPC分类号： H02K41/031 , H02K5/128 , H02K9/197
摘要： A canned linear motor such that increase of the temperature of the mover is suppressed, the viscous damping force is reduced, and the strength of the can does not deteriorate. A canned linear motor comprises two parts, in one of which a permanent magnet is provided as a field system and in the other of which a three-phase armature winding, a winding fixing frame for supporting the armature winding, a coolant passage through which a coolant for cooling the surface of the armature winding passes, a can (14) covering the armature winding and the coolant passage, and a header (14′) for sealing the can. Slits (151, 152) extending in the direction of travel and parallel to each other are formed in the can (14).
摘要翻译：能够抑制动子的温度上升的粘性线性电动机，粘性阻尼力降低，罐的强度不劣化。罐装线性电动机包括两部分，其中一个设置有永磁体作为场系统，另一部分设置有三相电枢绕组，用于支撑电枢绕组的绕组固定框架，冷却剂通道，用于冷却电枢绕组表面的冷却剂通过，覆盖电枢绕组和冷却剂通道的罐（14）和用于密封罐的集管（14'）。在罐（14）中形成在行进方向上延伸并且彼此平行的狭缝（151,152）。

4. 发明授权

US06337162B1 Method of exposure, photomask, method of production of photomask, microdevice, and method of production of microdevice 有权
标题翻译：曝光方法，光掩模，光掩模的生产方法，微型装置以及微型装置的生产方法
公开(公告)号：US06337162B1
公开(公告)日：2002-01-08
申请号：US09661396
申请日：2000-09-13
申请人： Nobuyuki Irie
发明人： Nobuyuki Irie
IPC分类号： G03F900
CPC分类号： G03F7/70591 , G03F7/70258 , G03F7/70358 , G03F7/706 , G03F7/707 , G03F7/70716 , G03F9/7003 , G03F9/7088
摘要： A method of exposure projecting and exposing a pattern formed on a mask on to a photosensitive substrate through a projection optical system, comprising the steps of measuring a position of an image projected by said projection optical system; and projecting and exposing said pattern of the mask in a state with imaging characteristics corrected to reduce an amount of offset of a position of said projected image from an ideal position.
摘要翻译：一种曝光方法，其通过投影光学系统将形成在掩模上的图案投影并曝光到感光基板上，包括以下步骤：测量由所述投影光学系统投影的图像的位置; 并且将所述掩模的所述图案投影和曝光在具有校正的成像特性的状态下，以减少所述投影图像的位置与理想位置的偏移量。

5. 发明授权

US5808910A Alignment method 失效
标题翻译：对齐方法
公开(公告)号：US5808910A
公开(公告)日：1998-09-15
申请号：US704363
申请日：1996-08-29
申请人： Nobuyuki Irie , Shigeru Hirukawa
发明人： Nobuyuki Irie , Shigeru Hirukawa
IPC分类号： G03F7/20 , G03F9/00 , G01B11/26
CPC分类号： G03F7/70633 , G03F7/70425 , G03F9/7003 , G03F9/7046
摘要： A substrate has a plurality of areas, from which several specific areas are selected. The coordinate positions of the specific areas on a static coordinate system are measured and the coordinate positions of the specific areas on the static coordinate system are calculated by the statistic calculation. For the respective specific areas, the calculated coordinate positions are subtracted from the measured coordinate positions to obtain the respective nonlinear position errors of the specific areas. When there is a peculiar area where the nonlinear position error exceeds an allowed value, the coordinate position of at least one area around the peculiar area is measured to obtain the nonlinear position error thereof. Prior to calculating the coordinate positions of the areas on the substrate on the static coordinate system by the use of the coordinate positions of the specific areas, it is judged based on the nonlinear position errors of the peculiar area and the area around the peculiar area whether the coordinate position of the peculiar area is used.
摘要翻译：衬底具有多个区域，从中选择几个特定区域。测量静态坐标系上特定区域的坐标位置，并通过统计量计算静态坐标系上特定区域的坐标位置。对于各个特定区域，从测量的坐标位置减去所计算的坐标位置，以获得特定区域的各自的非线性位置误差。当存在非线性位置误差超过允许值的特殊区域时，测量特殊区域周围的至少一个区域的坐标位置以获得非线性位置误差。在通过使用特定区域的坐标位置计算静态坐标系上的基板上的区域的坐标位置之后，基于特殊区域的非线性位置误差和特殊区域周围的区域来判断是否使用特殊区域的坐标位置。

6. 发明授权

US5596204A Method for aligning processing areas on a substrate with a predetermined position in a static coordinate system 失效
标题翻译：将基板上的处理区域与静态坐标系中的预定位置对准的方法
公开(公告)号：US5596204A
公开(公告)日：1997-01-21
申请号：US222868
申请日：1994-04-05
申请人： Nobuyuki Irie , Shigeru Hirukawa , Hiroki Tateno
发明人： Nobuyuki Irie , Shigeru Hirukawa , Hiroki Tateno
IPC分类号： G03F9/00 , G01N21/86
CPC分类号： G03F9/70
摘要： Measured is a coordinate position, on a static coordinate system, of each of some specified areas selected from a plurality of areas on a substrate. The coordinate positions of some specified areas undergo a weighted averaging process by use of such a weight that it decreases with a larger distance between the specified areas. The coordinate position is thereby smoothed per specified area. The weight is given to each of some smoothed coordinate positions, and, thereafter, a statistic calculation is effected. The coordinate position, on the static coordinate system, of the area on the substrate is thereby obtained. The substrate is sequentially located based on the obtained coordinate position, and each area on the substrate is thus aligned to a predetermined position.
摘要翻译：测量的是坐标位置，在静态坐标系上，从基板上的多个区域中选择的每个指定区域。一些指定区域的坐标位置通过使用这样的重量进行加权平均处理，该重量随着指定区域之间的较大距离而减小。从而平滑每个指定区域的坐标位置。给予每个平滑坐标位置的权重，然后进行统计计算。由此获得基板上的区域的静坐标系上的坐标位置。基于所获得的坐标位置顺序地设置基板，并且将基板上的每个区域对准到预定位置。

7. 发明授权

US06800968B1 Linear motor 有权
标题翻译：直线电机
公开(公告)号：US06800968B1
公开(公告)日：2004-10-05
申请号：US10311226
申请日：2003-07-29
申请人： Toru Shikayama , Nobuyuki Irie , Yasuhiro Miyamoto
发明人： Toru Shikayama , Nobuyuki Irie , Yasuhiro Miyamoto
IPC分类号： H02K4100
CPC分类号： H02K41/031 , H02K3/47 , H02K41/03
摘要： A linear motor excellent in insulation between armature coils, easy to assemble, very small in thrust ripple, comprising a secondary side supporter attached with a secondary side consisting of a plurality of magnetic field poles, and an armature element supporter facing the secondary side via a clearance and provided with an armature element (4) having a plurality of concentrate-wound armature coils (6), the secondary side and the armature element (4) being disposed facing each other and in parallel in the advancing direction, wherein field poles in the secondary side are disposed in the advancing direction of a mover with adjacent poles being unlike every Pm pitches, and a plurality of armature coils (6) are disposed in an array in the advancing direction of the mover every Pc pitches, the coil pitch Pc=5/3×Pm.
摘要翻译：一种电枢线圈之间的绝缘性优异的线性电动机，易于组装，推力波纹非常小，包括：二次侧支撑体，其附接有由多个磁场极组成的次级侧;以及电枢元件支撑体，其通过经由间隙设置有具有多个浓缩绕线电枢线圈（6）的电枢元件（4），所述次侧和所述电枢元件（4）彼此面对并且在前进方向上平行设置，其中，次级侧沿移动器的前进方向设置，相邻的极与每个Pm间距不同，并且多个电枢线圈（6）按每个Pc间距沿移动器的前进方向排列成阵列，线圈间距Pc = 5 / 3xPm。

8. 发明授权

US06710847B1 Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US06710847B1
公开(公告)日：2004-03-23
申请号：US09830501
申请日：2001-04-27
申请人： Nobuyuki Irie
发明人： Nobuyuki Irie
IPC分类号： G03B2742
CPC分类号： G03F7/70541 , G03F1/00 , G03F7/70475
摘要： A pattern enlarged from a transfer pattern is divided into patterns (Pi) of a plurality of master reticles (Ri). Images of the patterns (Pi) of the plurality of master reticles (Ri) reduced by a projection optical system are successively-projected and exposed on the surface of a blank (mask substrate) while stitching. Marks (M1, M2) indicating identification information for identifying a master reticle from another master reticle, transfer positions, etc. are formed on the master reticles (Ri). These marks (M1, M2) are detected before the exposure and exposure is performed in accordance with the information on the transfer position etc. shown by the marks (M1, M2) or reticle information (exposure conditions, various correction values, etc.) relating to the master reticles stored and held in advance corresponding to the identification information. The number of work steps when producing a working reticle using the plurality of master reticles is reduced and occurrence of work errors can be prevented.
摘要翻译：从传送图案放大的图案被划分为多个主光阑（Ri）的图案（Pi）。通过投影光学系统减少的多个主准线（Ri）的图案（Pi）的图像在缝合时被连续地投影并暴露在坯料（掩模基板）的表面上。标示（M1，M2）表示用于从另一个主掩模板识别主掩模的识别信息，转印位置等形成在主光罩（Ri）上。根据由标记（M1，M2）或标线信息（曝光条件，各种校正值等）所示的关于转印位置等的信息，在曝光和曝光之前检测这些标记（M1，M2）涉及根据识别信息预先存储和保存的主标线。使用多个母版印章生产作业标线片时的工作步骤减少，并且可以防止工作错误的发生。

9. 发明授权

US06607863B2 Exposure method of production of density filter 失效
标题翻译：密度过滤器的生产曝光方法
公开(公告)号：US06607863B2
公开(公告)日：2003-08-19
申请号：US09793648
申请日：2001-02-27
申请人： Nobuyuki Irie
发明人： Nobuyuki Irie
IPC分类号： G03F900
CPC分类号： G03F7/70066 , G03F7/70191 , G03F7/70358 , G03F7/70475 , Y10S430/143
摘要： A method of exposure while gradually reducing the exposure at peripheral parts when transferring patterns to a plurality of areas on a substrate where the peripheral parts are partially superposed, including exposing one shot area of the substrate through a density filter set so that the energy at the peripheral parts becomes a predetermined first distribution, measuring the distribution of exposure at portions corresponding to the peripheral parts on the substrate, determining a second distribution where the exposure at the peripheral parts becomes a target value based on the measured distribution of exposure, and exposes the shot areas adjoining the one shot area through a density filter set to give the second distribution.
摘要翻译：一种曝光方法，当将图案转印到周边部分重叠的基板上的多个区域时，在周边部分逐渐减少曝光，包括通过密度滤光片组曝光基板的一个照射区域，使得在周边部分成为预定的第一分布，测量与基板上的周边部分相对应的部分处的曝光分布，确定基于所测量的曝光分数使外围部分的曝光成为目标值的第二分布，通过密度滤波器设置邻接单一拍摄区域的拍摄区域以给出第二分布。

10. 发明授权

US6118516A Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns 失效
标题翻译：具有布置在其投影光学系统中的滤光器的投影曝光设备和用于保护电路图案的方法
公开(公告)号：US6118516A
公开(公告)日：2000-09-12
申请号：US826063
申请日：1997-03-24
申请人： Nobuyuki Irie , Nobutaka Magome , Yasuaki Tanaka , Naomasa Shiraishi , Shigeru Hirukawa
发明人： Nobuyuki Irie , Nobutaka Magome , Yasuaki Tanaka , Naomasa Shiraishi , Shigeru Hirukawa
IPC分类号： G03F7/20 , G03F9/00 , G03B27/42
CPC分类号： G03F7/70125 , G03F7/70308 , G03F7/70333 , G03F9/70 , G03F9/7015 , G03F9/7076
摘要： A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.
摘要翻译：一种投影曝光装置，当通过设置瞳孔滤光片的投影光学系统观察或投影标记时，可以对所选标记进行优异的观察或投影。投影曝光装置，其通过投影光学系统将掩模上的图案投影到保持在基板台上的感光基板上，该感光基板可在与投影光学系统的光轴垂直的平面中移动，并具有瞳孔滤光器（光学校正板）放置在投影光学系统的光瞳平面上或附近，以基于瞳孔滤光器的形状的比例因子形成在基板台上的基准标记，用照明光照射基准标记的照明装置，以及光接收装置用于接收从基准标记出来的照明光，然后通过投影光学系统。

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